Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2007
06/28/2007US20070148927 Isolation structure of semiconductor device and method for forming the same
06/28/2007US20070148926 Dual halo implant for improving short channel effect in three-dimensional tri-gate transistors
06/28/2007US20070148925 Laser apparatus, laser annealing method, and manufacture method of a semiconductor device
06/28/2007US20070148924 Mask pattern, method of fabricating thin film transistor, and method of fabricating organic light emitting display device using the same
06/28/2007US20070148923 Nitride semiconductor device and method of manufacturing the same
06/28/2007US20070148922 Method of fabricating semiconductor device
06/28/2007US20070148921 Mixed orientation semiconductor device and method
06/28/2007US20070148920 Fabrication method and fabrication apparatus of group III nitride crystal substance
06/28/2007US20070148919 Multi-step epitaxial process for depositing Si/SiGe
06/28/2007US20070148918 Method for fabricating a chip scale package using wafer level processing
06/28/2007US20070148917 Process for Regeneration of a Layer Transferred Wafer and Regenerated Layer Transferred Wafer
06/28/2007US20070148916 Semiconductor surface protecting sheet and method
06/28/2007US20070148915 Device and method for cutting an assembly
06/28/2007US20070148914 Process for Regeneration of a Layer Transferred Wafer and Regenerated Layer Transferred Wafer
06/28/2007US20070148913 Method for Manufacturing Semiconductor Device
06/28/2007US20070148912 Method for Manufacturing Direct Bonded SOI Wafer and Direct Bonded SOI Wafer Manufactured by the Method
06/28/2007US20070148911 Wafer bonding method
06/28/2007US20070148910 Process for simplification of a finishing sequence and structure obtained thereby
06/28/2007US20070148909 Shallow trench isolation region in semiconductor device and method of manufacture
06/28/2007US20070148908 Method of forming trench isolation layer of semiconductor device
06/28/2007US20070148907 Method of forming isolation layer of semiconductor device
06/28/2007US20070148906 Method of fabricating a semiconductor device
06/28/2007US20070148905 Method of forming a trench isolation layer in a semiconductor device
06/28/2007US20070148904 Device and method for controlling high density plasma chemical vapor deposition apparatus
06/28/2007US20070148903 Method for Fabricating STI Gap Fill Oxide Layer in Semiconductor Devices
06/28/2007US20070148902 Semiconductor device
06/28/2007US20070148901 Method for manufacturing a semiconductor device
06/28/2007US20070148900 Surface-mount capacitor and method of producing the same
06/28/2007US20070148899 Capacitor and manufacturing method thereof
06/28/2007US20070148898 Method for Forming Capacitor
06/28/2007US20070148897 Method for fabricating capacitor in semiconductor device
06/28/2007US20070148896 Memory with memory cells that include a mim type capacitor with a lower electrode made for reduced resistance at an interface with a metal film
06/28/2007US20070148895 Integrateable capacitors and microcoils and methods of making thereof
06/28/2007US20070148894 Semiconductor device and method for regional stress control
06/28/2007US20070148893 Method of forming a doped semiconductor portion
06/28/2007US20070148892 Semiconductor device and method of manufacturing the same
06/28/2007US20070148891 Method for manufacturing bipolar transistor
06/28/2007US20070148890 Oxygen enhanced metastable silicon germanium film layer
06/28/2007US20070148889 Method for manufacturing a bipolar transisstor
06/28/2007US20070148888 System and method for the manufacture of semiconductor devices by the implantation of carbon clusters
06/28/2007US20070148887 Method for manufacturing semiconductor device
06/28/2007US20070148886 Method for gate electrode height control
06/28/2007US20070148885 Method of fabricating semiconductor device with dual gate structure
06/28/2007US20070148884 Method of forming a recess channel trench pattern, and fabricating a recess channel transistor
06/28/2007US20070148883 Method for manufacturing a semiconductor device
06/28/2007US20070148882 Method for making pmc type memory cells
06/28/2007US20070148881 Hybrid STI stressor with selective re-oxidation anneal
06/28/2007US20070148880 Method of manufacturing a sonos memory
06/28/2007US20070148879 III-V compound semiconductor heterostructure MOSFET with a high workfunction metal gate electrode and process of making the same
