Patents
Patents for H01L 21 - Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof (658,974)
01/2010
01/21/2010US20100013013 1t/0c ram cell with a wrapped-around gate device structure
01/21/2010US20100013012 Integrated complementary low voltage rf-ldmos
01/21/2010US20100013009 Structure and Method for Forming Trench Gate Transistors with Low Gate Resistance
01/21/2010US20100013008 Semiconductor device and method of manufacturing the same
01/21/2010US20100013007 Semiconductor device and method for manufacturing the same
01/21/2010US20100013006 Semiconductor device
01/21/2010US20100013005 Integrated circuit including a vertical transistor and method
01/21/2010US20100013002 Nonvolatile storage device and method for manufacturing the same
01/21/2010US20100013001 Method for manufacturing non-volatile memory and structure thereof
01/21/2010US20100012999 Semiconductor memory device and method of manufacturing the same
01/21/2010US20100012995 Localized biasing for silicon on insulator structures
01/21/2010US20100012992 Method of manufacturing semiconductor device
01/21/2010US20100012991 Semiconductor device and method for fabricating semiconductor device
01/21/2010US20100012990 Mosfets including crystalline sacrificial structures
01/21/2010US20100012989 Semiconductor device and method of fabricating the same
01/21/2010US20100012988 Metal oxide semiconductor devices having implanted carbon diffusion retardation layers and methods for fabricating the same
01/21/2010US20100012980 Contact Structures in Substrate Having Bonded Interface, Semiconductor Device Including the Same, Methods of Fabricating the Same
01/21/2010US20100012977 Semiconductor device
01/21/2010US20100012976 Polishing of small composite semiconductor materials
01/21/2010US20100012975 Transistor device having asymmetric embedded strain elements and related manufacturing method
01/21/2010US20100012973 Dark current reduction for large area photodiodes
01/21/2010US20100012972 Silicon-Germanium Hydrides and Methods for Making and Using Same
01/21/2010US20100012970 Light emitting diode chip and fabricating method thereof
01/21/2010US20100012969 Light emitting device and fabrication method thereof
01/21/2010US20100012966 Organic light emitting display apparatus and method of manufacturing the same
01/21/2010US20100012963 Light emitting diode and method of the same
01/21/2010US20100012962 Light emitting diode and fabrication thereof
01/21/2010US20100012961 Light emitting device and method for producing the same
01/21/2010US20100012958 Light emitting device with tension relaxation
01/21/2010US20100012954 Vertical III-Nitride Light Emitting Diodes on Patterned Substrates with Embedded Bottom Electrodes
01/21/2010US20100012952 Nitride-Based Transistors Having Laterally Grown Active Region and Methods of Fabricating Same
01/21/2010US20100012951 Silicon carbide semiconductor device and method for producing the same
01/21/2010US20100012950 Crackstop structures and methods of making same
01/21/2010US20100012949 Substrate, in particular made of silicon carbide, coated with a thin stoichiometric film of silicon nitride, for making electronic components, and method for obtaining such a film
01/21/2010US20100012948 Growth of Planar Non-Polar M-Plane and Semi-Polar Gallium Nitride with Hydride Vapor Phase Epitaxy (HVPE)
01/21/2010US20100012947 PROCESS FOR MAKING A GaN SUBSTRATE
01/21/2010US20100012945 Method of forming photoresist burr edge and method of manufacturing array substrate
01/21/2010US20100012944 Thin film transistor substrate and thin film transistor of display panel and method of making the same
01/21/2010US20100012943 Thin film transistor and manufacturing method thereof
01/21/2010US20100012942 Poly-si thin film transistor and method of manufacturing the same
01/21/2010US20100012941 Thin film transistor array panel for liquid crystal display having pixel electrode
01/21/2010US20100012940 Image Display Device and Manufacturing Method for the Same
01/21/2010US20100012938 Thin film transistor substrate and method for manufacturing same
