Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2003
10/15/2003CN1124280C Novel monomer and polymer for photoresist, and photoresist using the same
10/15/2003CA2424391A1 Workpiece holder for semiconductor manufacturing apparatus
10/14/2003USRE38273 Baseband RF voltage-current probe
10/14/2003US6634015 Computer-readable storage media stored with a delay library for designing a semiconductor integrated circuit device
10/14/2003US6634013 Wiring failure analysis method using simulation of electromigration
10/14/2003US6634010 ASIC design support system
10/14/2003US6634008 Methodology server based integrated circuit design
10/14/2003US6634002 Test circuit of semiconductor memory
10/14/2003US6633831 Methods and systems for determining a critical dimension and a thin film characteristic of a specimen
10/14/2003US6633793 Method to reduce lot-to-lot variation of array threshold voltage in a DRAM device
10/14/2003US6633501 Integrated circuit and circuit configuration for supplying power to an integrated circuit
10/14/2003US6633498 Magnetoresistive random access memory with reduced switching field
10/14/2003US6633497 Resistive cross point array of short-tolerant memory cells
10/14/2003US6633496 Symmetric architecture for memory cells having widely spread metal bit lines
10/14/2003US6633421 A unit has an array of lasers having an emission surface through which beams can be emitted in a substantially vertical direction so as to define an emission side, drive electronics connected to a side opposite to the emission side of the array
10/14/2003US6633392 X-ray reflectance system to determine suitability of SiON ARC layer
10/14/2003US6633390 Focus measurement in projection exposure apparatus
10/14/2003US6633375 Method and device for optically examining structured surfaces of objects
10/14/2003US6633372 Method for inspection of an analyzed surface and surface scanning analyzer
10/14/2003US6633366 Lithographic apparatus, device manufacturing method, and device manufactured thereby
10/14/2003US6633364 Exposure apparatus, exposure method, and device manufacturing method
10/14/2003US6633363 Scanning exposure apparatus and method
10/14/2003US6633362 Projection exposure apparatus
10/14/2003US6633359 Liquid crystal display having signal lines on substrate intermittently extending and its manufacture
10/14/2003US6633192 Level shift circuit and semiconductor device using the same
10/14/2003US6633183 Antifuse reroute of dies
10/14/2003US6633180 Methods of rerouting dies using antifuses
10/14/2003US6633177 Method of predicting lifetime of semiconductor integrated circuit and method for reliability testing of the circuit
10/14/2003US6633176 Semiconductor device test probe having improved tip portion and manufacturing method thereof
10/14/2003US6633174 Stepper type test structures and methods for inspection of semiconductor integrated circuits
10/14/2003US6633170 Detecting and measuring the level of metal present on the surface of a substrate is achieved. Energy, in the form of rf or light or microwave energy, is directed at the surface of a wafer, the reflected energy or the energy that passes through
10/14/2003US6633167 Signal supply apparatus and method for examining the same, and semiconductor device, electro-optical apparatus and electronic apparatus using the same
10/14/2003US6633132 Plasma gereration apparatus and method
10/14/2003US6633085 Method of selectively alloying interconnect regions by ion implantation
10/14/2003US6633084 Semiconductor wafer for improved chemical-mechanical polishing over large area features
10/14/2003US6633082 Semiconductor device and method for manufacturing the semiconductor device
10/14/2003US6633081 Semiconductor device on a packaging substrate
10/14/2003US6633080 Semiconductor device
10/14/2003US6633077 Semiconductor device and method for manufacturing the same
10/14/2003US6633076 Methods and apparatus for producing stable low k FSG film for HDP-CVD
10/14/2003US6633075 Heterojunction bipolar transistor and method for fabricating the same
10/14/2003US6633074 Integrated circuit wiring with low RC time delay
10/14/2003US6633073 Method and apparatus for isolating circuits using deep substrate n-well
10/14/2003US6633072 Fabrication method for semiconductor integrated circuit devices and semiconductor integrated circuit device
10/14/2003US6633071 Contact on a P-type region
10/14/2003US6633070 Semiconductor device
10/14/2003US6633069 A bipolar transistor has metal silicide as a base lead-out electrode instead of conventional polysilicon, and the metal silicide film extends to an edge of an etching stopper layer, to reduce an emitter resistance and restrain an occurrence of
10/14/2003US6633067 Compact SOI body contact link
10/14/2003US6633066 CMOS integrated circuit devices and substrates having unstrained silicon active layers
10/14/2003US6633065 High-voltage transistor with multi-layer conduction region
