Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
07/2007
07/25/2007CN1328759C Method for forming spacers with different widths of semiconductor component
07/25/2007CN1328758C Manufacturing method of multifunction integrated sensor chip
07/25/2007CN1328757C Gas processing equipment having clearing device
07/25/2007CN1328756C Apparatus used for manufacturing semiconductor device, method of manufacturing the semiconductor devices, and semiconductor device manufactured by the apparatus and method
07/25/2007CN1328755C Low contaminatino, high density plasma etch chamber and method for making the same
07/25/2007CN1328621C Circuit array substrate
07/25/2007CN1328616C Method of fabricating liquid crystal display panels having various sizes
07/25/2007CN1328608C Repeatered lens used in lighting system of photoetching system
07/25/2007CN1328598C Method for preparing coplanar grid anode tellurium-zinc-cadmium detector
07/25/2007CN1328418C Process for Li doping growing P type ZnO Single Crystal film
07/25/2007CN1328411C Laser CVD apparatus and laser CVD method
07/25/2007CN1328409C High purity niobium and products containing the same, and methods of making the same
07/25/2007CN1328346C Coating composition, porous siliceous film, method for preparing porous siliceous film, and semiconductor device
07/25/2007CN1328345C Composition for preparing porous dielectric thin film containing saccharides porogen
07/25/2007CN1328295C Auxiliary for forming fine pattern and process for producing the same
07/25/2007CN1328196C Etching solution for forming an embedded resistor
07/25/2007CN1328133C Handling and managing device
07/25/2007CN1328129C Door and two-position spring biased latching mechanism
07/25/2007CN1328010C Method for fabricating polishing pad using laser beam and mask
07/25/2007CN1328009C Method for fabricating chemical mechanical polishing pad using laser
07/25/2007CN1328002C Cutting method for workpiece
07/25/2007CN101006754A Electronic device and its manufacturing method
07/25/2007CN101006630A Method of determining the correct average bias compensation voltage during a plasma process
07/25/2007CN101006580A Graded semiconductor layer
07/25/2007CN101006579A Forming integrated circuits with replacement metal gate electrodes
07/25/2007CN101006578A Wafer with improved conductive loops in the dicing lines
07/25/2007CN101006577A Method for producing a layer arrangement
07/25/2007CN101006576A Integrated low-K hard mask
07/25/2007CN101006575A Isolation structure for a memory cell using Al2O3 dielectric
07/25/2007CN101006574A Transfer apparatus for target object
07/25/2007CN101006573A Substrate transfer apparatus, substrate transfer method and exposure apparatus
07/25/2007CN101006572A Substrate carrying device, substrate carrying method, and exposure device
07/25/2007CN101006571A System and method of cleaning and etching a substrate
07/25/2007CN101006570A Land grid array packaged device and method of forming same
07/25/2007CN101006569A Forming abrupt source drain metal gate transistors
07/25/2007CN101006568A Method of forming a nanocluster charge storage device
07/25/2007CN101006567A Film forming apparatus, film forming method, program and storage medium
07/25/2007CN101006566A A method and system for modifying a gate dielectric stack containing a high-k layer using plasma processing
07/25/2007CN101006565A Method for providing uniform removal of organic material
07/25/2007CN101006564A Plasma processing apparatus
07/25/2007CN101006563A Apparatus for an optimized plasma chamber top piece
07/25/2007CN101006562A Substrate processing apparatus
07/25/2007CN101006561A Solvent for cleaning
07/25/2007CN101006560A Semiconductor device and its manufacturing method
07/25/2007CN101006559A DUV laser annealing and stabilization of SiCOH films
07/25/2007CN101006558A 校正方法及曝光装置 Correction method and exposure apparatus
07/25/2007CN101006557A Lighting apparatus, exposure apparatus and micro device manufacturing method
07/25/2007CN101006556A Lighting optical device, exposure system, and exposure method
07/25/2007CN101006555A Alignment information display method, program thereof, alignment method, exposure method, device manufacturing method, display system, display device, program, and measurement/inspection device
