Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2003
07/01/2003US6585567 Short CMP polish method
07/01/2003US6585563 In-situ monitoring of linear substrate polishing operations
07/01/2003US6585560 Apparatus and method for feeding slurry
07/01/2003US6585478 Semiconductor handling robot with improved paddle-type end effector
07/01/2003US6585471 Method and apparatus for separating semiconductor elements, and mounting method of semiconductor elements
07/01/2003US6585470 System for transporting substrates
07/01/2003US6585430 System and method for coating and developing
07/01/2003US6585150 Complexing tin oxide with dicarboxylic acid imparting oxidation resistance
07/01/2003US6585145 Die bonder and/or wire bonder with a device for holding down a substrate
07/01/2003US6584989 Comprises deionized water, sulfuric acid, an oxidant such as hydrogen peroxide, and hydrofluoric acid
07/01/2003US6584897 Method and stencil for extruding material on a substrate
07/01/2003US6584807 Method of fabricating a component with crystalline silicon substrate
07/01/2003US6584684 Applying polymer containing ionized metallic particles; exposing to electric field growing dendrites forming electro-conductive path and metallurgical bond; setting polymer for structural reinforcement and electrical insulation
06/2003
06/30/2003CA2415324A1 Multilayer structure, used in particular as a material with high relative permittivity
06/30/2003CA2415312A1 Multilayer structure, used in particular as a material with high relative permittivity
06/30/2003CA2415309A1 Multilayer structure, used in particular as a material with high relative permittivity
06/30/2003CA2414400A1 Electronic component incorporating an integrated circuit and a planar microcondenser
06/26/2003WO2003052890A1 Processing a memory link with a set of at least two laser pulses
06/26/2003WO2003052841A1 Organic field effect transistor with an organic dielectric
06/26/2003WO2003052837A1 Semiconductor device with higher oxygen (o2) concentration within window layers and method for making
06/26/2003WO2003052835A1 Method and system for molecular charge storage field effect transistor
06/26/2003WO2003052834A1 Non-volatile memory device with improved data retention and method therefor
06/26/2003WO2003052833A1 A method for manufacturing a thin film transistor using poly silicon
06/26/2003WO2003052831A1 A method for fabricating high aspect ratio electrodes
06/26/2003WO2003052830A1 Semiconductor devices with localized reduced lifetime regions and their manufacture
06/26/2003WO2003052829A1 Semiconductor device and method for manufacturing the same
06/26/2003WO2003052828A1 Semiconductor device
06/26/2003WO2003052826A1 Polarity reversal tolerant electrical circuit for esd protection
06/26/2003WO2003052817A2 Method of bonding and transferring a material to form a semiconductor device
06/26/2003WO2003052816A1 Sacrificial inlay process for improved integration of porous interlevel dielectrics
06/26/2003WO2003052815A2 Electrode structure for use in an integrated circuit
06/26/2003WO2003052814A1 Method of manufacturing an electronic device
06/26/2003WO2003052813A2 Dual cure b-stageable underfill for wafer level
06/26/2003WO2003052812A2 Non volatile memory cell with a trench transistor
06/26/2003WO2003052811A1 Silicon wafer and method for production of silicon wafer
06/26/2003WO2003052810A1 Substrate treating method
06/26/2003WO2003052809A1 Method for production of dielectric layers using polyfunctional carbosilanes
06/26/2003WO2003052808A2 Self-aligned contact etch with high sensitivity to nitride shoulder
06/26/2003WO2003052807A1 Plasma processor
06/26/2003WO2003052806A1 Plasma treatment apparatus and plasma generation method
06/26/2003WO2003052805A1 Film removing device, film removing method, and substrate processing system
06/26/2003WO2003052802A2 Dual robot processing system
06/26/2003WO2003052801A2 Wafer pad assembly
06/26/2003WO2003052800A2 Semiconductor wafer carrier mapping sensor
06/26/2003WO2003052799A2 A method of forming differential spacers for individual optimization of n-channel and p-channel transistors
06/26/2003WO2003052798A2 Method for improving electromigration performance of metallization features through multiple depositions of binary alloys
06/26/2003WO2003052797A1 Electrically pumped long-wavelength vcsel and methods of fabrication
06/26/2003WO2003052796A2 Automatic multi-channel etching system
06/26/2003WO2003052794A2 Process for formation of a wiring network using a porous interlevel dielectric and related structures
06/26/2003WO2003052792A2 Water carrier for semiconductor process tool
06/26/2003WO2003052790A2 Lens array with a laterally movable optical axis for corpuscular rays
06/26/2003WO2003052762A1 Apparatus and method for non-destructive data storage and retrieval
