| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/13/2009 | US7476564 Flip-chip packaging process using copper pillar as bump structure |
| 01/13/2009 | US7476563 Method of packaging a device using a dielectric layer |
| 01/13/2009 | US7476562 Gapless microlens array and method of fabrication |
| 01/13/2009 | US7476561 Method of making microminiature moving device |
| 01/13/2009 | US7476560 Photoelectric conversion device, and process for its fabrication |
| 01/13/2009 | US7476559 Thin film pattern is formed forming a hexamethyl disilazane layer on the substrate, the thin film pattern includes a first domain area into which the functional liquid is infused and a second domain area on which the functional liquid infused into the first domain area flows |
| 01/13/2009 | US7476558 Method for manufacturing selective area grown stacked-layer electro-absorption modulated laser structure |
| 01/13/2009 | US7476557 Roll-to-roll fabricated light sheet and encapsulated semiconductor circuit devices |
| 01/13/2009 | US7476556 Systems and methods for plasma processing of microfeature workpieces |
| 01/13/2009 | US7476555 Method of chip manufacturing |
| 01/13/2009 | US7476554 Substrate processing method |
| 01/13/2009 | US7476552 Method of reworking a semiconductor structure |
| 01/13/2009 | US7476488 Photosensitive composition and method for forming pattern using same |
| 01/13/2009 | US7476487 Inorganic nanocrystals surface-coordinated with a compound containing a photosensitive carbon to carbon double bond functional group is used for photolithographic process to form a pattern; curable with a curing agents; photomasking; simple method; organic-inorganic hybrid electroluminescent devices |
| 01/13/2009 | US7476485 Resist lower layer film material and method for forming a pattern |
| 01/13/2009 | US7476473 Process control method, a method for forming monitor marks, a mask for process control, and a semiconductor device manufacturing method |
| 01/13/2009 | US7476471 Based on extreme ultraviolet radiation energies; lithography; semiconductors |
| 01/13/2009 | US7476470 Method for manufacturing thin film semiconductor device and method for forming resist pattern thereof |
| 01/13/2009 | US7476454 controlled roughness; head flying stability ; high recording density |
| 01/13/2009 | US7476413 Low magnetization materials for high performance magnetic memory devices |
| 01/13/2009 | US7476412 Method for the metalization of an insulator and/or a dielectric |
| 01/13/2009 | US7476341 Process for producing photo-conductor layers for constituting radiation imaging panels |
| 01/13/2009 | US7476329 Methods for contacting conducting layers overlying magnetoelectronic elements of MRAM devices |
| 01/13/2009 | US7476306 Method and apparatus for electroplating |
| 01/13/2009 | US7476301 Procedure and device for the production of a plasma |
| 01/13/2009 | US7476291 High chamber temperature process and chamber design for photo-resist stripping and post-metal etch passivation |
| 01/13/2009 | US7476290 Substrate processing apparatus and substrate processing method |
| 01/13/2009 | US7476073 Vacuum processing method |
| 01/13/2009 | US7475803 Solder ball loading method and solder ball loading unit background of the invention |
| 01/08/2009 | WO2009006263A2 Forming complimentary metal features using conformal insulator layer |
| 01/08/2009 | WO2009006197A1 Method of forming a guard ring or contact to an soi substrate |
| 01/08/2009 | WO2009006183A2 Diffusion control in heavily doped substrates |
| 01/08/2009 | WO2009006182A1 Suppression of oxygen precipitation in heavily doped single crystal silicon substrates |
| 01/08/2009 | WO2009006175A2 Test structure, test structure formation and mask reuse in semiconductor processing |
| 01/08/2009 | WO2009006152A2 Method and apparatus for a voltage/current probe test arrangements |
| 01/08/2009 | WO2009006151A2 Arrays of inductive elements for minimizing radial non-uniformity in plasma |
| 01/08/2009 | WO2009006149A1 Distributed power arrangements for localizing power delivery |
| 01/08/2009 | WO2009006147A2 Integrated steerability array arrangement for minimizing non-uniformity |
| 01/08/2009 | WO2009006127A2 Method for forming a metal siliicide |
| 01/08/2009 | WO2009006072A2 Methods and arrangements for plasma processing system with tunable capacitance |
| 01/08/2009 | WO2009006062A1 Methods and apparatus for substrate processing |
| 01/08/2009 | WO2009006038A1 Edge ring arrangements for substrate processing |
| 01/08/2009 | WO2009005993A2 Method and apparatus for a highly collimated light collection arrangement |
| 01/08/2009 | WO2009005991A1 Plasma processing with enhanced charge neutralization and process control |
| 01/08/2009 | WO2009005959A1 Techniques for handling substrates |
| 01/08/2009 | WO2009005921A2 Polyceramic e-chuck |
| 01/08/2009 | WO2009005904A1 Method for forming a dual metal gate structure |
| 01/08/2009 | WO2009005903A1 Method for forming a dual metal gate structure |
| 01/08/2009 | WO2009005902A1 Method for forming gate structures |
