Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2008
06/10/2008US7384802 ESD protection device for high voltage
06/10/2008US7384801 Integrated circuit with inductor having horizontal magnetic flux lines
06/10/2008US7384800 Method of fabricating metal-insulator-metal (MIM) device with stable data retention
06/10/2008US7384799 Method to avoid amorphous-si damage during wet stripping processes in the manufacture of MEMS devices
06/10/2008US7384730 Top coating composition for photoresist and method of forming photoresist pattern using same
06/10/2008US7384728 First organic layer, silicon-containing sacrificial layer, and second organic layer; photolithographically patterning the 2nd organic layer and using it as a mask to etch the sacrificial layer; using the etched sacrificial layer as a mask to etch first organic layer; using product to etch the substrate
06/10/2008US7384727 Semiconductor processing patterning methods
06/10/2008US7384713 Exposure mask blank manufacturing method and exposure mask manufacturing method
06/10/2008US7384712 Transferring pattern to substrate; holes surrounded by sheilding zones; forming semiconductors
06/10/2008US7384711 Stencil mask having main and auxiliary strut and method of forming the same
06/10/2008US7384698 Metal article intended for at least partially coating with a substance and a method for producing the same
06/10/2008US7384693 Diamond-like carbon films with low dielectric constant and high mechanical strength
06/10/2008US7384682 Reacted with a polyarylene ether flexibilizer; thermoplastic poly(2,3-epoxy-2-methyl ether) thermoplastic; spheriodal particle filler; higher fracture toughness, lower viscosity or increased thermal shock resistance at below -40 degrees C.; encapsulated semiconductor chips
06/10/2008US7384595 Heat-treating apparatus and heat-treating method
06/10/2008US7384582 Mold cleaning sheet and method for producing semiconductor devices using the same
06/10/2008US7384569 Imprint lithography mask trimming for imprint mask using etch
06/10/2008US7384567 Method of manufacturing thin film magnetic head
06/10/2008US7384534 Amines, amides, carboxylate, dicarboxylate or tri-carboxylate groups containing chelating agents, a substituted or unsubstituted benzotriazole or a polymeric corrosion resistance agent, sodium hydroxide or ammonium hydroxide as pH adjuster, a solvent
06/10/2008US7384484 Substrate processing method, substrate processing apparatus and substrate processing system
06/10/2008US7384476 Method for crystallizing silicon
06/10/2008US7384471 Porogens, porogenated precursors and methods for using the same to provide porous organosilica glass films with low dielectric constants
06/10/2008US7384447 Coated nickel-containing powders, methods and apparatus for producing such powders and devices fabricated from same
06/10/2008US7384322 Apparatus and method for manufacturing liquid crystal display devices
06/10/2008US7384228 Insertion device, lithographic apparatus with said insertion device and device manufacturing method
06/10/2008US7384140 Liquid droplet ejecting apparatus, liquid droplet ejecting system, electro-optical device, method of manufacturing electro-optical device, method of forming a metal wiring line, and electronic apparatus
06/10/2008US7383955 Thin plate supporting container
06/10/2008US7383929 Anti-vibration technique
06/10/2008US7383844 Meniscus, vacuum, IPA vapor, drying manifold
06/10/2008US7383843 Method and apparatus for processing wafer surfaces using thin, high velocity fluid layer
06/10/2008US7383770 Printing device for electronic parts having a roller and a squeegee arrangement
06/10/2008US7383751 Articulated robot
06/10/2008US7383626 Methods for fabricating giant magnetoresistive (GMR) devices
06/10/2008CA2326677C A method of making a wafer-pair having sealed chambers
06/10/2008CA2324357C Ultra-high resolution liquid crystal display on silicon-on-sapphire
06/05/2008WO2008067537A2 Method and apparatus for growth of iii-nitride semiconductor epitaxial layers
06/05/2008WO2008067494A1 Integrated circuit with built-in heating circuitry to reverse operational degeneration
06/05/2008WO2008067243A1 Method of applying a super-absorbent composition to tissue or towel substrates
06/05/2008WO2008067242A2 Semiconductor device with leadframe finger lock
06/05/2008WO2008067228A1 Methods to reduce the critical dimension of semiconductor devices and partially fabricated semiconductor devices having reduced critical dimensions
06/05/2008WO2008067213A2 Techniques for low temperature ion implantation
06/05/2008WO2008067146A1 Method of fabricating thin film transistor
06/05/2008WO2008067136A1 Selective processing of semiconductor nanowires by polarized visible radiation
06/05/2008WO2008067135A1 Thin film transistor with enhanced stability
06/05/2008WO2008066999A2 Devices, methods, and systems with mos-gated trench-to-trench lateral current flow
06/05/2008WO2008066952A2 Selective destruction of metallic nanostructures via electromagnetic radiation
06/05/2008WO2008066947A2 Formation of carbon and semiconductor nanomaterials using molecular assemblies
