Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2014
03/18/2014US8673677 Method for producing group III nitride semiconductor light emitting element
03/18/2014US8673676 Surface processing method of silicon substrate for solar cell, and manufacturing method of solar cell
03/18/2014US8673675 Humidity control and method for thin film photovoltaic materials
03/18/2014US8673671 Methods and devices for fabricating tri-layer beams
03/18/2014US8673670 Micro-electro-mechanical system (MEMS) structures and design structures
03/18/2014US8673669 Method of making a CMOS image sensor and method of suppressing dark leakage and crosstalk for a CMOS image sensor
03/18/2014US8673668 Test structure for controlling the incorporation of semiconductor alloys in transistors comprising high-k metal gate electrode structures
03/18/2014US8673667 Method for manufacturing light emitting diode chip
03/18/2014US8673666 Light-emitting devices with textured active layer
03/18/2014US8673664 Method of manufacturing photodiode with waveguide structure and photodiode
03/18/2014US8673663 Method for manufacturing array substrate of transflective liquid crystal display
03/18/2014US8673662 Light-emitting diode cutting method and product thereof
03/18/2014US8673661 Display apparatus and method of manufacturing the same
03/18/2014US8673660 Method of producing liquid ejection head
03/18/2014US8673659 Method of fabricating semiconductor device including process monitoring pattern having overlapping input/output pad array area
03/18/2014US8673658 Fabricating method of semiconductor device
03/18/2014US8673657 Semiconductor device including a circuit area and a monitor area having a plurality of monitor layers and method for manufacturing the same
03/18/2014US8673656 Method and device for measuring temperature during deposition of semiconductor
03/18/2014US8673655 Semiconductor package repair process
03/18/2014US8673654 Underlayer for high performance magnetic tunneling junction MRAM
03/18/2014US8673450 Graphite member for beam-line internal member of ion implantation apparatus
03/18/2014US8673396 Method of forming continuous thin film and linear glass substrate with thin film
03/18/2014US8673166 Plasma processing apparatus and plasma processing method
03/18/2014US8673165 Sidewall image transfer process with multiple critical dimensions
03/18/2014US8673162 Methods for substrate surface planarization during magnetic patterning by plasma immersion ion implantation
03/18/2014US8673111 Plasma processing chamber for bevel edge processing
03/18/2014US8673080 Temperature controlled showerhead
03/18/2014US8673077 Vapor deposition device, vapor deposition method, and organic EL display device
03/18/2014US8673076 Substrate processing apparatus and semiconductor device producing method
03/18/2014US8672605 Semiconductor wafer handling and transport
03/18/2014US8672603 Auto-sequencing inline processing apparatus
03/18/2014US8672563 Development method, method of manufacturing photomask, method of manufacturing semiconductor device and development device
03/18/2014US8671882 Plasma processing apparatus
03/18/2014US8671878 Profile and CD uniformity control by plasma oxidation treatment
03/18/2014CA2572959C Silicon-rich nickel-silicide ohmic contacts for sic semiconductor devices
03/14/2014DE202014100815U1 Vorrichtung zur nasschemischen Behandlung von Objekten, insbesondere von flachen, insbesondere scheibenförmigen Gegenständen wie Halbleiterscheiben, Substraten oder dergleichen An apparatus for wet-chemical treatment of objects, in particular flat, in particular disc-shaped objects such as semiconductor wafers, substrates or the like
03/14/2014DE202014100814U1 Vorrichtung zur nasschemischen Behandlung von Objekten, insbesondere von flachen, insbesondere scheibenförmigen Gegenständen wie Halbleiterscheiben, Substraten oder dergleichen An apparatus for wet-chemical treatment of objects, in particular flat, in particular disc-shaped objects such as semiconductor wafers, substrates or the like
03/14/2014DE202014100813U1 Vorrichtung zur nasschemischen Behandlung von Objekten, insbesondere von flachen, insbesondere scheibenförmigen Gegenständen wie Halbleiterscheiben, Substraten oder dergleichen An apparatus for wet-chemical treatment of objects, in particular flat, in particular disc-shaped objects such as semiconductor wafers, substrates or the like
03/13/2014WO2014040071A1 Method and apparatus for massively parallel multi-wafer test
03/13/2014WO2014040033A2 Temperature control of semiconductor processing chambers by modulating plasma generation energy
03/13/2014WO2014039973A1 Wireless module
03/13/2014WO2014039928A1 Systems and methods related to ablation and cleaning during manufacture of radio-frequency modules
03/13/2014WO2014039863A1 Monitoring incident beam position in a wafer inspection system
03/13/2014WO2014039698A1 Dual active layer semiconductor device and method of manufacturing the same
03/13/2014WO2014039693A1 Dual active layer semiconductor device and method of manufacturing the same
03/13/2014WO2014039689A1 Device correlated metrology (dcm) for ovl with embedded sem structure overlay targets
03/13/2014WO2014039658A1 Vertically stacked power fets and synchronous buck converter having low on-resistance
