Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2010
01/07/2010US20100001329 Method of manufacturing semiconductor integrated circuit device having capacitor element
01/07/2010US20100001326 One transistor dram cell structure and method for forming
01/07/2010US20100001325 Semiconductor device and method for manufacturing the same
01/07/2010US20100001324 Semiconductor device with a superparaelectric gate insulator
01/07/2010US20100001323 Method for manufacturing semiconductor device and semiconductor device
01/07/2010US20100001322 Semiconductor device
01/07/2010US20100001320 Thin film transistor array devices
01/07/2010US20100001319 Method for Making a Heterojunction Bipolar Transistor
01/07/2010US20100001318 Field effect transistor, method of manufacturing the same, and semiconductor device
01/07/2010US20100001317 Cmos transistor and the method for manufacturing the same
01/07/2010US20100001316 Epitaxial lift off stack having a non-uniform handle and methods thereof
01/07/2010US20100001310 Light emitting diode and manufacturing method thereof
01/07/2010US20100001307 Encapsulation for electronic and/or optoelectronic device
01/07/2010US20100001301 Organic light emitting device, method for producing thereof and array of organic light emitting devices
01/07/2010US20100001294 LED module having a heat sink
01/07/2010US20100001291 Electronic device and manufacturing thereof
01/07/2010US20100001290 Bipolar semiconductor device and manufacturing method thereof
01/07/2010US20100001288 Low Etch Pit Density (EPD) Semi-Insulating GaAs Wafers
01/07/2010US20100001287 Thin film transistor, method of fabricating the same, and organic light emitting diode display device including the same
01/07/2010US20100001286 Thin film transistor array substrate and fabricating method thereof
01/07/2010US20100001285 Semiconductor Structure and Method for Manufacturing the Same
01/07/2010US20100001284 Method of manufacturing transistor and method of manufacturing organic electroluminescence display using the same
01/07/2010US20100001283 Triggered silicon controlled rectifier for rf esd protection
01/07/2010US20100001282 Tft floating gate memory cell structures
01/07/2010US20100001281 Tft sas memory cell structures
01/07/2010US20100001280 Tft monos or sonos memory cell structures
01/07/2010US20100001278 Thin film transistor (tft) array substrate and fabricating method thereof that protect the tft and a pixel electrode without a protective film
01/07/2010US20100001277 Thin film transistor array and method of manufacturing the same
01/07/2010US20100001276 Thin film transistor array panel and manufacturing method of the same
01/07/2010US20100001275 Thin-film transistor substrate and method of fabricating the same
01/07/2010US20100001274 Capping Layers for Metal Oxynitride TFTS
01/07/2010US20100001273 Semiconductor device, production method thereof, and electronic device
01/07/2010US20100001272 Thin film transistors using multiple active channel layers
01/07/2010US20100001271 Semiconductor device with amorphous silicon mas memory cell structure and manufacturing method thereof
01/07/2010US20100001270 Amorphous silicon monos or mas memory cell structure with otp function
01/07/2010US20100001269 Methods of Combinatorial Processing for Screening Multiple Samples on a Semiconductor Substrate
01/07/2010US20100001268 Semiconductor Device and Method of Shunt Test Measurement for Passive Circuits
01/07/2010US20100001267 Nram arrays with nanotube blocks, nanotube traces, and nanotube planes and methods of making same
01/07/2010US20100001266 Thin film transistor, method of fabricating the same, and organic light emitting diode display device including the same
01/07/2010US20100001265 Thin film transistor, method of fabricating the same, and organic light emitting diode display device including the same
01/07/2010US20100001260 Self-aligned nanotube field effect transistor and method of fabricating same
01/07/2010US20100001256 White light emitting devices