07/25/2007CN101006554A Reticle protective member, reticle carrying apparatus, exposure device, and reticle carrying method
07/25/2007CN101006553A Optical integrator, illumination optical device, exposal device ,method and element manufacture method
07/25/2007CN101006552A Lighting optical device, regulation method for lighting optical device, exposure system, and exposure method
07/25/2007CN101006551A Substrate handling device for a charged particle beam system
07/25/2007CN101006550A Methods and apparatus for determining endpoint in a plasma processing system
07/25/2007CN101006549A A semiconductor substrate processing apparatus and method thereof
07/25/2007CN101006548A Deposition technique for producing high quality compound semiconductor materials
07/25/2007CN101006545A Method for reciprocating a workpiece through an ion beam
07/25/2007CN101006398A Semiconductor processing method using virtual modules
07/25/2007CN101006394A Micro pattern forming material, method of forming micro resist pattern and electronic device
07/25/2007CN101006352A Substrate with patterned conductive layer
07/25/2007CN101006206A Silicon wafer, method for manufacturing the same and method for growing silicon single crystals
07/25/2007CN101006199A Method of forming film, film forming apparatus and storage medium
07/25/2007CN101006198A In situ surface contaminant removal for ion implanting
07/25/2007CN101006197A Vaporizing device and treatment apparatus
07/25/2007CN101006196A Shield body and vacuum processing apparatus
07/25/2007CN101006195A Method for producing silicon nitride films
07/25/2007CN101006194A Film-forming apparatus and film-forming method
07/25/2007CN101006153A Cerium oxide abrasive and slurry containing the same
07/25/2007CN101006021A Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method
07/25/2007CN101005727A Electrode for generating plasma and plasma processing apparatus using same
07/25/2007CN101005281A Logic processing apparatus, semiconductor device and logic circuit
07/25/2007CN101005125A Thin film pattering substrate and surface treatment
07/25/2007CN101005124A Thin film pattering substrate and surface treatment
07/25/2007CN101005123A Thin film pattering substrate and surface treatment
07/25/2007CN101005117A Light-emitting device, method for manufacturing light-emitting device, and electronic apparatus
07/25/2007CN101005109A Low height lead frame for LED device and the manufacturing method thereof
07/25/2007CN101005108A Power type light emitting diode heat sink and its method
07/25/2007CN101005107A Flip-chip light emitting diode with metal convex spot array structure and its producing method
07/25/2007CN101005099A Gated diode structure and method of forming same
07/25/2007CN101005096A Dual field plate mesfet and its forming method
07/25/2007CN101005094A Novel metal oxide silicon field effect transistor grid structure and its preparing process
07/25/2007CN101005093A Phase change memory device and method for manufacturing phase change memory device
07/25/2007CN101005090A Backside illuminated image -sensor, its forming method and package
07/25/2007CN101005089A Image sensor and its producing method
07/25/2007CN101005087A Mounting structure of image pickup device
07/25/2007CN101005085A Semiconductor device and method for manufacturing the same
07/25/2007CN101005083A TFT array structure and its producing method
07/25/2007CN101005082A Thin film transistor channel structure and its forming method
07/25/2007CN101005081A Non-volatile memory device, and manufacturing method and programming method thereof
07/25/2007CN101005077A Non-volatile storage and its producing method and operation method
07/25/2007CN101005075A Non-volatile storage and its producing method
07/25/2007CN101005074A Hollow cylindrical capacitor and its producing method
07/25/2007CN101005073A 位线选择晶体管布局结构 Bit line selection transistor layout structure
07/25/2007CN101005072A Non-volatile storage and its producing method
07/25/2007CN101005071A Composite field effect transistor structure
07/25/2007CN101005070A Methods and apparatuses for creating integrated circuit capacitance from gate array structures
07/25/2007CN101005069A Zapping circuit
07/25/2007CN101005067A 半导体器件 Semiconductor devices
07/25/2007CN101005066A Semiconductor element and its producing method
07/25/2007CN101005064A Multichip packaging structure and its production method