Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2006
01/03/2006US6982187 Methods of making shallow trench-type pixels for CMOS image sensors
01/03/2006US6982186 CMOS image sensor and method for manufacturing the same
01/03/2006US6982185 Single crystal, dual wafer, tunneling sensor or switch with silicon on insulator substrate and a method of making same
01/03/2006US6982184 Method of fabricating MEMS devices on a silicon wafer
01/03/2006US6982183 Method and system for manufacturing a pixel image sensor
01/03/2006US6982182 Moisture passivated planar index-guided VCSEL
01/03/2006US6982181 Manufacturing process for ultra slim electrooptic display device unit
01/03/2006US6982180 Electroluminescent display device manufacturing method
01/03/2006US6982179 Structure and method of fabricating organic devices
01/03/2006US6982178 Components and methods for use in electro-optic displays
01/03/2006US6982176 Method for monitoring production of pixel detectors and detectors produced thereby
01/03/2006US6982175 End point detection in time division multiplexed etch processes
01/03/2006US6982174 Directed assembly of nanometer-scale molecular devices
01/03/2006US6982141 Semiconductor device and manufacturing method thereof
01/03/2006US6982140 Resolution
01/03/2006US6982102 When coating a photoresist on a semiconductor wafer using an apparatus having a second exhaust pipe for atmospheric gas separate from a first exhaust pipe so that the flow rate and maintainence of a constant pressure in the casing are controlled
01/03/2006US6982007 Divided pressure vessel apparatus for carbon dioxide based systems and methods of using same
01/03/2006US6982002 Apparatus and method for forming coating film
01/03/2006US6981993 Carrier reel, carriage method using the carrier reel, and method for manufacturing electronic device
01/03/2006US6981859 Method for manufacturing electronic component and apparatus for manufacturing the same
01/03/2006US6981832 Wafer handling system
01/03/2006US6981808 Substrate processing apparatus and substrate transferring method
01/03/2006US6981629 Apparatus of clamping semiconductor devices using sliding finger supports
01/03/2006US6981585 Surface package type semiconductor package and method of producing semiconductor memory
01/03/2006US6981521 Exhaust valve for semiconductor manufacturing process
01/03/2006US6981517 Gas supply system, valve assembly and method of forming reactant pulses by operating a valve assembly
01/03/2006US6981465 Chemical vapor deposition process and apparatus thereof
01/03/2006US6981317 Method and device for mounting electronic component on circuit board
01/03/2006US6981312 System for handling microelectronic dies having a non-piercing die ejector
01/03/2006CA2320278C Plating apparatus and method
01/03/2006CA2197627C Antifuse based on silicided single polysilicon bipolar transistor
01/03/2006CA2191339C Method and device for continuous uniform electrolytic metallising or etching
01/01/2006CA2529595A1 Heterostructure bipolar transistor
12/2005
12/29/2005WO2005125298A2 Method for manufacturing an electronics module comprising a component electrically connected to a conductor- pattern layer
12/29/2005WO2005125292A1 Method for the selective deposition of a galvanic coating on a miniaturised electric circuit created by etching
12/29/2005WO2005125014A1 Programmable semiconductor device
12/29/2005WO2005125013A1 Optically reconfigurable gate array write state inspection method, write state inspection device, and optically reconfigurable gate array
12/29/2005WO2005125007A1 High-frequency element, power supply element, and communication device
12/29/2005WO2005124888A1 Suspended carbon nanotube field effect transistor
12/29/2005WO2005124873A1 High-voltage device structure
12/29/2005WO2005124872A1 Nanowire semiconductor device
12/29/2005WO2005124871A2 Hybrid substrate technology for high-mobility planar and multiple-gate mosfets
12/29/2005WO2005124865A1 Method for manufacturing bonded wafer
12/29/2005WO2005124864A1 2-transistor memory cell with modified access gate
12/29/2005WO2005124859A2 Methods and apparatuses for depositing uniform layers
12/29/2005WO2005124858A2 Package and method for packaging an integrated circuit die
12/29/2005WO2005124856A2 Method and system for improved wire bonding
12/29/2005WO2005124855A1 Capping of metal interconnects in integrated circuit electronic devices
12/29/2005WO2005124854A1 Method for producing a layer arrangement
12/29/2005WO2005124853A1 Load port
12/29/2005WO2005124852A1 Temperature sensor apparatus of wafer
12/29/2005WO2005124851A1 Resin paste for die bonding and its use
