Patents
Sitemap › H01 - Basic electric elements › H01L - Semiconductor devices; Electric solid state devices not otherwise provided for › H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
12/2009
12/30/2009WO2009157484A1 Annealing apparatus
12/30/2009WO2009157479A1 Switching element and switching element manufacturing method
12/30/2009WO2009157447A1 Substrate provided with transparent conductive film, thin film photoelectric conversion device and method for manufacturing the substrate
12/30/2009WO2009157439A1 Sputtering apparatus and sputtering method
12/30/2009WO2009157438A1 Cathode unit and spattering device having same
12/30/2009WO2009157413A1 Semiconductor element and method for manufacturing same
12/30/2009WO2009157373A1 Method and apparatus for laser annealing
12/30/2009WO2009157369A1 Method for manufacturing soi substrate
12/30/2009WO2009157341A1 Sputtering device and recording medium whereon a control program thereof is recorded
12/30/2009WO2009157333A1 Shallow trench isolation structure and method for forming the shallow trench isolation structure
12/30/2009WO2009157326A1 Titanium complex, method for production of the complex, titanium-containing thin film, and method for production of the thin film
12/30/2009WO2009157321A1 Support body and substrate storage container
12/30/2009WO2009157299A1 Semiconductor device and method for manufacturing the same
12/30/2009WO2009157247A1 Wiring board and liquid crystal display device
12/30/2009WO2009157237A1 Semiconductor device and method for manufacturing the same
12/30/2009WO2009157228A1 Sputtering apparatus, sputtering method and light emitting element manufacturing method
12/30/2009WO2009157193A1 Wafer frame
12/30/2009WO2009157186A1 Magnetic field generating apparatus and plasma processing apparatus
12/30/2009WO2009157182A1 Semiconductor inspecting apparatus
12/30/2009WO2009157160A1 Packaging structure and method for manufacturing packaging structure
12/30/2009WO2009157137A1 Method of producing abrasive head and abrasive apparatus
12/30/2009WO2009157130A1 Joint structure and electronic component
12/30/2009WO2009157122A1 Mems device, mems device module and acoustic transducer
12/30/2009WO2009157114A1 Semiconductor device and method for manufacturing same
12/30/2009WO2009157113A1 Semiconductor device and method for manufacturing the same
12/30/2009WO2009157105A1 Apparatus for inspecting silicon wafer defect and method for inspecting silicon wafer defect
12/30/2009WO2009157101A1 Magnetic memory element and its driving method and nonvolatile memory device
12/30/2009WO2009157100A1 Spin valve recording element and storage device
12/30/2009WO2009157084A1 Vacuum processing apparatus and method for operating vacuum processing apparatus
12/30/2009WO2009157060A1 Nitrogen radical generator, nitriding treatment apparatus, nitrogen radical generating method, and nitriding treatment method
12/30/2009WO2009157054A1 Multicolumn electron beam exposure apparatus and magnetic field generating apparatus
12/30/2009WO2009157042A1 Semiconductor device and method for manufacturing the same
12/30/2009WO2009157040A1 Semiconductor device and process for producing the semiconductor device
12/30/2009WO2009156954A1 Interfacial layer regrowth control in high-k gate structure for field effect transistor
12/30/2009WO2009156321A1 Method for preparing dye sensitised solar cells
12/30/2009WO2009156038A1 Illumination optical unit for microlithography
12/30/2009WO2009156037A1 Mixtures of precursors for producing ceramic layers by means of mocvd
12/30/2009WO2009155851A1 A method and device for testing the paramaters of circuit
12/30/2009WO2009155782A1 Detergent for removing photoresist
12/30/2009WO2009155717A2 Device for structuring a solar module
12/30/2009WO2009137210A3 Methods of forming isolated active areas, trenches, and conductive lines in semiconductor structures and semiconductor structures including the same
12/30/2009WO2009137199A3 Boron nitride and boron-nitride derived materials deposition method
12/30/2009WO2009136974A3 Thick-shell nanocrystal quantum dots
12/30/2009WO2009136095A3 Method for making complementary p and n mosfet transistors, electronic device including such transistors, and processor including at least one such device
12/30/2009WO2009135188A3 Led structure to increase brightness
12/30/2009WO2009134345A3 Gas bearing eletrostatic chuck
12/30/2009WO2009131889A9 Method and apparatus for excimer curing
12/30/2009WO2009126351A3 Silicon laser-quantum well intermixing wafer bonded integration platform
12/30/2009WO2009126204A3 High aspect ratio openings
12/30/2009WO2009120612A3 Semiconductor devices having tensile and/or compressive strain and methods of manufacturing and design structure
12/30/2009WO2009120353A3 Semiconductor buried grating fabrication method
12/30/2009WO2009120000A3 Substrate processing apparatus and method
