Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2007
04/17/2007US7205236 Semiconductor substrate polishing methods and equipment
04/17/2007US7205235 Method for reducing corrosion of metal surfaces during semiconductor processing
04/17/2007US7205234 Method of forming metal silicide
04/17/2007US7205233 Method for forming CoWRe alloys by electroless deposition
04/17/2007US7205232 Method of forming a self-aligned contact structure using a sacrificial mask layer
04/17/2007US7205231 Method for in-situ uniformity optimization in a rapid thermal processing system
04/17/2007US7205230 Process for manufacturing a wiring board having a via
04/17/2007US7205229 Interconnect alloys and methods and apparatus using same
04/17/2007US7205228 Selective metal encapsulation schemes
04/17/2007US7205227 Methods of forming CMOS constructions
04/17/2007US7205226 Sacrificial layer for protection during trench etch
04/17/2007US7205225 Method of manufacturing a semiconductor device and semiconductor device obtained by using such a method
04/17/2007US7205224 Very low dielectric constant plasma-enhanced CVD films
04/17/2007US7205223 Method of forming an interconnect structure for a semiconductor device
04/17/2007US7205222 Method of fabricating a semiconductor integrated circuit that includes patterning a semiconductor substrate with a first photomask that uses metal for blocking light and patterning the same substrate with a second photomask that uses organic resin for blocking light
04/17/2007US7205221 Under bump metallization pad and solder bump connections
04/17/2007US7205220 Gallium nitride based III-V group compound semiconductor device and method of producing the same
04/17/2007US7205219 Methods of forming integrated circuits devices having pad contact plugs in the cell array and peripheral circuit regions of the integrated circuit substrate
04/17/2007US7205218 Method including forming gate dielectrics having multiple lanthanide oxide layers
04/17/2007US7205217 Method for forming trench gate dielectric layer
04/17/2007US7205216 Modification of electrical properties for semiconductor wafers
04/17/2007US7205215 Fabrication method of thin film transistor
04/17/2007US7205214 Device transferring method
04/17/2007US7205213 Device transferring method
04/17/2007US7205212 Device transferring method
04/17/2007US7205211 Method for handling semiconductor layers in such a way as to thin same
04/17/2007US7205210 Semiconductor structure having strained semiconductor and method therefor
04/17/2007US7205209 Fabrication of stacked dielectric layer for suppressing electrostatic charge buildup
04/17/2007US7205208 Method of manufacturing a semiconductor device
04/17/2007US7205207 High performance strained CMOS devices
04/17/2007US7205206 Method of fabricating mobility enhanced CMOS devices
04/17/2007US7205205 Ramp temperature techniques for improved mean wafer before clean
04/17/2007US7205204 Semiconductor device and fabrication method for the same
04/17/2007US7205203 Method of fabricating crystalline silicon and switching device using crystalline silicon
04/17/2007US7205202 Semiconductor device and method for regional stress control
04/17/2007US7205201 CMOS compatible process with different-voltage devices
04/17/2007US7205199 Method of forming a recess channel trench pattern, and fabricating a recess channel transistor
04/17/2007US7205198 Method of making a bi-directional read/program non-volatile floating gate memory cell
04/17/2007US7205197 Method of fabricating a nonvolatile semiconductor memory
04/17/2007US7205196 Manufacturing process and structure of integrated circuit
04/17/2007US7205195 Method for fabricating NROM memory cells with trench transistors
04/17/2007US7205194 Method of fabricating a flash memory cell
04/17/2007US7205193 Semiconductor device and method for fabricating the same
04/17/2007US7205192 Semiconductor memory device capable of preventing oxidation of plug and method for fabricating the same
04/17/2007US7205191 Semiconductor integrated circuit and method of designing the same
04/17/2007US7205190 Semiconductor device fabrication method
04/17/2007US7205189 Method of manufacturing a dual bit flash memory
04/17/2007US7205188 Method for producing high-speed vertical npn bipolar transistors and complementary MOS transistors on a chip
04/17/2007US7205187 Micro-feature fill process and apparatus using hexachlorodisilane or other chlorine-containing silicon precursor
04/17/2007US7205186 System and method for suppressing oxide formation
04/17/2007US7205185 Self-aligned planar double-gate process by self-aligned oxidation
04/17/2007US7205184 Method of crystallizing silicon film and method of manufacturing thin film transistor liquid crystal display
04/17/2007US7205183 Methods of manufacturing thin film transistors using masks to protect the channel regions from impurities while doping a semiconductor layer to form source/drain regions
04/17/2007US7205182 Method of manufacturing semiconductor device
04/17/2007US7205180 Process of fabricating semiconductor packages using leadframes roughened with chemical etchant
