Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2007
05/18/2007WO2007056002A1 Free radical-forming activator attached to solid and used to enhance cmp formulations
05/18/2007WO2007055985A2 METHOD AND SYSTEM FOR PROVIDING A HETEROJUNCTION BIPOLAR TRANSISTOR HAVING SiGe EXTENSIONS
05/18/2007WO2007055901A1 Method for manufacturing microporous cmp materials having controlled pore size
05/18/2007WO2007055849A2 Multi-step system and method for curing a dielectric film
05/18/2007WO2007055843A2 Method for manufacturing a semiconductor component using a sacrificial masking structure
05/18/2007WO2007055817A2 Recessed channel negative differential resistance-based memory cell
05/18/2007WO2007055453A1 Abrupt metal-insulator transition wafer, and heat treatment apparatus and method for the wafer
05/18/2007WO2007055381A1 Film forming apparatus and placing table for film forming apparatus
05/18/2007WO2007055377A1 METHOD FOR FORMING CRYSTALLINE SiC BY CARBONIZATION OF Si SUBSTRATE SURFACE, AND CRYSTALLINE SiC SUBSTRATE
05/18/2007WO2007055373A1 Liquid recovery member, exposure apparatus, exposure method, and device production method
05/18/2007WO2007055371A1 Method for production of nano-porous substrate
05/18/2007WO2007055352A1 Semiconductor device and method for manufacturing same
05/18/2007WO2007055309A1 Method for manufacturing semiconductor device
05/18/2007WO2007055299A1 Semiconductor device and manufacturing method thereof
05/18/2007WO2007055278A1 Polishing agent for silicon oxide, liquid additive, and method of polishing
05/18/2007WO2007055272A1 Positive resist composition and method for forming resist pattern
05/18/2007WO2007055270A1 Semiconductor device manufacturing method and semiconductor device
05/18/2007WO2007055263A1 Semiconductor device
05/18/2007WO2007055237A1 Exposure apparatus, exposure method and device manufacturing method
05/18/2007WO2007055207A1 Process and equipment for charging ethylene carbonate containing material
05/18/2007WO2007055199A1 Exposure apparatus and method, and method for manufacturing device
05/18/2007WO2007055190A1 Substrate processing apparatus, substrate processing method and recording medium
05/18/2007WO2007055185A1 Shower plate and plasma treatment apparatus using shower plate
05/18/2007WO2007055154A1 Electron gun, electron beam exposure system and exposure method
05/18/2007WO2007055149A1 Work holding vessel and work dismounting method for reflow device
05/18/2007WO2007055138A1 Substrate processing apparatus
05/18/2007WO2007055124A1 Method of polishing work and apparatus therefor
05/18/2007WO2007055120A1 Lighting optical system, exposure system, and exposure method
05/18/2007WO2007055119A1 Organic thin-film transistor, method for manufacturing the organic thin-film transistor, and tft sheet
05/18/2007WO2007055095A1 Semiconductor device and method for manufacturing same
05/18/2007WO2007055079A1 Photosensitive resin composition and method of forming pattern
05/18/2007WO2007055010A1 Semiconductor device manufacturing method and semiconductor device
05/18/2007WO2007055006A1 Electrostatic zipper
05/18/2007WO2007054870A1 Trench capacitor device suitable for decoupling applications in high-frequency operation
05/18/2007WO2007054869A1 Method of manufacturing a plurality of semiconductor devices and carrier substrate
05/18/2007WO2007054867A2 Producing a covered through substrate via using a temporary cap layer
05/18/2007WO2007054844A2 Vertical insulated gate field-effect transistor and method of manufacturing the same
05/18/2007WO2007054611A1 A method of manufacturing a 3d semiconductor that minimize stress and void formation
05/18/2007WO2007054521A1 Method for producing electrically conductive bushings through non-conductive or semiconductive substrates
05/18/2007WO2007054506A1 Method for printing contacts on a substrate
05/18/2007WO2007054466A1 Methods of fabricating semiconductor devices and structures thereof
05/18/2007WO2007054434A1 Method of dicing integrated-circuit chips on a thinned substrate
05/18/2007WO2007054427A1 Buried subcollector for super high frequency passive devices
05/18/2007WO2007054405A1 Rotational shear stress for charge carrier mobility modification
05/18/2007WO2007054403A1 Structure and method to increase strain enhancement with spacerless fet and dual liner process
05/18/2007WO2007054377A1 Method for drying a surface
05/18/2007WO2007053976A1 A new glass packaging diode
05/18/2007WO2007053937A1 A method and an apparatus for simultaneous 2d and 3d optical inspection and acquisition of optical inspection data of an object
05/18/2007WO2007027558A3 Method of forming pitch multipled contacts
