Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2005
03/15/2005US6867080 Polysilicon tilting to prevent geometry effects during laser thermal annealing
03/15/2005US6867079 Method for manufacturing semiconductor device
03/15/2005US6867078 Method for forming a microwave field effect transistor with high operating voltage
03/15/2005US6867077 Semiconductor device and method of manufacturing the same
03/15/2005US6867076 Liquid crystal display for preventing galvanic phenomenon
03/15/2005US6867075 Manufacturing method of thin film transistor in which a total film thickness of silicon oxide films is defined
03/15/2005US6867074 Method of fabricating a polysilicon layer
03/15/2005US6867073 Single mask via method and device
03/15/2005US6867072 Flipchip QFN package and method therefor
03/15/2005US6867071 Leadframe including corner leads and semiconductor package using same
03/15/2005US6867070 Bonding pad structure of a semiconductor device and method for manufacturing the same
03/15/2005US6867069 Semiconductor package with a chip connected to a wiring substrate using bump electrodes and underfilled with sealing resin
03/15/2005US6867068 Semiconductor device, method of making the same, circuit board, and film carrier tape
03/15/2005US6867067 Methods for fabricating final substrates
03/15/2005US6867065 Method of making a microelectronic assembly
03/15/2005US6867064 Method to alter chalcogenide glass for improved switching characteristics
03/15/2005US6867063 Organic spin-on anti-reflective coating over inorganic anti-reflective coating
03/15/2005US6867059 A-C:H ISFET device manufacturing method, and testing methods and apparatus thereof
03/15/2005US6867058 Transparent electrode film and group III nitride semiconductor device
03/15/2005US6867057 Method of manufacturing a semiconductor laser
03/15/2005US6867055 Method of testing ion implantation energy in ion implantation equipment
03/15/2005US6867054 Method of manufacturing a semiconductor device
03/15/2005US6867053 Fabrication of a FeRAM capacitor using a noble metal hardmask
03/15/2005US6866987 Resolution and process window improvement using lift-off
03/15/2005US6866986 Method of 193 NM photoresist stabilization by the use of ion implantation
03/15/2005US6866976 Monitoring method, exposure method, a manufacturing method for a semiconductor device, including an etching method and exposure processing unit
03/15/2005US6866973 For forming semiconductor device
03/15/2005US6866971 Full phase shifting mask in damascene process
03/15/2005US6866969 Photomask, microstructure, manufacturing method of photomask, and aligner
03/15/2005US6866968 Photomask for off-axis illumination and method of fabricating the same
03/15/2005US6866929 Glass powders, methods for producing glass powders and devices fabricated from same
03/15/2005US6866900 Methods which increase ratio of processed wafers to plasma reaction chamber internal sidewall cleanings while maintaining low particle counts on wafers; sequentially processing, plasma-enhanced deposition of material on wafer
03/15/2005US6866893 Pressing open end against resin transferring layer of material; drying
03/15/2005US6866891 Targeted deposition of nanotubes
03/15/2005US6866890 Method of forming a dielectric film
03/15/2005US6866882 Method of forming a thin film
03/15/2005US6866793 High selectivity and high planarity dielectric polishing
03/15/2005US6866763 Thickness profile control member is included that has first and second regions that allow for processing at first and second rates different from each other; for planar deposition or etching of conductive layers in integrated circuits
03/15/2005US6866752 Method of forming ultra thin film devices by vacuum arc vapor deposition
03/15/2005US6866747 Plasma processing apparatus
03/15/2005US6866746 Clamshell and small volume chamber with fixed substrate support
03/15/2005US6866745 Semiconductor manufacturing apparatus
03/15/2005US6866744 Semiconductor processing apparatus and a diagnosis method therefor
03/15/2005US6866741 Dispensing a liquid polymeric material between a conducting surface on a first substrate and a conducting surface on a second substrate, pressing the liquid polymeric material so that it flows towards edges of both substrates, curing
03/15/2005US6866723 Wet cleaning process and wet cleaning equipment
03/15/2005US6866721 Apparatus and method for photo-induced process
03/15/2005US6866567 Activated slurry CMP system and methods for implementing the same
03/15/2005US6866564 Method of backgrinding wafers while leaving backgrinding tape on a chuck
