Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2014
03/11/2014US8668837 Method for etching substrate
03/11/2014US8668836 Plasma processing device and method of monitoring plasma discharge state in plasma processing device
03/11/2014US8668833 Method of forming a nanostructure
03/11/2014US8668816 Self-ionized and inductively-coupled plasma for sputtering and resputtering
03/11/2014US8668805 Line end shortening reduction during etch
03/11/2014US8668776 Gas delivery apparatus and method for atomic layer deposition
03/11/2014US8668775 Machine CVD shower head
03/11/2014US8668553 Method of manufacturing semiconductor device
03/11/2014US8668428 Horizontal articulated robot and substrate transfer system provided with the same
03/11/2014US8668422 Low cost high throughput processing platform
03/11/2014US8667928 Semiconductor processing
03/06/2014WO2014036500A1 Photovoltaic devices
03/06/2014WO2014036494A1 Methods of treating a semiconductor layer
03/06/2014WO2014036489A1 METHOD OF CONTROLLING THE AMOUNT OF Cu DOPING WHEN FORMING A BACK CONTACT OF A PHOTOVOLTAIC CELL
03/06/2014WO2014036480A1 Three dimensional memory array architecture
03/06/2014WO2014036461A1 Three dimensional memory array architecture
03/06/2014WO2014036456A2 Method and apparatus for routing die signals using external interconnects
03/06/2014WO2014036407A1 Heterogeneous annealing method and device
03/06/2014WO2014036294A1 Memory array having connections going through control gates
03/06/2014WO2014036280A1 Semiconductor device with jfet width defined by trench isolation
03/06/2014WO2014036264A1 Resistive memory devices
03/06/2014WO2014036257A1 3d tsv assembly method for mass reflow
03/06/2014WO2014036181A1 Wave front aberration metrology of optics of euv mask inspection system
03/06/2014WO2014036000A1 Wide dynamic range ion energy bias control; fast ion energy switching; ion energy control and a pulsed bias supply; and a virtual front panel
03/06/2014WO2014035957A1 Reflective deposition rings and substrate processing chambers incorporating same
03/06/2014WO2014035933A1 Methods and apparatus for forming tantalum silicate layers on germanium or iii-v semiconductor devices
03/06/2014WO2014035897A1 A method of controlling the switched mode ion energy distribution system
03/06/2014WO2014035894A1 Systems and methods for calibrating a switched mode ion energy distribution system
03/06/2014WO2014035889A1 Systems and methods for monitoring faults, anomalies, and other characteristics of a switched mode ion energy distribution system
03/06/2014WO2014035826A1 Mask residue removal for substrate dicing by laser and plasma etch
03/06/2014WO2014035820A1 Method of silicon etch for trench sidewall smoothing
03/06/2014WO2014035768A1 System, architecture and method for simultaneous transfer and process of substrates
03/06/2014WO2014035675A1 Large high-quality epitaxial wafers
03/06/2014WO2014035568A1 Arrays of vertically-oriented transistors, and memory arrays including vertically-oriented transistors
03/06/2014WO2014035556A1 Finfet with self-aligned punchthrough stopper
03/06/2014WO2014035532A1 Semiconductor fin on local oxide
03/06/2014WO2014035481A1 Group iii nitride wafer and its production method
03/06/2014WO2014035348A1 Multifunction wafer and film frame handling system
03/06/2014WO2014035347A1 System and method for automatically correcting for rotational misalignment of wafers on film frames
03/06/2014WO2014035346A1 Single ultra-planar wafer table structure for both wafers and film frames
03/06/2014WO2014035096A1 Substrate processing device
03/06/2014WO2014035095A1 Substrate processing device
03/06/2014WO2014035045A1 Insert ring for retainer ring structure in chemical-mechanical polishing apparatus
03/06/2014WO2014035044A1 Retainer ring structure for chemical-mechanical polishing and method for manufacturing same
03/06/2014WO2014035019A1 Semiconductor and exhaust gas inspection hole for lcd
03/06/2014WO2014034921A1 Machining method and machining device
03/06/2014WO2014034874A1 Thin film transistor and display device
03/06/2014WO2014034873A1 Thin film transistor and display device
03/06/2014WO2014034872A1 Thin film transistor and display device
03/06/2014WO2014034841A1 Method for cutting high-hardness material by multi-wire saw
03/06/2014WO2014034805A1 Bonded substrate and method for manufacturing same
