Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
10/2008
10/09/2008WO2008121793A1 Mist fabrication of quantum dot devices
10/09/2008WO2008121752A1 Apparatus and method for semiconductor wafer bumping via injection molded solder
10/09/2008WO2008121726A1 Non-uniform feedthrough and lead configuration for a transistor outline package
10/09/2008WO2008121674A1 Diffusion barrier in 3d memory and method for implementing
10/09/2008WO2008121659A1 Semiconductor device having self-aligned epitaxial source and drain extensions
10/09/2008WO2008121657A1 A recipe-and-component control module and methods thereof
10/09/2008WO2008121656A1 Recipe report card framework and methods thereof
10/09/2008WO2008121655A1 Method and apparatus for dc voltage control on rf-powered electrode
10/09/2008WO2008121654A1 Method and apparatus for inducing dc voltage on wafer-facing electrode
10/09/2008WO2008121643A1 Methods and processing systems for using a gas cluster ion beam to offset systematic non-uniformities in workpieces processed in a process tool
10/09/2008WO2008121628A1 Apparatus and methods for systematic non-uniformity correction using a gas cluster ion beam
10/09/2008WO2008121620A1 Method of forming ultra-shallow junctions for semiconductor devices
10/09/2008WO2008121549A1 Techniques for improving the performance and extending the lifetime of an ion source with gas mixing
10/09/2008WO2008121511A1 Method and structure for reducing cracks in a dielectric layer in contact with metal
10/09/2008WO2008121500A1 Method for fabricating a low cost integrated circuit (ic) package
10/09/2008WO2008121479A2 Method and structure for making a top-side contact to a substrate
10/09/2008WO2008121463A1 Method for forming strained silicon nitride films and a device containing such films
10/09/2008WO2008121445A2 Parallel fabrication of nanogaps and devices thereof
10/09/2008WO2008121424A1 Process of filling deep vias for 3-d integration of substrates
10/09/2008WO2008121383A2 Curled semiconductor transistor
10/09/2008WO2008121327A1 Method of forming a semiconductor structure
10/09/2008WO2008121326A2 An soi transistor having drain and source regions of reduced length and a stressed dielectric material adjacent thereto
10/09/2008WO2008121290A1 Cleaning of bonded silicon electrodes
10/09/2008WO2008121289A1 Aluminum-plated components of semiconductor material processing apparatuses and methods of manufacturing the components
10/09/2008WO2008121288A1 Showerhead electrodes and showerhead electrode assemblies having low-particle performance for semiconductor material processing apparatuses
10/09/2008WO2008121287A1 Methodology for cleaning of surface metal contamination from electrode assemblies
10/09/2008WO2008121262A2 Glass-ceramic-based semiconductor-on-insulator structures and method for making the same
10/09/2008WO2008121254A2 High capacity pick and place process
10/09/2008WO2008121190A1 Proximity head with angled vacuum conduit system, apparatus and method
10/09/2008WO2008121172A2 Electrode isolation method and nanowire-based device having isolated electrode pair
10/09/2008WO2008121142A1 Method of forming bends in a wire loop
10/09/2008WO2008120946A1 Apparatus for supporting substrate and plasma etching apparatus having the same
10/09/2008WO2008120883A1 Apparatus for inspection of semiconductor device and method for inspection using the same
10/09/2008WO2008120881A1 System for vision inspection of semiconductor device
10/09/2008WO2008120876A1 Apparatus for transfer semiconductor packages
10/09/2008WO2008120837A1 Rectangular gate valve
10/09/2008WO2008120794A1 Method of cleaning powdery source supply system, storage medium, substrate treating system and method of substrate treatment
10/09/2008WO2008120785A1 Exposure apparatus and exposure method
10/09/2008WO2008120716A1 Substrate processing apparatus, substrate processing method and computer readable storage medium
10/09/2008WO2008120715A1 Substrate processing apparatus and method for stabilizing status in processing chamber of the substrate processing apparatus
10/09/2008WO2008120705A1 Semiconductor device
10/09/2008WO2008120628A1 Vacuum treating apparatus, method of operating the same and recording medium
10/09/2008WO2008120578A1 Metal film polishing pad and method for polishing metal film using the same
10/09/2008WO2008120568A1 Semiconductor integrated circuit device
10/09/2008WO2008120564A1 Mounting structure of electronic component and method for mounting electronic component
10/09/2008WO2008120531A1 Vaporizer, vaporization module, and film forming device
10/09/2008WO2008120528A1 Mounting apparatus for electronic part
10/09/2008WO2008120482A1 Magnetic random access memory
10/09/2008WO2008120480A1 Semiconductor integrated circuit