10/14/2003US6633062 Semiconductor device incorporated therein high K capacitor dielectric and method for the manufacture thereof
10/14/2003US6633061 SOI substrate, a semiconductor circuit formed in a SOI substrate, and an associated production method
10/14/2003US6633060 Contact structure for a ferroelectric memory device
10/14/2003US6633059 Semiconductor device having MOS transistor
10/14/2003US6633057 Non-volatile semiconductor memory and fabricating method therefor
10/14/2003US6633056 Hetero-integration of dissimilar semiconductor materials
10/14/2003US6633050 Virtual gauging system for use in lithographic processing
10/14/2003US6633048 High output extreme ultraviolet source
10/14/2003US6633047 Apparatus and method for introducing impurity
10/14/2003US6633045 Assembly part with wiring and for manufacturing system, method of manufacturing such assembly part, and semiconductor manufacturing system constituted using assembly part
10/14/2003US6633022 A controller controls the temperature of a hot plate and the degree of vacuum in a tightly closed space to a temperature and a pressure at levels at which a thinner contained in a resist applied to a wafer volatilizes and an acid generator, a
10/14/2003US6633002 Tape carrier having high flexibility with high density wiring patterns
10/14/2003US6632893 Used as an underfilling sealant between such a semiconductor device and a circuit board to which the semiconductor device is electrically connected
10/14/2003US6632751 Method and apparatus for liquid-treating and drying a substrate
10/14/2003US6632750 Depositing a silicon nitride film to give a uniform thickness over the main surface of a semiconductor wafer having a high pattern density region and a low pattern density region.
10/14/2003US6632749 Method for manufacturing silicon oxide film, method for manufacturing semiconductor device, semiconductor device, display device and infrared light irradiating device
10/14/2003US6632748 For use as porogen, so as to form uniform nano-pores
10/14/2003US6632747 Method of ammonia annealing of ultra-thin silicon dioxide layers for uniform nitrogen profile
10/14/2003US6632746 Etching method, semiconductor and fabricating method for the same
10/14/2003US6632745 Method of forming almost L-shaped spacer for improved ILD gap fill
10/14/2003US6632744 Manufacturing method of semiconductor integrated circuit device
10/14/2003US6632743 Post-planarization, pre-oxide removal ozone treatment
10/14/2003US6632742 Method for avoiding defects produced in the CMP process
10/14/2003US6632741 Self-trimming method on looped patterns
10/14/2003US6632740 Two-step process for nickel deposition
10/14/2003US6632739 Method for fabricating a semiconductor device
10/14/2003US6632738 Method of manufacturing semiconductor device
10/14/2003US6632737 Method for enhancing the adhesion of a barrier layer to a dielectric
10/14/2003US6632736 Method of forming low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer
10/14/2003US6632735 Method of depositing low dielectric constant carbon doped silicon oxide
10/14/2003US6632733 Components and methods with nested leads
10/14/2003US6632732 Stereolithographically fabricated conductive elements, semiconductor device components and assemblies including such conductive elements, and methods
10/14/2003US6632731 Structure and method of making a sub-micron MOS transistor
10/14/2003US6632730 Method for self-doping contacts to a semiconductor
10/14/2003US6632729 Laser thermal annealing of high-k gate oxide layers
10/14/2003US6632728 Increasing the electrical activation of ion-implanted dopants
10/14/2003US6632727 Expanded implantation of contact holes
10/14/2003US6632726 Film formation method and film formation apparatus
10/14/2003US6632724 Controlled cleaving process
10/14/2003US6632723 Semiconductor device
10/14/2003US6632722 Fiducial mark bodies for charged-particle-beam (CPB) microlithography, methods for making same, and CPB microlithography apparatus comprising same
10/14/2003US6632721 Method of manufacturing semiconductor devices having capacitors with electrode including hemispherical grains
10/14/2003US6632719 Capacitor structures with recessed hemispherical grain silicon
10/14/2003US6632718 Disposable spacer technology for reduced cost CMOS processing
10/14/2003US6632717 Transistor of semiconductor device and method of manufacturing the same
10/14/2003US6632716 Better stable operation performance by preventing an element isolating film being etched away
10/14/2003US6632715 Semiconductor device having nonvolatile memory cell and field effect transistor
10/14/2003US6632714 Method for manufacturing semiconductor memory
10/14/2003US6632712 Method of fabricating variable length vertical transistors
10/14/2003US6632711 Process for producing thin film semiconductor device and laser irradiation apparatus
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