Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
08/2004
08/17/2004US6777322 Method for fabricating a multi-layered dielectric layer including insulating layer having Si-CH3 bond therein
08/17/2004US6777321 Method of forming buried wiring
08/17/2004US6777320 In-plane on-chip decoupling capacitors and method for making same
08/17/2004US6777319 Microelectronic spring contact repair
08/17/2004US6777318 Aluminum/copper clad interconnect layer for VLSI applications
08/17/2004US6777317 Method for semiconductor gate doping
08/17/2004US6777315 Method of controlling the resistivity of Gallium Nitride
08/17/2004US6777314 Method of forming electrolytic contact pads including layers of copper, nickel, and gold
08/17/2004US6777313 Semiconductor device manufacturing method for reinforcing chip by use of seal member at pickup time
08/17/2004US6777312 Wafer-level transfer of membranes in semiconductor processing
08/17/2004US6777311 Thick wafer processing and resultant products
08/17/2004US6777310 Method of fabricating semiconductor devices on a semiconductor wafer using a carrier plate during grinding and dicing steps
08/17/2004US6777309 Method for fabricating thin film transistor display device
08/17/2004US6777308 Method of improving HDP fill process
08/17/2004US6777307 Method of forming semiconductor structures with reduced step heights
08/17/2004US6777306 Memory cell capacitors having an over/under configuration
08/17/2004US6777305 Method for fabricating semiconductor device
08/17/2004US6777303 Method for fabricating an insulation collar in a trench capacitor
08/17/2004US6777302 Nitride pedestal for raised extrinsic base HBT process
08/17/2004US6777301 Method of producing hetero-junction bipolar transistor
08/17/2004US6777300 Method to improve silicide formation on polysilicon
08/17/2004US6777299 Method for removal of a spacer
08/17/2004US6777298 Elevated source drain disposable spacer CMOS
08/17/2004US6777297 Disposable spacer and method of forming and using same
08/17/2004US6777296 Semiconductor device and manufacturing method thereof
08/17/2004US6777295 Method of fabricating trench power MOSFET
08/17/2004US6777294 Method of forming a select line in a NAND type flash memory device
08/17/2004US6777292 Set of three level concurrent word line bias conditions for a NOR type flash memory array
08/17/2004US6777291 Methods of forming programmable memory devices comprising tungsten
08/17/2004US6777290 Global column select structure for accessing a memory
08/17/2004US6777289 Processing methods of forming an electrically conductive plug to a node location
08/17/2004US6777288 Vertical MOS transistor
08/17/2004US6777287 Sputtering a target containing pb, zr, ti, ca and sr to form a pzt ferroelectric film; annealing in an inert atmosphere containing o2; annealing in a second oxidizing atmosphere; and depositing strontium ruthanate
08/17/2004US6777286 Compact SRAM cell incorporating refractory metal-silicon-nitrogen resistive elements and method for fabricating
08/17/2004US6777285 Memory device and method for fabricating the same
08/17/2004US6777284 Method of manufacturing an electronic device
08/17/2004US6777283 Both an insulating gate type transistor for high voltage and one for low voltage are formed in the same step
08/17/2004US6777282 Method of manufacturing a semiconductor memory device having a memory cell portion including MISFETs with a floating gate and a peripheral circuit portion with MISFETs
08/17/2004US6777281 Maintaining LDD series resistance of MOS transistors by retarding dopant segregation
08/17/2004US6777280 Method for fabricating an integrated circuit with a transistor electrode
08/17/2004US6777279 Semiconductor integrated circuit device and manufacturing method thereof
08/17/2004US6777278 Methods of fabricating aluminum gallium nitride/gallium nitride high electron mobility transistors having a gate contact on a gallium nitride based cap segment
08/17/2004US6777277 Manufacturing method of Schottky barrier diode
08/17/2004US6777276 System and method for optimized laser annealing smoothing mask
08/17/2004US6777275 Single anneal for dopant activation and silicide formation
08/17/2004US6777274 Low temperature polycrystalline silicon type thin film transistor and a method of the thin film transistor fabrication
08/17/2004US6777273 Semiconductor display device
08/17/2004US6777272 Method of manufacturing an active matrix display
08/17/2004US6777271 Thyristor-based device including trench isolation
08/17/2004US6777269 Semiconductor integrated circuit device, design method for semiconductor integrated circuit device, design aiding device for semiconductor integrated circuit device, program, and program recording medium
08/17/2004US6777267 Die singulation using deep silicon etching
08/17/2004US6777265 Partially patterned lead frames and methods of making and using the same in semiconductor packaging
08/17/2004US6777264 Method of manufacturing a semiconductor device having a die pad without a downset
08/17/2004US6777263 Film deposition to enhance sealing yield of microcap wafer-level package with vias