12/30/2009WO2009117255A3 Tungsten liner for aluminum-based electromigration resistant interconnect structure
12/30/2009WO2009111668A9 Use of dopants with different diffusivities for solar cell manufacture
12/30/2009WO2009110872A3 Semiconductor-based, large-area, flexible, electronic devices on {110}<100> oriented substrates
12/30/2009WO2009108335A3 Hermetically-sealed packages for electronic components having reduced unused areas
12/30/2009WO2009108173A3 Methods for formation of substrate elements
12/30/2009WO2009091333A3 Method and apparatus for laminating a bumped wafer
12/30/2009WO2009025961A3 Semiconductor component and method of manufacture
12/30/2009WO2008157146A3 Method and system for removing tape from substrates
12/30/2009WO2008137811A3 Print processing for patterned conductor, semiconductor and dielectric materials
12/30/2009WO2008134686A3 Silicon germanium heterojunction bipolar transistor structure and method
12/30/2009WO2008128039A3 Cluster ion implantation for defect engineering
12/30/2009WO2008121976A3 Method to fabricate iii-n semiconductor devices on the n-face of layers which are grown in the iii-face direction using wafer bonding and substrate removal
12/30/2009WO2008121925A3 Semiconductor device including an amorphous nitrided silicon adhesion layer and method of manufacture therefor
12/30/2009WO2008103994A3 Wafer fabrication monitoring systems and methods, including edge bead removal processing
12/30/2009EP2139303A1 Plasma generating apparatus and plasma film forming apparatus
12/30/2009EP2139300A1 Plasma electron temperature measuring method and device
12/30/2009EP2139049A1 Device for structuring a solar module
12/30/2009EP2139044A1 Conductive reflecting film and method for manufacturing the same
12/30/2009EP2139042A1 High voltage device with constant current source and manufacturing method thereof
12/30/2009EP2139038A2 Horizontal interconnection architecture based on carbon nanotubes
12/30/2009EP2139037A1 Interconnect structure for electromigration enhancement
12/30/2009EP2139035A1 Flotox-type eeprom and method for manufacturing the same
12/30/2009EP2139034A1 Structure to facilitate plating into high aspect ratio vias and method of its fabrication
12/30/2009EP2139033A2 Method for determining the doping profile of a partially activated doped semiconductor region
12/30/2009EP2139032A1 Highly reliable gold alloy bonding wire and semiconductor device
12/30/2009EP2139031A1 Semiconductor device and method for manufacturing semiconductor device
12/30/2009EP2139030A1 Etching solution
12/30/2009EP2139029A1 Polishing agent composition and method for manufacturing semiconductor integrated circuit device
12/30/2009EP2139028A1 Method for manufacturing semiconductor chip, adhesive film for semiconductor, and composite sheet using the film
12/30/2009EP2139027A1 Adhesive film for semiconductor, composite sheet, and method for producing semiconductor chip using them
12/30/2009EP2139026A1 Reflective mask blank for euv lithography
12/30/2009EP2139025A1 Arrangement for coating a cristalline silicon solar cell with an antireflection/passivation layer
12/30/2009EP2139009A1 Electroconductive fine particles, anisotropic electroconductive material, and electroconductive connection structure
12/30/2009EP2138898A1 Method for pattern formation, and resist composition, developing solution and rinsing liquid for use in the method for pattern formation
12/30/2009EP2138897A1 Material for formation of conductive anti-reflection film, method for formation of conductive anti-reflection film, method for formation of resist pattern, semiconductor device, and magnetic head
12/30/2009EP2138457A1 Method for obtaining a carpet of carbon nanotubes on a conductor or semi-conductor substrate
12/30/2009EP2138241A1 Method and device for discharging viscous liquid material
12/30/2009EP2137762A1 An end effector of a robot for transporting substrates
12/30/2009EP2137761A1 Method of depositing materials on a non-planar surface
12/30/2009EP2137759A1 Use of oxidants for the processing of semiconductor wafers, use of a composition and composition therefore
12/30/2009EP2137758A1 Layers composite comprising a pyrogenic zinc oxide layer and field-effect transistor comprising this composite
12/30/2009EP2137757A2 Method for reducing the thickness of substrates
12/30/2009EP2137756A1 A void-free contact plug
12/30/2009EP2137755A2 Method of fabricating a hybrid substrate
12/30/2009EP2137754A1 Method for forming a pattern on a substrate and electronic device formed thereby
12/30/2009EP1949429B1 Rotational shear stress for charge carrier mobility modification
12/30/2009EP1794803B1 Method of manufacturing a lateral DMOS-Transistor
12/30/2009EP1673782B1 Mram array with segmented word and bit lines
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