H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/1992
12/23/1992	EP0519297A2 Radiation-sensitive composition comprising as binders novel polymers with units derived from amides of alpha,beta-unsaturated carboxylic acids
12/23/1992	EP0519175A2 Method for making multilayer electronic circuits
12/23/1992	EP0519156A1 Ground loss protection device particularly for mos integrated circuits
12/23/1992	EP0519128A1 A positive type, photosensitive resinous composition
12/23/1992	EP0519079A1 Process for forming silicon oxide film
12/23/1992	EP0519033A1 Method and device for measuring the temperature of an object and heating method
12/23/1992	EP0472647A4 Voltage stress alterable esd protection structure
12/22/1992	US5173875 Semiconductor memory device
12/22/1992	US5173844 Integrated circuit device having a metal substrate
12/22/1992	US5173840 Molded ic card
12/22/1992	US5173835 Voltage variable capacitor
12/22/1992	US5173792 Electrooptical display with compensative redundancy means
12/22/1992	US5173766 Semiconductor device package and method of making such a package
12/22/1992	US5173765 Conductive adhesive and article made therewith
12/22/1992	US5173764 Semiconductor device having a particular lid means and encapsulant to reduce die stress
12/22/1992	US5173763 Electronic packaging with varying height connectors
12/22/1992	US5173762 Semiconductor device using bonding wires of different materials
12/22/1992	US5173761 Large breakdown voltage
12/22/1992	US5173760 BiCMOS semiconductor device
12/22/1992	US5173757 Charge detection circuit for use in charge transfer device
12/22/1992	US5173753 Inverted coplanar amorphous silicon thin film transistor which provides small contact capacitance and resistance
12/22/1992	US5173752 Semiconductor device having interconnection layer contacting source/drain regions
12/22/1992	US5173719 Method and apparatus for the inspection of patterns
12/22/1992	US5173626 Flip-flop with scan path
12/22/1992	US5173625 Method and apparatus for conversion of signal level from ecl to ttl
12/22/1992	US5173616 Code setting circuit
12/22/1992	US5173574 Soldering connector and method for manufacturing an electric circuit with this soldering connector
12/22/1992	US5173524 Conductive polysulfone resine composition and high-heat-resistant, conductive semi-conductor article molded from same
12/22/1992	US5173451 Soft bond for semiconductor dies
12/22/1992	US5173450 Titanium silicide local interconnect process
12/22/1992	US5173449 Forming T; WN layer by sputtering TiW in N2, purging, forming TiW layer in nitrogen-free atmosphere
12/22/1992	US5173448 Process for fabricating a semiconductor device
12/22/1992	US5173446 Semiconductor substrate manufacturing by recrystallization using a cooling medium
12/22/1992	US5173445 Method of making p-type compound semiconductor employing trimethylgallium, trimethylarsenic and arsine
12/22/1992	US5173444 Method for forming a semiconductor device isolation region
12/22/1992	US5173442 Masking, etching insulation; copper-polyimide substrate
12/22/1992	US5173441 Laser ablation deposition process for semiconductor manufacture
12/22/1992	US5173440 Method of fabricating a semiconductor device by reducing the impurities
12/22/1992	US5173439 Forming wide dielectric-filled isolation trenches in semi-conductors
12/22/1992	US5173438 Method of performing a field implant subsequent to field oxide fabrication by utilizing selective tungsten deposition to produce encroachment-free isolation
12/22/1992	US5173437 Preventing formation of "stringers"; integrated circuits; having recessed oxide isolation pattern
12/22/1992	US5173436 Having floating-gate transistor, tunnel windows; patterning, doping, growing gate oxides
12/22/1992	US5173393 Etch-resistant deep ultraviolet resist process having an aromatic treating step after development
12/22/1992	US5173392 Forming a pattern on a substrate
12/22/1992	US5173389 Polyhydroxy material reacted with 1,2-naphthoquinonediazide-4 or 5-sulfonyl chloride; novolak binder
12/22/1992	US5173380 Photomask
12/22/1992	US5173369 For simplified connecting on inner leads of integrated circuits
12/22/1992	US5173338 Lead frame workholder and transport apparatus and method
12/22/1992	US5173331 Forming a dielectric composite containing conductor parts; for packaging of integrated circuits
12/22/1992	US5173330 Patterning composition and method for patterning on a substrate
12/22/1992	US5173327 LPCVD process for depositing titanium films for semiconductor devices
