Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2013
12/31/2013US8617954 Formation of nitrogen containing dielectric layers having an improved nitrogen distribution
12/31/2013US8617953 Memory having a vertical access device
12/31/2013US8617952 Vertical transistor with hardening implatation
12/31/2013US8617951 Method of manufacturing a semiconductor memory device having a floating gate
12/31/2013US8617950 Method of forming a capacitor and method of manufacturing a semiconductor device using the same
12/31/2013US8617949 Capacitor and method for making same
12/31/2013US8617948 Reducing resistance in source and drain regions of FinFETs
12/31/2013US8617947 Method of manufacturing semiconductor device
12/31/2013US8617946 Integrated circuits including metal gates and fabrication methods thereof
12/31/2013US8617945 Stacking fault and twin blocking barrier for integrating III-V on Si
12/31/2013US8617944 Method of etching a pixel electrode
12/31/2013US8617943 Method for making a semiconductor device on a flexible substrate
12/31/2013US8617942 Producing transistor including single layer reentrant profile
12/31/2013US8617941 High-speed graphene transistor and method of fabrication by patternable hard mask materials
12/31/2013US8617939 Enhanced thin film field effect transistor integration into back end of line
12/31/2013US8617937 Forming narrow fins for finFET devices using asymmetrically spaced mandrels
12/31/2013US8617936 Reverse-conducting semiconductor device and method for manufacturing such a reverse-conducting semiconductor device
12/31/2013US8617935 Back side alignment structure and manufacturing method for three-dimensional semiconductor device packages
12/31/2013US8617934 Methods of manufacture of top port multi-part surface mount silicon condenser microphone packages
12/31/2013US8617933 Integrated circuit packaging system with interlock and method of manufacture thereof
12/31/2013US8617932 Display device, organic light emitting diode display, and manufacturing method of sealing substrate
12/31/2013US8617930 Adhesive sheet, dicing tape integrated type adhesive sheet, and method of producing semiconductor device
12/31/2013US8617929 On-Chip RF shields with front side redistribution lines
12/31/2013US8617928 Dicing/die bonding film
12/31/2013US8617927 Method of mounting electronic chips
12/31/2013US8617926 Semiconductor chip device with polymeric filler trench
12/31/2013US8617925 Methods of forming bonded semiconductor structures in 3D integration processes using recoverable substrates, and bonded semiconductor structures formed by such methods
12/31/2013US8617924 Stacked integrated circuit package-in-package system and method of manufacture thereof
12/31/2013US8617923 Semiconductor device manufacturing apparatus and method for manufacturing semiconductor device
12/31/2013US8617922 Method of manufacturing semiconductor device
12/31/2013US8617921 Package substrate dynamic pressure structure
12/31/2013US8617920 Semiconductor device and manufacturing method thereof
12/31/2013US8617918 Thermoelectric converter and method thereof
12/31/2013US8617917 Consumable adhesive layer for thin film photovoltaic material
12/31/2013US8617915 Annealing thin films
12/31/2013US8617914 Method of forming semiconductor device having seal ring structure
12/31/2013US8617913 Alkali silicate glass based coating and method for applying
12/31/2013US8617912 Method for manufacturing semiconductor laser
12/31/2013US8617911 Method for forming coating film on facet of semiconductor optical device
12/31/2013US8617910 Display device and a method of manufacturing the same
12/31/2013US8617909 LED with substrate modifications for enhanced light extraction and method of making same
12/31/2013US8617908 Method for producing a substrate including a step of thinning with stop when a porous zone is detected
12/31/2013US8617797 Pattern forming method, semiconductor device manufacturing method and phase shift photomask having dummy gate patterns
12/31/2013US8617412 Nano-filter and method of forming same, and method of filtration
12/31/2013US8617411 Methods and apparatus for atomic layer etching
12/31/2013US8617409 Magnetically levitated gas cell for touchless site-isolated wet processing
12/31/2013US8617352 Electrode assembly for the removal of surface oxides by electron attachment
