| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 04/07/2005 | US20050072625 Acoustic diffusers for acoustic field uniformity |
| 04/07/2005 | US20050072528 Integration of sensor based metrology into semiconductor processing tools |
| 04/07/2005 | US20050072527 Substrate holding apparatus and substrate polishing apparatus |
| 04/07/2005 | US20050072526 Heating apparatus to heat wafers using water and plate with turbolators |
| 04/07/2005 | US20050072525 Apparatus to improve wafer temperature uniformity for face-up wet processing |
| 04/07/2005 | US20050072524 System for the preferential removal of silicon oxide |
| 04/07/2005 | US20050072517 Method and apparatus for joining protective tape to semiconductor wafer |
| 04/07/2005 | US20050072460 GaAs substrate with Sb buffering for high in devices |
| 04/07/2005 | US20050072446 Removing a coating, especially a photoresist, from, e.g., a semiconductive wafer, heating the workpiece at or above ambient pressure, adding water vapor, and diffusing O3 through the liquid layer and oxidizing a contaminant or film on the workpiece. |
| 04/07/2005 | US20050072444 Method for processing plasma processing apparatus |
| 04/07/2005 | US20050072360 Submicron size metal deposit apparatus |
| 04/07/2005 | US20050072358 Substrate processing apparatus and substrate processing method |
| 04/07/2005 | US20050072357 Sublimation bed employing carrier gas guidance structures |
| 04/07/2005 | US20050072353 Method of manufacturing gallium nitride-based single crystal substrate |
| 04/07/2005 | US20050072266 Planetary system workpiece support and method for surface treatment of workpieces |
| 04/07/2005 | US20050072121 Method and system for shipping semiconductor wafers |
| 04/07/2005 | US20050072054 Safe for nickel phosphide, glass and/or ceramic materials; polishing efficiency, uniformity, removal rate; minimizing defects; includes purified sodium containing clays |
| 04/07/2005 | US20050071993 Ball grid array rework using a continuous belt furnace |
| 04/07/2005 | US20050071991 Electronic component mounting apparatus and electronic component mounting method |
| 04/07/2005 | US20050071990 Electronic-component alignment method and apparatus therefor |
| 04/07/2005 | US20050071989 Apparatus used for manufacturing semiconductor device, method of manufacturing the semiconductor devices, and semiconductor device manufactured by the apparatus and method |
| 04/07/2005 | US20050071974 Method of retrofitting a probe station |
| 04/07/2005 | US20050071970 Manufacturing method for electrodes that inhibit corona effect on ceramic capacitor |
| 04/07/2005 | US20050071969 Solid state embossing of polymer devices |
| 04/07/2005 | DE19782235B4 Lasergestütztes Verfahren und System für die Reparatur oder Neukonfiguration einer integrierten Schaltung Laser-assisted method and system for repair or reconfiguration of an integrated circuit |
| 04/07/2005 | DE10392347T5 Gerät mit einer Schaltung zur Erfassung von Substratfehlern Device with a circuit for detecting substrate defects |
| 04/07/2005 | DE10392327T5 Verfahren zum Herstellen einer Belichtungsmaske, Belichtungsmaske und Verfahren zum Herstellen einer Halbleitereinrichtung A method of manufacturing an exposure mask, the exposure mask and method for manufacturing a semiconductor device |
| 04/07/2005 | DE10342155A1 Verfahren zur Herstellung von Ätzlöchern und/oder Ätzgräben sowie Membransensoreinheit A process for the production of etching holes and / or etching trenches as well as membrane sensor unit |
| 04/07/2005 | DE10341592A1 Power transistor used in direct current/DC converter, has gate electrode whose lower edge is obliquely angled, arranged between semiconductor cell height and semiconductor cell surface |
| 04/07/2005 | DE10341564A1 Capacitor unit, e.g. of metal-insulator-metal (MIM) type for integrated circuits, with first conductive auxiliary layer on substrate, capacitor dielectric, second conductive layer |
| 04/07/2005 | DE10341544A1 Strip conductor arrangement used in the electronics industry comprises a strip conductor arranged in a substrate, additional strip conductors, a covering layer, a hollow chamber, wall layers, plugs, and further layers |
