| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/07/2014 | US8623673 Structure and method for detecting defects in BEOL processing |
| 01/07/2014 | US8623671 ALD processing techniques for forming non-volatile resistive switching memories |
| 01/07/2014 | US8623670 Method for making a perpendicular thermally-assisted recording (TAR) magnetic recording disk having a carbon segregant |
| 01/07/2014 | US8623669 Method of fabricating epitaxial semiconductor devices |
| 01/07/2014 | US8623512 Adhesive composition for stealth dicing of semiconductor, adhesive film, and semiconductor device including the adhesive film |
| 01/07/2014 | US8623471 Plasma treatment system |
| 01/07/2014 | US8623255 Method for making a semiconductor device |
| 01/07/2014 | US8623231 Method for etching an ultra thin film |
| 01/07/2014 | US8623230 Methods and systems for removing a material from a sample |
| 01/07/2014 | US8623193 Method of electroplating using a high resistance ionic current source |
| 01/07/2014 | US8623173 Substrate processing apparatus having electrode member |
| 01/07/2014 | US8623172 Gas flow path structure and substrate processing apparatus |
| 01/07/2014 | US8623171 Plasma processing apparatus |
| 01/07/2014 | US8623142 Coating apparatus |
| 01/07/2014 | US8622451 Endeffectors for handling semiconductor wafers |
| 01/07/2014 | US8622021 High lifetime consumable silicon nitride-silicon dioxide plasma processing components |
| 01/07/2014 | US8622020 Simultaneous electroless plating of two substrates |
| 01/03/2014 | WO2014005147A2 Three-dimensional crystalline, homogenous, and hybrid nanostructures fabricated by electric field directed assembly of nanoelements |
| 01/03/2014 | WO2014004917A1 Laser and plasma etch wafer dicing with a double sided uv-curable adhesive film |
| 01/03/2014 | WO2014004885A1 Semiconductor devices with integrated hole collectors |
| 01/03/2014 | WO2014004797A1 Silicided integrated circuit with data retaining floating-gate capacitor |
| 01/03/2014 | WO2014004751A1 Spin hall effect memory |
| 01/03/2014 | WO2014004693A1 Compact socket connection to cross-point array |
| 01/03/2014 | WO2014004682A1 Detection of defects embedded in noise for inspection in semiconductor manufacturing |
| 01/03/2014 | WO2014004679A1 Diode laser based broad band light sources for wafer inspection tools |
| 01/03/2014 | WO2014004669A1 Device-like scatterometry overlay targets |
| 01/03/2014 | WO2014004606A1 Semiconductor structure with multiple transistors having various threshold voltages and method of fabrication thereof |
| 01/03/2014 | WO2014004564A1 Scanning in angle-resolved reflectometry and algorithmically eliminating diffraction from optical metrology |
| 01/03/2014 | WO2014004555A1 Near field metrology |
| 01/03/2014 | WO2014004535A1 Bipolar transistor on high-resistivity substrate |
| 01/03/2014 | WO2014004520A1 Integrated circuit package having offset vias |
| 01/03/2014 | WO2014004514A1 Covalently-bonded graphene coating and its applications thereof |
| 01/03/2014 | WO2014004285A1 TEMPERATURE CONTROL FOR GaN BASED MATERIALS |
| 01/03/2014 | WO2014004261A1 Lateral electrochemical etching of iii-nitride materials for microfabrication |
| 01/03/2014 | WO2014004162A1 Fabrication of window cavity cap structures in wafer level packaging |
| 01/03/2014 | WO2014004079A1 Glass-ceramic substrates for semiconductor processing |
| 01/03/2014 | WO2014004049A1 Isolated and bulk semiconductor devices formed on a same bulk substrate |
| 01/03/2014 | WO2014004034A1 Preventing isolation leakage in iii-v devices |
| 01/03/2014 | WO2014004033A1 Integration methods to fabricate internal spacers for nanowire devices |
| 01/03/2014 | WO2014004012A2 High voltage three-dimensional devices having dielectric liners |
| 01/03/2014 | WO2014003995A1 Enhancement in uv curing efficiency using oxygen-doped purge for ultra low-k dielectric film |
| 01/03/2014 | WO2014003980A1 Through gate fin isolation |
| 01/03/2014 | WO2014003933A1 Composite high-k gate dielectric stack for reducing gate leakage |
| 01/03/2014 | WO2014003893A1 Microwave excursion detection for semiconductor processing |
| 01/03/2014 | WO2014003842A1 Shallow trench isolation structures |
| 01/03/2014 | WO2014003793A1 Charge sharing testing of through-body-vias |
| 01/03/2014 | WO2014003792A1 Pulsed testing of through-body-vias |
| 01/03/2014 | WO2014003445A1 Zinc oxide-based p-type semiconductor thin film using hydrogen, and method for manufacturing same |
| 01/03/2014 | WO2014003437A1 Gas supply unit for supplying multiple gases, and method for manufacturing same |
| 01/03/2014 | WO2014003434A1 Apparatus for treating substrate and method for treating substrate |
