Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
09/1998
09/01/1998US5801417 Self-aligned power MOSFET device with recessed gate and source
09/01/1998US5801416 FET having gate insulating film of nonuniform thickness and asymmetrical source and drain structures
09/01/1998US5801415 Non-volatile-memory cell for electrically programmable read only memory having a trench-like coupling capacitors
09/01/1998US5801414 Non-volatile semiconductor memory having programming region for injecting and ejecting carriers into and from a floating gate
09/01/1998US5801413 Container-shaped bottom electrode for integrated circuit capacitor with partially rugged surface
09/01/1998US5801412 Semiconductor device having a capacitance element with excellent area efficiency
09/01/1998US5801410 Ferroelectric capacitors including extended electrodes
09/01/1998US5801409 Multiphase charge coupled device solid-state image sensors
09/01/1998US5801408 Insulated gate semiconductor device and method of manufacturing the same
09/01/1998US5801407 Semiconductor integrated circuit using standardized analog cells
09/01/1998US5801405 High frequency
09/01/1998US5801399 Semiconductor device with antireflection film
09/01/1998US5801398 Field effect transistor
09/01/1998US5801397 Device having a self-aligned gate electrode wrapped around the channel
09/01/1998US5801396 Integrated circuit
09/01/1998US5801395 Thin film transistor having a buffering pad layer for a liquid crystal display and a method for manufacturing the same
09/01/1998US5801394 Structure for wiring reliability evaluation test and semiconductor device having the same
09/01/1998US5801388 Particle beam, in particular ionic optic imaging system
09/01/1998US5801382 Method of analyzing foreign materials
09/01/1998US5801350 Surface reformation method of high polymer material
09/01/1998US5801315 Developer flow check system and method thereof
09/01/1998US5801105 Multilayer thin film, substrate for electronic device, electronic device, and preparation of multilayer oxide thin film
09/01/1998US5801104 Uniform dielectric film deposition on textured surfaces
09/01/1998US5801103 Etching process which protects metal
09/01/1998US5801101 Method of forming metal wirings on a semiconductor substrate by dry etching
09/01/1998US5801100 Electroless copper plating method for forming integrated circuit structures
09/01/1998US5801099 Method for forming interconnection of semiconductor device
09/01/1998US5801098 Method of decreasing resistivity in an electrically conductive layer
09/01/1998US5801097 Thermal annealing method employing activated nitrogen for forming nitride layers
09/01/1998US5801096 Covering tungsten plug underlay with interconnecting metal structure(which acts as a mask) before etching
09/01/1998US5801095 Production worthy interconnect process for deep sub-half micrometer back-end-of-line technology
09/01/1998US5801094 Dual damascene process
09/01/1998US5801093 Semiconductors
09/01/1998US5801092 Applying solution containing particles having ceramic cores with crosslinkable organic coating to fill gaps in substrate, then drying and curing yields porous dielectric layer for microelectronic devices
09/01/1998US5801090 Chemical mechanical polishing
09/01/1998US5801089 Method of forming stacked devices
09/01/1998US5801088 Method of forming a gate electrode for an IGFET
09/01/1998US5801087 Method of forming improved contacts from polysilicon to siliconor other polysilicon layers
09/01/1998US5801086 Process for formation of contact conductive layer in a semiconductor device
09/01/1998US5801085 Method for the prevention of misfit dislocation in silicon wafer and silicon structure manufactured thereby
09/01/1998US5801084 Bonded wafer processing
09/01/1998US5801083 Use of polymer spacers for the fabrication of shallow trench isolation regions with rounded top corners
09/01/1998US5801082 Method for making improved shallow trench isolation with dielectric studs for semiconductor integrated circuits
09/01/1998US5801081 Semiconductor device and method of manufacturing semiconductor device
09/01/1998US5801080 Method of manufacturing semiconductor substrate having total and partial dielectric isolation
09/01/1998US5801079 Method for manufacturing a stacked capacitor type semiconductor memory device with good flatness characteristics
