Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2003
10/09/2003WO2003083906A2 An integrated circuit-integrated flexible shear-stress sensor skin
10/09/2003WO2003083902A2 Thermal production of nanowires
10/09/2003WO2003083893A1 Device for confinement of a plasma within a volume
10/09/2003WO2003083873A1 Method for producing a reference layer and an mram memory cell provided with said type of reference layer
10/09/2003WO2003083582A1 Ph buffered compositions for cleaning semiconductor substrates
10/09/2003WO2003083581A1 Resist releasing agent
10/09/2003WO2003083579A1 Collector unit comprising a reflective element for lighting systems having a wavelength of less than 193 nm
10/09/2003WO2003083522A2 System and method of broad band optical end point detection for film change indication
10/09/2003WO2003083494A1 Test probe alignment apparatus
10/09/2003WO2003083453A1 Method and system using exposure control to inspect a surface
10/09/2003WO2003083450A1 Dark field detection apparatus with traveling lens multi-beam scanner and a method thereof
10/09/2003WO2003083449A1 Wafer defect detection system with traveling lens multi-beam scanner
10/09/2003WO2003083429A1 A novel highly-integrated flash memory and mask rom array architecture
10/09/2003WO2003083408A1 Fizeau lens, interference measuring device, interference measuring method, method of manufacturing projective optical system, and projective exposure device
10/09/2003WO2003083175A2 Method and apparatus for electrochemical processing
10/09/2003WO2003083170A1 Cvd method using pulsed gas flow
10/09/2003WO2003083167A1 Vapor deposition of silicon dioxide nanolaminates
10/09/2003WO2003083002A1 Pressure sensitive adhesive film for protection of semiconductor wafer surface and method of protecting semiconductor wafer with the pressure sensitive adhesive film
10/09/2003WO2003082940A1 Film adhesives containing maleimide and related compounds and methods for use thereof
10/09/2003WO2003082523A1 Fluid mixing device and cutting device
10/09/2003WO2003082522A1 Apparatus and methods for detecting transitions of wafer surface properties in chemical mechanical polishing for process status and control
10/09/2003WO2003082521A1 Method and apparatus for heating polishing pad
10/09/2003WO2003082486A1 Removal of contaminants using supercritical processing
10/09/2003WO2003070610A3 Local store for a wafer processing station
10/09/2003WO2003067596A3 Semiconductor memory cell having a trench and a planar selection transistor and method for producing the same
10/09/2003WO2003063243B1 Thin films, structures having thin films, and methods of forming thin films
10/09/2003WO2003061904B1 Chemical mechanical polishing apparatus and method having a retaining ring with a contoured surface for slurry distribution
10/09/2003WO2003055445A3 Compositions and methods for enhancing corticosteriod delivery
10/09/2003WO2003040252A3 Chemical mechanical polishing compositions
10/09/2003WO2003038904A3 Field effect transistor on insulating layer and manufacturing method
10/09/2003WO2003038893A3 Semiconductor structure and method for the production thereof
10/09/2003WO2003036767A3 Parallel, individually addressable probes for nanolithography
10/09/2003WO2003034499A3 Semiconductor structure having compensated resistance in the ldd region, and method for producing the same
10/09/2003WO2003032393A3 Double densed core gates in sonos flash memory
10/09/2003WO2003032383A3 Method for making a thin layer comprising all or part of component(s) and/or of circuit(s)
10/09/2003WO2003025678A3 Method and device for control of the data flow on application of reticles in a semiconductor component production
10/09/2003WO2003017331A3 Memory cell with a trench capacitor and vertical selection transistor and annular contacting area formed between them
10/09/2003WO2003015159A3 Trench isolation having a self-adjusting surface seal and method for producing one such trench isolation
10/09/2003WO2003012882A3 Effecting intersignal treatment with a plurality of signals
10/09/2003WO2003009337A3 Ferroelectric circuit element that can be fabricated at low temperatures and method for making same
10/09/2003WO2003007342A3 Alignment of semiconductor wafers and other articles
10/09/2003WO2003003118A3 Mask repair with electron beam-induced chemical etching
10/09/2003WO2002103582A3 Method and system for design selection by interactive visualization
10/09/2003WO2002101466A3 Exposure control for phase shifting photolithographic masks
10/09/2003WO2002099813A3 Semiconductor storage location
10/09/2003WO2002099500A3 Correction of birefringence in cubic crystalline projection lenses and optical systems
10/09/2003WO2002097891A3 Dram cell arrangement with vertical mos transistors and method for the production thereof
10/09/2003WO2002071167A3 Manufacturing system and method for processing materials
