| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/05/2005 | US6875709 Application of a supercritical CO2 system for curing low k dielectric materials |
| 04/05/2005 | US6875708 Method of producing diamond film and diamond film produced thereby |
| 04/05/2005 | US6875707 Method of forming a capacitor dielectric layer |
| 04/05/2005 | US6875706 Cleaning solution and method of cleaning a semiconductor device using the same |
| 04/05/2005 | US6875705 Method of high selectivity wet etching of salicides |
| 04/05/2005 | US6875704 Method for forming pattern using printing process |
| 04/05/2005 | US6875703 Method for forming quadruple density sidewall image transfer (SIT) structures |
| 04/05/2005 | US6875702 Plasma treatment system |
| 04/05/2005 | US6875701 Nanotopography removing method |
| 04/05/2005 | US6875700 Using electron-free ion-ion plasmas, wherein the substrate bias waveform is synched to a pulsed RF drive where there's a delay between the drive pulse and bias pulse to let the electron count drop to zero; microstructue circuitry |
| 04/05/2005 | US6875699 Method for patterning multilevel interconnects |
| 04/05/2005 | US6875698 Dry etching method |
| 04/05/2005 | US6875697 Dual depth trench isolation |
| 04/05/2005 | US6875696 Ultrasonic-wave washing unit, ultrasonic-wave washing apparatus, ultrasonic-wave washing method, method of manufacturing a semiconductor device, and method of manufacturing a liquid crystal display |
| 04/05/2005 | US6875695 System and method for analog replication of microdevices having a desired surface contour |
| 04/05/2005 | US6875694 Method of treating inlaid copper for improved capping layer adhesion without damaging porous low-k materials |
| 04/05/2005 | US6875693 Via and metal line interface capable of reducing the incidence of electro-migration induced voids |
| 04/05/2005 | US6875692 Copper electromigration inhibition by copper alloy formation |
| 04/05/2005 | US6875691 Temperature control sequence of electroless plating baths |
| 04/05/2005 | US6875690 Semiconductor device having self-aligned contact plug and method for fabricating the same |
| 04/05/2005 | US6875689 Method of patterning lines in semiconductor devices |
| 04/05/2005 | US6875688 Method for reactive ion etch processing of a dual damascene structure |
| 04/05/2005 | US6875687 Capping layer for extreme low dielectric constant films |
| 04/05/2005 | US6875686 Method for fabricating a structure of interconnections comprising an electric insulation including air or vacuum gaps |
| 04/05/2005 | US6875685 Method of forming gas dielectric with support structure |
| 04/05/2005 | US6875684 Method for forming a bit line of a semiconductor device |
| 04/05/2005 | US6875683 Method of forming bump |
| 04/05/2005 | US6875682 Mesh pad structure to eliminate IMD crack on pad |
| 04/05/2005 | US6875681 Wafer passivation structure and method of fabrication |
| 04/05/2005 | US6875680 Methods of manufacturing transistors using dummy gate patterns |
| 04/05/2005 | US6875679 Etch stop layer in poly-metal structures |
| 04/05/2005 | US6875678 Post thermal treatment methods of forming high dielectric layers in integrated circuit devices |
| 04/05/2005 | US6875677 Method to control the interfacial layer for deposition of high dielectric constant films |
| 04/05/2005 | US6875676 Methods for producing a highly doped electrode for a field effect transistor |
| 04/05/2005 | US6875675 Method for manufacturing a semiconductor film having a planarized surface |
| 04/05/2005 | US6875674 Method of manufacturing a semiconductor device with fluorine concentration |
| 04/05/2005 | US6875672 Method of manufacturing a semiconductor device with penetration electrodes that protrude from a rear side of a substrate formed by thinning the substrate |
| 04/05/2005 | US6875671 Method of fabricating vertical integrated circuits |
| 04/05/2005 | US6875670 Trench isolation method |
| 04/05/2005 | US6875669 Method of controlling the top width of a deep trench |
| 04/05/2005 | US6875668 Notched gate structure fabrication |
| 04/05/2005 | US6875667 Method for forming capacitor |
| 04/05/2005 | US6875666 Methods of manufacturing transistors and transistors having an anti-punchthrough region |
| 04/05/2005 | US6875665 Method of manufacturing a semiconductor device |
| 04/05/2005 | US6875664 Formation of amorphous carbon ARC stack having graded transition between amorphous carbon and ARC material |
| 04/05/2005 | US6875663 Semiconductor device having a trench isolation and method of fabricating the same |
| 04/05/2005 | US6875662 Semiconductor device |
| 04/05/2005 | US6875661 Solution deposition of chalcogenide films |
| 04/05/2005 | US6875660 Method of manufacturing high coupling ratio flash memory having sidewall spacer floating gate electrode |
| 04/05/2005 | US6875659 Methods of code programming a mask ROM |
| 04/05/2005 | US6875658 High-voltage device with improved punch through voltage and process for same compatible with low-voltage device process |
| 04/05/2005 | US6875657 Method of fabricating trench MIS device with graduated gate oxide layer |
