| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 05/24/2007 | US20070114570 Power semiconductor device |
| 05/24/2007 | US20070114547 Optical element sealing structure, optical coupler, and optical element sealing method |
| 05/24/2007 | US20070114537 Electro-optical device and manufacturing method thereof |
| 05/24/2007 | US20070114536 Front substrate of plasma display panel and fabrication method thereof |
| 05/24/2007 | US20070114535 Thin Film Transistor, Thin Film Transistor Substrate, and Methods for Manufacturing the Same |
| 05/24/2007 | US20070114534 Polycrystalline silicon thin film, fabrication method thereof, and thin film transistor without directional dependency on active channels fabricated using the same |
| 05/24/2007 | US20070114533 Thin film transistor including a lightly doped amorphous silicon channel layer |
| 05/24/2007 | US20070114532 Semiconductor display device |
| 05/24/2007 | US20070114515 Nitride semiconductor device having a silver-base alloy electrode |
| 05/24/2007 | US20070114453 Beam dose computing method and writing method and record carrier body and writing apparatus |
| 05/24/2007 | US20070114450 Mask-making member and its production method, mask and its making method, exposure process, and fabrication method of semiconductor device |
| 05/24/2007 | US20070114409 Electron beam apparatus with aberration corrector |
| 05/24/2007 | US20070114402 Object inspection and/or modification system and method |
| 05/24/2007 | US20070114214 Scanning laser light source |
| 05/24/2007 | US20070114208 Substrate treating method and apparatus |
| 05/24/2007 | US20070114206 Plasma chamber wall segment temperature control |
| 05/24/2007 | US20070114205 Method of forming etching mask |
| 05/24/2007 | US20070114133 Method for filling recessed micro-structures with metallization in the production of a microelectronic device |
| 05/24/2007 | US20070114124 Charge-free low-temperature method of forming thin film-based nanoscale materials and structures on a substrate |
| 05/24/2007 | US20070114058 Circuit board and its manufacturing method |
| 05/24/2007 | US20070113981 Etch system with integrated inductive coupling |
| 05/24/2007 | US20070113980 Method for shaping a magnetic field in a magnetic field-enhanced plasma reactor |
| 05/24/2007 | US20070113978 Plasma processing apparatus and method |
| 05/24/2007 | US20070113977 Revolution member supporting apparatus and semiconductor substrate processing apparatus |
| 05/24/2007 | US20070113976 Plasma chamber wall segment temperature control |
| 05/24/2007 | US20070113975 Plasma reaction chamber assemblies |
| 05/24/2007 | US20070113874 Substrate processing method and substrate processing apparatus |
| 05/24/2007 | US20070113789 Method and system for depositing material on a substrate using a solid precursor |
| 05/24/2007 | US20070113788 Plasma processing equipment |
| 05/24/2007 | US20070113787 Plasma process apparatus |
| 05/24/2007 | US20070113783 Band shield for substrate processing chamber |
| 05/24/2007 | US20070113778 Epitaxial silicon wafer |
| 05/24/2007 | DE4329260B9 Verfahren zur Herstellung einer Verdrahtung in einem Halbleiterbauelement A process for producing a wiring in a semiconductor device |
| 05/24/2007 | DE19746533B4 Verfahren zur Erzeugung eines Kühlmittelstromes für die Wafer-Bearbeitung A method for generating a coolant flow for the wafer processing |
| 05/24/2007 | DE112005001593T5 Verfahren zum Herstellen einer Halbleitervorrichtung mit einer High-K-Gate-Dielektrikumschicht und einer Metall-Gateelektrode A method of manufacturing a semiconductor device having a high-K gate dielectric layer and a metal gate electrode |
| 05/24/2007 | DE112005001588T5 Fotomaskenrohling, Fotomaskenherstellungsverfahren und Halbleiterbausteinherstellungsverfahren Photomask blank photomask manufacturing method and semiconductor device production method |
| 05/24/2007 | DE112005001489T5 Atomlagenabgeschiedene Tantal enthaltende Haftschicht Atomic Layer Deposited tantalum-containing adhesive layer |
| 05/24/2007 | DE112005001488T5 Tri-Gate Bauelement mit hoher Beweglichkeit und deren Herstellungsverfahren Tri-gate device with high mobility and its manufacturing method |
| 05/24/2007 | DE10393364B4 Lochmikrosonde unter Nutzung einer MEMS-Technik und ein Verfahren zur Herstellung derselben Hollow microprobe using an MEMS technique and a method of manufacturing the same |
| 05/24/2007 | DE10355587B4 Verfahren zur Herstellung eines vertikalen Leistungs-Halbleitertransistors A process for producing a vertical power semiconductor transistor |