10/09/2003WO2002063677A3 Formation of a tantalum-nitride layer
10/09/2003WO2002061824A9 Slurry and method for chemical mechanical polishing of copper
10/09/2003WO2002059946A8 Method of producing soi materials
10/09/2003WO2002029949A3 Semiconductor device with protective functions
10/09/2003WO2002017391A3 Method of manufacturing a semiconductor device and a support plate, and a semiconductor device obtained by means of said method
10/09/2003US20030192022 Layout method of voltage division resistors
10/09/2003US20030192019 Design support apparatus for semiconductor devices
10/09/2003US20030191998 Built-in self test circuit
10/09/2003US20030191997 Device and method for testing integrated circuit dice in an integrated circuit module
10/09/2003US20030191693 System and method for conducting an advertising business
10/09/2003US20030191551 Substrate processing system and method
10/09/2003US20030191275 Solvent systems for polymeric dielectric materials
10/09/2003US20030191269 Mixing and reacting organic silane compounds with water in presence of catalyst to hydrolyze and condensation polymerize the silane compounds
10/09/2003US20030190886 Work working method and apparatus, cassette, and unit for printing apparatus
10/09/2003US20030190873 Chemical-mechanical polishing platform
10/09/2003US20030190867 Forming a transparent window in a polishing pad for a chemical mechanical polishing apparatus
10/09/2003US20030190843 Apparatus for forming modular sockets using flexible interconnects and resulting structures
10/09/2003US20030190829 Dual damascene barrier structures and preferential etching method
10/09/2003US20030190823 Method of loading a wafer onto a wafer holder to reduce thermal shock
10/09/2003US20030190822 Charged particle beam adjusting method, pattern transfer method and device manufacturing method using the same method
10/09/2003US20030190821 Nitrogen-rich barrier layer and structures formed
10/09/2003US20030190820 Titanium carbonate films for use in semiconductor processing
10/09/2003US20030190819 Method of patterning dielectric layer with low dielectric constant
10/09/2003US20030190818 Enhanced processing of performance films using high-diffusivity penetrants
10/09/2003US20030190817 Electrode structure, and method for manufacturing thin-film structure
10/09/2003US20030190816 Method for post-CMP conversion of a hydrophobic surface of a low-k dielectric layer to a hydrophilic surface
10/09/2003US20030190815 Apparatus for etching glass substrate
10/09/2003US20030190814 Method of reducing micromasking during plasma etching of a silicon-comprising substrate
10/09/2003US20030190813 Method for forming barrier layer
10/09/2003US20030190812 Electroless deposition method
10/09/2003US20030190811 Elimination of resist footing on tera hardmask
10/09/2003US20030190810 Method of reducing particulate contamination during polishing of a wafer
10/09/2003US20030190809 Defect-minimizing, topology-independent planarization of process surfaces in semiconductor devices
10/09/2003US20030190808 Method of forming a metal-insulator-metal capacitor
10/09/2003US20030190807 Method for manufacturing semiconductor device
10/09/2003US20030190805 Method of manufacturing semiconductor device
10/09/2003US20030190804 Simultaneous cyclical deposition in different processing regions
10/09/2003US20030190803 System and method for analog replication of microdevices having a desired surface contour
10/09/2003US20030190802 Method for forming a plug metal layer
10/09/2003US20030190801 Method for forming a metal extrusion free via
10/09/2003US20030190800 Method of fabricating semiconductor device having metal conducting layer
10/09/2003US20030190798 Method for manufacturing a semiconductor device having a layered gate electrode
10/09/2003US20030190797 Laser irradiation apparatus and method of fabricating a semiconductor device
10/09/2003US20030190795 Method of manufacturing a semiconductor device
10/09/2003US20030190794 Semiconductor substrate and process for producing the same using a composite member having porous layers and varying thickness and porosity
10/09/2003US20030190793 Lateral shift measurement using an optical technique
10/09/2003US20030190792 Semiconductor element comprising a sequence of layers for converting acoustic or thermal signal and electrical voltage changes into each other and method for producing the same
10/09/2003US20030190791 Germanium field effect transistor and method of fabricating the same
10/09/2003US20030190790 Method of fabricating gate dielectric for use in semiconductor device
10/09/2003US20030190788 Semiconductor device and its manufacturing method
10/09/2003US20030190787 Process for realizing a channel scaled and small body gradient VDMOS for high current densities and low driving voltages
10/09/2003US20030190786 Memory manufacturing process with bitline isolation
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