Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2005
03/17/2005US20050059231 Semiconductor device and method for fabricating the same
03/17/2005US20050059230 Method for the lateral contacting of a semiconductor chip
03/17/2005US20050059229 Method of manufacturing Group III nitride crystal substrate, etchant used in the method, Group III nitride crystal substrate, and semiconductor device including the same
03/17/2005US20050059228 Integration of pre-S/D anneal selective nitride/oxide composite cap for improving transistor performance
03/17/2005US20050059227 Thin film transistor and fabrication method for same
03/17/2005US20050059226 Ion implantation method
03/17/2005US20050059225 Method of monitoring introduction on interfacial species
03/17/2005US20050059224 Systems and methods for inducing crystallization of thin films using multiple optical paths
03/17/2005US20050059223 Laser-irradiated thin films having variable thickness
03/17/2005US20050059222 Method of forming polycrystalline semiconductor layer and thin film transistor using the same
03/17/2005US20050059221 Methods and apparatuses for manufacturing ultra thin device layers for integrated circuit devices
03/17/2005US20050059220 Semiconductor device and method of manufacturing the same
03/17/2005US20050059219 Process for fabricating a thin film semiconductor device, thin film semiconductor device, and liquid crystal display
03/17/2005US20050059218 Thin films and production methods thereof
03/17/2005US20050059217 Methods of forming backside connections on a wafer stack
03/17/2005US20050059216 Method of making direct contact on gate by using dielectric stop layer
03/17/2005US20050059215 Semiconductor device with dual gate oxides
03/17/2005US20050059214 Method and structure of vertical strained silicon devices
03/17/2005US20050059213 Semiconductor device with nanoclusters
03/17/2005US20050059212 Nonvolatile semiconductor memory device and its manufacturing method
03/17/2005US20050059211 Method of manufacturing semiconductor device
03/17/2005US20050059209 Local-length nitride SONOS device having self-aligned ONO structure and method of manufacturing the same
03/17/2005US20050059208 Spacer patterned, high dielectric constant capacitor
03/17/2005US20050059207 Method for forming a deep trench capacitor buried plate
03/17/2005US20050059206 Integrated circuit devices having barrier layers between upper electrodes and dielectric layers and methods of fabricating the same
03/17/2005US20050059205 Method of manufacturing semiconductor device
03/17/2005US20050059204 Semiconductor structure with one or more through-holes
03/17/2005US20050059203 Cleaning method for a semiconductor device manufacturing apparatus
03/17/2005US20050059202 Silicon on insulator device and layout method of the same
03/17/2005US20050059201 Mosfet performance improvement using deformation in soi structure
03/17/2005US20050059200 Semiconductor apparatus and method for fabricating the same
03/17/2005US20050059199 Semiconductor device and manufacturing method thereof
03/17/2005US20050059198 Metal gate MOS transistors and methods for making the same
03/17/2005US20050059197 Semiconductor device and method for manufacturing the same
03/17/2005US20050059196 Method for manufacturing semiconductor devices
03/17/2005US20050059195 Manufacturing method for a power device having an auto-aligned double thickness gate layer and corresponding device
03/17/2005US20050059194 Method of forming double-gated silicon-on-insulator (SOI) transistors with corner rounding
03/17/2005US20050059193 Method for forming metal single-layer film, method for forming wiring, and method for producing field effect transistors
03/17/2005US20050059192 Method of fabricating low temperature polysilicon thin film transistor
03/17/2005US20050059191 Method of fabricating low temperature polysilicon thin film transistor
03/17/2005US20050059190 Method of fabricating thin film transistor TFT array
03/17/2005US20050059189 Dual depth trench termination method for improving Cu-based interconnect integrity
03/17/2005US20050059188 Image sensor packages and methods of fabrication
03/17/2005US20050059185 Display apparatus
03/17/2005US20050059184 Method for making a microstructure by surface micromachining
03/17/2005US20050059183 Wafer processing method
03/17/2005US20050059182 Light emitting diode and method of making the same
03/17/2005US20050059181 Semiconductor laser manufacturing method
03/17/2005US20050059180 Masked spacer etching for imagers
03/17/2005US20050059179 Light emitting device processes
03/17/2005US20050059178 Light emitting device processes
03/17/2005US20050059177 A method of producing an imaging device
03/17/2005US20050059172 Fabrication method and structure for ferroelectric nonvolatile memory field effect transistor
03/17/2005US20050059171 Method of laser annealing to form an epitaxial growth layer
03/17/2005US20050059170 Magnetic random access memory designs with patterned and stabilized magnetic shields
