| Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974) |
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| 01/26/2010 | US7651896 Method for manufacturing semiconductor device |
| 01/26/2010 | US7651895 Transistor, method for manufacturing thereof, substrate for an electrooptical device |
| 01/26/2010 | US7651894 Method for manufacturing semiconductor device |
| 01/26/2010 | US7651893 Metal electrical fuse structure |
| 01/26/2010 | US7651892 Electrical programmable metal resistor |
| 01/26/2010 | US7651891 Integrated circuit package with stress reduction |
| 01/26/2010 | US7651889 Electromagnetic shield formation for integrated circuit die package |
| 01/26/2010 | US7651888 Wafer lever fixture and method for packaging micro-electro-mechanical-system devices |
| 01/26/2010 | US7651887 Optical semiconductor device and method of manufacturing thereof |
| 01/26/2010 | US7651886 Semiconductor device and manufacturing process thereof |
| 01/26/2010 | US7651883 High energy implant photodiode stack |
| 01/26/2010 | US7651882 RFID tag circuit die with shielding layer to control I/O bump flow |
| 01/26/2010 | US7651881 Solid-state imaging device and method for manufacturing the same |
| 01/26/2010 | US7651879 Surface acoustic wave pressure sensors |
| 01/26/2010 | US7651878 Wafer-level chip-scale package of image sensor and method of manufacturing the same |
| 01/26/2010 | US7651877 Two-dimensional image detecting apparatus and method for manufacturing the same |
| 01/26/2010 | US7651876 Semiconductor structures and method for fabricating the same |
| 01/26/2010 | US7651874 Method and apparatus for localizing production errors in a semiconductor component part |
| 01/26/2010 | US7651873 Method relating to the accurate positioning of a semiconductor wafer |
| 01/26/2010 | US7651872 Discrete nano-textured structures in biomolecular arrays, and method of use |
| 01/26/2010 | US7651831 Acrylic terpolymer with fluorosulfonamide-containing unit e.g. 2-trifluoromethanesulfonylaminoethyl methacrylate, a second unit having pendant acid labile group, and a third unit having a lactone moiety, and an acid generator; good etch resistance and dissolution properties; use making semiconductors |
| 01/26/2010 | US7651829 Positive resist material and pattern formation method using the same |
| 01/26/2010 | US7651823 Optically semitransmissive film, photomask blank and photomask, and method for designing optically semitransmissive film |
| 01/26/2010 | US7651761 Polishing layer is closed-cell resin foam, wherein number of closed cells in polishing layer is 200 to 600 per mm2, and average diameter of closed cells is 30 to 60 mu m, wherein resin constituting resin foam consists of polyurethane resin; for polishing silicone wafers, glass or aluminum substrates |
| 01/26/2010 | US7651733 Forming film on a surface of a tabular substrate such as a semiconductor wafer with a high uniformity, by a plurality of source gases including an organic-metal including gas |
| 01/26/2010 | US7651725 Low dielectric constant film produced from silicon compounds comprising silicon-carbon bond |
| 01/26/2010 | US7651724 Sealing substrate, wafter; cost efficiency |
| 01/26/2010 | US7651723 Microelectronic fabrication system components and method for processing a wafer using such components |
| 01/26/2010 | US7651594 Silicon oxide or silicon oxynitride layers on substrates; high barrier property and better transparency; used as a wrapping material for foods, drugs, a packaging material for electronic devices |
| 01/26/2010 | US7651587 Two-piece dome with separate RF coils for inductively coupled plasma reactors |
| 01/26/2010 | US7651586 Particle removal apparatus and method and plasma processing apparatus |
| 01/26/2010 | US7651585 Apparatus for the removal of an edge polymer from a substrate and methods therefor |
| 01/26/2010 | US7651584 Processing apparatus |
| 01/26/2010 | US7651583 Processing system and method for treating a substrate |
| 01/26/2010 | US7651571 Susceptor |
| 01/26/2010 | US7651568 Plasma enhanced atomic layer deposition system |
| 01/26/2010 | US7651567 Mask for sequential lateral solidification and crystallization method using thereof |
| 01/26/2010 | US7651365 Outlet adapter with EL elements, receptacles for other electric devices, and prongs for supplying power from a power source to the receptacles and EL elements |
| 01/26/2010 | US7651315 Large area substrate transferring method for aligning with horizontal actuation of lever arm |
| 01/26/2010 | US7651306 Cartesian robot cluster tool architecture |
| 01/26/2010 | US7651284 Development apparatus and development method |
| 01/26/2010 | US7651197 Method of manufacturing an inkjet head through the anodic bonding of silicon members |
| 01/26/2010 | US7651022 Method and apparatus for forming bumps for semiconductor interconnections using a wire bonding machine |
| 01/26/2010 | US7650982 Production system |
| 01/26/2010 | US7650897 Nozzle arrangement |
| 01/26/2010 | US7650853 Device for applying electromagnetic microwave radiation in a plasma cavity |
| 01/26/2010 | US7650762 Cooling air flow control valve for burn-in system |