12/22/1992	US5173271 Heating the silicon from above to below the melting point while a moveable strip heater inbetween scans across the wafer; uniform single crystal
12/22/1992	US5173152 Mixing hydrogen fluoride and water vapor, controlling the temperature of the wafer surface at a temperature higher than that of the vapor and applying vapor to etch dielectric
12/22/1992	US5173151 Method of dry etching in semiconductor device processing
12/22/1992	US5173149 Method of etching semiconductor substrate
12/22/1992	US5173147 Apparatus for sealing a semiconductor package having frosted quartz glass piece and UV light source
12/22/1992	US5173121 Apparatus for the deposition and film formation of silicon on substrates
12/22/1992	US5172851 Method of forming a bump electrode and manufacturing a resin-encapsulated semiconductor device
12/22/1992	CA1311862C Devices having shallow junctions
12/22/1992	CA1311860C Device mounting
12/22/1992	CA1311859C Bipolar transistor having self-aligned emitter-base and method of forming same using selective and non-selective epitaxy
12/22/1992	CA1311857C Environmentally protected semiconductor chip package
12/18/1992	CA2066069A1 Method for making multilayer electronic circuits
12/17/1992	DE4136303A1 Verfahren zur herstellung einer halbleitereinrichtung A process for producing a semiconductor device
12/16/1992	EP0518800A2 Heteroepitaxial growth of germanium on silicon by UHV/CVD
12/16/1992	EP0518789A1 Probe card for testing apparatus of chips
12/16/1992	EP0518783A1 Mask and charged particle beam exposure method using the mask
12/16/1992	EP0518774A1 Process for cleaning oxidized metallic surfaces in the fabrication of interconnection networks and boards for such networks
12/16/1992	EP0518683A1 High power, high frequency metal-semiconductor field-effect transistor formed in silicon carbide
12/16/1992	EP0518642A1 Apparatus for chamfering notch of wafer
12/16/1992	EP0518641A1 Apparatus for chamfering notch of wafer
12/16/1992	EP0518640A1 Method for chamfering notch of wafer and apparatus therefor
12/16/1992	EP0518611A2 Method of fabricating a semiconductor structure having MOS and bipolar devices
12/16/1992	EP0518545A1 Dry lithographic etching with gaseous mixtures of oxygen and chlorine
12/16/1992	EP0518544A2 Anisotropic deposition of dielectrics
12/16/1992	EP0518532A1 Boron-doped diamond
12/16/1992	EP0518524A2 Valve and semiconductor fabricating equipment using the same
12/16/1992	EP0518467A2 Substrate for recording head, recording head and method for producing same
12/16/1992	EP0518418A1 Method of manufacturing a semiconductor device whereby field oxide regions are formed in a surface of a silicon body through oxidation
12/16/1992	EP0518377A2 Method for forming a seed and a semiconductor film using said seed
12/16/1992	EP0518372A1 Rolling element cage constraint
12/16/1992	EP0518332A1 Method and apparatus for liquid-phase epitaxial growth
12/16/1992	EP0518325A2 Epitaxial semiconductor chip with low oxygen zone of adjustable thickness and process of making same
12/16/1992	EP0518196A1 Polyethers based on 9,9-BIS-perfluoroalkyl-3,6-dihydroxy-xanthene or 9-aryl-9-perfluoroalkyl-3,6-dihydroxy-xanthene
12/16/1992	EP0518117A1 Conducting electrode layers for ferroelectric capacitors in integrated circuits and method
12/16/1992	EP0518109A1 Apparatus for vacuum treatment
12/16/1992	EP0518005A2 Via paste compositions and use thereof to form conductive vias in circuitized ceramic substrates
12/16/1992	EP0518000A2 Non-volatile semiconductor memory device and method for manufacturing the same
12/16/1992	EP0517999A1 Apparatus for reactive ion beam etching and plasma-assisted CVD processing
12/16/1992	EP0517923A1 Method of forming minute resist pattern
12/16/1992	CN1067138A Electronic detail mounting module
12/15/1992	US5172403 X-ray exposure apparatus
12/15/1992	US5172399 Semiconductor charge transfer device including charge quantity detection
12/15/1992	US5172337 Semiconductor memory device
12/15/1992	US5172330 Clock buffers arranged in a peripheral region of the logic circuit area
12/15/1992	US5172212 Semiconductor having an improved electrode pad
12/15/1992	US5172211 High resistance polysilicon load resistor
12/15/1992	US5172209 Integral Bi-CMOS logic circuit
12/15/1992	US5172207 Semiconductor wafer to be etched electrochemically
12/15/1992	US5172204 Artificial ionic synapse

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