03/13/2014WO2014039655A1 Portable electrostatic chuck carrier for thin substrates
03/13/2014WO2014039647A1 Plasma treatment system
03/13/2014WO2014039597A2 Direct liquid injection of solution based precursors for atomic layer deposition
03/13/2014WO2014039580A1 Polyp yrrol1done polishing compost-ion and method
03/13/2014WO2014039558A1 Finfet capacitor and manufacturing method thereof
03/13/2014WO2014039546A1 Electronic devices utilizing contact pads with protrusions and methods for fabrication
03/13/2014WO2014039409A1 Metal-safe solid form aqueous-based compositions and methods to remove polymeric materials in electronics manufacturing
03/13/2014WO2014039407A1 Access arbitration system for semiconductor fabrication equipment and methods for using and operating the same
03/13/2014WO2014039335A1 Mass transfer tool
03/13/2014WO2014039325A1 Integrated circuits with selective gate electrode recess
03/13/2014WO2014039262A1 Doors for high volume, low cost system for epitaxial silicon deposition
03/13/2014WO2014039249A1 Gas exhaust for high volume, low cost system for epitaxial silicon deposition
03/13/2014WO2014039194A1 Integrated processing of porous dielectric, polymer-coated substrates and epoxy within a multi-chamber vacuum system confirmation
03/13/2014WO2014039166A1 Self-aligned contacts
03/13/2014WO2014039072A1 Method and structure for forming contact pads on a printed circuit board using zero under- cut technology
03/13/2014WO2014039033A1 Method of producing a microelectronic device in a monocrystalline semiconductor substrate with isolation trenches partially formed under an active region
03/13/2014WO2014038986A1 Galnassb solid solution-based heterostructure, method for producing same and light emitting diode based on said heterostructure
03/13/2014WO2014038869A1 Method for forming silicon oxide nanopattern, method for forming metal nanopattern and magnetic recording medium for information storage using same
03/13/2014WO2014038850A1 Bonding wire for semiconductor device and manufacturing method therefor
03/13/2014WO2014038827A1 Apparatus for imaging plasma particles and method for detecting etching end point using same
03/13/2014WO2014038704A1 Polishing auxiliary agent, and polishing agent composition including said polishing auxiliary agent
03/13/2014WO2014038694A1 Composite substrate and method for producing same
03/13/2014WO2014038693A1 Manufacturing method for device
03/13/2014WO2014038683A1 Semiconductor device and method for producing same
03/13/2014WO2014038667A1 Substrate processing device, semiconductor-device manufacturing method, and recording medium
03/13/2014WO2014038643A1 Semiconductor device and method for producing same
03/13/2014WO2014038634A1 Epitaxial wafer and method for producing same
03/13/2014WO2014038579A1 Fluorine-containing compound, substrate for pattern formation, photodegradable coupling agent, pattern formation method, and compound
03/13/2014WO2014038536A1 Production method for polishing-material particles
03/13/2014WO2014038483A1 Composition for forming resist upper layer film for lithography and method for manufacturing semiconductor device using same
03/13/2014WO2014038454A1 Pattern forming method, structures, interdigitated electrode manufacturing method, and rechargeable battery
03/13/2014WO2014038453A1 Substrate treatment device, substrate treatment method, and method of manufacturing semiconductor device
03/13/2014WO2014038439A1 Method for manufacturing liquid crystal display device
03/13/2014WO2014038438A1 Calculation method, calculation device, and recording medium
03/13/2014WO2014038420A1 Substrate processing method, computer storage medium, and substrate processing system
03/13/2014WO2014038391A1 Polishing composition
03/13/2014WO2014038374A1 Semiconductor device producing method
03/13/2014WO2014038353A1 Base film for dicing sheets, and dicing sheet
03/13/2014WO2014038331A1 Silver paste composition and semiconductor device using same
03/13/2014WO2014038314A1 Normal temperature bonding device and normal temperature bonding method
03/13/2014WO2014038310A1 Semiconductor element producing method
03/13/2014WO2014038301A1 Mounting port and mounting port opening/closing method
03/13/2014WO2014038283A1 Measurement apparatus, measurement method, and device manufacturing method provided with measurement method
03/13/2014WO2014038277A1 Solar cell manufacturing apparatus and solar cell manufacturing method using same
03/13/2014WO2014038244A1 Graphene structure and method for producing same
03/13/2014WO2014038243A1 Graphene-cnt structure and method for producing same
03/13/2014WO2014038225A1 Silicon carbide semiconductor device and method for producing same
03/13/2014WO2014038211A1 Semiconductor device and semiconductor device producing method
03/13/2014WO2014038204A1 Sputtering target
03/13/2014WO2014038181A1 Mask data generating method, program and information processing apparatus for execution of the same
03/13/2014WO2014038176A1 Semiconductor device producing method
03/13/2014WO2014038129A1 Double surface polishing method
03/13/2014WO2014038106A1 Epitaxial wafer, method for producing same and ultraviolet light emitting device
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