| 04/07/2005 | DE10340409A1 Support wafer for processing a semiconductor wafer comprises a support substrate permeable in a partial region for light having a predetermined wavelength, and an adhesive region arranged directly on the light-permeable partial region |
| 04/07/2005 | DE10340131A1 Halbleiterleistungsbauteil mit Ladungskompensationsstruktur und monolithisch integrierter Schaltung, sowie Verfahren zu dessen Herstellung The semiconductor power component having charge compensation structure and a monolithically integrated circuit, and to processes for the preparation thereof |
| 04/07/2005 | DE10339992A1 Eine Technik zur Erhöhung der Genauigkeit kritischer Abmessungen einer Gateelektrode durch Nutzung von Eigenschaften einer antireflektierenden Beschichtung One technique for increasing the accuracy of critical dimensions of a gate electrode by use of properties of an anti-reflective coating |
| 04/07/2005 | DE10339989A1 Verfahren zur Herstellung eines konformen Abstandselements benachbart zu einer Gateelektrodenstruktur A process for producing a conformal spacer adjacent to a gate electrode structure |
| 04/07/2005 | DE10339924A1 ESD-Testanordnung und Verfahren ESD test arrangement and method |
| 04/07/2005 | DE10339702A1 Method for simultaneous forming of different gate regions of FET structure, starting with silicon substrate with two FET regions and simultaneous formation of stray layer over both FET regions |
| 04/07/2005 | DE10338967A1 Mikrosystembauelement und Verfahren zum Kleben von Mikrobauteilen auf ein Substrat Microsystem device and method for bonding of micro components on a substrate |
| 04/07/2005 | DE10337830A1 Producing a multiple layer arrangement with a metal layer comprises applying a metal layer on one surface of a first wafer, applying an intermediate layer on the metal layer, and further processing |
| 04/07/2005 | DE10335062A1 Semiconductor bar scribing/cutting method, involves removing saw/scribing base by immersion in purification bath |
| 04/07/2005 | DE10297660T5 Prüfgerät für elektronische Bauelemente An electronic component tester |
| 04/07/2005 | DE102004043430A1 Dämpfender Phasenverschiebungsmaskenrohling und Photomaske Steaming phase shift mask blank and photomask |
| 04/07/2005 | DE102004043233A1 Verfahren zum Herstellen eines beweglichen Abschnitts einer Halbleitervorrichtung A method of manufacturing a movable portion of a semiconductor device |
| 04/07/2005 | DE102004041654A1 Verfahren zum Entfernen von Fremdmaterial für einen Dynamikgrössensensor vom Kapazitätstyp A method for removing foreign material for a dynamic variable capacitance type sensor |
| 04/07/2005 | DE102004041346A1 Halbleiter und Verfahren zur Herstellung desselben Semiconductor and method for manufacturing the same |
| 04/07/2005 | DE102004041102A1 Semiconductor wafer testing arrangement used in semiconductor production, has temperature control station that transfers wafer to prober through handling system, after applying thermal or mechanical load to wafer |
| 04/07/2005 | DE102004025974A1 One-time programmable memory device for integrated circuit, comprises floating gate formed over active area and isolation layer, inter-gate dielectric layer formed on floating gate, and control gate formed on inter-gate dielectric layer |
| 04/07/2005 | DE102004022736A1 Vorrichtung und Verfahren zum Erzeugen eines Schreibstroms für eine magnetische Speicherzelle Apparatus and method for generating a write current for a magnetic memory cell |
| 04/07/2005 | DE102004022573A1 Magnetische Speicherzellenstruktur Magnetic memory cell structure |
| 04/07/2005 | DE102004021636A1 Selbstausgerichtetes vergrabenes Kontaktpaar und Verfahren zum Ausbilden desselben The same self-aligned buried contact pair and method of forming |
| 04/07/2005 | DE102004020874A1 Systeme und Verfahren, die Schnellanalyseinformationen während einer detaillierten Analyse eines Schaltungsentwurfs verwenden Using systems and methods, the quick analysis information during a detailed analysis of circuit design |
| 04/07/2005 | DE102004020699A1 Integrierte Halbleiterschaltung A semiconductor integrated circuit |
| 04/07/2005 | DE102004020258A1 Verfahren und System zum Lesen von Magnetspeicher A method and system for reading magnetic memory |