05/18/2007WO2007022234A9 Systems and methods for uniform sequential lateral solidification of thin films using high frequency lasers
05/18/2007WO2007021385A3 SEQUENTIAL DEPOSITION PROCESS FOR FORMING Si-CONTAINING FILMS
05/18/2007WO2007019105A8 A transfer container
05/18/2007WO2007009000A3 Fluid deposition cluster tool
05/18/2007WO2007007670B1 Semiconductor device and electric device
05/18/2007WO2007005088A3 Vaporizable metalorganic compounds for deposition of metals and metal-containing thin films
05/18/2007WO2007001414A3 Low thermal resistance power module assembly
05/18/2007WO2006135861A3 Power semiconductor device
05/18/2007WO2006124183A3 High voltage silicon carbide devices having bi-directional blocking capabilities and methods of fabricating the same
05/18/2007WO2006086471A3 A method to grow iii-nitride materials using no buffer layer
05/18/2007WO2006062795A3 Protoresist strip using solvent vapor
05/18/2007WO2006058081A3 Multiple shadow mask structure for deposition shadow mask protection and method of making and using same
05/18/2007WO2005117073A3 Semiconductor device and method for manufacture
05/18/2007WO2005112092A3 CARBON-DOPED-Si OXIDE ETCH USING H2 ADDITIVE IN FLUOROCARBON ETCH CHEMISTRY
05/18/2007WO2005110661A3 Laser thermal processing with laser diode radiation
05/18/2007WO2005099350A3 Non-contact support platforms for distance adjustment
05/18/2007WO2005094254A3 Crystalline-type device and approach therefor
05/18/2007WO2005092025A3 Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
05/18/2007WO2005064681A3 Non-volatile ferroelectric memory device and manufacturing method
05/18/2007WO2005062752A3 Metal carbide gate structure and method of fabrication
05/18/2007WO2005030636A3 Methods, devices and compositions for depositing and orienting nanostructures
05/18/2007WO2004071949A3 Nanostructured casting of organic and bio-polymers in porous silicon templates
05/17/2007US20070113305 Electrical device comprising conductors made of carbonized plastic, and method and apparatus for the production thereof
05/17/2007US20070113214 Integrated structure layout and layout of interconnections for an instruction execution unit of an integrated circuit chip
05/17/2007US20070112533 Method for failure analysis and system for failure analysis
05/17/2007US20070112465 Vision system
05/17/2007US20070112452 Remote maintenance method, industrial device, and semiconductor device
05/17/2007US20070112147 Curable organopolysiloxane composition and semiconductor device
05/17/2007US20070111641 Methods and apparatus for electromechanically and/or electrochemically-mechanically removing conductive material from a microelectronic substrate
05/17/2007US20070111638 Pad assembly for electrochemical mechanical polishing
05/17/2007US20070111637 Substrate holding apparatus and polishing apparatus
05/17/2007US20070111567 Method and device for connecting chips
05/17/2007US20070111549 Laser irradiation apparatus
05/17/2007US20070111548 Plasma doping method and plasma doping apparatus
05/17/2007US20070111547 Method for producing a semiconductor structure
05/17/2007US20070111546 Method for fabricating controlled stress silicon nitride films
05/17/2007US20070111545 Methods of forming silicon dioxide layers using atomic layer deposition
05/17/2007US20070111544 Systems with a gate dielectric having multiple lanthanide oxide layers
05/17/2007US20070111543 Methods for improving low k FSG film gap-fill characteristics
05/17/2007US20070111542 Substrate treatment apparatus and substrate treatment method
05/17/2007US20070111541 Barrier film material and pattern formation method using the same
05/17/2007US20070111540 Method of forming silicon-containing insulation film having low dielectric constant and low film stress
05/17/2007US20070111539 Material for forming adhesion reinforcing layer, adhesion reinforcing layer, semiconductor device, and manufacturing method thereof
05/17/2007US20070111538 Method of fabricating a silicon nitride stack
05/17/2007US20070111537 Method and system for controllable deposition of nanoparticles on a substrate
05/17/2007US20070111536 Substrate treatment apparatus and substrate treatment method
05/17/2007US20070111535 Method to create damage-free porous Low-k dielectric films and structures resulting therefrom
05/17/2007US20070111534 Method of removing silicon from a substrate
05/17/2007US20070111533 Removal of mems sacrificial layers using supercritical fluid/chemical formulations
05/17/2007US20070111532 PAA-based etchant, methods of using same, and resultant structures
05/17/2007US20070111531 Technique for the growth of planar semi-polar gallium nitride