| 01/08/2009 | WO2009005863A2 Fabricating complex micro and nanoscale structures, electronic devices, and components |
| 01/08/2009 | WO2009005862A2 Novel methods for making and using halosilylgermanes |
| 01/08/2009 | WO2009005843A1 Carrier used for deposition of materials on a non-planar surface |
| 01/08/2009 | WO2009005788A2 A technique for forminig an interlayer dielectric material of increased reliability above a structure including closely spaced lines |
| 01/08/2009 | WO2009005787A1 Blocking pre-amorphization of a gate electrode of a transistor |
| 01/08/2009 | WO2009005785A1 Reducing transistor junction capacitance by recessing drain and source regions |
| 01/08/2009 | WO2009005751A1 Fabricating method for quantum dot of active layer of led by nano-lithography |
| 01/08/2009 | WO2009005710A1 Fabricating method of nano-ring structure by nano-lithography |
| 01/08/2009 | WO2009005699A1 Memory cell that employs a selectively grown reversible resistance-switching element and methods of forming the same |
| 01/08/2009 | WO2009005624A2 Inductively coupled dual zone processing chamber with single planar antenna |
| 01/08/2009 | WO2009005477A1 Separation of semiconductor devices |
| 01/08/2009 | WO2009005462A1 Low resistance through-wafer via |
| 01/08/2009 | WO2009005394A1 Device for measuring mechanical quantities (variants) and a method for the production thereof |
| 01/08/2009 | WO2009005295A2 Nanostructure, a method for fabricating the same, and fed, blu and fe type lamp with the nanostructure |
| 01/08/2009 | WO2009005257A2 Method for manufacturing led package |
| 01/08/2009 | WO2009005222A1 Vision inspection system for semiconductor devices |
| 01/08/2009 | WO2009005214A1 Probe assembly and manufacturing method thereof |
| 01/08/2009 | WO2009005183A1 Batch type ashing apparatus using remote radical generator |
| 01/08/2009 | WO2009005148A1 Surface treatment apparatus |
| 01/08/2009 | WO2009005143A1 Polishing liquid for metal film and polishing method |
| 01/08/2009 | WO2009005134A1 Diamond semiconductor device |
| 01/08/2009 | WO2009005130A1 Adhesive composition, bonded member made with adhesive composition, support member for semiconductor mounting, semiconductor device, and processes for producing these |
| 01/08/2009 | WO2009005126A1 Iii nitride semiconductor light emitting element, method for manufacturing the iii nitride semiconductor light emitting element, and lamp |
| 01/08/2009 | WO2009005087A1 Quantitative evaluation device of atomic vacancies existing in silicon wafer, method for the device, silicon wafer manufacturing method, and thin-film oscillator |
| 01/08/2009 | WO2009005065A1 Projection optical system |
| 01/08/2009 | WO2009005027A1 Substrate transfer robot and vacuum processing apparatus provided with the same |
| 01/08/2009 | WO2009005014A1 Resist stripping composition |
| 01/08/2009 | WO2009004988A1 System for continuously using resist stripper liquid based on nanofiltration |
| 01/08/2009 | WO2009004977A1 Substrate treatment apparatus, substrate treatment method and storage medium |
| 01/08/2009 | WO2009004968A1 Testing apparatus |
| 01/08/2009 | WO2009004964A1 Ultrasonic rinsing device, and ultrasonic rinsing method |
| 01/08/2009 | WO2009004919A1 Semiconductor device and manufacturing method thereof |
| 01/08/2009 | WO2009004906A1 Substrate treatment method, substrate treatment apparatus, reducing agent sheet, and computer-readable storage medium |
| 01/08/2009 | WO2009004889A1 Thin film silicon wafer and its fabricating method |
| 01/08/2009 | WO2009004883A1 Levitation transportation device |
| 01/08/2009 | WO2009004882A1 Levitation device and levitation transportation device |
| 01/08/2009 | WO2009004858A1 Levitation transportation device |
| 01/08/2009 | WO2009004852A1 Method for removing foreign matter from glass substrate surface and method for processing glass substrate surface |
| 01/08/2009 | WO2009004793A1 Semiconductor device, semiconductor device manufacturing method and image display device |
| 01/08/2009 | WO2009004243A2 Assemblage of radiofrequency chips |
| 01/08/2009 | WO2009004117A1 Method in depositing metal oxide materials |
| 01/08/2009 | WO2009003972A1 A method for producing a copper contact |
| 01/08/2009 | WO2009003896A1 Hybrid fully-silicided (fusi)/partially-silicided (pasi) structures |
| 01/08/2009 | WO2009003895A1 Integrated fin-local interconnect structure |
| 01/08/2009 | WO2009003646A2 Method and apparatus for drying a substrate surface |
| 01/08/2009 | WO2009003565A1 Method for packing semiconductor components, and product produced according to the method |
| 01/08/2009 | WO2009003435A1 Method for producing optoelectronic components, and optoelectronic component |
| 01/08/2009 | WO2009003343A1 Methods and apparatus for cleaning semiconductor wafers |
| 01/08/2009 | WO2008137738A3 Method of forming group iv semiconductor junctions using laser processing |
| 01/08/2009 | WO2008133767A3 Polysilicon planarization solution for planarizing low temperature polysilicon thin film panels |
| 01/08/2009 | WO2008132703A8 High-voltage metal-oxide semiconductor device and corresponding manufacturing method and implantation mask |