03/15/2005US6866470 Methods and apparatus for retaining a tray stack having a plurality of trays for carrying microelectronic devices
03/15/2005US6866460 Apparatus and method for loading of carriers containing semiconductor wafers and other media
03/15/2005US6866200 Semiconductor device identification apparatus
03/15/2005US6866182 Apparatus and method to prevent oxidation of electronic devices
03/15/2005US6866148 Spool case for bonding wire, and method of handling spool using same
03/15/2005US6866094 Temperature-controlled chuck with recovery of circulating temperature control fluid
03/15/2005US6866051 Megasonic substrate processing module
03/15/2005US6866049 Device addressing gas contamination in a wet process
03/15/2005US6865764 Fixture for assembling a post-CMP cleaning brush
03/15/2005CA2843395A1 Device package and methods for the fabrication and testing thereof
03/15/2005CA2793031A1 Device package and methods for the fabrication and testing thereof
03/15/2005CA2481637A1 Device package and methods for the fabrication and testing thereof
03/15/2005CA2481616A1 Device package and methods for the fabrication and testing thereof
03/15/2005CA2338314C Semiconductor thin film and thin film device
03/10/2005WO2005022967A1 Electronic part manufacturing method
03/10/2005WO2005022966A2 A method for pattern metalization of substrates
03/10/2005WO2005022664A2 Production of electronic devices
03/10/2005WO2005022661A2 Correcting potential defects in an oled device
03/10/2005WO2005022655A1 Algainn based optical device and fabrication method thereof
03/10/2005WO2005022650A1 Field effect transistor and method of manufacturing the same
03/10/2005WO2005022649A1 Field effect transistor and method of manufacturing the same
03/10/2005WO2005022648A1 Method of fabricating a double gate field effect transistor device, and such a double gate field effect transistor device
03/10/2005WO2005022647A1 Vertical nanotransistor, method for producing the same and memory assembly
03/10/2005WO2005022645A2 Electronic device comprising an ldmos transistor
03/10/2005WO2005022644A1 Zinc oxide-based multilayer structural body and its producing method
03/10/2005WO2005022643A1 Thermal stability for silver metallization
03/10/2005WO2005022641A1 Semiconductor quantum dot device and its production method
03/10/2005WO2005022640A1 Semiconductor quantum dot device and its production method
03/10/2005WO2005022639A2 Gallium nitride material devices and methods of forming the same
03/10/2005WO2005022637A1 Semiconductor device having fin-type field effect transistors
03/10/2005WO2005022635A1 Semiconductor device protection circuit and semiconductor device having the same
03/10/2005WO2005022633A1 Chip support of a lead frame for an integrated circuit package
03/10/2005WO2005022630A1 Lid and method of employing a lid in an integrated circuit
03/10/2005WO2005022628A1 Sealed pores in low-k material damascene structures
03/10/2005WO2005022627A1 Substrate processing device
03/10/2005WO2005022626A1 Methods for packaging integrated circuits, and integrated circuit packages produced by the method
03/10/2005WO2005022625A1 Basic cell, end section cell, wiring shape, wiring method, shield wiring structure
03/10/2005WO2005022624A1 Method for forming insulating film
03/10/2005WO2005022623A1 High aspect ratio etch using modulation of rf powers of various frequencies
03/10/2005WO2005022622A1 Dry etching process and method for manufacturing magnetic memory device
03/10/2005WO2005022621A1 Polishing composition and polishing method using same
03/10/2005WO2005022620A1 Nitride semiconductor substrate and nitride semiconductor device using same
03/10/2005WO2005022619A1 Method for forming silicon thin-film on flexible metal substrate
03/10/2005WO2005022618A1 Method for depositing thin film on wafer
03/10/2005WO2005022617A1 Masking methods
03/10/2005WO2005022616A1 Exposure apparatus and device producing method
03/10/2005WO2005022615A1 Liquid recovery apparatus, exposure apparatus, exposure method, and device production method
03/10/2005WO2005022614A1 Exposure method and apparatus, and device manufacturing method
03/10/2005WO2005022613A1 Vacuum device, operation method for vacuum device, exposure system, and operation method for exposure system
03/10/2005WO2005022612A1 Fence-free etching of iridium barrier having a steep taper angle
03/10/2005WO2005022611A1 Process for fabrication of a ferroelectric capacitor
03/10/2005WO2005022610A1 Method for manufacturing bonded wafer
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