| 05/24/2007 | DE10342981B4 Verfahren zum selektiven Aufbringen einer Folie auf definierte Bereiche eines Wafers A method of selectively applying a film to defined areas of a wafer |
| 05/24/2007 | DE10340409B4 Trägerwafer und Verfahren zum Bearbeiten eines Halbleiterwafers unter Verwendung eines Trägerwafers Carrier wafer and method of processing a semiconductor wafer by using a carrier wafer |
| 05/24/2007 | DE10234208B4 Waferlevel-Stapelchippackung und Herstellungsverfahren hierfür Wafer-level stack chip package and manufacturing method thereof |
| 05/24/2007 | DE10233194B4 Verfahren zum Beschreiben/Löschen nichtflüchtiger Halbleiterspeichervorrichtungen Method for writing / erasing non-volatile semiconductor memory devices |
| 05/24/2007 | DE10228528B4 Diffusionssperrfilm und dessen Herstellungsverfahren, Halbleiterspeicher und dessen Herstellungsverfahren Diffusion barrier film and its manufacturing method, semiconductor memory and its production method |
| 05/24/2007 | DE10228509B4 Lotstruktur zur elektrischen und/oder mechanischen Kontaktierung sowie Vorrichtung und Verfahren zu ihrer Herstellung Lotstruktur for electrical and / or mechanical contact, as well as apparatus and methods for their preparation |
| 05/24/2007 | DE10228325B4 Verfahren zur Herstellung einer Halbleiterspeichervorrichtung durch den Einsatz eines mit ArF-Laserstrahl belichteten Photoresist-Musters A method of manufacturing a semiconductor memory device by the use of an exposed with ArF laser beam photoresist pattern |
| 05/24/2007 | DE102006054087A1 Trennvorrichtung zum Trennen eines Halbleitersubstrats und Verfahren zum Trennen des Gleichen Separating means for separating a semiconductor substrate and method for separating the same |
| 05/24/2007 | DE102006054073A1 Halbleitervorrichtung und Verfahren zur Bearbeitung eines Wafers A semiconductor device and method for processing a wafer |
| 05/24/2007 | DE102006053597A1 Halbleitervorrichtung und Verfahren zum Schneiden eines Halbleitersubstrats A semiconductor device and method of cutting a semiconductor substrate |
| 05/24/2007 | DE102006052693A1 Verfahren zur Fertigung eines Halbleitersensors A method for manufacturing a semiconductor sensor |
| 05/24/2007 | DE102006051455A1 Production process for a zinc oxide crystal or zinc oxide-based semiconductor crystal for light devices reacts zinc and oxygen on a substrate zinc polarity plane and grows the crystal |
| 05/24/2007 | DE102006049212A1 Halbleitervorrichtung und Verfahren zur Herstellung derselben A semiconductor device and method of manufacturing the same |
| 05/24/2007 | DE102006048270A1 Verfahren zum Ausbilden eines isolierenden Grabens mit einem dielektrischen Material A method for forming an insulating trench with a dielectric material |
| 05/24/2007 | DE102006035377A1 Verfahren zur Herstellung eines Halbleiterkristalls A process for producing a semiconductor crystal |
| 05/24/2007 | DE102005055477A1 Vorrichtung zur Verpackung eines Bauelements, Verfahren zur Herstellung der Vorrichtung und Verwendung der Vorrichtung Device for packaging a device, method for manufacturing the device and using the device |
| 05/24/2007 | DE102005055172A1 Verfahren zum Herstellen von Zonenerweiterungen von Kanalanschlusszonen eines mittels Feldeffekt steuerbaren Halbleiterbauelements A method of producing zone extensions of channel connection zones by means of a controllable field-effect semiconductor device |
| 05/24/2007 | DE102005054631A1 Sensoranordnung mit einem Substrat und mit einem Gehäuse und Verfahren zur Herstellung einer Sensoranordnung Sensor arrangement having a substrate and having a housing and method for producing a sensor arrangement |
| 05/24/2007 | DE102005054552A1 Vorrichtung und Verfahren zur Prüfung von Halbleitersubstraten auf Risse Method and apparatus for testing semiconductor substrates for cracks |
| 05/24/2007 | DE102005054268A1 Halbleiterbauteil mit mindestens einem Halbleiterchip und Verfahren zu dessen Herstellung A semiconductor device comprising at least a semiconductor chip and method of manufacture |
| 05/24/2007 | DE102005054267B3 Halbleiterbauteil und Verfahren zu dessen Herstellung sowie Verwendung des Elektrospinningverfahrens A semiconductor device and method for its production and use of the electrospinning method |
| 05/24/2007 | DE102005054219A1 Production process for an FET and such an FET has oxidized micro cavities at least beneath the channel region |
| 05/24/2007 | DE102005054218A1 Production process for a semiconductor element in a substrate implants dopant atoms to give defects and removes some using micro cavities |
