| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 10/22/2008 | CN100428429C Production of manganese-doped zinc oxide thin-film and nano-column by electrochemical deposition |
| 10/22/2008 | CN100428428C Method of forming flash memory process |
| 10/22/2008 | CN100428427C Micro-electro-mechanical element and its manufacturing method and P type channel transistor manufacturing method |
| 10/22/2008 | CN100428426C Structure of metal-oxide-semiconductor transistor and process for forming same |
| 10/22/2008 | CN100428425C Gate-cathode structure design method for gate pole converting thyristor GCT |
| 10/22/2008 | CN100428424C Doped nitride film, doped oxide film and other doped films |
| 10/22/2008 | CN100428423C Sedimentation technique of reducing SiC dielectric constant |
| 10/22/2008 | CN100428422C Device and methodology for reducing effective dielectric constant in semiconductor devices |
| 10/22/2008 | CN100428421C Dry process for removing excessive metal in silicide generating procedure |
| 10/22/2008 | CN100428420C Dry method photoresist removing technology used after Z3 MS etching |
| 10/22/2008 | CN100428419C Method for cleaning gallium arsenide crystal chip |
| 10/22/2008 | CN100428418C Method for cutting wafer |
| 10/22/2008 | CN100428417C High dielectric grid medium Al2O3/BaO/Al2O3 structure and preparing method thereof |
| 10/22/2008 | CN100428416C Method for producing semiconductor device |
| 10/22/2008 | CN100428415C Method for preparing nano electrode based on silicon nitride hollowed-out mask |
| 10/22/2008 | CN100428414C Method for forming low-stress multi-layer metallized structure and leadless solder end electrode |
| 10/22/2008 | CN100428413C Ion injection simulation method |
| 10/22/2008 | CN100428412C Substrate processing system |
| 10/22/2008 | CN100428411C Silicon epitaxial wafer manufacturing method and silicon epitaxial wafer |
| 10/22/2008 | CN100428410C Homogeneity improving method and device for hydride gaseous epitaxially groven GaN material |
| 10/22/2008 | CN100428409C Nitride-based semiconductor substrate and semiconductor device |
| 10/22/2008 | CN100428408C Electrostatic discharge protection method and structure for photomask |
| 10/22/2008 | CN100428407C Making method for pliable array base plate |
| 10/22/2008 | CN100428406C Processing method for the semiconductor pipe core assembly crystal surface |
| 10/22/2008 | CN100428405C The cleaning method for removing the impure ion from the semiconductor pipe core assembly |
| 10/22/2008 | CN100428404C Enclosed infrared heating device for semiconductor chip |
| 10/22/2008 | CN100428403C Optimization method of the experimental parameters in the direct key bonding process of the wafer |
| 10/22/2008 | CN100428402C Method for detaching a semiconductor chip from a foil and apparatus for mounting semiconductor chips |
| 10/22/2008 | CN100428401C Method and system for treating similarity of semiconductor device finished product ratio |
| 10/22/2008 | CN100428400C Apparatus and method for thermally isolating a heat chamber |
| 10/22/2008 | CN100428367C Aluminum alloy wiring material having high resistance to heat and target material |
| 10/22/2008 | CN100428319C Liquid crystal display device |
| 10/22/2008 | CN100428092C Method and system for thermal process control |
| 10/22/2008 | CN100428057C Air float support base for regulating air diaphragm two-way rigidity |
| 10/22/2008 | CN100428055C Photolithographic process, photomask and manufacturing thereof |
| 10/22/2008 | CN100428038C Liquid crystal display device and method for fabricating the same |
| 10/22/2008 | CN100428035C Liquid crystal display device and method of manufacturing the same |
| 10/22/2008 | CN100428034C Liquid crystal display device and fabricating method thereof |
| 10/22/2008 | CN100428032C Liquid crystal display device and method for fabricating the same and display device |
| 10/22/2008 | CN100428014C Substrate for a display apparatus, display device, colour filter substrate and liquid crystal display device and producing method thereof |
| 10/22/2008 | CN100428010C Fabricating method of flexible display |
| 10/22/2008 | CN100427994C Optical element, optical system, laser device, exposure device, mask testing device and high polymer crystal processing device |
| 10/22/2008 | CN100427963C Semiconductor test management system and method |
| 10/22/2008 | CN100427881C High seeparation sharpness gasometer-type approach sensor |
| 10/22/2008 | CN100427879C Corrugation flaw inspection mask, corrugation flaw inspection device and method and method for manufacturing photo mask |
| 10/22/2008 | CN100427519C Resin for resist, positive resist composition, and method of forming resist pattern |
| 10/22/2008 | CN100427266C Method and structure for aluminium chemical mechanical polishing and protective layer |
| 10/22/2008 | CN100427258C Wire bonder |
| 10/22/2008 | CN100427225C Universal alternation kit for testing classifier of ball grade package |
| 10/21/2008 | US7441168 Fault detecting method and layout method for semiconductor integrated circuit |