04/17/2007US7205179 Hydrogen diffusion hybrid port and method of making
04/17/2007US7205178 Land grid array packaged device and method of forming same
04/17/2007US7205177 Methods of bonding two semiconductor devices
04/17/2007US7205176 Surface MEMS mirrors with oxide spacers
04/17/2007US7205175 Method for encapsulating a chip and/or other article
04/17/2007US7205174 Micromechanical actuator with multiple-plane comb electrodes and methods of making
04/17/2007US7205173 Method of fabricating micro-electromechanical systems
04/17/2007US7205172 Display device and method of manufacturing the same
04/17/2007US7205171 Thin film transistor and manufacturing method thereof including a lightly doped channel
04/17/2007US7205170 Method for the production of LED bodies
04/17/2007US7205169 Driving circuit for AMOLED display and driving method thereof
04/17/2007US7205168 Semiconductor light emitting device, its manufacturing method, integrated semiconductor light emitting apparatus, its manufacturing method, illuminating apparatus, and its manufacturing method
04/17/2007US7205167 Method to detect photoresist residue on a semiconductor device
04/17/2007US7205166 Method and apparatus of arrayed, clustered or coupled eddy current sensor configuration for measuring conductive film properties
04/17/2007US7205164 Methods for fabricating magnetic cell junctions and a structure resulting and/or used for such methods
04/17/2007US7205163 Curvature anisotropy in magnetic bits for a magnetic random access memory
04/17/2007US7205090 Interpolymer of an adamantyl (meth)acrylate, a tetrahydrofuranonyl (meth)acrylate, and a cyclohexyl or cyclopentyl (meth)acrylate and an acid generator; gives particularly excellent pattern shape and excellent line edge roughness
04/17/2007US7205089 Cross-linking polymer for organic anti-reflective coating, organic anti-reflective coating composition comprising the same and method for forming photoresist pattern using the same
04/17/2007US7205087 Solvents and photoresist compositions for 193 nm imaging
04/17/2007US7205085 Composition having permitivity being radiation-sensitively changeable and method for forming permitivity pattern
04/17/2007US7205078 Determining the backscattering intensity by using the reflection coefficient (rn), the transmission coefficient (tn), and the scatter distribution.
04/17/2007US7205076 Shaping laser beams; surface with aperture and reflection layer; liquid crystal display
04/17/2007US7205075 Method of forming a vertical memory device with a rectangular trench
04/17/2007US7205074 Venting of pellicle cavity for a mask
04/17/2007US7205056 First crystal layer having a Bi-based perovskite structure is intermittently formed in a surface direction of the ceramic film, and second crystal layer having a lower melting point composed of ABO-type oxides in which Bi is in an A-site and Si or Ge is in a B-site is between the first crystals
04/17/2007US7205033 Method for forming polycrystalline silicon film of polycrystalline silicon TFT
04/17/2007US7205030 polysiloxane, a pore-forming agent, an onium salt, and a solvent is applied onto a substrate, solvent evaporated, polysiloxane polymerized, pore forming agent evaporated
04/17/2007US7205025 Apparatus and method for drying under reduced pressure, and coating film forming apparatus
04/17/2007US7205019 Electroluminescence displaying; electrolytic cells; preferential doping at interface between electrode and light emitter using photoresists
04/17/2007US7204999 Method of production of nanoparticle and nanoparticle produced by the method of production
04/17/2007US7204960 Apparatus and method for calibration of a dispensing system
04/17/2007US7204936 Containing roll-off reducing agent , used in polishing the substrate for precision parts
04/17/2007US7204934 Forming a hard mask over the substrate and etching a trench in the substrate using the hard mask, and forming a dielectric layer over the hard mask and in the trench, where the dielectric layer lines the trench, conductive material is then applied over the dielectric layer, etching to planarize
04/17/2007US7204924 Method and apparatus to deposit layers with uniform properties
04/17/2007US7204921 Vacuum apparatus and vacuum processing method
04/17/2007US7204917 Workpiece surface influencing device designs for electrochemical mechanical processing and method of using the same
04/17/2007US7204916 Plating apparatus and plating method
04/17/2007US7204912 Method and apparatus for an improved bellows shield in a plasma processing system
04/17/2007US7204889 Using nitrogen laden isopropyl alcohol as dynamic barrier that wipes down surface during rinsing and drying; entraining water and contaminants
04/17/2007US7204888 Lift pin assembly for substrate processing
04/17/2007US7204887 Wafer holding, wafer support member, wafer boat and heat treatment furnace
04/17/2007US7204886 Apparatus and method for hybrid chemical processing
04/17/2007US7204881 Silicon wafer for epitaxial growth, an epitaxial wafer, and a method for producing it
04/17/2007US7204865 Polishing composition
04/17/2007US7204743 Integrated circuit interconnect fabrication systems