| 04/05/2005 | US6875656 Method for improving silicon-on-insulator (SOI) film uniformity on a semiconductor wafer |
| 04/05/2005 | US6875655 Method of forming DRAM capacitors with protected outside crown surface for more robust structures |
| 04/05/2005 | US6875654 Memory device and fabrication method thereof |
| 04/05/2005 | US6875653 DRAM cell structure with buried surrounding capacitor and process for manufacturing the same |
| 04/05/2005 | US6875652 Method for producing ferroelectric capacitors and integrated semiconductor memory chips |
| 04/05/2005 | US6875651 Dual-trench isolated crosspoint memory array and method for fabricating same |
| 04/05/2005 | US6875650 Eliminating substrate noise by an electrically isolated high-voltage I/O transistor |
| 04/05/2005 | US6875649 Methods for manufacturing integrated circuit devices including an isolation region defining an active region area |
| 04/05/2005 | US6875648 Fabrication of an EEPROM cell with emitter-polysilicon source/drain regions |
| 04/05/2005 | US6875647 Method of manufacturing semiconductor devices to protect against a punchthrough phenomenon |
| 04/05/2005 | US6875646 Semiconductor processing methods of forming integrated circuitry |
| 04/05/2005 | US6875645 Pixel structure and fabricating method thereof |
| 04/05/2005 | US6875644 Methods of manufacturing thin film transistors using masks to protect the channel regions from impurities while doping a semiconductor layer to form source/drain regions |
| 04/05/2005 | US6875643 SOI substrate and manufacturing method thereof |
| 04/05/2005 | US6875639 Semiconductor device and method of manufacturing the same |
| 04/05/2005 | US6875638 Manufacturing method of a semiconductor device incorporating a passive element and a redistribution board |
| 04/05/2005 | US6875637 Semiconductor package insulation film and manufacturing method thereof |
| 04/05/2005 | US6875633 Process for production of SOI substrate and process for production of semiconductor device |
| 04/05/2005 | US6875632 Underfill and encapsulation of carrier substrate-mounted flip-chip components using stereolithography |
| 04/05/2005 | US6875630 Lead frame, method of manufacturing the same, and method of manufacturing a semiconductor device using the same |
| 04/05/2005 | US6875629 III group nitride based semiconductor element and method for manufacture thereof |
| 04/05/2005 | US6875628 Semiconductor device and fabrication method of the same |
| 04/05/2005 | US6875624 Combined E-beam and optical exposure semiconductor lithography |
| 04/05/2005 | US6875623 Method for fabricating semiconductor device |
| 04/05/2005 | US6875559 Method of etching materials patterned with a single layer 193nm resist |
| 04/05/2005 | US6875558 Integration scheme using self-planarized dielectric layer for shallow trench isolation (STI) |
| 04/05/2005 | US6875556 Resist compositions and patterning process |
| 04/05/2005 | US6875547 Mask for crystallizing amorphous |
| 04/05/2005 | US6875546 Method of patterning photoresist on a wafer using an attenuated phase shift mask |
| 04/05/2005 | US6875545 Performing a first exposure of the substrate utilizing a x-dipole illumination, and a second exposure of the substrate utilizing a y-dipole illumination; using optical proximity correction |
| 04/05/2005 | US6875544 Method for the fabrication of three-dimensional microstructures by deep X-ray lithography |
| 04/05/2005 | US6875477 Method for coating internal surface of plasma processing chamber |
| 04/05/2005 | US6875468 Method and device for treating and/or coating a surface of an object |
| 04/05/2005 | US6875466 Coating a resist on the substrate, and placing in a vapor atmosphere |
| 04/05/2005 | US6875372 Fine particle size; monodispersion; crystal structure |
| 04/05/2005 | US6875371 Using fluorohydrocarbon mixture |
| 04/05/2005 | US6875365 Method for producing liquid discharge head |
| 04/05/2005 | US6875359 Developer waste liquid regenerating apparatus and method |
| 04/05/2005 | US6875326 Plasma processing apparatus with real-time particle filter |
| 04/05/2005 | US6875321 Auxiliary magnet array in conjunction with magnetron sputtering |
| 04/05/2005 | US6875306 Vacuum processing device |
| 04/05/2005 | US6875289 Rinsing microelectronics by immersing in vessels containing liquids, then lifting from the bath to form an interface and blowing cleaning compounds to create surface tension gradients |
| 04/05/2005 | US6875288 Cleaning agent and cleaning method |
| 04/05/2005 | US6875287 Choosing rinse recipe for wet bench, activating wet bench and detecting waste water quality of waste water produced for rinse recipe to generate water quality data for a plurality of reclamation switch time levels, ascertaining best switch time |
| 04/05/2005 | US6875286 Solid CO2 cleaning |
| 04/05/2005 | US6875285 System and method for dampening high pressure impact on porous materials |
| 04/05/2005 | US6875284 Selectively clean various surfaces of a microelectronic workpiece using vibrational, megasonics energy |
| 04/05/2005 | US6875283 Film forming apparatus and film forming method |