06/28/2007US20070148878 Method of manufacturing split gate type non-volatile memory device
06/28/2007US20070148877 Semiconductor device and method for fabricating the same
06/28/2007US20070148876 Method for fabricating semiconductor device with dual poly-recess gate
06/28/2007US20070148875 Common drain dual semiconductor chip scale package and method of fabricating same
06/28/2007US20070148874 Integrated semiconductor device and method of manufacturing thereof
06/28/2007US20070148873 Method of Forming Transistors with Ultra-short Gate Feature
06/28/2007US20070148872 Method of forming floating gate array of flash memory device
06/28/2007US20070148871 Erasable and programmable read only memory (eprom) cell of an eprom device and method of manufacturing a semiconductor device having the eprom cell
06/28/2007US20070148870 Method for forming common source line in NOR-type flash memory device
06/28/2007US20070148869 Method of manufacturing phase-change memory element
06/28/2007US20070148868 Method of manufacturing non-volatile memory device
06/28/2007US20070148867 Nonvolatile memory devices having floating gates and method of fabricating the same
06/28/2007US20070148866 Method of manufacturing eeprom device
06/28/2007US20070148865 Method of manufacturing flash memory device
06/28/2007US20070148864 Method of manufacturing flash memory device
06/28/2007US20070148863 Method for fabricating semiconductor device
06/28/2007US20070148862 Phase-change memory layer and method of manufacturing the same and phase-change memory cell
06/28/2007US20070148861 Method of manufacturing non-volatile memory
06/28/2007US20070148860 Method for selective epitaxial growth of source/drain areas
06/28/2007US20070148859 Method for producing a chip card contact zone
06/28/2007US20070148858 Method for forming metal contact in semiconductor device
06/28/2007US20070148857 Independently controlled, double gate nanowire memory cell with self-aligned contacts
06/28/2007US20070148856 Method of forming pip capacitor
06/28/2007US20070148855 Phase change memory device and fabricating method therefor
06/28/2007US20070148854 Nonvolatile semiconductor memory device and method of manufacturing the same
06/28/2007US20070148853 Novel masked nitrogen enhanced gate oxide
06/28/2007US20070148852 Method of Manufacturing Semiconductor Device
06/28/2007US20070148851 Method of programming eeprom having single gate structure
06/28/2007US20070148850 Method for forming a DRAM semiconductor device with a sense amplifier
06/28/2007US20070148849 Semiconductor device and method of manufacturing the same
06/28/2007US20070148848 Methods of forming dual gate of semiconductor device
06/28/2007US20070148847 Method of Fabricating CMOS Image Sensor
06/28/2007US20070148846 Image Sensor and Method of Manufacturing the Same
06/28/2007US20070148845 Non-volatile memory device and method for fabricating the same
06/28/2007US20070148844 Method for manufacturing semiconductor device
06/28/2007US20070148843 Semiconductor device and method of manufacturing the same
06/28/2007US20070148842 Method of manufacturing a transistor
06/28/2007US20070148841 Method for forming transistor in semiconductor device
06/28/2007US20070148840 Method of forming fin transistor
06/28/2007US20070148839 Method of manufacturing semiconductor device, semiconductor device and electronic apparatus therefore
06/28/2007US20070148838 Metal gate CMOS with at least a single gate metal and dual gate dielectrics
06/28/2007US20070148837 Method of fabricating a multi-cornered film
06/28/2007US20070148836 Reduced-resistance finFETs and methods of manufacturing the same
06/28/2007US20070148835 Semiconductor integrated circuit device and fabrication process thereof
06/28/2007US20070148834 Laser irradiation apparatus and laser irradiation method
06/28/2007US20070148833 Thin film transistor and method of manufacturing the same
06/28/2007US20070148832 Method for manufacturing a semiconductor substrate, method for manufacturing a semiconductor device, and the semiconductor device
06/28/2007US20070148831 Thin film transistor device, method for manufacturing the same and display apparatus having the same
06/28/2007US20070148830 NOR-type flash memory cell array and method for manufacturing the same
06/28/2007US20070148829 Multi-layered flexible print circuit board and manufacturing method thereof
06/28/2007US20070148828 Substrate supporting frame
1 ... 2958 2959 2960 2961 2962 2963 2964 2965 2966 2967 2968 2969 2970 2971 2972 2973 2974 2975 2976 2977 2978 ... 6590