Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2005
10/13/2005US20050224894 Semiconductor integrated circuit device
10/13/2005US20050224893 Semiconductor memroy device with a stacked gate including a floating gate and a control gate and method of manufacturing the same
10/13/2005US20050224892 Method and structure in the manufacture of mask read only memory
10/13/2005US20050224891 Self aligned contact in a semiconductor device and method of fabricating the same
10/13/2005US20050224890 FinFET transistor and circuit
10/13/2005US20050224889 Surrounded-channel transistors with directionally etched gate or insulator formation regions and methods of fabrication therefor
10/13/2005US20050224886 Semiconductor device having a laterally modulated gate workfunction and method of fabrication
10/13/2005US20050224884 Double-gate MOS transistor, double-gate CMOS transistor, and method for manufacturing the same
10/13/2005US20050224881 Methods of making semiconductor-on-insulator thin film transistor constructions
10/13/2005US20050224880 Multi-gate MOS transistor and method of manufacturing the same
10/13/2005US20050224878 Memory with split gate devices and method of fabrication
10/13/2005US20050224877 Connection structure for SOI devices
10/13/2005US20050224876 [structure of ltps-tft and method of fabricating channel layer thereof]
10/13/2005US20050224875 High mobility plane cmos soi
10/13/2005US20050224874 Forming a retrograde well in a transistor to enhance performance of the transistor
10/13/2005US20050224873 Method of forming a recessed buried-diffusion device
10/13/2005US20050224872 Semiconductor device and method for fabricating the same
10/13/2005US20050224871 Power semiconductor device with buried source electrode
10/13/2005US20050224870 Trench mosfet with trench tip implants
10/13/2005US20050224869 Contact process and structure for a semiconductor device
10/13/2005US20050224868 MOS-gated device having a buried gate and process for forming same
10/13/2005US20050224867 Slim spacer device and manufacturing method
10/13/2005US20050224866 Semiconductor memory device and manufacturing method thereof
10/13/2005US20050224865 Circuit layout and structure for a non-volatile memory
10/13/2005US20050224864 Semiconductor device and its manufacture method
10/13/2005US20050224863 Semiconductor device and method of manufacturing the same
10/13/2005US20050224862 Nonvolatile semiconductor memory and a fabrication method for the same
10/13/2005US20050224861 Isolation-less, contact-less array of nonvolatile memory cells each having a floating gate for storage of charges, and methods of manufacturing, and operating therefor
10/13/2005US20050224860 Conductive spacers extended floating gates
10/13/2005US20050224859 Semiconductor storage device
10/13/2005US20050224858 [non-volatile memory structure and manufacturing method thereof]
10/13/2005US20050224857 MOS transistor
10/13/2005US20050224856 Trench capacitor and a method for manufacturing the same
10/13/2005US20050224855 Via recess in underlying conductive line
10/13/2005US20050224854 Semiconductor memory device and method of manufacturing the same
10/13/2005US20050224853 Semiconductor device, manufacturing process thereof and imaging device
10/13/2005US20050224852 Offset vertical device
10/13/2005US20050224851 Semiconductor device and method for manufacturing thereof
10/13/2005US20050224850 Mram device having low-k inter-metal dielectric
10/13/2005US20050224848 Semiconductor device and method for manufacturing semiconductor device
10/13/2005US20050224847 Semiconductor memory device and manufacturing method for the same
10/13/2005US20050224846 Semiconductor device and method of manufacturing the same
10/13/2005US20050224840 Dual-oxide transistors for the improvement of reliability and off-state leakage
10/13/2005US20050224833 Light emitting nitride semiconductor device and method of fabricating the same
10/13/2005US20050224832 High luminance indium gallium aluminum nitride light emitting device and manufacture method thereof
10/13/2005US20050224831 P-type nitride semiconductor structure and bipolar transistor
10/13/2005US20050224825 Production method for light emitting element
10/13/2005US20050224824 Gallium nitride-based semiconductor light-emitting device
10/13/2005US20050224817 Silicon light emitting device and method of manufacturing the same
10/13/2005US20050224809 Transistors having buried p-type layers beneath the source region and methods of fabricating the same
10/13/2005US20050224808 Silicon carbide semiconductor devices with a regrown contact layer
