Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/1998
08/04/1998US5789808 Semiconductor device structured to be less susceptible to power supply noise
08/04/1998US5789803 Semiconductor package
08/04/1998US5789802 Shallow
08/04/1998US5789800 Bipolar transistor having an improved epitaxial base region
08/04/1998US5789798 Low noise propagation semiconductor device
08/04/1998US5789796 Programmable anti-fuse device and method for manufacturing the same
08/04/1998US5789793 Dielectrically isolated well structures
08/04/1998US5789792 Isolation trench structures protruding above a substrate surface
08/04/1998US5789790 Semiconductor device
08/04/1998US5789789 Semiconductor device and manufacturing method for improved voltage resistance between an N-well and N-type diffusion layer
08/04/1998US5789788 Semiconductor device with first and second wells which have opposite conductivity types and a third well region formed on one of the first and second wells
08/04/1998US5789787 Asymmetrical N-channel and P-channel devices
08/04/1998US5789786 High-Voltage CMOS transistors on a standard CMOS wafer
08/04/1998US5789783 Multilevel metallization structure for integrated circuit I/O lines for increased current capacity and ESD protection
08/04/1998US5789782 Lateral semiconductor device with maximized breakdown voltage, and methods of fixing potential of same
08/04/1998US5789780 Transistor with source and drain regions within the semiconductor substrate detached or laterally displaced from the transistor gate
08/04/1998US5789779 IGFET circuit preventing parasitic diode current
08/04/1998US5789778 Semiconductor device with gate insulator film
08/04/1998US5789777 Non-volatile memory having multi-bit data cells with double layered floating gate structure
08/04/1998US5789776 Non-volatile semiconductor device
08/04/1998US5789773 Aluminum, gallium, indium phosphide
08/04/1998US5789769 Semiconductor device having an improved trench isolation
08/04/1998US5789767 Compound semiconductor device
08/04/1998US5789763 Substrate for a display device, a TFT display element using the substrate
08/04/1998US5789762 Semiconductor active matrix circuit
08/04/1998US5789734 Exposure apparatus that compensates for spherical aberration of an image forming device
08/04/1998US5789682 Circuit board assembly torsion tester and method
08/04/1998US5789460 Radiation curable compositions
08/04/1998US5789360 Phosphoric acid, fluoroboric acid, surfactant, water
08/04/1998US5789359 Rinsing, drying; water and air pollution control
08/04/1998US5789325 Coating electronic substrates with silica derived from polycarbosilane
08/04/1998US5789323 Fabrication of metal-ferroelectric-metal capacitors with a two step patterning sequence
08/04/1998US5789322 Focusing collar; patterned apertured gas conduit
08/04/1998US5789321 Low pressure vapor deposition of nitrogen compound and titanium chloride
08/04/1998US5789320 Plating of noble metal electrodes for DRAM and FRAM
08/04/1998US5789319 Method of dual masking for selective gap fill of submicron interconnects
08/04/1998US5789318 Use of titanium hydride in integrated circuit fabrication
08/04/1998US5789317 Low temperature reflow method for filling high aspect ratio contacts
08/04/1998US5789316 Self-aligned method for forming a narrow via
08/04/1998US5789315 Eliminating metal extrusions by controlling the liner deposition temperature
08/04/1998US5789314 Vapor deposition of tetraethyl silicate and etching to suppress void formation
08/04/1998US5789313 Process for producing a semiconductor device with a planar top surface
08/04/1998US5789312 Method of fabricating mid-gap metal gates compatible with ultra-thin dielectrics
08/04/1998US5789311 Depositing electrode on silicon carbide semiconductor; hetaing
08/04/1998US5789310 Doping with an inert gas; forming intakes, drains
08/04/1998US5789309 Method and system for monocrystalline epitaxial deposition
08/04/1998US5789308 Manufacturing method for wafer slice starting material to optimize extrinsic gettering during semiconductor fabrication
08/04/1998US5789307 Method of separating electronic devices contained in a carrier
08/04/1998US5789306 Dual-masked field isolation
08/04/1998US5789305 Locos with bird's beak suppression by a nitrogen implantation
08/04/1998US5789304 Method of forming a capacitor