| 05/24/2007 | DE102005053718A1 Floating gate memory cell and production process has channel with tunnel dielectric, floating gate and control gate regions and different writing and erasing energy barriers |
| 05/24/2007 | DE102005053410A1 Disc-shaped substrate e.g. wafer, isolating device, has carrier unit with surface, where carrier unit is designed for developing adhesion force between surface and disc-shaped substrate e.g. wafer, to sharpen substrate |
| 05/24/2007 | DE102005052798A1 Vorrichtung zur Positionierung und Verfahren zur Oberflächenbehandlung von Leistungshalbleitermodulen Device for positioning and method for surface treatment of semiconductor power modules |
| 05/24/2007 | DE102005039478B4 Leistungshalbleiterbauteil mit Halbleiterchipstapel und Verfahren zur Herstellung desselben Power semiconductor component with the same semiconductor chip stack and processes for preparing |
| 05/24/2007 | DE102005035393B4 Verfahren zur Herstellung eines Bauelementes mit mehreren Chips sowie ein solches Bauelement A method for producing a component with a plurality of chips, as well as such a component |
| 05/24/2007 | DE102004034820B4 Verfahren zum Einebnen aktiver Schichten von TMR-Bauelementen auf einer Halbleiterstruktur A process for planarizing the active layers of the TMR devices on a semiconductor structure |
| 05/24/2007 | DE102004029103B4 Wärmebehandlungseinrichtung und Wärmebehandlungsverfahren Heat treatment device and heat treatment process |
| 05/24/2007 | DE10141025B4 Verfahren zum Testen von Wafern unter Verwendung eines Kalibrierwafers und zugehöriger Kalibriewafer A method for testing of wafers using a Kalibrierwafers and associated Kalibriewafer |
| 05/24/2007 | DE10036961B4 Verfahren zum Testen von Halbleiterwafern unter Verwendung von in Unterbereiche aufgeteilten Bereichen A method for testing semiconductor wafers using the divided areas into sub-areas |
| 05/23/2007 | EP1788694A1 Planar motor equipment, stage equipment, exposure equipment and device manufacturing method |
| 05/23/2007 | EP1788635A1 Method of manufacturing a self-aligned dual-gates transistor through gate pattern reduction |
| 05/23/2007 | EP1788621A2 Method for manufacturing bonded substrate and bonded substrate manufactured by the method |
| 05/23/2007 | EP1788620A1 Method for producing silicon wafer |
| 05/23/2007 | EP1788619A2 Semiconductor device and method of fabricating the same |
| 05/23/2007 | EP1788618A1 Substrate processing method |
| 05/23/2007 | EP1788617A1 Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate |
| 05/23/2007 | EP1788615A2 Substrate treatment apparatus and substrate treatment method |
| 05/23/2007 | EP1788589A1 Antiferromagnetic half metallic semiconductor and method for forming the same |
| 05/23/2007 | EP1788439A1 Material for forming resist protective film and method for forming resist pattern using same |
| 05/23/2007 | EP1788438A1 Material for formation of resist protection film and method of forming resist pattern therewith |
| 05/23/2007 | EP1788437A2 Rework process for photoresist film |
| 05/23/2007 | EP1788433A2 Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method |
| 05/23/2007 | EP1788401A1 Method and apparatus for testing electrical characteristics of object under test |
| 05/23/2007 | EP1788126A1 Method of manufacturing single crystalline gallium nitride thick film |
| 05/23/2007 | EP1788120A1 Removal of titanium nitride with xenon difluoride |
| 05/23/2007 | EP1787955A1 Single-layer carbon nanotube and alinged single-layer carbon nanotube bulk structure, and their production process, production apparatus and use |
| 05/23/2007 | EP1787576A1 Resin composition for medical equipment sealing and medical equipment for endoscope having been sealed therewith |
| 05/23/2007 | EP1787333A2 Thin film transistor and its manufacturing method |
| 05/23/2007 | EP1787331A2 Multiple dielectric finfet structure and method |
| 05/23/2007 | EP1787330A2 Fabrication of nonpolar indium gallium nitride thin films, heterostructures and devices by metalorganic chemical vapor deposition |
| 05/23/2007 | EP1787324A1 Fabrication of an eeprom cell with sige source/drain regions |
| 05/23/2007 | EP1787323A1 A method to form an interconnect |
| 05/23/2007 | EP1787322A2 A system and method for low temperature plasma-enhanced bonding |
| 05/23/2007 | EP1787321A2 Formation of ultra-shallow junctions by gas-cluster ion irridation |
| 05/23/2007 | EP1787320A2 Process for fabricating a self-aligned deposited source/drain insulated gate field-effect transistor |
| 05/23/2007 | EP1787319A1 Novel polyorganosiloxane dielectric materials |
| 05/23/2007 | EP1787318A2 Method of forming ultra shallow junctions |