12/31/2013US8617351 Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction
12/31/2013US8617350 Linear plasma system
12/31/2013US8617349 Showerhead assembly for plasma processing chamber
12/31/2013US8617348 Modulating etch selectivity and etch rate of silicon nitride thin films
12/31/2013US8617347 Vacuum processing chambers incorporating a moveable flow equalizer
12/31/2013US8617275 Polishing agent and method for polishing substrate using the polishing agent
12/31/2013US8616936 Abrasive, method of polishing target member and process for producing semiconductor device
12/31/2013US8616821 Integrated apparatus to assure wafer quality and manufacturability
12/31/2013US8616820 Double dual slot load lock chamber
12/31/2013CA2692335C Broadcast receiving system and method for processing broadcast signals
12/27/2013WO2013192623A2 High density aligned silicon nanowire
12/27/2013WO2013192534A1 Rinsing solution to prevent tin pattern collapse
12/27/2013WO2013192323A1 Sidewall protection of low-k material during etching and ashing
12/27/2013WO2013192119A1 Epitaxial growth of smooth and highly strained germanium
12/27/2013WO2013192065A1 Refining process for producing low alpha tin
12/27/2013WO2013192012A2 Laser crystal degradation compensation
12/27/2013WO2013192001A1 Plasma-assisted atomic layer epitaxy of cubic and hexagonal inn films and its alloys with ain at low temperatures
12/27/2013WO2013191939A1 Methods for patterning coatings
12/27/2013WO2013191920A1 Memory cells, semiconductor device structures, memory systems, and methods of fabrication
12/27/2013WO2013191863A1 Aperture control of thermal processing radiation
12/27/2013WO2013191796A1 Double layer interleaved p-n diode modulator
12/27/2013WO2013191744A1 Oversized interposer
12/27/2013WO2013191618A1 Precise definition of transducer electrodes
12/27/2013WO2013191520A1 Apparatus for manufacturing semiconductor wafer
12/27/2013WO2013191471A1 Atomic layer deposition apparatus and method
12/27/2013WO2013191469A1 Atomic layer deposition apparatus
12/27/2013WO2013191421A1 Substrate-treating apparatus
12/27/2013WO2013191415A1 Substrate processing apparatus
12/27/2013WO2013191414A1 Substrate processing apparatus
12/27/2013WO2013191341A1 Method of manufacturing stamp for plasmonic nanolithography apparatus and plasmonic nanolithography apparatus
12/27/2013WO2013191266A1 Sputtering target and method for using the same
12/27/2013WO2013191228A1 Under layer film-forming composition for imprints and method of forming pattern
12/27/2013WO2013191224A1 Seasoning method, plasma processing apparatus, and manufacturing method
12/27/2013WO2013191206A1 Roller pressing device, imprinting device, and roller pressing method
12/27/2013WO2013191203A1 Silicon-containing resist underlayer film-forming composition having sulfone structure and amine structure
12/27/2013WO2013191201A1 SiC EPITAXIAL WAFER AND METHOD FOR MANUFACTURING SAME
12/27/2013WO2013191165A1 Observation and photography apparatus
12/27/2013WO2013191155A1 Photosensitive resin composition, method for manufacturing cured film, cured film, organic el display device, and liquid crystal display device
12/27/2013WO2013191139A1 Polishing composition and substrate fabrication method using same
12/27/2013WO2013191118A1 Composition for bonding curable imprinting composition and substrate and semiconductor device using same
12/27/2013WO2013191108A1 Plasma processing apparatus and plasma processing method
12/27/2013WO2013191065A1 Method for forming film containing manganese
12/27/2013WO2013191033A1 Semiconductor device and method for producing same
12/27/2013WO2013190997A1 Semiconductor device
12/27/2013WO2013190992A1 Method for manufacturing thin film transistor
12/27/2013WO2013190988A1 Switching element and method for manufacturing switching element
12/27/2013WO2013190952A1 Inspection device
12/27/2013WO2013190944A1 Extreme ultraviolet light generation system
12/27/2013WO2013190926A1 Attaching apparatus
12/27/2013WO2013190907A1 Silicon carbide semiconductor device
12/27/2013WO2013190901A1 Silicon carbide semiconductor device and method for producing same
12/27/2013WO2013190895A1 Semiconductor device manufacturing method and film forming device
12/27/2013WO2013190863A1 Stacked semiconductor device and method for manufacturing same
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