Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2013
12/03/2013US8596312 Gas charging apparatus, gas discharging apparatus, gas charging method, and gas discharging method
12/03/2013DE202006021231U1 Leistungshalbleitermodul The power semiconductor module
12/03/2013CA2436759C Method for modifying the impedance of semiconductor devices using a focused heating source
11/2013
11/28/2013WO2013177576A1 Method for fabrication of high aspect ratio trenches and formation of nanoscale features therefrom
11/28/2013WO2013177557A2 Methods of atomic layer deposition of hafnium oxide as gate dielectrics
11/28/2013WO2013177552A1 Monolithically integrated sic mosfet and schottky barrier diode
11/28/2013WO2013177541A1 Polymer hot-wire chemical vapor deposition in chip scale packaging
11/28/2013WO2013177477A1 Photoemission monitoring of euv mirror and mask surface contamination in actinic euv systems
11/28/2013WO2013177472A1 Cmp pad dresser having leveled tips and associated methods
11/28/2013WO2013177299A2 Three dimensional microelectronic components and fabrication methods for same
11/28/2013WO2013177251A1 Polishing composition for nickel-phosphorous-coated memory disks
11/28/2013WO2013177208A1 Overlay targets with orthogonal underlayer dummyfill
11/28/2013WO2013177134A1 Substrate-less stackable package with wire-bond interconnect
11/28/2013WO2013177110A1 Cmp composition containing zirconia particles and method of use
11/28/2013WO2013177047A1 Apparatus and method for improving efficiency of thin-film photovoltaic devices
11/28/2013WO2013177045A1 Design alteration for wafer inspection
11/28/2013WO2013177003A1 Conformal sacrificial film by low temperature chemical vapor deposition technique
11/28/2013WO2013176964A1 Method of forming a micro device transfer head with silicon electrode
11/28/2013WO2013176963A1 Micro device transfer head with silicon electrode
11/28/2013WO2013176960A2 Multi-level contact to a 3d memory array and method of making
11/28/2013WO2013176906A1 Hemt device and method of manufacturing the same
11/28/2013WO2013176905A1 A high electron mobility field effect transistor and method of manufacturing the same
11/28/2013WO2013176904A1 Hemt device and method of manufacturing the same
11/28/2013WO2013176824A1 Semiconductor constructions and methods of forming semiconductor constructions
11/28/2013WO2013176680A1 Copper substrate for deposition of graphene
11/28/2013WO2013176496A1 Method and apparatus for measuring physical properties of deposited thin film
11/28/2013WO2013176453A1 Apparatus for substrate treatment and method for operating the same
11/28/2013WO2013176446A1 Probe card
11/28/2013WO2013176445A1 Probe card
11/28/2013WO2013176408A1 Nozzle unit and substrate-processing system including the nozzle unit
11/28/2013WO2013176294A1 Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, and electronic device
11/28/2013WO2013176291A1 Composite substrate, light-emitting element, and method for manufacturing composite substrate
11/28/2013WO2013176247A1 Method for manufacturing transistor and transistor
11/28/2013WO2013176222A1 Substrate processing apparatus and device manufacturing method
11/28/2013WO2013176203A1 Semiconductor device
11/28/2013WO2013176199A1 Programmable logic device and semiconductor device
11/28/2013WO2013176178A1 Exposure device, exposure method, and method for manufacturing device
11/28/2013WO2013176168A1 Component for plasma processing apparatus, and method for manufacturing component for plasma processing apparatus
11/28/2013WO2013176146A1 Manufacturing method for optical member, optical member, optical member having protective film, and manufacturing method for optical panel
11/28/2013WO2013176144A1 Plasma processing device and plasma processing method
11/28/2013WO2013176122A1 Polishing solution composition for wafers
11/28/2013WO2013176120A1 Surface protecting adhesive tape for use in semiconductor processing
11/28/2013WO2013176097A1 GaN SEMICONDUCTOR ELEMENT AND MANUFACTURING METHOD THEREOF
11/28/2013WO2013176089A1 Cutting method for item to be processed, item to be processed and semiconductor element
11/28/2013WO2013176063A1 Chemical amplification resist composition, resist film using the same, resist-coated mask blank, method of forming photomask and pattern, and method of manufacturing electronic device and electronic device
11/28/2013WO2013176048A1 Method for feeding raw material and device for feeding raw material
11/28/2013WO2013176037A1 Process for producing semiconductor device
11/28/2013WO2013176025A1 Conveyor
11/28/2013WO2013176020A1 Photocurable resin composition for imprinting, method for producing same, and structure
