Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
06/2008
06/04/2008CN101193694A Apparatus and method for mixing fluids, comprising mixing of at least one fluid with a near-critical or super-critical carrier fluid
06/04/2008CN101193490A Magnetic confinement of a plasma
06/04/2008CN101192625A Semiconductor device and its manufacture method
06/04/2008CN101192624A Nonvolatile semiconductor memory device and method for manufacturing the same
06/04/2008CN101192622A Image display system comprising low temperature poly silicon thin film transistor and its manufacture method
06/04/2008CN101192621A Non-volatile memory device and method of fabricating the same
06/04/2008CN101192620A Solid-state imaging device
06/04/2008CN101192619A Image sensor and fabricating method thereof
06/04/2008CN101192618A CMOS image sensor and its manufacture method
06/04/2008CN101192617A Thin film solar module and method of fabricating the same
06/04/2008CN101192616A Semiconductor device and manufacturing method thereof
06/04/2008CN101192615A Semiconductor device, method for manufacturing semiconductor device, and electro-optical apparatus
06/04/2008CN101192614A Thin film transistor substrate and its producing method
06/04/2008CN101192613A Non-volatile memory device and method of fabricating the same
06/04/2008CN101192609A Semiconductor integrated circuit and fabrication method for the same
06/04/2008CN101192608A 半导体集成电路及其制作方法 Semiconductor integrated circuit and manufacturing method thereof
06/04/2008CN101192605A Semiconductor device and its manufacture method
06/04/2008CN101192604A Integrated circuit element, chip and method of manufacture
06/04/2008CN101192603A Shallow groove structure and its filling method
06/04/2008CN101192596A Semiconductor device and display device having alignment mark
06/04/2008CN101192595A Multi-speed interconnected reliability testing structure
06/04/2008CN101192594A Shallow ditch groove separation process monitoring domain and monitoring method
06/04/2008CN101192593A Semiconductor device and method for manufacturing the same
06/04/2008CN101192592A Metal conducting wire mosaic structure and method of manufacture
06/04/2008CN101192588A Wire bonding and method for forming same
06/04/2008CN101192587A Semiconductor device and method of manufacturing the same
06/04/2008CN101192583A Semiconductor device and method of manufacturing semiconductor device
06/04/2008CN101192582A Bonding structures and methods for manufacturing same
06/04/2008CN101192578A Pixel structure and its manufacture method
06/04/2008CN101192577A Flash memory device and method of manufacturing the same
06/04/2008CN101192576A SONOSSONOS Flash memory manufacture method
06/04/2008CN101192575A Method for improving DRAM PN junction leakage of current
06/04/2008CN101192574A CMOSCMOS device stress membrane forming method and CMOS device
06/04/2008CN101192573A CMOSCMOS device stress membrane forming method
06/04/2008CN101192572A Method of manufacturing image sensor
06/04/2008CN101192571A Method of manufacturing cmos image sensor
06/04/2008CN101192570A CMOS image sensor
06/04/2008CN101192569A Semicondutor device polycrystalline silicon contact structure for mounting chip and grid structure preparation method
06/04/2008CN101192568A Integrate circuit 'metal-insulator-metal' capacitor structure and its manufacture method
06/04/2008CN101192567A Method of forming metal line in semiconductor device
06/04/2008CN101192566A Semiconductor device and method for manufacturing the same
06/04/2008CN101192565A Dry method etching system using etching barrier area and method
06/04/2008CN101192564A Etching method for accomplishing small size through hole technology
06/04/2008CN101192563A Method for avoiding wafer border striping in metal wiring procedure
06/04/2008CN101192562A Semiconductor device metal contact adhesive layer preparation method
06/04/2008CN101192561A Polycrystalline silicon self-aligning plug manufacture method
06/04/2008CN101192560A Contact hole filling method
06/04/2008CN101192559A Isolation groove filling method
06/04/2008CN101192558A Spin head, method of operating the spin head and apparatus for treating substrates with the spin head
06/04/2008CN101192557A Power supply apparatus and deposition method using the power supply apparatus
06/04/2008CN101192556A Wafer transfer apparatus