10/13/2005US20050224807 Low dielectric constant carbon films
10/13/2005US20050224806 Electrically resistant diamond-based component
10/13/2005US20050224805 Method of manufacturing electroluminescent display device
10/13/2005US20050224800 Bulk non-planar transistor having strained enhanced mobility and methods of fabrication
10/13/2005US20050224799 Semiconductor device and method for fabricating the same
10/13/2005US20050224798 Process to improve transistor drive current through the use of strain
10/13/2005US20050224797 CMOS fabricated on different crystallographic orientation substrates
10/13/2005US20050224796 Semiconductor device and method of manufacture thereof
10/13/2005US20050224795 Display device
10/13/2005US20050224794 Semiconductor device manufacturing method
10/13/2005US20050224793 Thin-film devices and method for fabricating the same on same substrate
10/13/2005US20050224792 Novel test structure for speeding a stress-induced voiding test and method of using same
10/13/2005US20050224786 Microelectronic device with depth adjustable sill and method of fabrication thereof
10/13/2005US20050224778 Forming self-aligned nano-electrodes
10/13/2005US20050224748 Etched semiconductor is contacted with liquid or supercritical carbon dioxide and a perhaloacid
10/13/2005US20050224724 Lithographic apparatus, device manufacturing method and device manufactured thereby
10/13/2005US20050224687 Vibration isolation system, vibration isolation method, lithographic apparatus and device manufacturing method
10/13/2005US20050224561 Method of manufacturing electronic component mounting body, electronic component mounting body, and electro-optical device
10/13/2005US20050224560 Mounting substrate and mounting method of electronic part
10/13/2005US20050224475 Laser beam processing machine
10/13/2005US20050224459 Etching solution, etched article and method for etched article
10/13/2005US20050224457 Method and apparatus for repairing shape, and method for manufacturing semiconductor device using those
10/13/2005US20050224456 Anisotropic dry etching of cu-containing layers
10/13/2005US20050224455 Method for making a semiconductor device using treated photoresist as an implant mask
10/13/2005US20050224453 Method for selectively covering a micro machined surface
10/13/2005US20050224452 For microstructuring electronic components, which yields high resolutions ( <== 200 nm) at a good aspect ratio while being significantly less expensive than photolithographic methods, semiconductors
10/13/2005US20050224451 Method for masking a recess in a structure with a large aspect ratio
10/13/2005US20050224429 Support jig of quartz glass for receiving wafer-like substrates of semiconductor material
10/13/2005US20050224391 Front opening wafer carrier with path to ground effectuated by door
10/13/2005US20050224368 Polishing system and polishing method
10/13/2005US20050224359 Method and apparatus for electroplating
10/13/2005US20050224358 Method for improved local planarity control during electropolishing
10/13/2005US20050224344 Plasma processing apparatus and method
10/13/2005US20050224337 Plasma processing apparatus and method
10/13/2005US20050224315 Dynamically balanced substrate carrier handler
10/13/2005US20050224256 Interlayer member used for producing multilayer wiring board and method of producing the same
10/13/2005US20050224252 Component mounting substrate and structure
10/13/2005US20050224251 Low moisture absorptive circuitized substrate, method of making same, electrical assembly utilizing same, and information handling system utilizing same
10/13/2005US20050224186 Method for processing electrical parts, particularly for processing semiconductor chips and electrical components, and device for carrying out said method
10/13/2005US20050224182 Plasma processing apparatus
10/13/2005US20050224181 Method and apparatus for in-situ film stack processing
10/13/2005US20050224180 Apparatus for controlling gas flow in a semiconductor substrate processing chamber
10/13/2005US20050224179 Baffle plate and plasma etching device having same
10/13/2005US20050224178 Heating jacket for plasma etching reactor, and etching method using same
10/13/2005US20050224167 Material separation to form segmented product
10/13/2005US20050224132 Apparatus and method of dispensing photosensitive solution in semiconductor device fabrication equipment
10/13/2005US20050224111 Photovoltaic device
10/13/2005US20050224103 Centrifugal container cleaning system
10/13/2005US20050224102 Apparatus and method of rinsing and drying semiconductor wafers
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