| 10/21/2008 | US7440881 Adaptive correlation of pattern resist structures using optical metrology |
| 10/21/2008 | US7440860 Sequential unique marking |
| 10/21/2008 | US7440605 Defect inspection apparatus, defect inspection method and program |
| 10/21/2008 | US7440350 Semiconductor integrated circuit device |
| 10/21/2008 | US7440334 Multi-transistor memory cells |
| 10/21/2008 | US7440255 Capacitor constructions and methods of forming |
| 10/21/2008 | US7440182 Multilayer mirror, method for manufacturing the same, and exposure equipment |
| 10/21/2008 | US7440105 Continuously varying offset mark and methods of determining overlay |
| 10/21/2008 | US7440104 Exposure system, test mask for monitoring polarization, and method for monitoring polarization |
| 10/21/2008 | US7440083 Printing a mask with maximum possible process window through adjustment of the source distribution |
| 10/21/2008 | US7440082 Method of predicting and minimizing model OPC deviation due to mix/match of exposure tools using a calibrated eigen decomposition model |
| 10/21/2008 | US7439654 Transmission of ultrasonic energy into pressurized fluids |
| 10/21/2008 | US7439627 Post passivation interconnection schemes on top of the IC chips |
| 10/21/2008 | US7439626 Post passivation interconnection schemes on top of IC chip |
| 10/21/2008 | US7439623 Semiconductor device having via connecting between interconnects |
| 10/21/2008 | US7439622 Semiconductor device |
| 10/21/2008 | US7439619 Electronic package structure and the packaging process thereof |
| 10/21/2008 | US7439616 Miniature silicon condenser microphone |
| 10/21/2008 | US7439614 Circuit device with dummy elements |
| 10/21/2008 | US7439613 Substrate based unmolded package |
| 10/21/2008 | US7439612 Integrated circuit package structure with gap through lead bar between a die edge and an attachment point corresponding to a conductive connector |
| 10/21/2008 | US7439609 Doping of gallium nitride by solid source diffusion and resulting gallium nitride structures |
| 10/21/2008 | US7439607 Beta control using a rapid thermal oxidation |
| 10/21/2008 | US7439604 Method of forming dual gate dielectric layer |
| 10/21/2008 | US7439603 Non-volatile memory device and fabricating method thereof |
| 10/21/2008 | US7439602 Semiconductor device and its manufacturing method |
| 10/21/2008 | US7439596 Transistors for semiconductor device and methods of fabricating the same |
| 10/21/2008 | US7439593 Semiconductor device having silicide formed with blocking insulation layer |
| 10/21/2008 | US7439587 Semiconductor device and method of manufacturing the same |
| 10/21/2008 | US7439586 Liquid crystal display device and fabricating method thereof |
| 10/21/2008 | US7439575 Protection against in-process charging in silicon-oxide-nitride-oxide-silicon (SONOS) memories |
| 10/21/2008 | US7439574 Silicon/oxide/nitride/silicon nonvolatile memory with vertical channels |
| 10/21/2008 | US7439573 Semiconductor device including transistor with composite gate structure and transistor with single gate structure, and method for manufacturing the same |
| 10/21/2008 | US7439572 Stacked gate memory cell with erase to gate, array, and method of manufacturing |
| 10/21/2008 | US7439571 Method for fabricating metal gate structures |
| 10/21/2008 | US7439569 Semiconductor device manufacturing method and semiconductor device |
| 10/21/2008 | US7439567 Contactless nonvolatile memory array |
| 10/21/2008 | US7439564 Methods of forming capacitor constructions |
| 10/21/2008 | US7439555 III-nitride semiconductor device with trench structure |
| 10/21/2008 | US7439554 Semiconductor device and method for fabricating the same |
| 10/21/2008 | US7439546 Semiconductor light emitting device, its manufacturing method, semiconductor device and its manufacturing method |
| 10/21/2008 | US7439543 Semiconductor device comprising thin film transistor comprising conductive film having tapered edge |
| 10/21/2008 | US7439531 Alignment systems and methods for lithographic systems |
| 10/21/2008 | US7439525 Demagnification measurement method for charged particle beam exposure apparatus, stage phase measurement method for charged particle beam exposure apparatus, control method for charged particle beam exposure apparatus, and charged particle beam exposure apparatus |
| 10/21/2008 | US7439506 Method and an apparatus of an inspection system using an electron beam |
| 10/21/2008 | US7439505 Scanning electron microscope |
| 10/21/2008 | US7439503 Charged particle beam irradiation method, method of manufacturing semiconductor device and charged particle beam apparatus |
| 10/21/2008 | US7439451 Tape carrier |
| 10/21/2008 | US7439334 controll by modifying the N-terminal part of ferritin with a peptide which recognizes and binds to portion of the substrate consisting of titanium, heating to decompose the titanium-binding ferritin, arranging inorganic fe2o3 particles on substrate with high accuracy; biosensors or biochips |
| 10/21/2008 | US7439198 Method for fabricating a buried metallic layer in a semiconductor body and semiconductor component having a buried metallic layer |