10/09/2008WO2008120469A1 Method for manufacturing silicon carbide semiconductor element
10/09/2008WO2008120467A1 Method for manufacturing semiconductor device
10/09/2008WO2008120459A1 Plasma processing device and plasma processing method
10/09/2008WO2008120458A1 Pedestal leveling method and pedestal leveling device
10/09/2008WO2008120432A1 Ohmic electrode structure and semiconductor element
10/09/2008WO2008120431A1 Soi substrate manufacturing method
10/09/2008WO2008120418A1 Semiconductor device, and its manufacturing method
10/09/2008WO2008120393A1 Information processor, information processor designing method, and information processor designing program
10/09/2008WO2008120391A1 Multi-column electron beam exposure device and multi-column electron beam exposure method
10/09/2008WO2008120387A1 Capacitor cell, integrated circuit, integrated circuit designing method, and integrated circuit manufacturing method
10/09/2008WO2008120384A1 Semiconductor device, and its manufacturing method
10/09/2008WO2008120378A1 Semiconductor device and its manufacturing method
10/09/2008WO2008120369A1 Semiconductor device and method of manufacturing the same
10/09/2008WO2008120348A1 Process for producing semiconductor device
10/09/2008WO2008120347A1 Semiconductor device and bias generating circuit
10/09/2008WO2008120335A1 Semiconductor device, and its manufacturing method
10/09/2008WO2008120323A1 Semiconductor device manufacturing method and wiring layer generation system
10/09/2008WO2008120302A1 Test device for semiconductor device
10/09/2008WO2008120294A1 Conveying device
10/09/2008WO2008120288A1 Ion implantation distribution computing method and program realizing this computing method
10/09/2008WO2008120286A1 Semiconductor storage unit, process for manufacturing the same, and method of forming package resin
10/09/2008WO2008120248A1 Device to transport support elements for electronic circuits, in particular photovoltaic cells, along a working line
10/09/2008WO2008120092A1 Doped substrate to be heated
10/09/2008WO2008120074A1 Improving the quality of a thin layer through high-temperature thermal annealing
10/09/2008WO2008119970A1 Functional protein crystals containing a core nano-particle and uses thereof
10/09/2008WO2008119582A1 Method for the production of a ceramic multi-layer circuit arrangement, and multi-layer circuit arrangement produced using said method
10/09/2008WO2008094464A3 Thick pseudomorphic nitride epitaxial layers
10/09/2008WO2008091910A3 Composite wafers having bulk-quality semiconductor layers
10/09/2008WO2008091494A3 Treatment of micropores in mica materials
10/09/2008WO2008076756A3 Method of making semiconductor-based electronic devices on a wire and by forming freestanding semiconductor structures, and devices that can be made thereby
10/09/2008WO2008070201A3 Electroadhesion
10/09/2008WO2008048862A3 Formation of high quality dielectric films of silicon dioxide for sti: usage of different siloxane-based precursors for harp ii - remote plasma enhanced deposition processes
10/09/2008WO2008042580A3 Offset correction techniques for positioning substrates
10/09/2008WO2008042199A8 Particles sensor integrated with substrate
10/09/2008WO2008039845A3 Fluorine plasma treatment of high-k gate stack for defect passivation
10/09/2008WO2008014197A3 Array-processed stacked semiconductor packages
10/09/2008WO2008011403A3 New scheme for copper filling in vias and trenches
10/09/2008WO2007149835A3 Photovoltaic cells
10/09/2008WO2007111837A3 Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material
10/09/2008WO2007108932A3 Technique for preparing precursor films and compound layers for thin film solar cell fabrication and apparatus corresponding thereto
10/09/2008WO2007097814A3 Semiconductor device having stressors and method for forming
10/09/2008WO2007024575A3 Low-noise semiconductor photodetectors
10/09/2008WO2005114719A3 Method of forming a recessed structure employing a reverse tone process
10/09/2008US20080250382 Semiconductor device manufacturing method
10/09/2008US20080250380 Method of OPC Model Building, Information-Processing Apparatus, and Method of Determining Process Conditions of Semiconductor Device
10/09/2008US20080249754 Generation of a library of periodic grating diffraction signals
10/09/2008US20080248728 Method for manufacturing polishing pad, polishing pad, and method for polishing wafer
10/09/2008US20080248727 Polishing Slurry
10/09/2008US20080248723 Polishing condition control apparatus and polishing condition control method of CMP apparatus
10/09/2008US20080248657 Method and system for thermally processing a plurality of wafer-shaped objects
10/09/2008US20080248656 Methods for stripping photoresist and/or cleaning metal regions
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