Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2013
04/25/2013US20130098392 Method and apparatus for processing wafer-shaped articles
04/25/2013US20130098391 Method and apparatus for processing wafer-shaped articles
04/25/2013US20130098390 Device for processing a carrier and a method for processing a carrier
04/25/2013US20130098291 Substrate treatment equipment and manufacturing method of substrate
04/25/2013US20130098274 Sample stage device
04/25/2013US20130097840 Edge seal for lower electrode assembly
04/25/2013DE112011102192T5 Zuführvorrichtung für reaktive Spezies und Oberflächenbehandlungseinrichtung Feeder reactive species and surface treatment device
04/25/2013DE112011101962T5 Methode zur Bildung von Resistmustern und Agens für die Musterminiaturisierung Method for formation of resist patterns and agent for Musterminiaturisierung
04/25/2013DE112011101410T5 Verfahren zum Herstellen einer Halbleitervorrichtung A method of manufacturing a semiconductor device
04/25/2013DE112010003269T5 Kopplung zwischen Strukturen mit sublithographischem Rasterabstand und Strukturen mit lithographischem Rasterabstand Coupling between structures with sublithographischem pitch and structures with lithographic pitch
04/25/2013DE112005001539B4 Vakuumbearbeitungsvorrichtung und Verfahren zum Austausch einer Vakuumbearbeitungskammer einer solchen Vorrichtung Vacuum processing apparatus and method for replacement of a vacuum processing chamber of such a device
04/25/2013DE112004002804B4 Züchtungsverfahren für eine dünne In-reiche Nitridhalbleiterschicht sowie UV-Lichtemissionsbauteil mit In-reicher Nitridhalbleiterschicht The growth method of a thin In-rich nitride semiconductor layer and UV light emitting device with In-rich nitride
04/25/2013DE10336328B4 Vorrichtung zur Bearbeitung eines Siliziumssubstrats An apparatus for processing a silicon substrate
04/25/2013DE102012219330A1 Halbleitervorrichtung und Verfahren zum Bilden von Höckerstrukturen mit einer Schutzschicht A semiconductor device and method for forming humps structures with a protective layer
04/25/2013DE102012204516A1 FinFET-Vorrichtung und Herstellungsverfahren für dieselbe FinFET device and manufacturing method for the same
04/25/2013DE102012110205A1 Vorrichtung zum Bearbeiten eines Trägers und Verfahren zum Bearbeiten eines Trägers An apparatus for processing a carrier and method for processing a carrier
04/25/2013DE102012110133A1 Ein Halbleiterbauelement mit einem Durchkontakt und ein Herstellungsverfahren dafür A semiconductor device having a via and a fabrication method thereof
04/25/2013DE102012109984A1 Halbleiterbauelement und Verfahren Semiconductor device and method
04/25/2013DE102012109961A1 Vorrichtung mit fokussiertem Ionenstrahl Focused ion beam device with
04/25/2013DE102012020481A1 Gruppe III-Nitrid Metall-Isolator-Halbleiter Heterostruktur-Feldeffekttransistoren Group III nitride-metal-insulator-semiconductor heterostructure field-effect transistors
04/25/2013DE102011085078A1 Method for manufacturing silicon layer on substrate in photovoltaic cell in laboratory, involves utilizing agent to form amorphous or part-crystalline silicon after heating layer at temperature below silicon melting temperature
04/25/2013DE102011085038A1 Verfahren zur Kapselung einer elektronischen Anordnung A method for encapsulating an electronic arrangement
04/25/2013DE102011085034A1 Klebemasse insbesondere zur Kapselung einer elektronischen Anordnung Adhesive useful for encapsulating an electronic device
04/25/2013DE102011084843A1 Electroplating of galvanic emitter contact used for silicon-based wafer for solar cell involves using fluoride-containing nickel and/or cobalt electrolyte composition
04/25/2013DE102009030294B4 Verfahren zur Politur der Kante einer Halbleiterscheibe A method for polishing the edge of a semiconductor wafer
04/25/2013DE102005025116B4 Verfahren zum Herstellen einer Struktur A method of producing a structure
04/24/2013EP2584602A1 Package structure, method for manufacturing same, and method for repairing package structure
04/24/2013EP2584601A1 Method for fabricating a dual workfunction semiconductor device
04/24/2013EP2584600A1 Semiconductor integrated circuit device inspection method and semiconductor integrated circuit device
04/24/2013EP2584599A1 Detection method for semiconductor integrated circuit device, and semiconductor integrated circuit device
04/24/2013EP2584598A1 Method of producing a semiconductor device comprising a through-substrate via and a capping layer and corresponding semiconductor device
04/24/2013EP2584597A1 Pitch change device and pitch change method
04/24/2013EP2584596A2 Testing device for testing wafers for electronic circuits and related method
04/24/2013EP2584595A1 Silicon carbide semiconductor device manufacturing method
04/24/2013EP2584594A1 Method for manufacturing silicon carbide semiconductor device and apparatus for manufacturing silicon carbide semiconductor device
04/24/2013EP2584593A2 Formation method for silicon oxynitride film, and substrate having silicon oxynitride film manufactured using same
04/24/2013EP2584592A1 Method for manufacturing silicon carbide semiconductor device and apparatus for manufacturing silicon carbide semiconductor device
04/24/2013EP2584591A1 Method for cleaning silicon carbide semiconductor
04/24/2013EP2584590A1 Process for production of silicon carbide single crystal, and silicon carbide substrate
