Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2005
10/06/2005US20050221526 Process for producing nitride semiconductor light-emitting device
10/06/2005US20050221525 Implementation of one or more optical waveguides in reduced optical material
10/06/2005US20050221524 Method for forming film pattern, method for manufacturing device, electro-optical apparatus, electronic apparatus, and method for manufacturing active matrix substrate
10/06/2005US20050221523 Film formation method, substrate, and liquid discharge head
10/06/2005US20050221522 Optical channels for multi-level metal optical imagers and method for manufacturing same
10/06/2005US20050221521 Nitride semiconductor light emitting device and method of manufacturing the same
10/06/2005US20050221520 Ternary nitride-based buffer layer of a nitride-based light-emitting device and a method for manufacturing the same
10/06/2005US20050221519 Semiconductor light emitting devices including a luminescent conversion element and methods for packaging the same
10/06/2005US20050221518 Reflector packages and methods for packaging of a semiconductor light emitting device
10/06/2005US20050221517 Optical isolator device, and method of making same
10/06/2005US20050221515 Method for producing semiconductor light emitting device, method for producing semiconductor device, method for producing device, method for growing nitride type III-V group compound semiconductor layer, method for growing semiconductor layer, and method for growing layer
10/06/2005US20050221514 Adaptive sampling method for improved control in semiconductor manufacturing
10/06/2005US20050221513 Method of controlling trimming of a gate electrode structure
10/06/2005US20050221512 Magnetic recording medium and magnetic memory apparatus
10/06/2005US20050221511 MRAM arrays with reduced bit line resistance and method to make the same
10/06/2005US20050221365 Polymerase chain reaction using metallic glass-coated microwire
10/06/2005US20050221236 photoresist patterning; reduced thickness after development
10/06/2005US20050221235 Applying alternating material layers on a ridge and then removing some of the alternating layers to expose edges; exposed edges can be of nearly arbitrary length and curvature; edges can be used to fabricate an array of nano-scale-width curved wires
10/06/2005US20050221234 Resist pattern forming method, semiconductor apparatus using said method, and exposure apparatus thereof
10/06/2005US20050221227 Alkali-soluble siloxane polymer, positive type resist composition, resist pattern, process for forming the same, electronic device and process for manufacturing the same
10/06/2005US20050221225 Positive resist composition
10/06/2005US20050221224 having high sensitivity and high resolution and being excellent in the pattern profile, line edge roughness, dissolution contrast, surface roughness and prevention of negative conversion
10/06/2005US20050221221 Sensitive to high-energy radiation, resolution, and etching resistance
10/06/2005US20050221208 Resist pattern formation method, patterned substrate manufacturing method, and resist pattern formation apparatus
10/06/2005US20050221207 Method and apparatus for monitoring exposure process
10/06/2005US20050221203 irradiating TiO2 photocatalyst and a silicone coupler having fluorocarbon chain with light through the light-transmitting substrate to modify a part of a surface of the material containing the fluorocarbon chain which is to be a 2nd region; patterning a conductive material to form pattern to 2nd region
10/06/2005US20050221201 Creating at least one drawing layer that defines changes to the structures to be formed on the surface of a semiconductor substrate at one step in the processing , which involves the use of a mask; drawing layer will define a pattern region that will either result in removal of matter from semiconductor
10/06/2005US20050221112 Microtools for package substrate patterning
10/06/2005US20050221020 Method of improving the wafer to wafer uniformity and defectivity of a deposited dielectric film
10/06/2005US20050221015 Apparatus and method for electroless deposition of materials on semiconductor substrates
10/06/2005US20050221006 Yttrium metal-doped aluminum oxide consisting of yttrium, aluminum, and oxygen; mole ratio of the yttrium to aluminum is 1:99 to 10:90; semiconductor substrate; formed by chemical vapor deposition or atomic layer deposition
10/06/2005US20050221005 Precoat film forming method
10/06/2005US20050221001 Method for extending time between chamber cleaning processes
10/06/2005US20050220998 Noble metal layer formation for copper film deposition
10/06/2005US20050220993 Thin film of oxidic materials having a high dielectric constant
10/06/2005US20050220985 Substrate processing apparatus and substrate processing method
10/06/2005US20050220984 Method and system for control of processing conditions in plasma processing systems
10/06/2005US20050220931 Nozzle assembly for applying a liquid to a substrate
10/06/2005US20050220714 Agents for use in magnetic resonance and optical imaging
