Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
05/2007
05/30/2007CN1319169C Semiconductor integrated circuit having controllable internal power source and voltage
05/30/2007CN1319166C Semiconductor device
05/30/2007CN1319165C Semiconductor device and its manufacturing method
05/30/2007CN1319164C Semiconductor device and its manufacturing method
05/30/2007CN1319158C Method of constructing electronic assembly having indium thermal couple
05/30/2007CN1319156C Negative thermal dilation system device and conductive elastomer in mlcroelectronics seal connection
05/30/2007CN1319155C SOI substrate and semiconductor integrated circuit device
05/30/2007CN1319154C Buried strap contact for a storage capacitor and method for fabricating it
05/30/2007CN1319153C Process for making trench
05/30/2007CN1319152C CMOS fabrication process utilizing special transistor orientation
05/30/2007CN1319151C Method of manufacturing semiconductor device
05/30/2007CN1319150C Observable register transmission stage covering analyzing and excitation producing method
05/30/2007CN1319149C Double metal/polycrystalline oxide nitride oxide silicon memory unit for wide programing
05/30/2007CN1319148C Structures with improved interfacial strength of SiCOH dielectrics and method for preparing the same
05/30/2007CN1319147C Method of forming a self-aligned contact structure using a sacrificial mask layer
05/30/2007CN1319146C Integration of ald tantalum nitride and alpha-phase tantalum for copper metallization application
05/30/2007CN1319145C Apparatus and method of substrate surface treatment of integrated circuit
05/30/2007CN1319144C Electrode piece for electrostatic chuck, electrostatic chuck device and its adsorpting method
05/30/2007CN1319143C Wafer pre-alignment apparatus and method
05/30/2007CN1319142C Apparatus for shear testing of solder ball
05/30/2007CN1319141C Method and system for monitoring etch process
05/30/2007CN1319140C Circuit device mounitng method
05/30/2007CN1319139C Production of local vacuum sealing protective structure of silicon based sensor flexible piece
05/30/2007CN1319138C Packaged semiconductor device and its forming method
05/30/2007CN1319137C Technique for improving voltage resistance of reduced surface field type LDMOS device
05/30/2007CN1319136C Method for manufacturing semiconductor device and active array substrate and semiconductor device
05/30/2007CN1319135C DC or AC electric field auxiliary annealing
05/30/2007CN1319134C Method of selective deposition of a barrier layer on a dielectric material
05/30/2007CN1319133C Post etch photoresist strip with hydrogen for organosilicate glass low-kappa etch applications
05/30/2007CN1319132C Tantalum barrier removal solution
05/30/2007CN1319131C Process and apparatus for treating a workpiece such as a semiconductor wafer
05/30/2007CN1319130C Apparatus for handling semiconductor substrate, method for handling semiconductor substrate
05/30/2007CN1319129C Soldering tin lug forming method
05/30/2007CN1319128C High dielectric grid laminating structure
05/30/2007CN1319127C Method for semultaneous forming silicide and shallow junction
05/30/2007CN1319126C Nozzle of CVD equipment for mfg of semiconductor device
05/30/2007CN1319125C Deposition method of insulating layers having low dielectric constant of semiconductor device
05/30/2007CN1319124C Method for manufacturing semiconductor channel on insulator structure
05/30/2007CN1319123C Method of forming polysilicon layer and manufacturing polysilicon thin film crystal
05/30/2007CN1319122C Thermal treatment equipment and thermal treatment method
05/30/2007CN1319121C Method for forming alignment pattern of semiconductor device
05/30/2007CN1319120C Pattern-producing method for semiconductor device
05/30/2007CN1319119C CMP aided stripping to make micro pattern
05/30/2007CN1319118C Datum plate and substrate handling systems and method for installing the handling device
05/30/2007CN1319117C Manufacturing apparatus and method for semiconductor and mask position confirming device
05/30/2007CN1319116C Film forming device and film forming method, and method for forming EL device
05/30/2007CN1319115C System and method for producing combined products
05/30/2007CN1319114C Electronic device having electrode made by carbon-affinity metal
05/30/2007CN1319085C Flat capacitor
05/30/2007CN1319083C Magnetic multilayer structure with improved magnetic field range
05/30/2007CN1319070C Multi-digit magnetic memory element
05/30/2007CN1319023C Semiconductor device and production method thereof
05/30/2007CN1319009C Semiconductor device
05/30/2007CN1319003C Multi-batch crystal circle attribute number revising method
