| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
|---|
| 01/14/2010 | WO2010005759A2 Performance improvements of ofets through use of field oxide to control ink flow |
| 01/14/2010 | WO2010005748A2 Adjustable micro device feeder system and method of operation thereof |
| 01/14/2010 | WO2010005707A1 Medium scale carbon nanotube thin film integrated circuits on flexible plastic substrates |
| 01/14/2010 | WO2010005700A2 Method for detection of oversized sub-resolution assist features |
| 01/14/2010 | WO2010005670A2 Methods of forming a plurality of capacitors |
| 01/14/2010 | WO2010005620A2 Modular and readily configurable reactor enclosures and associated function modules |
| 01/14/2010 | WO2010005573A2 Method and system for producing a solar cell using atmospheric pressure plasma chemical vapor deposition |
| 01/14/2010 | WO2010005543A2 Method of polishing nickel-phosphorous |
| 01/14/2010 | WO2010005541A2 Clamped showerhead electrode assembly |
| 01/14/2010 | WO2010005540A2 Clamped monolithic showerhead electrode |
| 01/14/2010 | WO2010005526A1 Double gate and tri-gate transistor formed on a bulk substrate and method for forming the transistor |
| 01/14/2010 | WO2010005455A1 Method and apparatus for a bevel etch chuck |
| 01/14/2010 | WO2010005427A1 Wire bonding tool with improved transducer interface |
| 01/14/2010 | WO2010005246A2 Substrate-conveying device |
| 01/14/2010 | WO2010005201A2 Plasma reactor for decomposing waste gas and gas scrubber using same |
| 01/14/2010 | WO2010005167A2 Method of manufacturing single thin film for nondestructive sensor |
| 01/14/2010 | WO2010005111A1 Group iii nitride semiconductor laminate structure and process for producing the group iii nitride semiconductor laminate structure |
| 01/14/2010 | WO2010005103A1 Polishing composition |
| 01/14/2010 | WO2010005086A1 Bonding structure of bonding wire |
| 01/14/2010 | WO2010005081A1 Deformation measuring apparatus, exposure apparatus, jig for deformation measuring apparatus, position measuring method and device manufacturing method |
| 01/14/2010 | WO2010005070A1 Plasma processing device and plasma processing method |
| 01/14/2010 | WO2010005032A1 Pattern-forming method |
| 01/14/2010 | WO2010004998A1 Film forming method and processing system |
| 01/14/2010 | WO2010004997A1 Plasma processing apparatus |
| 01/14/2010 | WO2010004983A1 Micro-ball removal method and removal device, and micro-ball batch mounting method and batch mounting device |
| 01/14/2010 | WO2010004981A1 Microstructure, and method for production thereof |
| 01/14/2010 | WO2010004979A1 Method of resist treatment |
| 01/14/2010 | WO2010004964A1 Gan crystal substrate, gan crystal substrate manufacturing method, gan crystal substrate provided with semiconductor epitaxial layer, semiconductor device and semiconductor device manufacturing method |
| 01/14/2010 | WO2010004917A1 Semiconductor device and arrangement method therefor |
| 01/14/2010 | WO2010004915A1 Bipolar electrostatic chuck |
| 01/14/2010 | WO2010004900A1 Position measuring method, and exposure method and device |
| 01/14/2010 | WO2010004881A1 Magnetic random access memory, and initialization method and writing method for magnetic random access memory |
| 01/14/2010 | WO2010004863A1 Hybrid silicon wafer and method for manufacturing same |
| 01/14/2010 | WO2010004836A1 Plasma processing device |
| 01/14/2010 | WO2010004827A1 Resist processing apparatus, resist applying/developing apparatus and resist processing method |
| 01/14/2010 | WO2010004800A1 Swirl flow forming body and non-contact conveying device |
| 01/14/2010 | WO2010004732A1 Mos transistor resistor, filter, and integrated circuit |
| 01/14/2010 | WO2010004715A1 Semiconductor element and manufacturing method therefor |
| 01/14/2010 | WO2010004708A1 Method for manufacturing semiconductor device |
| 01/14/2010 | WO2010004706A1 Nonvolatile semiconductor memory device |
| 01/14/2010 | WO2010004681A1 Electronic device, light-receiving and light-emitting device, electronic integrated circuit and optical integrated circuit using the devices |
| 01/14/2010 | WO2010004680A1 Semiconductor device |
| 01/14/2010 | WO2010004679A1 Semiconductor device and method for manufacturing the same |
| 01/14/2010 | WO2010004668A1 Delay library, delay library creation method, and delay calculation method |
| 01/14/2010 | WO2010004666A1 Method for verifying mask layout of semiconductor integrated circuit |