01/07/2010US20100001255 Selective nanotube formation and related devices
01/07/2010US20100001249 Semiconductor device enabling further microfabrication
01/07/2010US20100001248 Phase-change memory cell with a patterned layer
01/07/2010US20100001188 Method of construction of CTE matching structure with wafer processing and resulting structure
01/07/2010US20100001176 Optical die with variable refractive index, corrective of negative distortion, and method of fabricating such a die
01/07/2010US20100001174 Semiconductor device, its manufacturing method and optical pickup module
01/07/2010US20100001168 Damping apparatus and exposure apparatus
01/07/2010US20100000877 with a polishing pad having thin cellular polymeric layer overlying a metal or alloy conductive substrate; improved electrical and thermal capabilities and control; porosity
01/07/2010US20100000871 Copper anode with a purity of 99.9-99.9999 wt % excluding gas components, and a crystal grain diameter of 100-2000 mu m.; generation of sludge in a copper sulfate bath is inhibited
01/07/2010US20100000858 Substrate Holder and Plating Apparatus
01/07/2010US20100000684 Dry etching apparatus
01/07/2010US20100000683 Showerhead electrode
01/07/2010US20100000682 Processing system
01/07/2010US20100000466 P-Type Semiconductor Zinc Oxide Films Process for Preparation Thereof, and Pulsed Laser Deposition Method Using Transparent Substrates
01/07/2010US20100000083 Metal-containing resin particle, resin particle, electronic circuit substrate, and method of producing electronic circuit
01/07/2010DE112008000638T5 Halbleitereinheit mit selbstausgerichteten epitaxialen Verlängerungen von Quellen und Senken Semiconductor device with self-aligned epitaxial extensions of sources and sinks
01/07/2010DE112008000396T5 Endpolierverfahren für Einkristall-Siliziumwafer und Einkristall-Siliziumwafer Endpolierverfahren for single crystal silicon wafers and single-crystal silicon wafer
01/07/2010DE112008000234T5 Vorgeformte Clip-Struktur Preformed clip structure
01/07/2010DE10355575B4 Verfahren zur Herstellung von Seitenwandabstandselementen für ein Schaltungselement durch Erhöhen einer Ätzselektivität Process for the preparation of sidewall spacers for a circuit element by increasing a etching selectivity
01/07/2010DE10221808B4 Verfahren zur Herstellung eines lateralen MOSFETs Process for the preparation of a lateral MOSFET
01/07/2010DE10210900B4 Halbleiterstruktur mit SOI-Struktur und Verfahren zu seiner Herstellung Semiconductor structure having SOI structure and process for its preparation
01/07/2010DE102009030471A1 Chuck zur Aufnahme und Halterung eines Testsubstrats und eines Kalibriersubstrats Chuck for receiving and holding a calibration substrate and a test substrate
01/07/2010DE102009027008A1 Verfahren zur Herstellung einer Materialschicht in einem Halbleiterkörper A method for producing a material layer in a semiconductor body
01/07/2010DE102009011875A1 Speicherzellenanordnungen und Verfahren zum Herstellen einer Speicherzellenanordnung Memory cell arrays and methods for fabricating a memory cell arrangement
01/07/2010DE102008061519A1 Method for producing semiconductor disc made silicon with internal getter, comprises heating the disc by rapid thermal annealing at a target temperature, holding the disc at the target temperature for five seconds and cooling the disc
01/07/2010DE102008046400A1 CMOS-Bauelement mit MOS-Transistoren mit abgesenkten Drain- und Sourcebereichen und einem Si/Ge-Material in den Drain- und Sourcebereichen des PMOS-Transistors CMOS device with MOS transistors with lowered drain and source regions and a Si / Ge material in the drain and source regions of the PMOS transistor
01/07/2010DE102008030856A1 Schwellwerteinstellung für MOS-Elemente durch Anpassen einer Abstandshalterbreite vor der Implantation Threshold value for MOS devices by fitting a spacer width prior to implantation
01/07/2010DE102008030854A1 CMOS-Bauelement mit MOS-Transistoren mit abgesenkten Drain- und Source-Bereichen und nicht-konformen Metallsilizidgebieten CMOS device with MOS transistors with lowered drain and source regions and non-conformal metal silicide
