Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2005
04/12/2005US6877517 Plasma etch method for forming plasma etched silicon layer
04/12/2005US6877458 Apparatus for forming deposited film
04/12/2005US6877365 Scanning probe microscope and specimen observation method and semiconductor device manufacturing method using said scanning probe microscope
04/12/2005US6877250 Apparatus, method and system for the treatment of a wafer
04/12/2005CA2122278C Adhesive sheet for wafer and process for preparing semiconductor apparatus using the same
04/07/2005WO2005031890A1 Process for laminating a dielectric layer onto a semiconductor
04/07/2005WO2005031873A1 An electronic package of photo-sensing semiconductor devices, and the fabrication and assembly thereof
04/07/2005WO2005031872A1 Semiconductor device and process for manufacturing the same
04/07/2005WO2005031871A1 Semiconductor device
04/07/2005WO2005031870A1 Semiconductor device
04/07/2005WO2005031869A1 Semiconductor device, semiconductor device manufacturing method, semiconductor device manufacturing apparatus, and computer recording medium
04/07/2005WO2005031863A1 Structure and method of making capped chips having vertical interconnects
04/07/2005WO2005031862A1 Structure and method of making sealed capped chips
04/07/2005WO2005031861A1 Structure and method of making capped chips including a flowable conductive medium
04/07/2005WO2005031859A1 2-transistor memory cell and method for manufacturing
04/07/2005WO2005031858A1 Self-aligned v0-contact for cell size reduction of feram devices
04/07/2005WO2005031857A1 Three-transistor storage location and storage unit with a capacitor containing metal collector electrodes
04/07/2005WO2005031856A1 A device and method for forming a contact to a top electrode in ferroelectric capacitor devices
04/07/2005WO2005031855A1 Fabrication method
04/07/2005WO2005031854A1 Method for producing a multifunctional dielectric layer on a substrate
04/07/2005WO2005031853A1 Process for manufacturing a multilayer structure made from semiconducting materials
04/07/2005WO2005031852A1 Indirect bonding with disappearance of the bonding layer
04/07/2005WO2005031851A1 Substrate processing device and method of producing substrates
04/07/2005WO2005031850A2 Detection and reduction of dielectric breakdown in semiconductor devices
04/07/2005WO2005031848A1 Designs and methods for conductive bumps
04/07/2005WO2005031847A1 Gripping method and device for removing balls from a bulk container
04/07/2005WO2005031846A2 Electrochemical etching process for the selective removal of contaminant phases on the surface of a sulphide-containing chalcopyrite semiconductor
04/07/2005WO2005031845A1 Field-effect transistors with weakly coupled layered inorganic semiconductors
04/07/2005WO2005031844A1 Plasma rapid thermal process apparatus in which supply part of radical source is improved
04/07/2005WO2005031843A1 Thermal treatment device and method of manufacturing substrate
04/07/2005WO2005031842A2 Method of manufacturing a multilayer semiconductor structure with reduced ohmic losses
04/07/2005WO2005031841A2 Methods of filling gaps and methods of depositing materials using high density plasma chemical vapor deposition
04/07/2005WO2005031840A1 Method for the elimination of the effects of defects on wafers
04/07/2005WO2005031839A1 Plasma processing system
04/07/2005WO2005031837A1 Selective silicon etch chemistries, methods of production and uses thereof
04/07/2005WO2005031836A1 Polishing composition and polishing method
04/07/2005WO2005031835A1 Etch with ramping
04/07/2005WO2005031834A1 Deep via seed repair using electroless plating chemistry
04/07/2005WO2005031833A1 Oxide-nitride stack gate dielectric
04/07/2005WO2005031832A1 Impurity introducing method, impurity introducing apparatus, and electronic device produced by using those
04/07/2005WO2005031831A1 Vaporizer
04/07/2005WO2005031830A1 Plasma processing device
04/07/2005WO2005031829A1 Method of cleaning treatment and method for manufacturing semiconductor device
04/07/2005WO2005031828A2 Low resistance t-shaped ridge structure
04/07/2005WO2005031827A2 Semiconductor channel on insulator structure
04/07/2005WO2005031826A1 Strained semiconductor structures
04/07/2005WO2005031825A1 Method for treating heteroepitaxially grown semi-conductor layers on semi-conductor substrates, semi-conductor substrate comprising a treated semi-conductor layer and semi-conductor component made of said type of semi-conductor substrate
04/07/2005WO2005031824A1 Projection exposure device, projection exposure method, and device manufacturing method
04/07/2005WO2005031822A1 Working chamber, maintenance method, exposure apparatus, and environment chamber
04/07/2005WO2005031821A1 Optical system, exposure system, and production methods therefor
04/07/2005WO2005031820A1 Projection exposure apparatus, cleaning and maintenance methods of projection exposure apparatus, and method of producing device
04/07/2005WO2005031819A1 A device and a method for forming a capacitor device
04/07/2005WO2005031818A1 Process for fabrication of a ferrocapacitor
