Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2007
06/21/2007WO2007069599A1 Method for precoating film forming apparatus
06/21/2007WO2007069585A1 Positive resist composition for circuit board, and positive dry film for circuit board, and process for producing circuit board with use thereof
06/21/2007WO2007069548A1 Resist composition for liquid immersion exposure and method for forming resist pattern
06/21/2007WO2007069523A1 PROCESS FOR PRODUCING InGaN
06/21/2007WO2007069516A1 Laser irradiation apparatus, laser irradiation method, and manufacturing method of semiconductor device
06/21/2007WO2007069488A1 Aqueous dispersion for chemical mechanical polishing, chemical mechanical polishing method, and kit for preparing aqueous dispersion for chemical mechanical polishing
06/21/2007WO2007069480A1 Aligner and aligning method
06/21/2007WO2007069457A1 Surface inspection apparatus and surface inspection method
06/21/2007WO2007069456A1 Semiconductor device manufacturing method
06/21/2007WO2007069442A1 Method for manufacturing bonded substrate
06/21/2007WO2007069438A1 Metal film decarbonizing method, film forming method and semiconductor device manufacturing method
06/21/2007WO2007069417A1 Reflection-type mask blank for euv lithography, and substrate with electrically conductive film for the mask blank
06/21/2007WO2007069388A1 AlxGayIn1-x-yN CRYSTAL SUBSTRATE, SEMICONDUCTOR DEVICE, AND METHOD FOR MANUFACTURING THE SAME
06/21/2007WO2007069376A1 Aligning apparatus, bonding apparatus and aligning method
06/21/2007WO2007069313A1 Resist application method
06/21/2007WO2007069305A1 Semiconductor device and method of manufacturing the same
06/21/2007WO2007069303A1 Device for positioning object to be conveyed
06/21/2007WO2007069299A1 Method of manufacturing semiconductor device
06/21/2007WO2007069292A1 Semiconductor device and method of manufacturing the same
06/21/2007WO2007069188A2 Mos transistor and a method of manufacturing a mos transistor
06/21/2007WO2007069180A1 Non-volatile memory device having a gap in the tunnuel insulating layer and method of manufacturing the same
06/21/2007WO2007068756A1 Process for growth of low dislocation density gan
06/21/2007WO2007068714A2 Method of making a contact in a semiconductor device
06/21/2007WO2007068393A1 Mos transistor with better short channel effect control and corresponding manufacturing method
06/21/2007WO2007068281A1 Method of forming a semiconductor device having a dummy feature
06/21/2007WO2007053553A3 Method and system for forming a nitrided germanium-containing layer using plasma processing
06/21/2007WO2007051313B1 Methods for performing circuit edit operations with low landing energy electron beams
06/21/2007WO2007050317A3 A method of making an inverted-t channel transistor
06/21/2007WO2007046945A3 Product-related feedback for process control
06/21/2007WO2007044368A3 Minimized profile circuit module systems and methods
06/21/2007WO2007041004A3 Composition and method for planarizing surfaces
06/21/2007WO2007038710A3 Intra-cavity gettering of nitrogen in sic crystal growth
06/21/2007WO2007035398A3 Control of strain in device layers by selective relaxation and prevention of relaxation
06/21/2007WO2007035071A8 Apparatus and method for treating substrate
06/21/2007WO2007030673A3 Vapor deposition of hafnium silicate materials with tris(dimethylamido)silane
06/21/2007WO2007030346A3 Memory cell layout and process flow
06/21/2007WO2007027417A3 Microfeature assemblies including interconnect structures and methods for forming such interconnect structures
06/21/2007WO2007023011A3 Dual port gain cell with side and top gated read transistor
06/21/2007WO2007018967A3 Methods of forming memory circuitry with different insulative sidewall spacers
06/21/2007WO2007015987A3 System and method for improving mesa width in a semiconductor device
06/21/2007WO2007008903A3 Memory cell comprising a thin film three-terminal switching device having a metal source and/or drain region
06/21/2007WO2007002396A3 System and method for measuring characteristics of a continuous medium and/or localized targets using multiple sensors
06/21/2007WO2006138404A3 Short channel semiconductor device fabrication
06/21/2007WO2006138367A3 Thermoplastic/thermoset composition material and method of attaching a wafer to a substrate
06/21/2007WO2006133123A3 Shadow mask deposition of materials using reconfigurable shadow masks
06/21/2007WO2006132380A3 Functional film containing structure and method of manufacturing functional film
06/21/2007WO2006122119A3 Method for resist strip in presence of regular low k and/or porous low k dielectric materials
06/21/2007WO2006114746A3 Bipolar transistor and method of fabricating the same
06/21/2007WO2006101577A3 Lead frame panel and a plurality of half-etched connection bars
06/21/2007WO2006091290A3 Method of forming nanoclusters