01/07/2010DE102008030852A1 Kontaktgräben zur besseren Verspannungsübertragung in Transistoren mit geringem Abstand Contact trenches for better stress transfer transistors in a small distance
01/07/2010DE102008030849A1 Reduzierung der Leckströme in dielektrischen Materialien mit Metallgebieten und einer Metalldeckschicht in Halbleiterbauelementen Reduction of the leakage currents in dielectric materials with metal regions and a metal coating layer in semiconductor devices
01/07/2010DE102008030545A1 Vorrichtung und Verfahren zur berührungslosen Ankontaktierung von leitfähigen Strukturen, insbesondere von Dünnschicht-Transistor-Flüssigkristallanzeigen (Thin Film Transistor Liquid Crystal Displays) Apparatus and method for non-contact of contacting of the conductive structures, in particular of thin film transistor-liquid crystal displays (Thin Film Transistor Liquid Crystal Displays)
01/07/2010DE102007003197B4 Halbleiterbauelement vom Grabenisolationstyp und Herstellungsverfahren The semiconductor device of grave insulation type and production methods
01/07/2010DE102006058185B4 EEPROM und Herstellungsverfahren EEPROM and manufacturing processes
01/07/2010DE102006046853B4 Randkonstruktion für ein Halbleiterbauelement und Verfahren zur Herstellung derselben Rim structure for a semiconductor device and method of manufacturing the same
01/07/2010DE102006046820B4 Verfahren zum Packen im Chipmassstab für integrierte Schaltungen The method of packing in chip scale integrated circuit
01/07/2010DE102006044369B4 Verfahren zum Herstellen eines Substrates mit einem Hohlraum A method of manufacturing a substrate with a cavity
01/07/2010DE102005049998B4 Dielektrische Mehrfachschicht, mikroelektronisches Bauelement, Kondensator und Herstellungsverfahren Dielectric multilayer microelectronic device, capacitor and manufacturing method
01/07/2010DE102005032547B4 Wafer-Klemmanordnung zur Aufnahme eines Wafers während eines Abscheidungsverfahrens Wafer clamp assembly for holding a wafer during a deposition method
01/07/2010DE102004017411B4 In-situ-Metallbarriereablagerung für Sputterätzen auf einer Verbindungsstruktur In-situ metal deposition barrier for sputter etching on a compound of structure
01/07/2010DE10165028B4 Halbleitervorrichtung mit einem Halbleitersubstrat und einem Film mit niedriger Dielektrizitätskonstante A semiconductor device comprising a semiconductor substrate and a low dielectric constant film
01/07/2010CA2728498A1 Method of preparing an electrical insulation film and application for the metallization of through-vias
01/06/2010EP2141750A2 Method of light induced plating on semiconductors
01/06/2010EP2141742A1 Semiconductor device, and its manufacturing method
01/06/2010EP2141741A2 Electronic circuit comprising a diode connected MOS transistor with enhanced efficiency
01/06/2010EP2141739A2 System and method for substrate transport
01/06/2010EP2141738A2 Chip-level underfill process and structures
01/06/2010EP2141737A1 Polishing apparatus and program for the same
01/06/2010EP2141736A1 Pressure-sensitive adhesive sheet for water jet laser dicing
01/06/2010EP2141735A2 Method for cleaning photovoltaic module and cleaning apparatus
01/06/2010EP2141734A2 Purge Apparatus
01/06/2010EP2141733A1 System and method for processing substrates with detachable mask
01/06/2010EP2141725A1 Surface emission type electron source and drawing device
01/06/2010EP2141022A2 Composite semiconductor device, print head and image forming apparatus
01/06/2010EP2140974A1 Synthetic grindstone
01/06/2010EP2140504A1 Method for obtaining high-quality boundary for semiconductor devices fabricated on a partitioned substrate
01/06/2010EP2140490A1 Fabricating a contact rhodium structure by electroplating and electroplating composition
01/06/2010EP2140488A1 Method for transferring an epitaxial layer
01/06/2010EP2140487A2 Hybrid substrates and methods for forming such hybrid substrates