Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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09/01/1998 | US5801417 Self-aligned power MOSFET device with recessed gate and source |
09/01/1998 | US5801416 FET having gate insulating film of nonuniform thickness and asymmetrical source and drain structures |
09/01/1998 | US5801415 Non-volatile-memory cell for electrically programmable read only memory having a trench-like coupling capacitors |
09/01/1998 | US5801414 Non-volatile semiconductor memory having programming region for injecting and ejecting carriers into and from a floating gate |
09/01/1998 | US5801413 Container-shaped bottom electrode for integrated circuit capacitor with partially rugged surface |
09/01/1998 | US5801412 Semiconductor device having a capacitance element with excellent area efficiency |
09/01/1998 | US5801410 Ferroelectric capacitors including extended electrodes |
09/01/1998 | US5801409 Multiphase charge coupled device solid-state image sensors |
09/01/1998 | US5801408 Insulated gate semiconductor device and method of manufacturing the same |
09/01/1998 | US5801407 Semiconductor integrated circuit using standardized analog cells |
09/01/1998 | US5801405 High frequency |
09/01/1998 | US5801399 Semiconductor device with antireflection film |
09/01/1998 | US5801398 Field effect transistor |
09/01/1998 | US5801397 Device having a self-aligned gate electrode wrapped around the channel |
09/01/1998 | US5801396 Integrated circuit |
09/01/1998 | US5801395 Thin film transistor having a buffering pad layer for a liquid crystal display and a method for manufacturing the same |
09/01/1998 | US5801394 Structure for wiring reliability evaluation test and semiconductor device having the same |
09/01/1998 | US5801388 Particle beam, in particular ionic optic imaging system |
09/01/1998 | US5801382 Method of analyzing foreign materials |
09/01/1998 | US5801350 Surface reformation method of high polymer material |
09/01/1998 | US5801315 Developer flow check system and method thereof |
09/01/1998 | US5801105 Multilayer thin film, substrate for electronic device, electronic device, and preparation of multilayer oxide thin film |
09/01/1998 | US5801104 Uniform dielectric film deposition on textured surfaces |
09/01/1998 | US5801103 Etching process which protects metal |
09/01/1998 | US5801101 Method of forming metal wirings on a semiconductor substrate by dry etching |
09/01/1998 | US5801100 Electroless copper plating method for forming integrated circuit structures |
09/01/1998 | US5801099 Method for forming interconnection of semiconductor device |
09/01/1998 | US5801098 Method of decreasing resistivity in an electrically conductive layer |
09/01/1998 | US5801097 Thermal annealing method employing activated nitrogen for forming nitride layers |
09/01/1998 | US5801096 Covering tungsten plug underlay with interconnecting metal structure(which acts as a mask) before etching |
09/01/1998 | US5801095 Production worthy interconnect process for deep sub-half micrometer back-end-of-line technology |
09/01/1998 | US5801094 Dual damascene process |
09/01/1998 | US5801093 Semiconductors |
09/01/1998 | US5801092 Applying solution containing particles having ceramic cores with crosslinkable organic coating to fill gaps in substrate, then drying and curing yields porous dielectric layer for microelectronic devices |
09/01/1998 | US5801090 Chemical mechanical polishing |
09/01/1998 | US5801089 Method of forming stacked devices |
09/01/1998 | US5801088 Method of forming a gate electrode for an IGFET |
09/01/1998 | US5801087 Method of forming improved contacts from polysilicon to siliconor other polysilicon layers |
09/01/1998 | US5801086 Process for formation of contact conductive layer in a semiconductor device |
09/01/1998 | US5801085 Method for the prevention of misfit dislocation in silicon wafer and silicon structure manufactured thereby |
09/01/1998 | US5801084 Bonded wafer processing |
09/01/1998 | US5801083 Use of polymer spacers for the fabrication of shallow trench isolation regions with rounded top corners |
09/01/1998 | US5801082 Method for making improved shallow trench isolation with dielectric studs for semiconductor integrated circuits |
09/01/1998 | US5801081 Semiconductor device and method of manufacturing semiconductor device |
09/01/1998 | US5801080 Method of manufacturing semiconductor substrate having total and partial dielectric isolation |
09/01/1998 | US5801079 Method for manufacturing a stacked capacitor type semiconductor memory device with good flatness characteristics |