12/29/2005WO2005124850A1 Semiconductor device and production method for semiconductor device
12/29/2005WO2005124849A2 System and method for forming multi-component dielectric films
12/29/2005WO2005124848A1 Heat treatment jig and semiconductor wafer heat treatment method
12/29/2005WO2005124847A1 Semiconductor device and manufacturing method thereof
12/29/2005WO2005124846A1 Organic siloxane film, semiconductor device using same, flat panel display and raw material liquid
12/29/2005WO2005124845A1 Substrate processing equipment and semiconductor device manufacturing method
12/29/2005WO2005124844A1 Plasma processing device amd method
12/29/2005WO2005124843A1 Silicon wafer manufacturing method and silicon wafer
12/29/2005WO2005124842A1 Laser irradiation method, laser irradiation apparatus, and method for manufacturing semiconductor device
12/29/2005WO2005124841A1 Laser irradiation apparatus and laser irradiation method
12/29/2005WO2005124840A1 Heat treatment device
12/29/2005WO2005124839A1 Heat treatment jig for semiconductor silicon substrate
12/29/2005WO2005124838A1 Low temperature epitaxial growth of silicon-containing films using uv radiation
12/29/2005WO2005124837A1 Method of manufacturing a strained semiconductor layer, method of manufacturing a semiconductor device and semiconductor substrate suitable for use in such a method
12/29/2005WO2005124836A1 Pellicle frame assembly
12/29/2005WO2005124835A1 Exposure equipment and device manufacturing method
12/29/2005WO2005124834A1 Best focus detecting method, exposure method and exposure equipment
12/29/2005WO2005124833A1 Exposure device, exposure device member cleaning method, exposure device maintenance method, maintenance device, and device manufacturing method
12/29/2005WO2005124832A1 Exposure system
12/29/2005WO2005124831A1 Light detecting apparatus, illumination optical apparatus, exposure apparatus and exposure method
12/29/2005WO2005124830A2 Apparatus and method for indexing of substrates and lead frames
12/29/2005WO2005124829A2 In-line heater for use in semiconductor wet chemical processing and method of manufacturing the same
12/29/2005WO2005124828A2 Active matrix electronic array device having built in resistive heating arrangement
12/29/2005WO2005124827A2 Improved method and apparatus for the etching of microstructures
12/29/2005WO2005124826A1 Method for transferring plates
12/29/2005WO2005124652A2 Localizing a temperature of a device for testing
12/29/2005WO2005124468A1 A photolitography apparatus and mask for nano meter scale patterning of some arbitrary shapes
12/29/2005WO2005124466A1 Exposure equipment
12/29/2005WO2005124463A1 Positive resist composition and method for forming resist pattern
12/29/2005WO2005124462A1 Photosensitive composition, method for forming pattern, and permanent pattern
12/29/2005WO2005124459A1 Organic film composition and method for forming resist pattern
12/29/2005WO2005124455A1 Production method for mask blank-use translucent substrate, production method for mask blank, production method for exposing mask, production method for semiconductor device and production method for liquid crystal display unit, and method of correcting defect in exposing mask
12/29/2005WO2005124454A1 Semitransmitting film, photomask blank, photomask, and semitransmitting film designing method
12/29/2005WO2005124420A1 Optical system, exposing apparatus and exposing method
12/29/2005WO2005123988A1 Method of barrier layer surface treatment to enable direct copper plating on barrier metal
12/29/2005WO2005123858A1 CHEMICAL-MECHANICAL POLISHING (CMP) SLURRY CONTAINING CLAY AND CeO2 ABRASIVE PARTICLES AND METHOD OF PLANARIZING SURFACES
12/29/2005WO2005123857A1 Polishing method for glass substrate, and glass substrate
12/29/2005WO2005123795A1 Polymer compound, positive resist composition and method for forming resist pattern
12/29/2005WO2005123655A1 Compound, polymer compound, positive resist composition and method for forming resist pattern
12/29/2005WO2005123637A1 Single crystal, material for nanowiring, electronic device, and process for producing material for nanowiring
12/29/2005WO2005123628A1 Anodic bonding process for ceramics
12/29/2005WO2005123617A1 Process for polishing glass substrate
12/29/2005WO2005123549A2 Serial thermal processor arrangement
12/29/2005WO2005123342A1 Process for producing improved membranes
12/29/2005WO2005123317A1 Edge bead removal by an electro polishing process
12/29/2005WO2005123281A2 System and method for carrying out liquid and subsequent drying treatments on one or more wafers
12/29/2005WO2005123236A1 Substrate processing device
12/29/2005WO2005122831A1 Fastener system