08/04/1998US5789303 Method of adding on chip capacitors to an integrated circuit
08/04/1998US5789302 Crack stops
08/04/1998US5789301 Method for reducing extrinsic base-collector capacitance
08/04/1998US5789300 Method of making IGFETs in densely and sparsely populated areas of a substrate
08/04/1998US5789298 High performance mosfet structure having asymmetrical spacer formation and method of making the same
08/04/1998US5789296 Method for manufacturing split gate flash memory
08/04/1998US5789295 Method of eliminating or reducing poly1 oxidation at stacked gate edge in flash EPROM process
08/04/1998US5789294 Manufacturing method of nonvolatile memory
08/04/1998US5789293 Nonvolatile memory device and manufacturing method thereof
08/04/1998US5789292 Laser processing method, method for forming a flash memory, insulated gate semiconductor device and method for forming the same
08/04/1998US5789291 Dram cell capacitor fabrication method
08/04/1998US5789290 Polysilicon CMP process for high-density DRAM cell structures
08/04/1998US5789289 Method for fabricating vertical fin capacitor structures
08/04/1998US5789288 Process for the fabrication of semiconductor devices having various buried regions
08/04/1998US5789287 Method of forming field isolation in manufacturing a semiconductor device
08/04/1998US5789286 Method of making a CMOS structure with FETS having isolated wells with merged depletions
08/04/1998US5789285 Manufacturing method for BIMOS
08/04/1998US5789284 Method for fabricating semiconductor thin film
08/04/1998US5789283 Lightly doped drain
08/04/1998US5789282 Method for fabricating thin film transistor
08/04/1998US5789278 Using electroconductive adhesive to join semiconductor die to substrate
08/04/1998US5789273 Method for fabricating compound semiconductor laser
08/04/1998US5789271 Method for fabricating microbump interconnect for bare semiconductor dice
08/04/1998US5789269 Field implant for semiconductor device
08/04/1998US5789268 Method of forming a electrode structure for ferroelectric capacitors for integrated circuits
08/04/1998US5789267 Method of making corrugated cell contact
08/04/1998US5789266 Metal oxide semiconductor field effect transistor (MOSFET) fabrication method
08/04/1998US5789264 Method for manufacturing a thin film actuated mirror having a flat light reflecting surface
08/04/1998US5789141 For improved resolution and increased density of integrated circuits;
08/04/1998US5789120 Method for designing a reticle mask
08/04/1998US5789119 Zones with different scattering or absorption
08/04/1998US5789030 Vapor deposition
08/04/1998US5789028 Method for eliminating peeling at end of semiconductor substrate in metal organic chemical vapor deposition of titanium nitride
08/04/1998US5788871 Dipping material to be etched into bath; measuring weight variations
08/04/1998US5788870 Promotion of the adhesion of fluorocarbon films
08/04/1998US5788869 Methodology for in situ etch stop detection and control of plasma etching process and device design to minimize process chamber contamination
08/04/1998US5788868 Substrate transfer method and interface apparatus
08/04/1998US5788854 Methods for fabrication of thin film inductors, inductor networks, inductor/capactor filters, and integration with other passive and active devices, and the resultant devices
08/04/1998US5788808 Apparatus for forming cavity substrates using compressive pads
08/04/1998US5788801 Real time measurement of etch rate during a chemical etching process
08/04/1998US5788800 Wet etching station and a wet etching method adapted for utilizing the same
08/04/1998US5788799 Apparatus and method for cleaning of semiconductor process chamber surfaces
08/04/1998US5788778 For electronics
08/04/1998US5788773 Substrate spin treating method and apparatus
08/04/1998US5788767 Method for forming single sin layer as passivation film
08/04/1998US5788763 High quality by controlling the oxygen deposits
08/04/1998US5788757 Solution of metal carboxylate in ester solvent, formation of strontium barium titantes, strontium bismuth tantalates and/or niobates, annealing
08/04/1998US5788747 Exhaust pipe passageways for forming films, pressure transferring, cooling and removing
08/04/1998US5788742 Method and apparatus for degassing processing solution for substrates
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