03/17/2005US20050058953 A thinner, resist-removing composition comprising an inorganic alkali compound, an organic amine, an organic solvent, anionic and nonionic surfactants and water; removes residue on edges and backs of substrates for thin film transistor-liquid crystal displays and semiconductors; corrosion resistance
03/17/2005US20050058951 photolithography technique to form an organic mono-molecular film pattern, then thin film is selectively grown on the organic monomolecular film pattern, transcribed onto a second substrate to form a micro pattern made of the thin film on the second substrate
03/17/2005US20050058950 Method for reducing pattern dimension in photoresist layer
03/17/2005US20050058944 Dissolving gaseous molecule having oxidizing properties or reducing properties in an aqueous alkaline solution; reducing solution is an aqueous solution containing at least one of hydrogen, hydrogen sulfide, nitric acid, and sulfurous acid; semiconductor manufacturing
03/17/2005US20050058937 photoresists comprising mixtures of alkali-soluble novolaks resin and phenolic compounds esterification with 1,2-naphthoquinonediazidosulfonic acid, having uniformity, high sensitivity and high resolution, and improved heat resistance, film retention, substrate adhesion, and storage stability
03/17/2005US20050058929 For production of layered materials, electronic components and semiconductor components
03/17/2005US20050058915 Photomask
03/17/2005US20050058914 Pattern designing method, photomask manufacturing method, resist pattern forming method and semiconductor device manufacturing method
03/17/2005US20050058913 Stencil mask, charged particle irradiation apparatus and the method
03/17/2005US20050058834 Nanotube films and articles
03/17/2005US20050058785 Substrate for inkjet printing and method of manufacturing the same
03/17/2005US20050058775 Method and apparatus for forming coating film
03/17/2005US20050058447 Substrate processing apparatus for inspecting processing history data
03/17/2005US20050058446 Method, apparatus and computer product for substrate processing
03/17/2005US20050058440 Thermal processing apparatus, thermal processing method, and substrate processing apparatus
03/17/2005US20050058416 Optical devices with engineered nonlinear nanocomposite materials
03/17/2005US20050058415 Optical devices with engineered nonlinear nanocomposite materials
03/17/2005US20050058335 Defect management method
03/17/2005US20050058011 Non-volatile semiconductor memory device, electronic card and electronic device
03/17/2005US20050058009 Memory devices based on electric field programmable films
03/17/2005US20050058006 Semiconductor device, method for testing the same and IC card
03/17/2005US20050057998 Semiconductor device with loop line pattern structure, method and alternating phase shift mask for fabricating the same
03/17/2005US20050057992 Magnetoresistance effect element, method of manufacture thereof, magnetic storage and method of manufacture thereof
03/17/2005US20050057989 Synchronous dynamic random access memory
03/17/2005US20050057984 Printed circuit card kit
03/17/2005US20050057971 Flash memory cell having multi-program channels
03/17/2005US20050057968 Methods for identifying non-volatile memory elements with poor subthreshold slope or weak transconductance
03/17/2005US20050057964 Memory with charge storage locations and adjacent gate structures
03/17/2005US20050057960 Magneto-resistive effect element and magnetic memory
03/17/2005US20050057959 Method of manufacturing a DRAM array
03/17/2005US20050057908 Multi-layered interconnect structure using liquid crystalline polymer dielectric
03/17/2005US20050057902 Mold-type electronic control unit
03/17/2005US20050057887 Single layer capacitor
03/17/2005US20050057883 Moisture-resistant electronic device package and methods of assembly
03/17/2005US20050057881 Clamping and de-clamping semiconductor wafers on a J-R electrostatic chuck having a micromachined surface by using force delay in applying a single-phase square wave AC clamping voltage
03/17/2005US20050057873 Semiconductor device having a protection circuit
03/17/2005US20050057856 Head assembly, disk unit, and bonding method and apparatus
03/17/2005US20050057827 Apparatus and method for retaining mirror, and mirror exchange method
03/17/2005US20050057792 Method of forming a micromechanical structure
03/17/2005US20050057755 Method of measuring meso-scale structures on wafers
03/17/2005US20050057752 Method of detecting attracting force between substrates, and near-field exposure method and apparatus
03/17/2005US20050057748 Selecting a hypothetical profile to use in optical metrology
03/17/2005US20050057747 Method of detecting and classifying scratches, particles and pits on thin film disks or wafers
03/17/2005US20050057740 Lithography tool having a vacuum reticle library coupled to a vacuum chamber
03/17/2005US20050057738 Illumination optical system and exposure apparatus
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