01/21/2010US20100012936 Manufacturing method of flexible semiconductor device and flexible semiconductor device
01/21/2010US20100012932 Metal oxide tft with improved carrier mobility
01/21/2010US20100012927 Devices having vertically-disposed nanofabric articles and methods of making the same
01/21/2010US20100012922 Methods of forming structures including nanotubes and structures including same
01/21/2010US20100012921 Nanowire, device comprising nanowire, and their production methods
01/21/2010US20100012919 Gas sensor having zinc oxide nano-structures and method of fabricating the same
01/21/2010US20100012916 Phase change memory
01/21/2010US20100012915 Phase-change memory device and method of fabricating the same
01/21/2010US20100012914 Carbon-based resistivity-switching materials and methods of forming the same
01/21/2010US20100012912 Electronic devices including carbon-based films having sidewall liners, and methods of forming such devices
01/21/2010US20100012856 Wafer holding tool for ion implanting apparatus
01/21/2010US20100012353 Elongated semiconductor devices, methods of making same, and systems for making same
01/21/2010US20100012275 Plasma processing apparatus
01/21/2010US20100012272 Substrate etching apparatus
01/21/2010US20100012179 Solar cell with high photon utilization and method of manufacturing the same
01/21/2010US20100012174 High band gap contact layer in inverted metamorphic multijunction solar cells
01/21/2010US20100012030 Process for Deposition of Semiconductor Films
01/21/2010US20100011860 Micromechanical sensor element, method for manufacturing a micromechanical sensor element and method for operating a micromechanical sensor element
01/21/2010DE4232504B4 Verfahren zur Herstellung von p-dotierten Schichten insbesondere in II-VI-Halbleitern A process for preparing p-doped layers in particular II-VI semiconductors
01/21/2010DE19626787B4 Herstellungsverfahren einer Halbleitervorrichtung Manufacturing method of a semiconductor device
01/21/2010DE112008000723T5 Vorrichtung und Verfahren zum Prüfen der Kante eines Halbleiterwafers Apparatus and method for inspecting the edge of a semiconductor wafer
01/21/2010DE112008000667T5 Vertikaler Wärmebehandlungsbehälter und Wärmebehandlungsverfahren für Halbleiterwafer Vertical heat treatment vessel and heat treatment method for semiconductor wafers
01/21/2010DE112008000486T5 Verfahren für die Fertigung eines Einkristall-Siliziumwafers A method for manufacturing a single crystal silicon wafer
01/21/2010DE112008000226T5 Verfahren zum Herstellen eines Substrats vom Typ Silizium auf Isolator (SOI) A method for producing a substrate of the type silicon on insulator (SOI)
01/21/2010DE112008000094T5 CMOS-Vorrichtung mit Dual-Epi-Kanälen und selbstausgerichteten Kontakten CMOS device with dual-epi-channels and self-aligned contacts
01/21/2010DE112007003424T5 Prüfgerät Tester
01/21/2010DE112006000241B4 Verfahren zur Herstellung eines FinFETs sowie Halbleiteranordnung A method for producing a semiconductor device as well as FinFETs
01/21/2010DE112006000151B4 Herstellungsverfahren für CMOS Transistsorübergangsbereiche, die durch ein CVD Ätzen gebildet sind und eine Ablagerungsabfolge in ein und derselben Kammer A method for manufacturing CMOS Transistsorübergangsbereiche formed by a CVD deposition and etching sequence in one and the same chamber
01/21/2010DE112004001251B4 Verfahren zur Herstellung einer integrierten Schaltung und integrierte Schaltung mit äusserst gleichförmigen Siliziden A process for producing an integrated circuit and integrated circuit with extremely uniform silicides
01/21/2010DE10351006B4 Verfahren zur Herstellung eines Transistors mit erhöhten Drain- und Source-Gebieten, wobei eine reduzierte Anzahl von Prozessschritten erforderlich ist A method of manufacturing a transistor with raised drain and source regions, wherein a reduced number of process steps is required
01/21/2010DE10261374B4 Verfahren zur Herstellung von als Feldeffekttransistor ausgebildeten Halbleiterelementen mit verbesserten Dotierprofilen A process for producing formed as a field effect transistor semiconductor devices with improved doping profiles