06/26/2003WO2003052643A1 Clock tree synthesis for mixed domain clocks
06/26/2003WO2003052519A1 Developing solution for photoresist
06/26/2003WO2003052518A1 Developing solution for photoresist
06/26/2003WO2003052517A2 Photolithography overlay control using feedforward overlay information
06/26/2003WO2003052516A1 Method and apparatus for patterning a workpiece
06/26/2003WO2003052515A1 Method of forming optical images, diffraction element for use with this method, apparatus for carrying out this method
06/26/2003WO2003052514A2 Patterning of solid state features by direct write nanolithographic printing
06/26/2003WO2003052511A2 Imaging device in a projection exposure facility
06/26/2003WO2003052482A1 Imaging optical system and projection aligner
06/26/2003WO2003052163A1 Cvd or etching process using 02/03 gas mixture
06/26/2003WO2003052162A1 A method of depositing dielectric materials in damascene applications
06/26/2003WO2003052160A1 Vaporiser/delivery vessel for volatile/thermally sensitive solid and liquid compounds
06/26/2003WO2003052159A1 Amorphous ferrosilicide film exhibiting semiconductor characteristics and method for producing the same
06/26/2003WO2003052016A2 Dual cure b-stageable adhesive for die attach
06/26/2003WO2003051955A1 Epoxidized acetals and thioacetals, episulfidized acetals and thioacetals, and reworkable thermosetting resin compositions formulated therefrom
06/26/2003WO2003051777A1 Method and apparatus for treating waste ozone water and apparatus for treatment with ozone
06/26/2003WO2003051765A2 Method of dividing a substrate into a plurality of individual chip parts
06/26/2003WO2003051581A2 Method and apparatus for alignment of carriers, carrier handlers and semiconductor handling equipment
06/26/2003WO2003051577A1 Abrasive article for the deposition and polishing of a conductive material
06/26/2003WO2003051552A1 Extrusion tool, method for manufacturing shaped article with fins, and heat sink
06/26/2003WO2003041132A3 Gas-assisted rapid thermal processing
06/26/2003WO2003024711A3 Method for producing a ceramic substrate and ceramic substrate
06/26/2003WO2003017342A3 Method for the production of a self-adjusted structure on a semiconductor wafer
06/26/2003WO2002093201A3 Preferred crystal orientation optical elements from cubic materials
06/26/2003WO2002078058A3 Method for the production of a mosfet with very small channel length
06/26/2003WO2002075804A3 Planarization of substrates using electrochemical mechanical polishing
06/26/2003WO2002065547A3 METHOD OF OBTAINING LOW TEMPERATURE ALPHA-Ta THIN FILMS USING WAFER BIAS
06/26/2003WO2002056340A3 Semiconductor device with fuse, resistor, diffusion barrier or capacitor of a refractory metal-silicon-nitrogen compound
06/26/2003WO2002050614B1 Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask
06/26/2003US20030121022 Method and its apparatus for manufacturing simiconductor device
06/26/2003US20030121016 Semiconductor design/fabrication system, semiconductor design/fabrication method and semiconductor design/fabrication program
06/26/2003US20030121014 Design method for integrated circuit chips
06/26/2003US20030121013 Timing model extraction by timing graph reduction
06/26/2003US20030121012 Crosstalk verifying device
06/26/2003US20030120474 Assertion handling for timing model extraction
06/26/2003US20030120459 Method of measuring the probability of failure caused only by defects, method of measuring defect limited yield, and system using the same
06/26/2003US20030120457 System and method for estimating reliability of components for testing and quality optimization
06/26/2003US20030120366 Semiconductor cleaning system and method of controlling the operation of the same
06/26/2003US20030120018 Spin-on-glass anti-reflective coatings for photolithography
06/26/2003US20030119692 Mixture containing complexing agentand corrosion inhibitor; antideposit agent
06/26/2003US20030119434 Apparatus for holding wafer cassettes in a cassette in a cassette tub during a chemical mechanical polishing process
06/26/2003US20030119433 Air platen for leading edge and trailing edge control
06/26/2003US20030119429 Apparatus and methods for controlling wafer temperature in chemical mechanical polishing
06/26/2003US20030119426 Methods for planarization of group VIII metal-containing surfaces using a fixed abrasive article
06/26/2003US20030119424 Methods for cleaning surfaces substantially free of contaminants utilizing filtered carbon dioxide
06/26/2003US20030119337 Process for oxide fabrication using oxidation steps below and above a threshold temperature
06/26/2003US20030119336 Insulation film on semiconductor substrate and method for forming same
06/26/2003US20030119335 Process for producing nanoporous dielectric films at high pH
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