Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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02/12/2014 | CN103578981A Preparation method for field stop insulated gate bipolar transistor |
02/12/2014 | CN103578980A Preparation method for field stop insulated gate bipolar transistor |
02/12/2014 | CN103578979A Technology for converting axial diode after welding |
02/12/2014 | CN103578978A Method for manufacturing high-voltage fast recovery diodes based on silicon-based bonding materials |
02/12/2014 | CN103578977A Method for improving fluorescence intensity of AlN epitaxial thin film |
02/12/2014 | CN103578976A Semiconductor wafer composed of monocrystalline silicon and method for producing it |
02/12/2014 | CN103578975A Method for etching metal layer and method for manufacturing a semiconductor device using the same |
02/12/2014 | CN103578974A Oxide layer forming method and semiconductor product |
02/12/2014 | CN103578973A Circulating etching method of silicon nitride hole with high depth-to-width ratio |
02/12/2014 | CN103578972A Method for removing polycrystalline silicon protection layer on reverse side of IGBT with field stop structure |
02/12/2014 | CN103578971A Method for removing photoresist after high-energy ion implantation |
02/12/2014 | CN103578970A Method of manufacturing semiconductor device |
02/12/2014 | CN103578969A Method of manufacturing a semiconductor device including a dielectric structure |
02/12/2014 | CN103578968A Structure of comprehensive type silicon epitaxy process photoetching alignment mark and manufacturing method |
02/12/2014 | CN103578967A Preparation method for improving grid electrode breakdown capability of groove type IGBT |
02/12/2014 | CN103578966A Wet process chemical preparation method for black silicon with pointed-cone-shaped surface |
02/12/2014 | CN103578965A Once forming method of two corrosion depths |
02/12/2014 | CN103578964A Semiconductor structure and fin field-effect tube forming method and etching device |
02/12/2014 | CN103578963A 半导体器件及其制造方法 Semiconductor device and manufacturing method thereof |
02/12/2014 | CN103578962A Metallizing method for chip front electrode and auxiliary devices |
02/12/2014 | CN103578961A Method for forming metal silicide semiconductor |
02/12/2014 | CN103578960A Method for manufacturing ohmic contact surface on back side of SiC substrate |
02/12/2014 | CN103578959A Manufacturing method of anode of FS-IGBT device |
02/12/2014 | CN103578958A Semiconductor grid structure and forming method thereof |
02/12/2014 | CN103578957A Substrate surface passivating method and semiconductor structure forming method |
02/12/2014 | CN103578956A Method for manufacturing electronic component and device for manufacturing electronic component |
02/12/2014 | CN103578955A Semiconductor and forming method thereof |
02/12/2014 | CN103578954A Semiconductor integrated circuit with metal gate |
02/12/2014 | CN103578953A Method of semiconductor integrated circuit fabrication |
02/12/2014 | CN103578952A Semiconductor device manufacturing method |
02/12/2014 | CN103578951A Semiconductor device manufacturing method |
02/12/2014 | CN103578950A Method for manufacturing flash memory tunnel oxidation layer |
02/12/2014 | CN103578949A Integrated production method of grid polysilicon and polysilicon resistors |
02/12/2014 | CN103578948A Method for restraining grid polycrystalline silicon from being exhausted in PMOS device technology |
02/12/2014 | CN103578947A Manufacturing method of high-dielectric metal gate |
02/12/2014 | CN103578946A Method for manufacturing semiconductor device |
02/12/2014 | CN103578945A Method for manufacturing semiconductor device |
02/12/2014 | CN103578944A Method for manufacturing semiconductor device |
02/12/2014 | CN103578943A Laser annealing device and laser annealing method |
02/12/2014 | CN103578942A Method for manufacturing silicon carbide high-temperature ion implantation mask with selectivity cut-off layer |
02/12/2014 | CN103578941A Method of manufacturing semiconductor devices using ion implantation, and semiconductor devices |
02/12/2014 | CN103578940A Aluminum metal grid electrode forming method |
02/12/2014 | CN103578939A Method of vapor-diffusing impurities |
02/12/2014 | CN103578938A Sn-doped ZnO semiconductor material, preparation method thereof and application thereof |
02/12/2014 | CN103578937A Manufacturing method of silicon nitride thin film |
02/12/2014 | CN103578936A Method for manufacturing semiconductor device |
02/12/2014 | CN103578935A Method for growing high-quality all-component adjustable ternary semiconductor alloy |
02/12/2014 | CN103578934A Germanium substrate structure on silica-based insulator and preparing method thereof |