04/24/2013EP2584589A1 Illuminating optical system, expose device, and device production method
04/24/2013EP2584588A1 Method of forming MIM capacitor with Ru-comprising oxygen diffusion barrier
04/24/2013EP2584409A1 Resist composition, resist pattern formation method, polymeric compound, and compound
04/24/2013EP2584407A1 Method for Printing Etch-masks Using Phase-change Materials
04/24/2013EP2583302A1 Non-volatile memory comprising bit line air gaps and word line air gaps and corresponding manufacturing method
04/24/2013EP2583301A2 Endpoint determination for capillary-assisted flow control
04/24/2013EP2583300A2 Discrete polarization scatterometry
04/24/2013EP2582771A1 Etching composition and its use in a method of making a photovoltaic cell
04/24/2013EP2582655A1 Leaving substituent-containing compound, organic semiconductor material formed therefrom, organic electronic device, organic thin-film transistor and display device using the organic semiconductor material, method for producing film-like product, pi-electron conjugated compound and method for producing the pi-electron conjugated compound
04/24/2013EP1847850B1 Hydrophone assembly
04/24/2013CN202907413U Processing turntable of magnet mounting machine of wafer element
04/24/2013CN202905767U A boat fork sleeve device
04/24/2013CN202905714U Photoelectric coupler integrated with two bidirectional controlled silicon chip
04/24/2013CN202905700U Pin type power device, heat radiation structure and pin clamp thereof
04/24/2013CN202905686U Multichip wafer level packaging structure
04/24/2013CN202905685U 伸缩式真空吸笔 Telescopic vacuum suction pen
04/24/2013CN202905684U Welding platform used for solar cells
04/24/2013CN202905683U Substrate bearing device capable of uniformly adjusting surface temperature
04/24/2013CN202905682U Battery-string turnover box for manufacturing solar battery assembly
04/24/2013CN202905681U Silicon wafer conveying mechanism
04/24/2013CN202905680U Transmission magazine for lead frame
04/24/2013CN202905679U Slice feeding device
04/24/2013CN202905678U A wafer conveyer
04/24/2013CN202905677U Gaily decorated basket used for crystalline silicon solar cells
04/24/2013CN202905676U Transparent cover plate of heat engine orbit
04/24/2013CN202905675U BGA separation device
04/24/2013CN202905674U Wafer reverse direction fool-proof device for semiconductor chip mounter
04/24/2013CN202905673U Wire bonder's XY workbench structure
04/24/2013CN202905672U Wire bonder substrate
04/24/2013CN202898552U Acid-washing conversion device for semi-finished diode products
04/24/2013CN202894635U Structure of aluminum wire linking machine Z direction and corner motion
04/24/2013CN1890784B Strained semiconductor substrate and processes therefor
04/24/2013CN103069931A Film for conductive surface mount terminal and method for manufacturing same
04/24/2013CN103069921A Induction heating apparatus and induction heating method
04/24/2013CN103069717A 半导体集成电路 The semiconductor integrated circuit
04/24/2013CN103069586A Light emitting element manufacturing method
04/24/2013CN103069572A Ink for production of compound semiconductor thin film, compound semiconductor thin film produced using the ink, solar cell equipped with the compound semiconductor thin film, and process for production of the solar cell
04/24/2013CN103069571A Silicon carbide semiconductor element and method for producing same
04/24/2013CN103069569A Variable resistance memory element and fabrication methods
04/24/2013CN103069564A Magnetoresistive element and magnetic random-access memory
04/24/2013CN103069563A Method for producing at least one optoelectronic semiconductor component
04/24/2013CN103069562A Sheet adhering device and adhering method
04/24/2013CN103069561A Suction plate
04/24/2013CN103069560A Apparatus for controlling the flow of a gas in a process chamber
04/24/2013CN103069559A Substrate transfer apparatus, system for manufacturing electronic device, and method for manufacturing electronic device
04/24/2013CN103069558A Wafer storing device, and wafer cassette storage case
04/24/2013CN103069557A Wire loops, methods of forming wire loops, and related process
04/24/2013CN103069556A Semiconductor module, mould device, and mould-forming method
04/24/2013CN103069555A Method of manufacturing organic semiconductor thin film and monocrystalline organic semiconductor thin film
04/24/2013CN103069554A Method and device for forming organic thin film, and method for manufacturing of organic device
04/24/2013CN103069553A Semiconductor substrate, insulated gate field effect transistor, and method for manufacturing semiconductor substrate
04/24/2013CN103069552A Mos transistors including sion gate dielectric with enhanced nitrogen concentration at its sidewalls
04/24/2013CN103069551A Plasma treatment device, and optical monitor device
04/24/2013CN103069550A Variable-density plasma processing of semiconductor substrates
04/24/2013CN103069549A Cmp slurry recycling system and methods
04/24/2013CN103069548A Composition for removal of nickel-platinum alloy metal
04/24/2013CN103069547A Etching method and etching apparatus
04/24/2013CN103069546A Method for manufacturing semiconductor device
04/24/2013CN103069545A Heat treatment method for wafer, method for producing silicon wafer, silicon wafer, and heat treatment apparatus
04/24/2013CN103069544A P-doped silicon layers
04/24/2013CN103069543A Gas distribution showerhead with high emissivity surface