Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
04/2007
04/17/2007US7206078 Non-destructive testing system using a laser beam
04/17/2007US7206061 Mask supporting apparatus using vacuum and light exposing system, and method using the same
04/17/2007US7206060 Illumination optical system, exposure apparatus, and device fabrication method with a polarizing element and an optical element with low birefringence
04/17/2007US7206059 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems
04/17/2007US7206058 Off-axis levelling in lithographic projection apparatus
04/17/2007US7206057 Liquid crystal display panel and fabricating method thereof
04/17/2007US7206055 Liquid crystal display device
04/17/2007US7206047 Transflective LCD with reflective electrode contacting the drain electrode in boundary between reflective region and transmission region
04/17/2007US7206045 Reflection type liquid crystal display and a method for manufacturing the same
04/17/2007US7205880 Trimmer impedance component, semiconductor device and trimming method
04/17/2007US7205795 Semiconductor device having universal logic cell
04/17/2007US7205783 Semiconductor integrated circuit, and electrostatic withstand voltage test method and apparatus therefor
04/17/2007US7205778 Electrostatic capacitance detecting device
04/17/2007US7205742 Calibration method
04/17/2007US7205716 Light-emitting device
04/17/2007US7205674 Semiconductor package with build-up layers formed on chip and fabrication method of the semiconductor package
04/17/2007US7205671 Semiconductor device
04/17/2007US7205666 Interconnections having double capping layer and method for forming the same
04/17/2007US7205664 Semiconductor device and method for manufacturing the same
04/17/2007US7205663 Adhesion layer of 11-trichlorosilylundecyl thioacetate coupled to a copper layer formed over a dielectric layer via the thioacetate group and a silicon dioxide layer via the trichlorosilyl group
04/17/2007US7205662 Dielectric barrier layer films
04/17/2007US7205661 Projected contact structures for engaging bumped semiconductor devices and methods of making the same
04/17/2007US7205659 Assemblies for temporarily connecting microelectronic elements for testing and methods therefor
04/17/2007US7205658 Singulation method used in leadless packaging process
04/17/2007US7205654 Programmed material consolidation methods for fabricating heat sinks
04/17/2007US7205650 Composite devices of laminate type and processes
04/17/2007US7205645 Wiring board, semiconductor device, and method of manufacturing wiring board
04/17/2007US7205644 Substrate with outer contacts one one surface and inner contacts disposed around it, electrically connected, memory chips are electrically connected to the inner contacts; molding compound encapsulating the memory chips and the inner contacts; and an ultra-thin plastic shell covering the second surface
04/17/2007US7205643 Stray field shielding structure for semiconductors
04/17/2007US7205642 Semiconductor package and method for fabricating the same
04/17/2007US7205641 Polydiode structure for photo diode
04/17/2007US7205637 Semiconductor device with a multilevel interconnection connected to a guard ring and alignment mark
04/17/2007US7205636 Semiconductor device with a multilevel interconnection connected to a guard ring
04/17/2007US7205633 Capacitor layout orientation
04/17/2007US7205631 Poly-silicon stringer fuse
04/17/2007US7205628 Semiconductor device
04/17/2007US7205620 Highly reliable amorphous high-k gate dielectric ZrOxNy
04/17/2007US7205619 Method of producing semiconductor device and semiconductor device
04/17/2007US7205618 Semiconductor device and method for manufacturing the same
04/17/2007US7205617 Semiconductor device including active regions and gate electrodes for field effect transistors, with a trench formed between the active regions
04/17/2007US7205616 Semiconductor device and manufacturing method of the same
04/17/2007US7205615 Semiconductor device having internal stress film
04/17/2007US7205612 Fully silicided NMOS device for electrostatic discharge protection
04/17/2007US7205611 Semiconductor device including a protection circuit
04/17/2007US7205609 Methods of forming semiconductor devices including fin structures and related devices
04/17/2007US7205608 Electronic device including discontinuous storage elements
04/17/2007US7205607 Semiconductor power device with insulated gate and trench-gate structure and corresponding manufacturing method
04/17/2007US7205606 DRAM access transistor
04/17/2007US7205605 Semiconductor component and method of manufacturing