10/06/2005US20050220694 Method for producing nitrides
10/06/2005US20050220604 Substrate support bushing
10/06/2005US20050220582 Teaching method and processing system
10/06/2005US20050220581 Adjustable substrate transfer apparatus
10/06/2005US20050220577 Cluster tool and transfer control method
10/06/2005US20050220576 Substrate manufacturing apparatus and substrate transfer module used therein
10/06/2005US20050220575 Vacuum processing apparatus and vacuum processing method
10/06/2005US20050220433 Methods for producing waveguides
10/06/2005US20050220334 Position detection apparatus and exposure apparatus
10/06/2005US20050220332 Pattern inspection method, pattern inspection system and pattern inspection program of photomask
10/06/2005US20050219936 Array of nanoscopic mosfet transistors and fabrication methods
10/06/2005US20050219927 Method for stabilizing or offsetting voltage in an integrated circuit
10/06/2005US20050219912 Electrically erasable and programmable, non-volatile semiconductor memory device having a single layer of gate material, and corresponding memory plane
10/06/2005US20050219911 Non-volatile memory circuit and semiconductor device
10/06/2005US20050219895 Magnetic random access memory array with free layer locking mechanism
10/06/2005US20050219893 Semiconductor memory device having dummy word line
10/06/2005US20050219790 Semiconductor component comprising an integrated capacitor structure tha has a plurality of metallization planes
10/06/2005US20050219786 Detachable electrostatic chuck
10/06/2005US20050219778 Semiconductor device
10/06/2005US20050219777 Wire bonding apparatus
10/06/2005US20050219767 Magneto-resistive element
10/06/2005US20050219696 Patterned grid element polarizer
10/06/2005US20050219549 Measuring apparatus and method
10/06/2005US20050219548 Method of measuring micro-structure, micro-structure measurement apparatus, and micro-structure analytical system
10/06/2005US20050219533 Exposure apparatus and aligning method
10/06/2005US20050219529 Sample analysis method
10/06/2005US20050219521 Apparatus and method for inspecting a semiconductor component
10/06/2005US20050219515 Aberration measuring method
10/06/2005US20050219501 Stage apparatus and exprosure apparatus
10/06/2005US20050219499 Lithographic apparatus and device manufacturing method
10/06/2005US20050219498 Illumination optical system and exposure apparatus having the same
10/06/2005US20050219497 Lithographic apparatus and device manufacturing method
10/06/2005US20050219494 Lithographic apparatus, illumination system, and optical element for rotating an intensity distribution
10/06/2005US20050219493 Illuminating method, exposing method, and device for therefor
10/06/2005US20050219492 Alignment method, exposure apparatus and device fabrication method
10/06/2005US20050219491 Position measurement technique
10/06/2005US20050219487 Scanning exposure apparatus and method
10/06/2005US20050219486 Exposure apparatus and device manufacturing method
10/06/2005US20050219485 Exposure apparatus and device manufacturing method
10/06/2005US20050219483 Lithographic apparatus and device manufacturing method
10/06/2005US20050219482 Lithographic apparatus, device manufacturing method and device manufactured thereby
10/06/2005US20050219481 Lithographic apparatus and device manufacturing method
10/06/2005US20050219454 Liquid crystal display device and repairing method thereof
10/06/2005US20050219435 Liquid crystal display device including driving circuit and method of fabricating the same
10/06/2005US20050219434 Liquid crystal display panel and manufacturing method thereof
10/06/2005US20050219433 Liquid crystal display device and method for fabricating the same
10/06/2005US20050219289 Liquid ejecting apparatus
10/06/2005US20050219098 D/A conversion circuit and semiconductor device
10/06/2005US20050219034 Semiconductor device, method of manufacturing the same, and electronic device
10/06/2005US20050218966 Booster circuit
10/06/2005US20050218965 Semiconductor integrated circuit
10/06/2005US20050218962 Voltage switching circuit
10/06/2005US20050218959 Semiconductor integrated circuit device
10/06/2005US20050218936 Semiconductor device having universal logic cell
10/06/2005US20050218934 Output drivers having adjustable swing widths during test mode operation
10/06/2005US20050218926 Measuring method, inspection method, inspection device, semiconductor device, method of manufacturing a semiconductor device, and method of manufacturing an element substrate
10/06/2005US20050218923 Semiconductor wafer and semiconductor device manufacturing method using the same
10/06/2005US20050218922 Method and apparatus for testing defective portion of semiconductor device
10/06/2005US20050218921 Method and application of pica (picosecond imaging circuit analysis) for high current pulsed phenomena
10/06/2005US20050218917 Semiconductor component with internal heating
10/06/2005US20050218916 Semiconductor device and inspection method
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