| 04/07/2005 | DE102004013707A1 Substrate e.g. semiconductor wafer, testing apparatus for use during semiconductor production, has two test arrangements that are jointly connected to handling system, substrate magazine station and alignment station |
| 04/07/2005 | DE10194370T5 Verfahren zum Züchten eines Kristalls A method for growing a crystal of |
| 04/07/2005 | CA2539481A1 Improved copper bath for electroplating fine circuitry on semiconductor chips |
| 04/07/2005 | CA2538262A1 Methods, devices and compositions for depositing and orienting nanostructures |
| 04/07/2005 | CA2530607A1 Device for detecting biological and chemical particles |
| 04/06/2005 | EP1521368A2 Field programmable gate array |
| 04/06/2005 | EP1521363A1 Integrated Coupler |
| 04/06/2005 | EP1521312A2 Optoelectronic device having a metallised carrier |
| 04/06/2005 | EP1521310A2 Nitride semiconductor substrate and method of producing same |
| 04/06/2005 | EP1521307A2 High-voltage semiconductor devices |
| 04/06/2005 | EP1521306A2 Bipolar transistor and method of manufacturing the same |
| 04/06/2005 | EP1521304A2 Process for producing resin-sealed type electronic device |
| 04/06/2005 | EP1521303A2 Method for manufacturing semiconductor memory device |
| 04/06/2005 | EP1521302A1 Method for formation of airgaps around an interconnect |
| 04/06/2005 | EP1521301A1 Method of formation of airgaps around interconnecting line |
| 04/06/2005 | EP1521300A1 Circuit structure integrated on a semiconductor substrate and relevant manufacturing method |
| 04/06/2005 | EP1521299A2 Method of mounting a semiconductor chip with an adhesive film and apparatus using the same |
| 04/06/2005 | EP1521298A2 Method of making a high-voltage field-effect transistor |
| 04/06/2005 | EP1521297A1 Plasma processing equipment |
| 04/06/2005 | EP1521296A2 Method of reclaiming silicon wafers |
| 04/06/2005 | EP1521295A2 Method for forming an epitaxial layer sequence in a component and optoelectronic semiconductor chip |
| 04/06/2005 | EP1521294A2 Method for surface treatment |
| 04/06/2005 | EP1521293A1 Submicron size metal deposit apparatus |
| 04/06/2005 | EP1521269A2 Asymmetric patterned magnetic memory |
| 04/06/2005 | EP1521155A2 Cooling system, exposure apparatus having the same, and device manufacturing method |
| 04/06/2005 | EP1521154A1 Method for supplying gas while dividing to chamber from gas supply facility equipped with flow controller |
| 04/06/2005 | EP1521121A2 Cooling technique |
| 04/06/2005 | EP1521120A2 Substrate holding system and exposure apparatus using the same |
| 04/06/2005 | EP1521119A2 A focusing-device for the radiation from a light source |
| 04/06/2005 | EP1521118A2 Use of perfluoropolyethers in optical systems |
| 04/06/2005 | EP1520894A1 Barrier polishing fluid |
| 04/06/2005 | EP1520893A1 High-rate barrier polishing composition |
| 04/06/2005 | EP1520892A2 Polishing composition |
| 04/06/2005 | EP1520891A1 Film forming composition, process for producing film forming composition, insulating film forming material, process for forming film, and silica-based film |
| 04/06/2005 | EP1520669A1 A method for separating plates which are bonded with each other and form a piled structure |
| 04/06/2005 | EP1520329A2 Nitride semiconductor laser device and a method for improving its performance |
| 04/06/2005 | EP1520303A1 Semiconductor component with an integrated radially symmetrical resistor |
| 04/06/2005 | EP1520302A1 Technique for fabricating logic elements using multiple gate layers |
| 04/06/2005 | EP1520299A2 Set of integrated capacitor arrangements, especially integrated grid capacitors |
| 04/06/2005 | EP1520298A1 Integrated circuit having building blocks |
| 04/06/2005 | EP1520295A2 Method for making an anisotropic conductive film with pointed conductive inserts |
| 04/06/2005 | EP1520294A1 Thin-film electronic device, in particular power device, and method for making same |
| 04/06/2005 | EP1520293A1 Method for the production of a short channel field effect transistor |
| 04/06/2005 | EP1520291A2 System and method for controlling wafer temperature |
| 04/06/2005 | EP1520289A1 Dielectric barrier discharge apparatus and process for treating a substrate |
| 04/06/2005 | EP1520288A2 Multirate processing for metrology of plasma rf source |
| 04/06/2005 | EP1520287A1 Adjustable implantation angle workpiece support structure for an ion beam implanter |