04/17/2007US7205603 Floating gate and fabricating method thereof
04/17/2007US7205602 Method to improve the coupling ratio of top gate to floating gate in flash
04/17/2007US7205600 Capacitor constructions with a barrier layer to threshold voltage shift inducing material
04/17/2007US7205599 Devices having improved capacitance
04/17/2007US7205598 Random access memory device utilizing a vertically oriented select transistor
04/17/2007US7205597 DMOS device of small dimensions and manufacturing process thereof
04/17/2007US7205595 Polymer memory device with electron traps
04/17/2007US7205594 Semiconductor device with capacitor and manufacturing method of the same
04/17/2007US7205593 MOS image pick-up device and camera incorporating the same
04/17/2007US7205590 Semiconductor memory device provided with magneto-resistive element and method for fabricating the same
04/17/2007US7205587 Semiconductor device and method of producing the same
04/17/2007US7205586 Semiconductor device having SiGe channel region
04/17/2007US7205584 Image sensor for reduced dark current
04/17/2007US7205583 Thyristor and method of manufacture
04/17/2007US7205582 Telecommunications switch array with thyristor addressing
04/17/2007US7205581 Thyristor structure and overvoltage protection configuration having the thyristor structure
04/17/2007US7205578 Semiconductor component which emits radiation, and method for producing the same
04/17/2007US7205576 Light emitting device and method of manufacturing the same
04/17/2007US7205571 Thin film transistor substrate for display device and fabricating method thereof
04/17/2007US7205570 Thin film transistor array panel
04/17/2007US7205568 Solid state image pickup apparatus and radiation image pickup apparatus
04/17/2007US7205567 Semiconductor product having a semiconductor substrate and a test structure and method
04/17/2007US7205565 Thin film transistor and OLED including the same
04/17/2007US7205564 Resistance change memory having organic semiconductor layer
04/17/2007US7205560 Method and apparatus for processing a micro sample
04/17/2007US7205557 Variable rectangle-type electron beam exposure apparatus and pattern exposure-formation method
04/17/2007US7205555 Defect inspection apparatus and defect inspection method
04/17/2007US7205554 Method and apparatus for processing a micro sample
04/17/2007US7205552 Monatomic boron ion source and method
04/17/2007US7205549 Pattern defect inspection method and its apparatus
04/17/2007US7205543 Auto focusing apparatus and method
04/17/2007US7205540 Electron beam apparatus and device manufacturing method using same
04/17/2007US7205483 Flexible substrate having interlaminar junctions, and process for producing the same
04/17/2007US7205482 Tape carrier for TAB
04/17/2007US7205338 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device
04/17/2007US7205265 Cleaning compositions and methods of use thereof
04/17/2007US7205256 solid solution of a perovskite or perovskite lamellar structure oxide with a catalytic substance containing silicon, germanium, and tin dissolved; semiconductors
04/17/2007US7205250 Plasma processing method and apparatus
04/17/2007US7205249 Reacting an oxygen containing compound such as nitrous oxide with 1,3,5-trisilacyclohexane, preferably in a helium carrier gas and at 40 degrees C.
04/17/2007US7205248 Method of eliminating residual carbon from flowable oxide fill
04/17/2007US7205247 Using ozone and a hafnium precursor that is tetrakis(dimethylamino)hafnium (TDMAHf), tetrakis(diethylamino)hafnium (TDEAHf), tetrakis(1-methoxy-2-methylpropoxy)hafnium (Hf(MMP)4, or tetrakis(ethylmethylamino)hafnium (TEMAHf).
04/17/2007US7205246 Forming low k dielectric layers
04/17/2007US7205245 Method of forming trench isolation within a semiconductor substrate
04/17/2007US7205244 Patterning substrates employing multi-film layers defining etch-differential interfaces
04/17/2007US7205243 Process for producing a mask on a substrate
04/17/2007US7205242 Method for forming isolation layer in semiconductor device
04/17/2007US7205241 Method for manufacturing semiconductor device with contact body extended in direction of bit line
04/17/2007US7205240 HDP-CVD multistep gapfill process
04/17/2007US7205239 Method of manufacturing semiconductor wafer and method of manufacturing semiconductor device
04/17/2007US7205238 Chemical mechanical polish of PCMO thin films for RRAM applications
04/17/2007US7205237 Apparatus and method for selected site backside unlayering of si, GaAs, GaxAlyAszof SOI technologies for scanning probe microscopy and atomic force probing characterization