05/30/2007CN1318917C Method for producing semiconductor device using argon fluoride exposure light source
05/30/2007CN1318916C Positive resist composition and method of forming resist pattern from the same
05/30/2007CN1318914C Method of manufacturing wafer and method of evaluating overlapping alignment between light shade patterns
05/30/2007CN1318913C Photoresist composite for short wavelength purpose
05/30/2007CN1318907C Display having multilayer silicon structure
05/30/2007CN1318906C Display and method of making same
05/30/2007CN1318661C III-v compound crystal and method for production thereof
05/30/2007CN1318626C Metallic material for electronic part, electronic part, electronic equipment, method of working metallic material, process for producing electronic part and electronic optical part
05/30/2007CN1318530C Adhesive agent, method for connecting wiring terminals and wiring structure
05/30/2007CN1318529C Novel slurry for chemical mechanical polishing of metals
05/30/2007CN1318469C Method of fabricating polyurethane foam with micro pores and polishing pad therefrom
05/30/2007CN1318317C Method for supply of constant-concentration ozonated water
05/30/2007CN1318177C Laser processing method
05/30/2007CN1318154C Figure forming method and manufacturing method of device
05/30/2007CN1318151C Device and method for forming coating film
05/30/2007CA2528420A1 Aqueous printable electrical conductors
05/29/2007USRE39665 Optimized container stacked capacitor DRAM cell utilizing sacrificial oxide deposition and chemical mechanical polishing
05/29/2007USRE39662 Projection exposure apparatus
05/29/2007US7225422 Wire trimmed programmable logic array
05/29/2007US7225418 Operation analyzing method for semiconductor integrated circuit device, analyzing system used in the same, and optimization design method using the same
05/29/2007US7225358 Semiconductor integrated circuit device having operation test function
05/29/2007US7225048 Gap adjustment apparatus and gap adjustment method for adjusting gap between two objects
05/29/2007US7225047 Method, system and medium for controlling semiconductor wafer processes using critical dimension measurements
05/29/2007US7225046 Semiconductor manufacturing apparatus, remote control system therefor, and remote operation device
05/29/2007US7225041 Information providing method and system
05/29/2007US7224882 Optical materials with selected index-of-refraction
05/29/2007US7224829 Bonding pattern discrimination method, bonding pattern discrimination device and bonding pattern discrimination program
05/29/2007US7224629 Memory device having high speed sense amplifier comprising pull-up circuit and pull-down circuits with different drivability for each
05/29/2007US7224627 Integrated semiconductor circuit and method for testing the same
05/29/2007US7224615 Non-volatile semiconductor memory device adapted to store a multi-valued in a single memory cell
05/29/2007US7224613 Operating techniques for reducing effects of coupling between storage elements of a non-volatile memory operated in multiple data states
05/29/2007US7224609 Apparatus and method of driving non-volatile DRAM
05/29/2007US7224576 High capacitance electrode and methods of producing same
05/29/2007US7224568 Plasma processing method and plasma processing apparatus
05/29/2007US7224505 Manufacturing method of electro-optical apparatus substrate, manufacturing method of electro-optical apparatus, electro-optical apparatus substrate, electro-optical apparatus, and electronic instrument
05/29/2007US7224504 Deformable mirror using piezoelectric actuators formed as an integrated circuit and method of use
05/29/2007US7224459 Exposure apparatus, method of controlling same, method of manufacturing devices, computer-readable memory and program
05/29/2007US7224446 Apparatus, method, and computer program for wafer inspection
05/29/2007US7224443 Imprint lithography substrate processing tool for modulating shapes of substrates
05/29/2007US7224442 Supply control system and method, program, and information storage medium
05/29/2007US7224438 Method of manufacturing a device, device manufactured thereby, computer program and lithographic apparatus
05/29/2007US7224436 Lithographic apparatus and device manufacturing method
05/29/2007US7224432 Stage device, exposure apparatus, and device manufacturing method
05/29/2007US7224429 Lithographic apparatus, device manufacturing method and positioning system
05/29/2007US7224428 Lithographic apparatus and device manufacturing method
05/29/2007US7224424 Drive IC and display device having the same
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