Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
03/2014
03/12/2014CN103632957A Manufacturing method for semiconductor chip first layer metal barrier layer
03/12/2014CN103632956A Method for preventing generation of defects in semiconductor product high temperature rapid annealing
03/12/2014CN103632955A Low temperature deposition of silicon-containing films
03/12/2014CN103632954A Plasma-enhanced etching in an augmented plasma processing system
03/12/2014CN103632953A A manufacturing method for a V-type groove structure based on a silicon oxide substrate
03/12/2014CN103632952A Elimination method of suspension step in multilayer composite film
03/12/2014CN103632951A Using Fast Anneal to Form Uniform Ni(Pt)Si(Ge) Contacts on SiGe Layer
03/12/2014CN103632950A A method for forming nitride films among polycrystalline silicon in a groove-type double layer grid MOS
03/12/2014CN103632949A Thermal oxidation dielectric layer forming method in groove type double-layer grid MOS polysilicon
03/12/2014CN103632948A Semiconductor device and manufacturing method thereof
03/12/2014CN103632947A Integration of multiple threshold voltage devices for complementary metal oxide semiconductor using full metal gate
03/12/2014CN103632946A Formation method for full-silicide metal gate
03/12/2014CN103632945A Formation method for fin-type field effect transistor
03/12/2014CN103632944A Method of forming gate electrodes
03/12/2014CN103632943A Manufacturing method of semiconductor device
03/12/2014CN103632942A SONOS device and LDMOS device integration method in CMOS process
03/12/2014CN103632941A Semiconductor device comprising metal gate, and preparation method thereof
03/12/2014CN103632940A Manufacturing method for semiconductor device
03/12/2014CN103632939A Method for optimizing top rounded corner of power device groove
03/12/2014CN103632938A Non-melt thin-wafer laser thermal annealing methods
03/12/2014CN103632937A Semiconductor device with an inclined source/drain and associated methods
03/12/2014CN103632936A Method for ion implantation
03/12/2014CN103632935A Boron diffusion method of N type silicon chip, crystalline silicon solar cell and manufacturing method of crystalline silicon solar cell
03/12/2014CN103632934A Boron diffusion method of N type silicon chip, crystalline silicon solar cell and manufacturing method of crystalline silicon solar cell
03/12/2014CN103632933A Boron diffusion method of N type silicon chip, crystalline silicon solar cell and manufacturing method of crystalline silicon solar cell
03/12/2014CN103632932A Chip loading and unloading device, plasma device and mechanical arm coordinate zero point positioning method
03/12/2014CN103632931A Metal aluminum silicon copper sputtering technological method
03/12/2014CN103632930A Method for preparing ultrathin modified material on insulator by employing ultrathin layer absorption
03/12/2014CN103632929A Method for forming double epitaxial layers of semiconductor device
03/12/2014CN103632928A Self-aligned double patterning formation method
03/12/2014CN103632927A Impedance matching method of plasma etching system
03/12/2014CN103632926A Method for electroplating film circuit pattern on ultrathin quartz substrate
03/12/2014CN103632925A Semiconductor device production method
03/12/2014CN103632924A Method for transferring Inp film on enhancing substrate
03/12/2014CN103632923A A method for forming nanowires of a gate-all-around device
03/12/2014CN103632922A A semiconductor structure and a manufacturing method thereof
03/12/2014CN103632921A Semiconductor device and manufacturing method thereof
03/12/2014CN103632916A Symmetric return liner for modulating azimuthal non-uniformity in a plasma processing system
03/12/2014CN103632915A Electronic knob for tuning radial etch non-uniformity at VHF frequencies
03/12/2014CN103632914A Plasma processing apparatus and plasma processing method
03/12/2014CN103631102A Rinsing agent for lithography, method for forming a resist pattern, and method for producing a semiconductor device
03/12/2014CN103631100A Wafer development apparatus and method
03/12/2014CN103631092A Formation method for semiconductor structure
03/12/2014CN103630825A Chip test circuit and formation method thereof
03/12/2014CN103628075A Plasma etching method
03/12/2014CN103628037A Preparation method of high-dielectric-constant oxide
03/12/2014CN103628035A Wafer carrying platform structure for batch production of small-sized wafers
03/12/2014CN103624909A Clamp and method for reducing bending of plastic-sealed body
03/12/2014CN103624463A FP-type ceramic tube-shell parallel seam welding packaging clamp