| 01/14/2010 | WO2010004642A1 Wafer storage container |
| 01/14/2010 | WO2010004636A1 Robot and its teaching method |
| 01/14/2010 | WO2010004635A1 Robot and its teaching method |
| 01/14/2010 | WO2010004620A1 Device and method for removing nitride film |
| 01/14/2010 | WO2010004619A1 Method for semiconductor element isolation |
| 01/14/2010 | WO2010004378A1 Antirelective coating compositions |
| 01/14/2010 | WO2010004271A1 Low-voltage thin-film field-effect transistors |
| 01/14/2010 | WO2010004047A1 Structure and process for fabricating a microelectronic 3d nand flash memory device |
| 01/14/2010 | WO2010003928A2 Method for doping semiconductor structures and the semiconductor device thereof |
| 01/14/2010 | WO2010003927A1 Apparatus for loading and unloading semiconductor wafers |
| 01/14/2010 | WO2010003910A1 Drain device and method |
| 01/14/2010 | WO2010003600A1 Process and system for fabrication of patterns on a surface |
| 01/14/2010 | WO2010003552A1 Method for producing a substrate contact in a cmos process |
| 01/14/2010 | WO2010003321A1 A gas injection device and a semiconductor processing apparatus including the gas injection device |
| 01/14/2010 | WO2010003186A1 Thin film imaging method and apparatus |
| 01/14/2010 | WO2010003179A1 A method of fabricating a material |
| 01/14/2010 | WO2009141534A3 Device and method for inspecting semiconductor wafers |
| 01/14/2010 | WO2009137768A3 Oxygen and carbon dioxide sensing |
| 01/14/2010 | WO2009136718A3 Semiconductor element and a production method therefor |
| 01/14/2010 | WO2009134840A3 Selective cobalt deposition on copper surfaces |
| 01/14/2010 | WO2009126899A3 Laser-scribing platform |
| 01/14/2010 | WO2009126827A3 Plasma processing apparatus and method |
| 01/14/2010 | WO2009123808A3 A solder bump bondig method, stencil. and system |
| 01/14/2010 | WO2009120804A3 Improved pad properties using nanoparticle additives |
| 01/14/2010 | WO2009120721A9 Plasmostor: a-metal-oxide-si field effect plasmonic modulator |
| 01/14/2010 | WO2009120360A3 High throughput cleaner chamber |
| 01/14/2010 | WO2009111473A3 Method for curing a porous low dielectric constant dielectric film |
| 01/14/2010 | WO2009111340A3 Flash lamp annealing crystallization for large area thin films |
| 01/14/2010 | WO2009104910A4 Joining structure and a substrate-joining method using the same |
| 01/14/2010 | US20100011334 Method and system for designing a probe card |
| 01/14/2010 | US20100010601 Self-Aligning Latch-up Mechanism in Out of Plane Silicon Microelectrode Arrays |
| 01/14/2010 | US20100009612 Polishing pad |
| 01/14/2010 | US20100009605 Method of manufacturing semiconductor wafer |
| 01/14/2010 | US20100009551 Semiconductor device and method for manufacturing the same |
| 01/14/2010 | US20100009550 Method and apparatus for modifying integrated circuit by laser |
| 01/14/2010 | US20100009549 Wafer treating method |
| 01/14/2010 | US20100009548 Method for heat-treating silicon wafer |
| 01/14/2010 | US20100009547 Laser working method |
| 01/14/2010 | US20100009546 Aminosilanes for Shallow Trench Isolation Films |
| 01/14/2010 | US20100009545 Methods of Fabricating Oxide Layers on Silicon Carbide Layers Utilizing Atomic Oxygen |
| 01/14/2010 | US20100009544 Manufacturing method of semiconductor device |
| 01/14/2010 | US20100009543 Method For Manufacturing Semiconductor Device |
| 01/14/2010 | US20100009542 Substrate processing method |
| 01/14/2010 | US20100009541 Process for Adjusting the Size and Shape of Nanostructures |
| 01/14/2010 | US20100009540 Polishing compound, its production process and polishing method |
| 01/14/2010 | US20100009539 Cerium oxide powder, method for preparing the same, and cmp slurry comprising the same |
| 01/14/2010 | US20100009538 Silicon nitride polishing liquid and polishing method |
| 01/14/2010 | US20100009537 Method of polishing nickel-phosphorous |
| 01/14/2010 | US20100009536 Multilayer low reflectivity hard mask and process therefor |
| 01/14/2010 | US20100009535 Methods and systems for barrier layer surface passivation |
| 01/14/2010 | US20100009534 Method for patterning a semiconductor device |
| 01/14/2010 | US20100009533 Conformal Films on Semiconductor Substrates |
| 01/14/2010 | US20100009532 Manufacturing method of semiconductor device and semiconductor manufacturing apparatus therefor |
| 01/14/2010 | US20100009531 Methods of forming a contact structure |
| 01/14/2010 | US20100009530 Semiconductor device fabrication method |