08/17/2004US6777262 Method of packaging a semiconductor device having gull-wing leads with thinner end portions
08/17/2004US6777260 Method of making sub-lithographic sized contact holes
08/17/2004US6777258 Conductive etch stop for etching a sacrificial layer
08/17/2004US6777255 Electro-optical device and manufacturing method thereof
08/17/2004US6777254 Semiconductor device and fabrication method thereof
08/17/2004US6777253 Method for fabricating semiconductor, method for fabricating semiconductor substrate, and semiconductor light emitting device
08/17/2004US6777251 Metrology for monitoring a rapid thermal annealing process
08/17/2004US6777250 Manufacture of wafer level semiconductor device with quality markings on the sealing resin
08/17/2004US6777248 Dielectric element and manufacturing method therefor
08/17/2004US6777173 H2O vapor as a processing gas for crust, resist, and residue removal for post ion implant resist strip
08/17/2004US6777171 Using gas mixtures; vapor deposition; applying electricity
08/17/2004US6777167 Comprises sterol layer deposited by evaporation, langmuir-blodgett deposition, spin coating and and/or dip coating
08/17/2004US6777166 Aberrations compensation such as image field curvature
08/17/2004US6777162 Photosensitive polymer and photoresist composition thereof
08/17/2004US6777161 Chemical resistance; uniform film thickness; mixture of phenolic resin and acid generator
08/17/2004US6777158 Method for the preparation of a semiconductor device
08/17/2004US6777157 Copolymers and photoresist compositions comprising same
08/17/2004US6777140 Lithographic apparatus, device manufacturing methods, devices manufactured thereby, method of manufacturing a reflector, reflector manufactured thereby and phase shift mask
08/17/2004US6777139 Method of calibration of a lithographic apparatus, mask for use in calibration of lithographic apparatus, lithographic apparatus, device manufacturing method, device manufactured thereby
08/17/2004US6777045 Chamber components having textured surfaces and method of manufacture
08/17/2004US6777036 Method for the deposition of materials from mesomorphous films
08/17/2004US6776969 Wetting chamber slides out of the housing along guide rails placed at the bottom side edges of the wetting chamber.
08/17/2004US6776919 Method and apparatus for etching ruthenium films
08/17/2004US6776893 Electroplating chemistry for the CU filling of submicron features of VLSI/ULSI interconnect
08/17/2004US6776892 Plating of metals such as copper onto semiconductor wafers and other semiconductor workpieces.
08/17/2004US6776885 Integrated plating and planarization apparatus having a variable-diameter counterelectrode
08/17/2004US6776880 Processing chamber for oxidation, a chamber for solution application, a chamber for baking, and processing chambers for vapor-phase film formation,reliability
08/17/2004US6776874 Processing method and apparatus for removing oxide film
08/17/2004US6776872 Data processing apparatus for semiconductor processing apparatus
08/17/2004US6776871 Method and apparatus for endpointing a chemical-mechanical planarization process
08/17/2004US6776859 Anisotropic bonding system and method using dynamic feedback
08/17/2004US6776850 Preventative maintenance aided tool for CVD chamber
08/17/2004US6776849 Wafer holder with peripheral lift ring
08/17/2004US6776847 Film formation apparatus and film formation method and cleaning method
08/17/2004US6776846 Integrated processing system having multiple reactors connected to a central chamber
08/17/2004US6776845 For applying a liquid which contains a resin dissolved in a solvent, e.g., a polyimide solution, on a substrate, such as a semiconductor wafer or an lcd substrate for a liquid crystal display, to form a liquid film
08/17/2004US6776842 First thin epitaxial deposition, then an anneal; the conditions and duration such that arsenic diffusion length is lower than thickness of the layer, then second epitaxial deposition to desired thickness; avoids autodoping of arsenic
08/17/2004US6776841 Method for fabricating a semiconductor epitaxial wafer having doped carbon and a semiconductor epitaxial wafer
08/17/2004US6776819 Gas supplying apparatus and method of testing the same for clogs
08/17/2004US6776810 Anionic abrasive particles treated with positively charged polyelectrolytes for CMP
08/17/2004US6776806 Isolating, resistive, conducting (or) and/or semiconducting patterns and structures for use in electronic circuits which most particularly consist of a single or several stacked layers of thin films
08/17/2004US6776805 Semiconductor manufacturing apparatus having a moisture measuring device
08/17/2004US6776699 Abrasive pad for CMP
08/17/2004US6776696 Continuous chemical mechanical polishing process for polishing multiple conductive and non-conductive layers on semiconductor wafers
08/17/2004US6776695 Platen design for improving edge performance in CMP applications
08/17/2004US6776694 Methods for carrier head with multi-part flexible membrane