02/12/2014 | CN103578933A Device having reduced bias temperature instability (BTI) |
02/12/2014 | CN103578932A Method for achieving self-alignment type double patterns |
02/12/2014 | CN103578931A Multiple graphical mask layer and forming method thereof |
02/12/2014 | CN103578930A Forming method for multiple graphical mask layer and semiconductor structure |
02/12/2014 | CN103578929A Method for preparing Al/Zn0.83Li0.17O/p-Si MFS structure information storage capacitor for computer |
02/12/2014 | CN103578928A Substrate drying method, substrate manufacturing method, and low-temperature heating drying device thereof |
02/12/2014 | CN103578927A Method of manufacturing a semiconductor device including grinding from a back surface and semiconductor device |
02/12/2014 | CN103578926A Semiconductor buffer structure, semiconductor device and method making same |
02/12/2014 | CN103578925A Method for manufacturing silicon carbide substrate |
02/12/2014 | CN103578924A Semiconductor structure for antenna switchover circuit and technique thereof |
02/12/2014 | CN103578923A Self-assembled monolayer for pattern formation |
02/12/2014 | CN103578922A Patterning process for oxide film |
02/12/2014 | CN103578921A Patterning technology |
02/12/2014 | CN103578920A Semiconductor device manufacturing method |
02/12/2014 | CN103578919A Method for forming passivation layer of MOS device and MOS device |
02/12/2014 | CN103578918A Method for reducing surface electric arcing defect of semiconductor chip |
02/12/2014 | CN103578917A Method for reducing critical dimension of metal hard mask layer |
02/12/2014 | CN103578904A Particle pollution reducing method used for multi-chamber plasma processing device |
02/12/2014 | CN103578901A Sequencer for combining automated and manual-assistance jobs in a charged particle beam device |
02/12/2014 | CN103578900A Plasma processing device and static chuck thereof |
02/12/2014 | CN103578899A Plasma processing device and electro static chuck thereof |
02/12/2014 | CN103578703A Chip device, multi-layered chip device and method of producing same |
02/12/2014 | CN103577786A 加工装置 Processing device |
02/12/2014 | CN103576462A Method for photoetching front surface of wafer after wet etching on back surface |
02/12/2014 | CN103576445A Photoetching method for photoresist as silicon groove etching mask |
02/12/2014 | CN103576401A Array substrate and preparation method thereof, and display device |
02/12/2014 | CN103575589A Detecting anomalous weak beol sites in metallization system |
02/12/2014 | CN103575075A Silicon wafer spin-drying system |
02/12/2014 | CN103571495A Etchant composition and manufacturing method for thin film transistor using the same |
02/12/2014 | CN103571253A High temperature thermal annealing process |
02/12/2014 | CN103571252A Thermal annealing process |
02/12/2014 | CN103569948A Bonding method using porous surface for making stacked structure |
02/12/2014 | CN103569629A Magazine replacing device, insert machine and semiconductor device |
02/12/2014 | CN103568073A Breaking apparatus for brittle material substrate |
02/12/2014 | CN103567857A Double-sided polishing process for silicon wafer |
02/12/2014 | CN103567683A Positioning tool for chip welding |
02/12/2014 | CN103567169A Substrate cleaning apparatus, substrate cleaning system, and substrate cleaning method |
02/12/2014 | CN103567110A Process liquid supply apparatus operating method, and process liquid supply apparatus |
02/12/2014 | CN102709238B Array substrate and manufacturing method thereof |
02/12/2014 | CN102543878B Manufacturing method of storage |
02/12/2014 | CN102543794B Crystal boat converter |
02/12/2014 | CN102533148B Cutting chip bonding film, composition used for cutting chip bonding film and semiconductor device |
02/12/2014 | CN102509718B Wafer-level chip size encapsulation technology for GaAs (gallium arsenide) CCD (Charge Coupled Device) image sensor |
02/12/2014 | CN102486444B Method for detecting film stress |
02/12/2014 | CN102471648B Adhesive sheet and method for manufacturing adhesive sheets |
02/12/2014 | CN102386093B Bipolar transistor and method of manufacturing same |
02/12/2014 | CN102347300B Chip package and fabricating method thereof |
02/12/2014 | CN102347277B Semiconductor device structure and manufacturing method thereof |
02/12/2014 | CN102347235B Strain semiconductor channel formation method and semiconductor device |
02/12/2014 | CN102332469B Longitudinally-conductive GaN (gallium nitride) normally-closed MISFET (metal integrated semiconductor field effect transistor) device and manufacturing method thereof |
02/12/2014 | CN102315151B Substrate stage, substrate processing apparatus and substrate processing system |
02/12/2014 | CN102308368B Chemical vapor deposition flow inlet elements and methods |