09/01/1998 | US5801078 Forming barrier isolation layer and electrode on surface of semiconductor substrate, then doping and thermal annealing |
09/01/1998 | US5801077 Method of making sidewall polymer on polycide gate for LDD structure |
09/01/1998 | US5801076 Method of making non-volatile memory device having a floating gate with enhanced charge retention |
09/01/1998 | US5801075 Forming protective dielectrics on the metal spacers which are isolated from the gate electrodes |
09/01/1998 | US5801073 Net-shape ceramic processing for electronic devices and packages |
09/01/1998 | US5801072 Method of packaging integrated circuits |
09/01/1998 | US5801069 Method of fabricating thin film piezoelectric device |
09/01/1998 | US5801068 Hermetically sealed microelectronic device and method of forming same |
09/01/1998 | US5801065 Structure and fabrication of semiconductor device having merged resistive/capacitive plate and/or surface layer that provides ESD protection |
09/01/1998 | US5800964 Photoresist composition |
09/01/1998 | US5800951 Exposure method and exposure mask with monitoring patterns |
09/01/1998 | US5800949 Mask, method of producing a device using the mask and aligner with the mask |
09/01/1998 | US5800906 Label for semiconductor wafer |
09/01/1998 | US5800877 Method for forming a fluorine containing silicon oxide film |
09/01/1998 | US5800871 Electrostatic chuck with polymeric impregnation and method of making |
09/01/1998 | US5800763 Method for producing data carriers with embedded elements |
09/01/1998 | US5800761 Method of making an interface layer for stacked lamination sizing and sintering |
09/01/1998 | US5800753 Chemical vapor deposition method |
09/01/1998 | US5800747 Method for molding using an ion implanted mold |
09/01/1998 | US5800726 Selective chemical etching in microelectronics fabrication |
09/01/1998 | US5800725 Etching; polishing |
09/01/1998 | US5800686 Chemical vapor deposition chamber with substrate edge protection |
09/01/1998 | US5800683 Use of calcium and strontium dopants to improve retention performance in a PZT ferroelectric film |
09/01/1998 | US5800667 Apparatus for adhering wafer to supporting substrate |
09/01/1998 | US5800665 Method and apparatus for fabricating semiconductor device |
09/01/1998 | US5800626 Control of gas content in process liquids for improved megasonic cleaning of semiconductor wafers and microelectronics substrates |
09/01/1998 | US5800625 Removal of material by radiation applied at an oblique angle |
09/01/1998 | US5800623 Semiconductor wafer support platform |
09/01/1998 | US5800622 Vapor-phase growth apparatus and compound semiconductor device fabricated thereby |
09/01/1998 | US5800621 Plasma source for HDP-CVD chamber |
09/01/1998 | US5800617 Method to deposit highly conformal CVD films |
09/01/1998 | US5800612 Single-crystal semiconductor pulling apparatus |
09/01/1998 | US5800577 Polishing composition for chemical mechanical polishing |
09/01/1998 | US5799995 Vertical wafer carrier handling apparatus |
09/01/1998 | US5799994 For picking up a thin flat object |
09/01/1998 | US5799860 Preparation and bonding of workpieces to form sputtering targets and other assemblies |
09/01/1998 | US5799858 Die bonding device |
09/01/1998 | US5799678 Apparatus for cleansing semiconductor wafer |
08/27/1998 | WO1998037627A1 Series powered, parallel output radio frequency generator |
08/27/1998 | WO1998037586A1 Method for fabricating low-resistance contacts on nitride semiconductor devices |
08/27/1998 | WO1998037584A1 Solid state power-control device using group iii nitrides |
08/27/1998 | WO1998037583A1 Method for manufacturing semiconductor device |
08/27/1998 | WO1998037581A2 Power semiconductor devices with a temperature sensor circuit |
08/27/1998 | WO1998037580A1 Area matched package |
08/27/1998 | WO1998037579A1 Process of tungsten chemical vapor deposition onto titanium nitride substrate |
08/27/1998 | WO1998037578A1 Process for producing semiconductor device |
08/27/1998 | WO1998037577A1 Anisotropic, fluorine-based plasma etching method for silicon |
08/27/1998 | WO1998037576A1 Method for manufacturing semiconductor device and system therefor |
08/27/1998 | WO1998037575A1 Surface treatment method and apparatus therefor |
08/27/1998 | WO1998037574A1 Method and apparatus for measuring volume |
08/27/1998 | WO1998037404A1 Method of scanning semiconductor wafers to inspect for defects |
08/27/1998 | WO1998037388A1 Miniature silicon condenser microphone |
08/27/1998 | WO1998037258A1 A rapid thermal processing barrel reactor for processing substrates |
08/27/1998 | WO1998037166A1 Sulfur-containing phosphor powders, methods for making phosphor powders and devices incorporating same |