03/06/2014WO2014034762A1 Nitride semiconductor element
03/06/2014WO2014034748A1 Semiconductor device, and method for producing same
03/06/2014WO2014034688A1 Method for modifying substrate surface, modifying film and coating solution used for modification of substrate surface
03/06/2014WO2014034687A1 Gan crystal and method for manufacturing semiconductor element
03/06/2014WO2014034674A1 Plasma processing method and plasma processing device
03/06/2014WO2014034666A1 Etching method and substrate processing apparatus
03/06/2014WO2014034639A1 Magnetic multilayer film and tunneling magnetoresistance element
03/06/2014WO2014034617A1 Circuit board and display device
03/06/2014WO2014034596A1 Illumination monitoring apparatus and exposure apparatus provided with same
03/06/2014WO2014034576A1 Imprint device and imprint method
03/06/2014WO2014034566A1 Semiconductor device, display panel, and method for manufacturing semiconductor devices
03/06/2014WO2014034541A1 Photosensitive resin composition and pattern formation method using same
03/06/2014WO2014034512A1 Thin film transistor substrate and display device
03/06/2014WO2014034504A1 Substrate stage and substrate processing device provided with same
03/06/2014WO2014034503A1 Substrate processing device and device for producing liquid crystal display panel
03/06/2014WO2014034425A1 Polishing composition and method for producing substrate
03/06/2014WO2014034411A1 Electric power semiconductor device
03/06/2014WO2014034396A1 Plasma processing method and plasma processing device
03/06/2014WO2014034393A1 Organic thin-film transistor, organic semiconductor thin film and organic semiconductor material
03/06/2014WO2014034379A1 Polishing agent, polishing agent set and method for polishing base
03/06/2014WO2014034358A1 Polishing agent, polishing agent set and method for polishing base
03/06/2014WO2014034349A1 Defect classification device, defect classification method, control program, and recording medium
03/06/2014WO2014034346A1 Composite semiconductor device
03/06/2014WO2014034338A1 Composite substrate, method for manufacturing same, method for manufacturing functional layer formed of group 13 element nitride, and functional element
03/06/2014WO2014034318A1 Plasma emission device and substrate processing device
03/06/2014WO2014034302A1 Photosensitive resin composition, method for forming curable film, curable film, organic el display device, and lcd device
03/06/2014WO2014034301A1 Photosensitive resin composition, method for forming curable film, curable film, organic el display device, and lcd device
03/06/2014WO2014034292A1 Resist removing apparatus and resist removing method
03/06/2014WO2014034289A1 Method for manufacturing silicon carbide semiconductor device
03/06/2014WO2014034271A1 Defect inspection method, and apparatus using same
03/06/2014WO2014034252A1 Defect observation system and defect observation method
03/06/2014WO2014034247A1 Gate valve and substrate processing system
03/06/2014WO2014034229A1 Plasma processing apparatus and substrate processing apparatus provided with same
03/06/2014WO2014034217A1 Substrate treating method and substrate treating device
03/06/2014WO2014034190A1 Radiation-sensitive resin composition, resist pattern forming method, radiation-sensitive acid generator, compound and method for producing compound
03/06/2014WO2014034161A1 Substrate support device and exposure device
03/06/2014WO2014034122A1 Sputtering target
03/06/2014WO2014034102A1 Display device and method for producing same
03/06/2014WO2014034080A1 3c-sic single crystal and production method therefor
03/06/2014WO2014034024A1 Electronic component package and method of manufacturing same
03/06/2014WO2014034019A1 Soi wafer manufacturing method
03/06/2014WO2014033991A1 Semiconductor device
03/06/2014WO2014033983A1 Component-carrying structure
03/06/2014WO2014033982A1 Semiconductor element producing method
03/06/2014WO2014033977A1 Semiconductor device
03/06/2014WO2014033973A1 Device for mounting components
03/06/2014WO2014033826A1 SiC SEMICONDUCTOR THIN FILM AND PRODUCTION METHOD THEREFOR
03/06/2014WO2014033753A2 "a process for the preparation of transparent conductive oxides".
03/06/2014WO2014033649A1 Method for depositing an aluminium nitride layer
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