06/04/2008CN101192555A Resin film evaluation method and method for manufacturing semiconductor device
06/04/2008CN101192554A System and method for introducing a substrate into a process chamber
06/04/2008CN101192553A Method for measuring silicon oxide layer-silicon nitride-silicon oxide layer electrical thickness
06/04/2008CN101192552A Semiconductor apparatus balling procedure and soldering flux tainting and printing tool used therefor
06/04/2008CN101192551A Gold/silicon eutectic die bonding method
06/04/2008CN101192550A Semiconductor packaging member and method for fabricating the same
06/04/2008CN101192549A Wafer grade chip packaging process
06/04/2008CN101192548A Chip packaging and chip packaging method
06/04/2008CN101192547A Semiconductor component buried loading plate splicing structure and its manufacture method
06/04/2008CN101192546A Luminous diode color matching method
06/04/2008CN101192545A Sensing and detecting type packaging piece and its method for making
06/04/2008CN101192544A Semiconductor component buried loading plate splicing structure and its manufacture method
06/04/2008CN101192543A Successive type multi-layer type image sensing chip packaging structure and method
06/04/2008CN101192542A Circuit board structure and its manufacture method
06/04/2008CN101192541A Semiconductor device and fabricating method thereof
06/04/2008CN101192540A Method of manufacturing semiconductor devices
06/04/2008CN101192539A Device manufacture method and device electrical performance regulation method
06/04/2008CN101192538A Hard mask etching method for strained silicon MOS transistor and structure
06/04/2008CN101192537A Vertical type bipolar transistor manufacture method and vertical type bipolar transistor
06/04/2008CN101192536A Method for constructing NPN transistor by selective epitaxy
06/04/2008CN101192535A Metal line re-etching method of semiconductor substrate
06/04/2008CN101192534A Film formation apparatus for semiconductor process and method for using the same
06/04/2008CN101192533A Etch stop layer and its forming method
06/04/2008CN101192532A Charge trap layer and method of manufacturing the same and charge trap semiconductor memory device
06/04/2008CN101192531A Method for processing polysilazanes film
06/04/2008CN101192530A Method for manufacturing semiconductor device
06/04/2008CN101192529A Manufacturing method of capacitor electrode, manufacturing system of capacitor electrode, and storage medium
06/04/2008CN101192528A Grid preparation method
06/04/2008CN101192527A Thin-film transistor production method and its grid preparation method
06/04/2008CN101192526A Semiconductor device grid preparation method and semiconductor device
06/04/2008CN101192525A Metal oxide semiconductor device grid preparation method
06/04/2008CN101192524A Semiconductor device grids preparation method
06/04/2008CN101192523A Semiconductor device grids preparation method and semiconductor device
06/04/2008CN101192522A Grids and method of manufacture
06/04/2008CN101192521A Electricity erasable memorizer tunnel oxide forming method
06/04/2008CN101192520A Semiconductor device and manufacture method thereof
06/04/2008CN101192519A Semiconductor element and method for fabricating the same
06/04/2008CN101192518A Method for promoting gallium nitride material carrier mobility
06/04/2008CN101192517A Gallium arsenide substrate multiple layer deformation buffer layer manufacture method
06/04/2008CN101192516A Formation and treatment of epitaxial layer containing silicon and carbon
06/04/2008CN101192515A Method for forming a pattern of a semiconductor device
06/04/2008CN101192514A Semiconductor device and method for fabricating the same
06/04/2008CN101192513A Metal-insulator-metal capacitor and its manufacture process
06/04/2008CN101192512A Method of manufacturing a semiconductor heterostructure
06/04/2008CN101192511A Vacuum processing device
06/04/2008CN101192510A Method of improving a surface
06/04/2008CN101192509A Apparatus, anode and method for manufacturing integrated circuit
06/04/2008CN101192508A Xenon difluoride selective erosion for titanium nitride
06/04/2008CN101192507A Phosphoric acid solution exchanging method and control program in semiconductor integrated circuit production
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