| 01/03/2014 | WO2014003396A1 Vertical resistive random access memory device, and method for manufacturing same |
| 01/03/2014 | WO2014003388A1 Transparent flexible memory |
| 01/03/2014 | WO2014003349A1 Iii-v transistor and method for manufacturing same |
| 01/03/2014 | WO2014003298A1 Process chamber and substrate processing method |
| 01/03/2014 | WO2014003297A1 Substrate heating device and process chamber |
| 01/03/2014 | WO2014003296A1 Process chamber and substrate processing device |
| 01/03/2014 | WO2014003286A1 Wafer gripper |
| 01/03/2014 | WO2014003285A1 Wafer pusher |
| 01/03/2014 | WO2014003284A1 Vertical-type wafer transfer conveyor |
| 01/03/2014 | WO2014003207A1 Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film therefrom, method of forming pattern, process for manufacturing semiconductor device, and semiconductor device |
| 01/03/2014 | WO2014003157A1 Aqueous processing liquid |
| 01/03/2014 | WO2014003146A1 Polarization control device, near-field light source, and parallel electron beam device |
| 01/03/2014 | WO2014003107A1 Crimping device and crimping method |
| 01/03/2014 | WO2014003092A1 Aromatic polyamide and film-forming composition containing same |
| 01/03/2014 | WO2014003086A1 Semiconductor device |
| 01/03/2014 | WO2014003058A1 Electrode structure for nitride semiconductor device, and nitride semiconductor field effect transistor |
| 01/03/2014 | WO2014003056A1 Method for producing semiconductor device |
| 01/03/2014 | WO2014003047A1 Electrode structure for nitride semiconductor device, production method therefor, and nitride semiconductor field-effect transistor |
| 01/03/2014 | WO2014003029A1 Workpiece ejection device and workpiece supply device provided with same |
| 01/03/2014 | WO2014003023A1 Composition for pattern formation and pattern forming method |
| 01/03/2014 | WO2014002965A1 Etching method and etching apparatus |
| 01/03/2014 | WO2014002959A1 PRODUCTION METHOD FOR m-PLANE NITRIDE-BASED LIGHT-EMITTING DIODE |
| 01/03/2014 | WO2014002949A1 Bonded substrate, method for manufacturing same, semiconductor module using bonded substrate, and method for manufacturing same |
| 01/03/2014 | WO2014002920A1 Semiconductor device |
| 01/03/2014 | WO2014002916A1 Method for using sputtering target and method for manufacturing oxide film |
| 01/03/2014 | WO2014002852A1 Semiconductor device, manufacturing method for semiconductor device, and electronic device |
| 01/03/2014 | WO2014002810A1 Polymer compound, resin composition for photoresists, and method for producing semiconductor |
| 01/03/2014 | WO2014002808A1 Resist mask processing method |
| 01/03/2014 | WO2014002794A1 Method for manufacturing thin film laminated element |
| 01/03/2014 | WO2014002679A1 Pattern formation method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method for manufacturing electronic device, and electronic device |
| 01/03/2014 | WO2014002672A1 Semiconductor device and method for manufacturing same |
| 01/03/2014 | WO2014002625A1 Semiconductor device |
| 01/03/2014 | WO2014002609A1 Overlapping device, and overlapping method |
| 01/03/2014 | WO2014002603A1 Method for producing semiconductor device |
| 01/03/2014 | WO2014002597A1 Silicon carbide semiconductor device |
| 01/03/2014 | WO2014002589A1 Method of manufacturing silicon carbide semiconductor device and silicon carbide semiconductor device |
| 01/03/2014 | WO2014002586A1 Plasma processing method and plasma processing apparatus |
| 01/03/2014 | WO2014002577A1 Method for producing semiconductor substrate |
| 01/03/2014 | WO2014002576A1 Method for producing semiconductor device |
| 01/03/2014 | WO2014002575A1 Method for producing semiconductor device |
| 01/03/2014 | WO2014002574A1 Semiconductor film manufacturing method |
| 01/03/2014 | WO2014002535A1 Semiconductor device manufacturing method |
| 01/03/2014 | WO2014002467A1 Method for polishing work and work polishing device |
| 01/03/2014 | WO2014002465A1 Epitaxial film-forming method, sputtering device, method for manufacturing semiconductor light-emitting element, semiconductor light-emitting element, and illumination device |
| 01/03/2014 | WO2014002353A1 Solid-state image sensing device and production method for same |
| 01/03/2014 | WO2014002336A1 Ion beam processing method and ion beam processing device |
| 01/03/2014 | WO2014002319A1 Optimum indicator generating device, optimum indicator generating method, optimum indicator generating program, and optimum indicator generating server |
| 01/03/2014 | WO2014002312A1 Pattern drawing device, pattern drawing method |
| 01/03/2014 | WO2014002283A1 Lead-free solder ball |
| 01/03/2014 | WO2014002154A1 Semiconductor device and method for manufacturing same |