09/01/1998US5801078 Forming barrier isolation layer and electrode on surface of semiconductor substrate, then doping and thermal annealing
09/01/1998US5801077 Method of making sidewall polymer on polycide gate for LDD structure
09/01/1998US5801076 Method of making non-volatile memory device having a floating gate with enhanced charge retention
09/01/1998US5801075 Forming protective dielectrics on the metal spacers which are isolated from the gate electrodes
09/01/1998US5801073 Net-shape ceramic processing for electronic devices and packages
09/01/1998US5801072 Method of packaging integrated circuits
09/01/1998US5801069 Method of fabricating thin film piezoelectric device
09/01/1998US5801068 Hermetically sealed microelectronic device and method of forming same
09/01/1998US5801065 Structure and fabrication of semiconductor device having merged resistive/capacitive plate and/or surface layer that provides ESD protection
09/01/1998US5800964 Photoresist composition
09/01/1998US5800951 Exposure method and exposure mask with monitoring patterns
09/01/1998US5800949 Mask, method of producing a device using the mask and aligner with the mask
09/01/1998US5800906 Label for semiconductor wafer
09/01/1998US5800877 Method for forming a fluorine containing silicon oxide film
09/01/1998US5800871 Electrostatic chuck with polymeric impregnation and method of making
09/01/1998US5800763 Method for producing data carriers with embedded elements
09/01/1998US5800761 Method of making an interface layer for stacked lamination sizing and sintering
09/01/1998US5800753 Chemical vapor deposition method
09/01/1998US5800747 Method for molding using an ion implanted mold
09/01/1998US5800726 Selective chemical etching in microelectronics fabrication
09/01/1998US5800725 Etching; polishing
09/01/1998US5800686 Chemical vapor deposition chamber with substrate edge protection
09/01/1998US5800683 Use of calcium and strontium dopants to improve retention performance in a PZT ferroelectric film
09/01/1998US5800667 Apparatus for adhering wafer to supporting substrate
09/01/1998US5800665 Method and apparatus for fabricating semiconductor device
09/01/1998US5800626 Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates
09/01/1998US5800625 Removal of material by radiation applied at an oblique angle
09/01/1998US5800623 Semiconductor wafer support platform
09/01/1998US5800622 Vapor-phase growth apparatus and compound semiconductor device fabricated thereby
09/01/1998US5800621 Plasma source for HDP-CVD chamber
09/01/1998US5800617 Method to deposit highly conformal CVD films
09/01/1998US5800612 Single-crystal semiconductor pulling apparatus
09/01/1998US5800577 Polishing composition for chemical mechanical polishing
09/01/1998US5799995 Vertical wafer carrier handling apparatus
09/01/1998US5799994 For picking up a thin flat object
09/01/1998US5799860 Preparation and bonding of workpieces to form sputtering targets and other assemblies
09/01/1998US5799858 Die bonding device
09/01/1998US5799678 Apparatus for cleansing semiconductor wafer
08/1998
08/27/1998WO1998037627A1 Series powered, parallel output radio frequency generator
08/27/1998WO1998037586A1 Method for fabricating low-resistance contacts on nitride semiconductor devices
08/27/1998WO1998037584A1 Solid state power-control device using group iii nitrides
08/27/1998WO1998037583A1 Method for manufacturing semiconductor device
08/27/1998WO1998037581A2 Power semiconductor devices with a temperature sensor circuit
08/27/1998WO1998037580A1 Area matched package
08/27/1998WO1998037579A1 Process of tungsten chemical vapor deposition onto titanium nitride substrate
08/27/1998WO1998037578A1 Process for producing semiconductor device
08/27/1998WO1998037577A1 Anisotropic, fluorine-based plasma etching method for silicon
08/27/1998WO1998037576A1 Method for manufacturing semiconductor device and system therefor
08/27/1998WO1998037575A1 Surface treatment method and apparatus therefor
08/27/1998WO1998037574A1 Method and apparatus for measuring volume
08/27/1998WO1998037404A1 Method of scanning semiconductor wafers to inspect for defects
08/27/1998WO1998037388A1 Miniature silicon condenser microphone
08/27/1998WO1998037258A1 A rapid thermal processing barrel reactor for processing substrates
08/27/1998WO1998037166A1 Sulfur-containing phosphor powders, methods for making phosphor powders and devices incorporating same