06/05/2008WO2008066884A1 Semiconductor structure with interconnect comprising silver and method of forming the same
06/05/2008WO2008066804A1 Quartz encapsulated heater assembly
06/05/2008WO2008066794A1 Current-driven device using nimn alloy and method of manufacture
06/05/2008WO2008066712A2 High light extraction efficiency light emitting diode (led) with emitters within structured materials
06/05/2008WO2008066335A1 Apparatus of transferring semiconductor package
06/05/2008WO2008066190A1 Wire bonding method and wire bonding apparatus
06/05/2008WO2008066181A1 Immersion exposure device and exposure method, and device manufacturing method
06/05/2008WO2008066173A1 Amorphous carbon film, semiconductor device, film forming method, film forming apparatus and storage medium
06/05/2008WO2008066172A1 Film forming method, film forming apparatus, storage medium and semiconductor device
06/05/2008WO2008066103A1 Substrate processing apparatus
06/05/2008WO2008066091A1 Device, and method for manufacturing the same
06/05/2008WO2008066088A1 Method of using boron diffusion source and process for producing semiconductor
06/05/2008WO2008066060A1 Method for producing polymer, composition for forming insulating film, and silica insulating film and method for producing the same
06/05/2008WO2008066059A1 Semiconductor device and semiconductor device manufacturing method
06/05/2008WO2008066030A1 Al ALLOY FILM FOR DISPLAY DEVICE, DISPLAY DEVICE, AND SPUTTERING TARGET
06/05/2008WO2008066013A1 Semiconductor device production apparatus and semiconductor device production method
06/05/2008WO2008066011A1 Positive radiation-sensitive resin composition and pattern forming method
06/05/2008WO2008065988A1 Process for producing rf powder
06/05/2008WO2008065979A1 Method and device for placing liquid material
06/05/2008WO2008065977A1 Exposure method, pattern forming method, exposure device, and device manufacturing method
06/05/2008WO2008065973A1 Method for finishing surface of preliminary polished glass substrate
06/05/2008WO2008065944A1 Photosensitive siloxane composition, hardened film formed therefrom and device having the hardened film
06/05/2008WO2008065929A1 Process for producing light emitting element
06/05/2008WO2008065927A1 Organic thin film transistor, organic composite electronic element, method for manufacturing such transistor and element, and display device and memory
06/05/2008WO2008065926A1 Electronic component mounting structure and method for manufacturing the same
06/05/2008WO2008065925A1 SEMICONDUCTOR DEVICE Cu WIRING AND METHOD FOR MANUFACTURING THE SAME
06/05/2008WO2008065924A1 Immersion exposure coat film forming apparatus and immersion exposure coat film forming method
06/05/2008WO2008065908A1 Method for forming group iv metallic element compound film and method for manufacturing semiconductor device
06/05/2008WO2008065892A1 Multicolor molded item, method of multicolor molding and substrate accommodation container
06/05/2008WO2008065827A1 Chemically amplified positive-type photoresist composition for thick film, chemically amplified dry film for thick film, and method for production of thick film resist pattern
06/05/2008WO2008065821A1 Optical element, exposure unit utilizing the same and process for device production
06/05/2008WO2008065820A1 Processing apparatus, processing method, and surface processing jig
06/05/2008WO2008065809A1 Treatment apparatus and surface treatment jig
06/05/2008WO2008065804A1 Apparatus and method for manufacturing semiconductor element and semiconductor element manufactured by the method
06/05/2008WO2008065782A1 Process for producing silicon carbide semiconductor device
06/05/2008WO2008065774A1 Wiring board and display unit
06/05/2008WO2008065747A1 Work transfer system
06/05/2008WO2008065745A1 Plasma processing apparatus
06/05/2008WO2008065744A1 Plasma processing apparatus
06/05/2008WO2008065645A1 A supporting system and a method for supporting an object
06/05/2008WO2008065644A1 Method for embedding non-volatile memory with logic circuitry
06/05/2008WO2008065616A1 Method of manufacturing an insulated gate field effect transistor
06/05/2008WO2008065143A1 Method of fabricating a hybrid substrate
06/05/2008WO2008065125A1 Fabrication of a diffusion barrier cap on copper containing conductive elements
06/05/2008WO2008064963A1 Dual liner capping layer interconnect structure
06/05/2008WO2008064863A1 Laser machining
06/05/2008WO2008064718A1 Electronic component module and method for the production thereof
06/05/2008WO2008064507A1 Transfer device for an overhead conveying system
06/05/2008WO2008049024B1 Methods and apparatus for tuning a set of plasma processing steps
06/05/2008WO2008048628A3 Aligned crystalline semiconducting film on a glass substrate and methods of making
06/05/2008WO2008042647A3 Technique for improved damage control in a plasma doping (plad) ion implantation
06/05/2008WO2008033982A3 Field effect transistor with raised source/drain fin straps
06/05/2008WO2008033804A3 Quantum dot barcode structures and uses thereof
06/05/2008WO2008033436A8 Systems and methods for forming strontium-and/or barium-containing layers