01/21/2010DE10258368B4 Waferhalter Wafer holder
01/21/2010DE10216607B4 Halbleiterspeichervorrichtung A semiconductor memory device
01/21/2010DE102009033648A1 Verfahren zum Herstellen eines III-V-Verbindungshalbleiter-Substrats, Verfahren zum Herstellen eines Epitaxial-Wafers, III-V-Verbindungshalbleiter-Substrat und Epitaxial-Wafer A method of preparing a group III-V compound semiconductor substrate, a method of manufacturing the epitaxial wafer, the III-V compound semiconductor substrate and epitaxial wafer
01/21/2010DE102009033423A1 Halbleiterchip und Halbleiterchip-Stapelgehäuse Semiconductor chip and the semiconductor chip stack housing
01/21/2010DE102009033265A1 Abdeckung für eine Rolle Cover for a role
01/21/2010DE102009032973A1 Leistungshalbleitervorrichtung Power semiconductor device
01/21/2010DE102009031356A1 Benetzungsmittel für Halbleiter, Polierzusammensetzung und sie verwendendes Polierverfahren Wetting agents for semiconductors, the polishing composition and polishing method-use
01/21/2010DE102009027476A1 Innenkammerelement-Temperatursteuerverfahren, kammerinternes Element, Substratanbringtisch und Plasmabearbeitungsvorrichtungsvorrichtung, die selbigen enthält Inner chamber element temperature control method, chamber internal element Substratanbringtisch and plasma processing apparatus apparatus including selfsame
01/21/2010DE102009025570A1 Elektronische Anordnung und ihre Herstellung Electronic device and its manufacturing
01/21/2010DE102009020348A1 Halbleitervorrichtung und Verfahren zur Herstellung derselben A semiconductor device and method of manufacturing the same
01/21/2010DE102008040521A1 Verfahren zur Herstellung eines Bauelements, Verfahren zur Herstellung einer Bauelementanordnung, Bauelement und Bauelementanordnung A method for manufacturing a device, method of manufacturing a component assembly, the component and component arrangement
01/21/2010DE102008040488A1 Elektronische Baueinheit und Verfahren zu deren Herstellung The electronic package and process for their preparation
01/21/2010DE102008033903A1 Vorrichtung und Verfahren zur Montage mehrerer Halbleiterbauelemente auf einem Zielsubstrat Device and method for mounting a plurality of semiconductor components on a target substrate
01/21/2010DE102008033410A1 Leistungselektronische Verbindungseinrichtung und Herstellungsverfahren hierzu Power electronic coupling device and manufacturing method therefor
01/21/2010DE102008032555B3 Strukturierungsvorrichtung für die Strukturierung von plattenförmigen Elementen, insbesondere von Dünnschicht-Solarmodulen, entsprechendes Strukturierungsverfahren sowie Verwendung derselben Structuring device for structuring plate-like elements, especially of thin-film solar modules, corresponding structuring method and use thereof
01/21/2010DE102008030425A1 LED-Beleuchtungssystem für ein elektrisches Prüfsystem LED lighting system for an electrical testing system
01/21/2010DE102008021167B3 Verfahren zur Erzeugung einer hermetisch dichten, elektrischen Durchführung mittels exothermer Nanofolie und damit hergestellte Vorrichtung A method for producing a hermetically sealed electrical feedthrough by means of exothermic nanofoil and thus produced device
01/21/2010DE102006034599B4 Verfahren zum Verschalten aus einem Wafer gefertigter Halbleiterchips Method for interconnecting manufactured from a wafer semiconductor chips
01/21/2010DE102004061326B4 Integrierte Schaltung Integrated circuit
01/21/2010CA2730431A1 Deposition apparatus for improving the uniformity of material processed over a substrate and method of using the apparatus
01/20/2010EP2146384A1 Method of making a laser diode
01/20/2010EP2146378A2 Semiconductor device
01/20/2010EP2146372A2 Power electronic connection device and production method for same
01/20/2010EP2146371A1 Thin film transistor, method of fabricating the same, and organic light emitting diode display device including the thin film transistor
01/20/2010EP2146370A2 Method of forming an in-situ recessed structure
01/20/2010EP2146369A2 Method of forming an in-situ recessed structure