03/12/2014CN103624032A Single wafer cleaning method
03/12/2014CN103155116B Etching method, and device
03/12/2014CN103118839B Wire saw
03/12/2014CN102834902B Etching method and device
03/12/2014CN102822981B Circuit board and display device
03/12/2014CN102751244B Semiconductor device and forming method of semiconductor device as well as radio frequency identification chip and forming method of radio frequency identification chip
03/12/2014CN102646643B Preparation method of accumulative type Si-NWFET (silicon-nanowire field effect transistor based on SOI (Silicon On Insulator)
03/12/2014CN102643613B Grinding liquid for sapphire substrate and preparation method of grinding liquid
03/12/2014CN102636962B Aerial image overlay test method and array base plate
03/12/2014CN102629573B Thin film transistor liquid crystal display array substrate and manufacturing method thereof
03/12/2014CN102629572B Thin film transistor liquid crystal display array substrate and manufacturing method thereof
03/12/2014CN102623382B Silicon on insulator (SOI)-based manufacturing method for three-dimensional array type silicon nano-wire metal oxide semiconductor field effect transistor
03/12/2014CN102610572B Preparation method of dual-layer semiconductor apparatus with semi-cavity structure
03/12/2014CN102592995B Manufacture method of Zener diode
03/12/2014CN102569250B High-density capacitor and electrode leading-out method thereof
03/12/2014CN102564319B Method for detecting slip during linear delivery of wafer by using image processing technology
03/12/2014CN102558266B Template derivative for forming ultra-low dielectric layer and method of forming ultra-low dielectric layer using same
03/12/2014CN102543877B Method for manufacturing three-dimensional semiconductor storage device
03/12/2014CN102543818B Balance wafer clamping device
03/12/2014CN102543729B Forming method of capacitor and capacitor structure thereof
03/12/2014CN102543717B Semiconductor device
03/12/2014CN102543698B Manufacturing method of metal gate electrode
03/12/2014CN102543693B Method for preparing germanium-based pseudo gallium arsenide (GaAs) substrate
03/12/2014CN102522379B High-current transistor packaging structure and manufacturing method thereof
03/12/2014CN102522329B Machining method of semiconductor chip
03/12/2014CN102509721B Method for manufacturing InP monolithic microwave integrated circuit
03/12/2014CN102502251B Supporting tool and moving method adopting supporting tool
03/12/2014CN102487057B Metal front dielectric layer and preparation method thereof
03/12/2014CN102487018B MOS transistor and formation method thereof
03/12/2014CN102487017B Manufacturing method of strain CMOS device
03/12/2014CN102487016B Preparation method of transistor
03/12/2014CN102487012B Manufacturing method of transistor
03/12/2014CN102487002B Method for manufacturing connecting piece
03/12/2014CN102484138B Wiring layer, semiconductor device, liquid crystal display device
03/12/2014CN102479758B Structure for reducing etching residue
03/12/2014CN102479749B Double-embedding structure and formation method thereof
03/12/2014CN102479740B Deep trench isolating structure of phase change memory and manufacturing method thereof
03/12/2014CN102479724B Method for manufacturing heat dissipating grain type stackable semiconductor assembly
03/12/2014CN102479722B Method for manufacturing transistor
03/12/2014CN102468237B Manufacturing method for semiconductor device
03/12/2014CN102468212B Method for forming shallow-ditch isolating structure
03/12/2014CN102468162B Production method for n-channel metal oxide semiconductor (NMOS) field effect transistor
03/12/2014CN102468139B Patterning methodology for uniformity control
03/12/2014CN102466467B Method for monitoring film thickness
03/12/2014CN102456746B Nonvolatile semiconductor memory cell, device and preparation method thereof
03/12/2014CN102446954B Integrated circuit device and manufacturing method thereof
03/12/2014CN102446847B Full photoresistance dual damascene method capable of reducing sheet resistance of copper interconnection
03/12/2014CN102446846B Method for achieving high-performance copper interconnection by utilizing upper mask
03/12/2014CN102446819B Method used for improving dual contact-etch-stop-layer crossover region contact etch
03/12/2014CN102446775B Non-carrier semiconductor packaging component and manufacturing method thereof
03/12/2014CN102446766B MOSFET (Metallic Oxide Semiconductor Field Effect Transistor) forming method
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