Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2008
06/12/2008US20080135995 Electronic component
06/12/2008US20080135991 Semiconductor device package featuring encapsulated leadframe with projecting bumps or balls
06/12/2008US20080135988 Method to reduce semiconductor device leakage
06/12/2008US20080135987 Gate conductor structure
06/12/2008US20080135986 Method of forming pre-metal dielectric layer of semiconductor device
06/12/2008US20080135985 Two-Step Oxidation Process For Semiconductor Wafers
06/12/2008US20080135984 Semiconductor device
06/12/2008US20080135983 Nanolaminate-structure dielectric film forming method
06/12/2008US20080135982 Semiconductor devices including mesa structures and multiple passivation layers
06/12/2008US20080135980 Method for making junction and processed material formed using the same
06/12/2008US20080135977 Semiconductor component including a semiconductor chip and a passive component
06/12/2008US20080135976 Semiconductor device and method of manufacturing the same
06/12/2008US20080135975 Semiconductor wafer, method of manufacturing the same and semiconductor device
06/12/2008US20080135973 Semiconductor device comprising high-withstand voltage mosfet and its manufacturing method
06/12/2008US20080135972 Lateral insulated gate bipolar transistor having a retrograde doping profile in base region and method of manufacture thereof
06/12/2008US20080135971 High voltage semiconductor device and method of manufacture thereof
06/12/2008US20080135965 Electrical/optical integration scheme using direct copper bonding
06/12/2008US20080135958 Magnetic random access memory and manufacturing method of the same
06/12/2008US20080135955 Semiconductor device and method for fabricating the same
06/12/2008US20080135954 Semiconductor device and method of producing the semiconductor device
06/12/2008US20080135953 Noise reduction in semiconductor devices
06/12/2008US20080135952 Method for making a semiconductor device having a high-k dielectric layer and a metal gate electrode
06/12/2008US20080135951 Semiconductor Device and Method of Forming the Same
06/12/2008US20080135950 Semiconductor device
06/12/2008US20080135946 Read only memory cell having multi-layer structure for storing charges and manufacturing method thereof
06/12/2008US20080135945 Semiconductor device having a silicided gate electrode and method of manufacture therefor
06/12/2008US20080135942 Semiconductor device, manufacturing method thereof, and SRAM cell
06/12/2008US20080135941 Modulated trigger device
06/12/2008US20080135937 Tft containing coalesced nanoparticles
06/12/2008US20080135936 Semiconductor device and manufacturing method thereof
06/12/2008US20080135935 Dual structure finfet and method of manufacturing the same
06/12/2008US20080135932 Semiconductor device and method for manufacturing same
06/12/2008US20080135931 Power Semiconductor Devices Having Termination Structures and Methods of Manufacture
06/12/2008US20080135928 MOS device resistant to ionizing radiation
06/12/2008US20080135927 Semiconductor device and manufacturing method thereof
06/12/2008US20080135924 Multilayered box in FDSOI MOSFETS
06/12/2008US20080135923 Non-volatile semiconductor memory devices
06/12/2008US20080135922 Nonvolatile semiconductor memory device and method for manufacturing the same
06/12/2008US20080135921 Semiconductor device and method for manufacturing the same
06/12/2008US20080135919 Sonos flash memory and method for fabricationg the same
06/12/2008US20080135917 Method to form uniform tunnel oxide for flash devices and the resulting structures
06/12/2008US20080135916 Non-volatile memory device and method of fabricating the same
06/12/2008US20080135915 Non-volatile memory and method of fabricating the same
06/12/2008US20080135914 Nanocrystal formation
06/12/2008US20080135912 Memory device and method of fabricating the same
06/12/2008US20080135911 Nrom fabrication method
06/12/2008US20080135910 Semiconductor device and method of fabricating the same
06/12/2008US20080135909 Display device and method of producing the same
06/12/2008US20080135908 Forming plurality of catalytic particles on a semiconductor substrate, and carbon nanotubes or Si naonwires by growing tubes or wires on the Fe Ti, Au, Pd catalytic particles, includes charging the plurality of tubes or wires with the same type of electrical charge so that tubes or wires can be separated
06/12/2008US20080135906 Method and Structure for Fabricating Capacitor Devices for Integrated Circuits
06/12/2008US20080135905 Selective coupling of voltage feeds for body bias voltage in an integrated circuit device
06/12/2008US20080135903 Transistor gates including cobalt silicide, semiconductor device structures including the transistor gates, precursor structures, and methods of fabrication
06/12/2008US20080135901 Semiconductor memory and method of manufacturing the same