06/21/2007WO2006083380A3 Method for fabricating a semiconductor device
06/21/2007WO2006055960A3 Device for emission of high frequency signals
06/21/2007WO2006025945A8 Semi conductor processing method using virtual modules
06/21/2007WO2006009444A9 Method and apparatus for inspecting a specimen surface and use of fluorescent materials
06/21/2007WO2005124850A8 Semiconductor device and production method for semiconductor device
06/21/2007WO2005122235A3 Methods and devices for forming nanostructure monolayers and devices including such monolayers
06/21/2007WO2005043591A3 HIGH PERFORMANCE STRESS-ENHANCED MOSFETs USING Si:C AND SiGe EPITAXIAL SOURCE/DRAIN AND METHOD OF MANUFACTURE
06/21/2007US20070143731 Method and Program for Supporting Register-Transfer-Level Design of Semiconductor Integrated Circuit
06/21/2007US20070142956 Method for adjoining adjacent coatings on a processing element
06/21/2007US20070142952 Error-correction assistance system
06/21/2007US20070142619 Forming electrical contacts to a molecular layer
06/21/2007US20070142617 Polymer for hard mask of semiconductor device and composition containing the same
06/21/2007US20070142592 3-hydroxy-1-methacryloyloxy-adamantane-2-acryloyloxypropyl phthalate copolymer; exposing layer of a photosensitive etching resistance material on a substrate made of semiconductor or quartz glass, heating, development, fluoric acid etching
06/21/2007US20070142344 fluocinonide or fluocinonide acetonide topical with two or more penetration enhancers
06/21/2007US20070142343 Mixture with penetration intensifiers, solvents and emulsifiers
06/21/2007US20070142017 Mixer circuit
06/21/2007US20070141958 Silicon Wafer Grinding Apparatus, Retaining Assembly Used for the Same and Silicon Wafer Flatness Correcting Method
06/21/2007US20070141951 Substrate processing method and substrate processing apparatus
06/21/2007US20070141859 Laser processing apparatus and laser processing process
06/21/2007US20070141858 Laser anneal of vertically oriented semiconductor structures while maintaining a dopant profile
06/21/2007US20070141857 Target designs and related methods for enhanced cooling and reduced deflection and deformation
06/21/2007US20070141856 Methods and apparatus for incorporating nitrogen in oxide films
06/21/2007US20070141855 Methods of modifying interlayer adhesion
06/21/2007US20070141854 Fabrication of nanoporous antireflection film
06/21/2007US20070141853 Semiconductive device fabricated using a substantially disassociated chlorohydrocarbon
06/21/2007US20070141852 Methods of fabricating isolation regions of semiconductor devices and structures thereof
06/21/2007US20070141851 System and method of reducing particle contamination of semiconductor substrates
06/21/2007US20070141850 Wet Treatment of Hafnium Containing Materials
06/21/2007US20070141849 Two-fluid nozzle for cleaning substrate and substrate cleaning apparatus
06/21/2007US20070141848 Method for manufacturing high-stability resistors, such as high ohmic poly resistors, integrated on a semiconductor substrate
06/21/2007US20070141847 Notch stop pulsing process for plasma processing system
06/21/2007US20070141846 Rapid thermal processing system
06/21/2007US20070141845 Apparatus and method for supplying chemicals
06/21/2007US20070141844 Etch mask and method of forming a magnetic random access memory structure
06/21/2007US20070141843 Substrate peripheral film-removing apparatus and substrate peripheral film-removing method
06/21/2007US20070141842 Method of Manufacturing Semiconductor Device
06/21/2007US20070141841 Method for fabricating a probing pad of an integrated circuit chip
06/21/2007US20070141840 Nickel silicide including indium and a method of manufacture therefor
06/21/2007US20070141839 Method for fabricating fully silicided gate
06/21/2007US20070141838 Direct patterning method for manufacturing a metal layer of a semiconductor device
06/21/2007US20070141837 Contact Structure of Semiconductor Device and Method for Fabricating the Same
06/21/2007US20070141836 Semiconductor device and method of manufacturing the same
06/21/2007US20070141835 Methods of fabricating interconnects for semiconductor components
06/21/2007US20070141834 Local interconnection method and structure for use in semiconductor device
06/21/2007US20070141833 Method for manufacturing semiconductor device
06/21/2007US20070141832 Integrated circuit insulators and related methods
06/21/2007US20070141831 Semiconductor device with a line and method of fabrication thereof
06/21/2007US20070141830 Methods for making integrated-circuit wiring from copper, silver, gold, and other metals
06/21/2007US20070141829 Semiconductive device fabricated using subliming materials to form interlevel dielectrics
06/21/2007US20070141828 Multi-layered structure forming method, method of manufacturing wiring substrate, and method of manufacturing electronic apparatus