04/07/2005WO2005031817A1 Method for forming ferrocapacitors and feram devices
04/07/2005WO2005031816A1 Method for forming vertical ferroelectric capacitors
04/07/2005WO2005031815A1 A device and a method for forming a ferroelectric capacitor device
04/07/2005WO2005031814A1 A method for producing a ferroelectric capacitor and a ferroelectric capacitor device
04/07/2005WO2005031812A2 Improved copper bath for electroplating fine circuitry on semiconductor chips
04/07/2005WO2005031811A2 Process and integration scheme for fabricating conductive components through-vias and semiconductor components including conductive through-wafer vias
04/07/2005WO2005031810A2 Formation of a silicon germanium-on-insulator structure by oxidation of a buried porous silicon layer
04/07/2005WO2005031809A2 The production of a germanium oxynitride layer on a ge-based material
04/07/2005WO2005031807A2 Wafer-level moat structures
04/07/2005WO2005031805A2 Multi-surface ic packaging structures and methods for their manufacture
04/07/2005WO2005031800A2 Processing chamber including a circulation loop integrally formed in a chamber housing
04/07/2005WO2005031799A2 Exposure apparatus, exposure method, and device manufacturing method
04/07/2005WO2005031780A2 Tunneling gap diodes
04/07/2005WO2005031759A1 Conductive particle and anisotropic conductive adhesive using same
04/07/2005WO2005031754A1 Nonvolatile semiconductor memory device having protection function for each memory block
04/07/2005WO2005031468A1 Near-field light generating method near-field exposure mask and near-field exposure method and apparatus
04/07/2005WO2005031464A1 Positive resist composition and resist laminate for low-acceleration electron beam and method of pattern formation
04/07/2005WO2005031233A2 Thermal processing system with cross-flow liner
04/07/2005WO2005031045A2 Method of producing self-supporting substrates comprising iii-nitrides by means of heteroepitaxy on a sacrificial layer
04/07/2005WO2005031035A2 Method for producing thin semiconductor films by deposition from solution
04/07/2005WO2005030978A2 Self-assembled circuits and circuit patterns
04/07/2005WO2005030837A1 Crosslinkable fluoroaromatic prepolymer and use thereof
04/07/2005WO2005030636A2 Methods, devices and compositions for depositing and orienting nanostructures
04/07/2005WO2005030439A1 Polishing cloth, polishing cloth processing method, and substrate manufacturing method using same
04/07/2005WO2005013340B1 Eddy current system for in-situ profile measurement
04/07/2005WO2005013320A3 A semiconductor device having an organic anti-reflective coating (arc) and method therefor
04/07/2005WO2005008746A3 Methods of forming a phosphorus doped silicon dioxide layer
04/07/2005WO2005008744A3 A transistor device with metallic electrodes and a method for use in forming such a device
04/07/2005WO2005007564B1 Method for fixing metal particle, and method for producing metal particle-containing substrate, method for producing carbon nanotube-containing substrate and method for producing semiconductor crystalline rod-containing substrate respectively using such fixing method
04/07/2005WO2005001937A3 One transistor flash memory cell
04/07/2005WO2004114018A3 Lithographic apparatus, device manufacturing method, and device manufactured thereby
04/07/2005WO2004106582A3 Physical vapor deposition of titanium-based films
04/07/2005WO2004102620A3 Method to passivate conductive surfaces during semiconductor processing
04/07/2005WO2004079801A8 Preventive treatment process for the ring of a multilayer wafer
04/07/2005WO2004079786A8 Apparatus and method for reducing impurities in a semiconductor material
04/07/2005WO2004075248A3 Surface-coating method, production of microelectronic interconnections using said method and integrated circuits
04/07/2005WO2004059809A3 Methods of forming semiconductor devices having self aligned semiconductor mesas and contact layers and related devices
04/07/2005WO2004059723A3 System to identify a wafer manufacturing problem and method therefor
04/07/2005WO2004044994A3 Monolithically integrated vertical pin photodiode used in bicmos technology
04/07/2005WO2004038785A8 Method of forming a self-aligned, selectively etched, double recess high electron mobility transistor
04/07/2005WO2004015496A3 Using scanning probe microscope topographic data to repair photomask defect using charged particle beams
04/07/2005WO2004006296A3 Laminate body and corresponding methods and apparatus
04/07/2005WO2003107396A8 Substrate processing apparatus and related systems and methods
04/07/2005WO2003100859A9 Method for producing a component comprising a conductor structure that is suitable for use at high frequencies and corresponding component
04/07/2005US20050076320 Layout structure of semiconductor integrated circuit and method for forming the same
04/07/2005US20050076275 Integraged circuit and method for testing the integrated circuit
04/07/2005US20050076274 Semiconductor integrated circuit
1 ... 3909 3910 3911 3912 3913 3914 3915 3916 3917 3918 3919 3920 3921 3922 3923 3924 3925 3926 3927 3928 3929 ... 6590