06/12/2008US20080135900 Method of forming organic ferroelectric film, method of manufacturing memory element, memory device, and electronic apparatus
06/12/2008US20080135893 Thin film transistor, method of fabricating the same, and display device including the same
06/12/2008US20080135892 Carbon nanotube field effect transistor and method of making thereof
06/12/2008US20080135890 Field-Effect Transistor and Method of Manufacturing Same
06/12/2008US20080135889 Structure and Method for Forming a Planar Schottky Contact
06/12/2008US20080135888 FinFET and method of manufacturing the same
06/12/2008US20080135887 Field effect transistor and fabrication method thereof
06/12/2008US20080135886 Semiconductor device and manufacturing method thereof
06/12/2008US20080135884 Solid-state imaging device and method for manufacturing same
06/12/2008US20080135883 Circuitry and method
06/12/2008US20080135879 Method of fabricating cmos transistor and cmos transistor fabricated thereby
06/12/2008US20080135878 Germanium semiconductor device and method of manufacturing the same
06/12/2008US20080135877 Semiconductor Manufacturing Method and Semiconductor Device
06/12/2008US20080135876 Trench capacitors with insulating layer collars in undercut regions
06/12/2008US20080135875 RELAXED LOW-DEFECT SGOI FOR STRAINED Si CMOS APPLICATIONS
06/12/2008US20080135874 Patterned strained semiconductor substrate and device
06/12/2008US20080135873 Inducement of Strain in a Semiconductor Layer
06/12/2008US20080135871 Semiconductor component
06/12/2008US20080135870 Semiconductor Device and Method of Manufacturing the Same
06/12/2008US20080135866 Method of forming three dimensional features on light emitting diodes for improved light extraction
06/12/2008US20080135864 High light extraction efficiency light emitting diode (led) with emitters within structured materials
06/12/2008US20080135857 Array substrate, method of manufacturing the same, and method of repairing line in the same
06/12/2008US20080135856 Light emitting device having vertical topology and method for manufacturing the same
06/12/2008US20080135853 Dislocation reduction in non-polar iii-nitride thin films
06/12/2008US20080135852 Gallium Nitride-Based Semiconductor Stacked Structure, Method for Fabrication Thereof,Gallium Nitride-Based Semiconductor Device and Lamp Using the Device
06/12/2008US20080135851 Display and method of manufacturing the same
06/12/2008US20080135850 Process for manufacturing a semiconductor device, a semiconductor device and a high-frequency circuit
06/12/2008US20080135849 Thin film transistor and method of manufacturing the same
06/12/2008US20080135848 Semiconductor Device
06/12/2008US20080135847 Thin film transistor, method of fabricating the same, and organic light emitting display device including the same
06/12/2008US20080135846 Thin film transistor substrate and method of manufacture
06/12/2008US20080135845 Thin-film transistor substrate and method of manufacturing the same
06/12/2008US20080135844 Semiconductor device and its manufacturing method
06/12/2008US20080135841 Semiconductor wafer, method of manufacturing the same and method of manufacturing semiconductor chip
06/12/2008US20080135839 Method of Fabricating Thin Film Transistor
06/12/2008US20080135838 Thin film transistor, method of fabricating the same, and organic light emitting diode display device including the same
06/12/2008US20080135837 Method of fabricating thin film transistor having multilayer structure and active matrix display device including the thin film transistor
06/12/2008US20080135831 Optoelectronic Circuit Employing a Heterojunction Thyristor Device to Convert a Digital Optical Signal to a Digital Electrical Signal
06/12/2008US20080135830 Semiconductor structures with structural homogeneity
06/12/2008US20080135826 nanowires, nanoribbons, nanotubes, and nanotapes (e.g., high width to height ratio cross-section) including single crystal SiNW, in a nanochannel template; permanent nanotemplates which control nanostructure growth and also become part of the overall device or array (or both) structure
06/12/2008US20080135825 Phase-change memory device and method of fabricating the same
06/12/2008US20080135824 Method and Structure of a Multi-Level Cell Resistance Random Access Memory with Metal Oxides
06/12/2008US20080135812 Cu(Ac)2 and/or In(Ac)3 and selenourea is dissolved in water and sonicated for about 1 hour or more under an atmosphere of inert gas, to form CuSe or In2Se3 or CuInSe2 nanoparticles ; oxide-free ink; solar cells
06/12/2008US20080135811 Solution-based fabrication of photovoltaic cell
06/12/2008US20080135785 Method of and apparatus for manufacturing semiconductor thin film, and method of manufacturing thin film transistor
06/12/2008US20080135758 Bolometer and method of manufacturing the same
06/12/2008US20080135627 Semiconductor Device, and Method for Manufacturing Thereof
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