11/28/2013WO2013175998A1 Failure detection system, generating circuit and program
11/28/2013WO2013175987A1 Dicing sheet
11/28/2013WO2013175976A1 Polishing agent composition for cmp and method for manufacturing a device wafer using said polishing agent composition for cmp
11/28/2013WO2013175954A1 Probe apparatus, and wafer placing table for probe apparatus
11/28/2013WO2013175934A1 Coating device, susbstrate processing system, and substrate processing method
11/28/2013WO2013175897A1 Substrate processing apparatus and substrate processing method
11/28/2013WO2013175882A1 Cutting mechanism, joining mechanism, substrate processing system, substrate processing device, and substrate processing method
11/28/2013WO2013175880A1 Silicon carbide semiconductor device and method for manufacturing same
11/28/2013WO2013175872A1 Gas treatment method
11/28/2013WO2013175859A1 Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
11/28/2013WO2013175857A1 Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
11/28/2013WO2013175856A1 Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
11/28/2013WO2013175854A1 Slurry, polishing-solution set, polishing solution, substrate polishing method, and substrate
11/28/2013WO2013175840A1 Silicon carbide semiconductor device and method for manufacturing same
11/28/2013WO2013175835A1 Reflector, projection optical system, exposure apparatus, and device manufacturing method
11/28/2013WO2013175705A1 Method for manufacturing soi wafer
11/28/2013WO2013175692A1 Auxiliary adhesive and manufacturing method thereof
11/28/2013WO2013175562A1 Semiconductor manufacturing apparatus
11/28/2013WO2013175557A1 Semiconductor device
11/28/2013WO2013175470A1 Nanoshell, method of fabricating same and uses thereof
11/28/2013WO2013175396A1 A process for the manufacture of semiconductor devices comprising the chemical mechanical polishing (cmp) of iii-v material in the presence of a cmp composition comprising a specific non-ionic surfactant
11/28/2013WO2013175326A1 Spin logic based on persistent spin helices
11/28/2013WO2013175278A1 Process for treating a semiconductor-on-insulator structure for improving thickness uniformity of the semiconductor layer
11/28/2013WO2013175166A1 Method and carrier for handling a substrate
11/28/2013WO2013175052A1 Coating and material method
11/28/2013WO2013174912A1 Etching method for iii‑v semiconductor materials
11/28/2013WO2013174418A1 Method for producing an electronic subassembly
11/28/2013WO2013174215A1 Photoresist stripping method after being etched by polyimide in manufacturing process of micromotor system
11/28/2013WO2013174177A1 High-voltage device isolation structure of high-voltage bcd process and manufacturing method thereof
11/28/2013WO2013174138A1 Method for manufacturing graphene-based dual-gate mosfet
11/28/2013WO2013174108A1 Thin film transistor, method for manufacturing same, and array substrate
11/28/2013WO2013174094A1 Dynamic random access memory cell and fabrication method therefor
11/28/2013WO2013174070A1 Semiconductor device and manufacturing method thereof
11/28/2013WO2013174069A1 Semiconductor structure and method for forming the same
11/28/2013WO2013174045A1 Method for substituting chlorine atom on film layer
11/28/2013WO2013174044A1 Photomask and method for manufacturing same
11/28/2013WO2013173999A1 Loadlock chamber and method for treating substrates using the same
11/28/2013WO2013173998A1 Method and apparatus for pulse electrochemical polishing
11/28/2013WO2013173944A1 Semiconductor device manufacturing method
11/28/2013WO2013173867A1 Advanced hydrogenation of silicon solar cells
11/28/2013WO2013128480A9 Vertical semiconductor device and manufacturing process of the same
11/28/2013WO2013095147A9 Method of bonding two substrates and device manufactured thereby
11/28/2013WO2013016136A3 A two-part dual-cure adhesive for use on electronics
11/28/2013US20130316620 Retainer ring
11/28/2013US20130316548 Single-shot semiconductor processing system and method having various irradiation patterns
11/28/2013US20130316547 Mitigation of silicide formation on wafer bevel
11/28/2013US20130316546 Methods of atomic layer deposition of hafnium oxide as gate dielectrics
11/28/2013US20130316545 Film forming method
11/28/2013US20130316544 Method for replacing chlorine atoms on a film layer
11/28/2013US20130316543 Method and apparatus for substrate-mask alignment
11/28/2013US20130316542 Spalling utilizing stressor layer portions
1 ... 412 413 414 415 416 417 418 419 420 421 422 423 424 425 426 427 428 429 430 431 432 ... 6590