| 01/26/2010 | US7650691 Component supply head device and component mounting head device |
| 01/26/2010 | US7650688 Bonding tool for mounting semiconductor chips |
| 01/26/2010 | CA2520972C Cmos-compatible integration of silicon-based optical devices with electronic devices |
| 01/26/2010 | CA2464078C Semiconductor device and method of manufacturing the same |
| 01/26/2010 | CA2309738C Method of molecular-scale pattern imprinting at surfaces |
| 01/25/2010 | CA2673705A1 Interface-infused nanotube interconnect |
| 01/21/2010 | WO2010009323A2 Phase mask and method of fabrication |
| 01/21/2010 | WO2010009268A2 Methods of preparing photovoltaic modules |
| 01/21/2010 | WO2010009253A1 Systems and methods for detecting scratches on non-semiconductor wafer surfaces |
| 01/21/2010 | WO2010009050A2 Substrate lift pin sensor |
| 01/21/2010 | WO2010009048A2 Tube diffuser for load lock chamber |
| 01/21/2010 | WO2010009013A2 Test head docking system and method |
| 01/21/2010 | WO2010008967A2 Improvement of organic line width roughness with h2 plasma treatment |
| 01/21/2010 | WO2010008959A2 Dc test resource sharing for electronic device testing |
| 01/21/2010 | WO2010008938A1 Electronic devices including carbon-based films having sidewall liners, and methods of forming such devices |
| 01/21/2010 | WO2010008930A2 Methods to promote adhesion between barrier layer and porous low-k film deposited from multiple liquid precursors |
| 01/21/2010 | WO2010008929A1 Work-piece transfer systems and methods |
| 01/21/2010 | WO2010008827A2 Pedestal heater for low temperature pecvd application |
| 01/21/2010 | WO2010008824A2 Closed-loop control for effective pad conditioning |
| 01/21/2010 | WO2010008754A2 Methods for forming an amorphous silicon film in display devices |
| 01/21/2010 | WO2010008752A2 Gold-tin-indium solder for processing compatibility with lead-free tin-based solder |
| 01/21/2010 | WO2010008748A1 Spacer fill structure, method and design structure for reducing device variation |
| 01/21/2010 | WO2010008747A2 Big foot lift pin |
| 01/21/2010 | WO2010008721A2 Substrate temperature measurement by infrared transmission in an etch process |
| 01/21/2010 | WO2010008711A2 Cathode with inner and outer electrodes at different heights |
| 01/21/2010 | WO2010008703A2 Liquid phase molecular self-assembly for barrier deposition and structures formed thereby |
| 01/21/2010 | WO2010008700A2 Method and system for growing a thin film using a gas cluster ion beam |
| 01/21/2010 | WO2010008673A2 Methods and systems for packaging integrated circuits with thin metal contacts |
| 01/21/2010 | WO2010008672A1 Semiconducting polymers |
| 01/21/2010 | WO2010008617A1 Mosfet switch with embedded electrostatic charge |
| 01/21/2010 | WO2010008517A2 Deposition apparatus for improving the uniformity of material processed over a substrate and method of using the apparatus |
| 01/21/2010 | WO2010008508A1 Inner cavity system for nano-imprint lithography |
| 01/21/2010 | WO2010008389A1 Method for making an electronic assembly |
| 01/21/2010 | WO2010008383A1 Thin sacrificial masking films for protecting semiconductors from pulsed laser process |
| 01/21/2010 | WO2010008287A1 Method for encapsulating electronic components with a controllable closing force |
| 01/21/2010 | WO2010008257A2 A spring assembly and a test socket using the same |
| 01/21/2010 | WO2010008212A2 Magazine for semiconductor package |
| 01/21/2010 | WO2010008211A2 Batch-type heat treatment device and heater used therein |
| 01/21/2010 | WO2010008116A2 Method and chamber for inductively coupled plasma processing for cylinderical material with three-dimensional surface |
| 01/21/2010 | WO2010008102A1 Cleaning method of apparatus for depositing carbon containing film |
| 01/21/2010 | WO2010008085A1 Screen plate, interlayer insulation film, circuit board, active matrix circuit board, and image display apparatus |
| 01/21/2010 | WO2010008076A1 Power introduction terminal for plasma processing device and plasma processing device |
| 01/21/2010 | WO2010008066A1 Compound having a plurality of tetraphenylmethane backbones, film-forming composition, insulating film and electronic device |
| 01/21/2010 | WO2010008037A1 Algan bulk crystal manufacturing method and algan substrate manufacturing method |
| 01/21/2010 | WO2010008021A1 Plasma treatment method and plasma treatment device |
| 01/21/2010 | WO2010008006A1 Plasma processing apparatus and plasma processing method |
| 01/21/2010 | WO2010007993A1 Positive-type radiation-sensitive composition, and resist pattern formation method |
| 01/21/2010 | WO2010007991A1 Cu wiring film forming method |
| 01/21/2010 | WO2010007983A1 Method for growing gan crystal |
| 01/21/2010 | WO2010007981A1 Film-forming apparatus and powder evaporation apparatus |
| 01/21/2010 | WO2010007976A1 Resin composition for making resist pattern insoluble, and method for formation of resist pattern by using the same |
| 01/21/2010 | WO2010007971A1 Radiation-sensitive resin composition |
| 01/21/2010 | WO2010007955A1 Reflective mask blank for euv lithography and reflective mask for euv lithography |