| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 08/11/1988 | WO1988005929A1 High speed aqueous developable radiation-sensitive composition and printing plate containing same |
| 08/11/1988 | WO1988005928A1 Positive photosensitive resin composition and process for its production |
| 08/11/1988 | WO1988005927A1 Positive photosensitive resin composition |
| 08/11/1988 | WO1988005813A1 Photoresist stripper composition |
| 08/11/1988 | DE3702897A1 Two-layer system |
| 08/10/1988 | EP0277915A2 Photoinitiator mixture containing a titanocene and a 3-ketocoumarin |
| 08/10/1988 | EP0277828A2 Thin film artwork compounds |
| 08/10/1988 | EP0277806A2 Apparatus and method for applying force for example in pressure development of imaging sets |
| 08/10/1988 | EP0277722A2 Formation method and photoresist composition for phosphor screens of colour picture tubes |
| 08/10/1988 | EP0277652A2 Picture recording method |
| 08/10/1988 | EP0277555A2 Copolymers with 0-nitrocarbinol ester groups, and process for preparing two-layer resists and semiconductor devices |
| 08/10/1988 | EP0277418A1 Photosensitive resin composition |
| 08/10/1988 | EP0277385A2 Process for the manufacture of a relief element |
| 08/10/1988 | CN87105998A Embedded catalyst receptors for metallization of dielectrics |
| 08/09/1988 | US4763189 Color image sensor with three line sensors on different layers separated by electrically-insulating layers |
| 08/09/1988 | US4763004 Calibration method for electron beam exposer |
| 08/09/1988 | US4762892 Ethylene-acrylic or methacrylic acid-alkyl acrylate modified to contain unsaturated side chains |
| 08/09/1988 | US4762771 Lithography, exposure, development |
| 08/09/1988 | US4762768 Coating with gelatin or hydrolyzed gelatin |
| 08/09/1988 | US4762767 Negatively operating photoresist composition, with radiation-absorbing additives |
| 08/09/1988 | US4762766 Dry transfer film with photosensitized color carrying layer and photosensitized pressure sensitive adhesive layer wherein photosensitizer is o-quinone diazide |
| 08/09/1988 | US4762747 Good adhesion to polyimides |
| 08/09/1988 | US4762732 Patters of silver solders in curable polymers |
| 08/09/1988 | US4762396 Masking method |
| 08/03/1988 | EP0277038A2 Multi-color transfer image forming method |
| 08/03/1988 | EP0277034A2 Lamination of two substrates |
| 08/03/1988 | EP0276938A2 Semiconductor device fabrication including a non-destructive method for examining lithographically defined features |
| 08/03/1988 | EP0276717A2 Method of forming a fine resist pattern in electron beam or x-ray lithography |
| 08/03/1988 | EP0276709A2 Copolymers with O-nitrocarbionol ester groups, their use and process for preparing semiconductor elements |
| 08/02/1988 | US4761670 Color image reproduction device |
| 08/02/1988 | US4761464 Interrupted polysilanes useful as photoresists |
| 08/02/1988 | US4761364 Screen printing stencil for making elastomer sealing layers on flat gasket plates and method for making same |
| 08/02/1988 | US4761363 UV curable compositions for making improved solder mask coatings |
| 08/02/1988 | US4761360 Light-sensitive material containing silver halide, reducing agent, polymerizable compound and a silver diazotate |
| 08/02/1988 | US4761311 Thermoplastic developers resins |
| 08/02/1988 | US4761136 Visible light cured impression material |
| 08/02/1988 | CA1239902A1 Electron beam curing of organic polymer coated substrate with rough surface |
| 08/02/1988 | CA1239826A1 Thermal development of photosensitive materials employing microencapsulated radiation sensitive compositions |
| 07/28/1988 | WO1988005559A1 Method of patterning resist |
| 07/27/1988 | EP0276108A2 Polymeric materials and their use as resists |
| 07/27/1988 | EP0276093A2 Water-developable photosentitive resin composition, and resin or printing plate therefrom |
| 07/27/1988 | EP0276092A2 Water-developable photosensitive resin composition, and resin or printing plate therefrom |
| 07/27/1988 | EP0276016A2 Photopolymerizable composition |
| 07/27/1988 | EP0275999A2 Liquid crystal optical device and process for its production |
| 07/27/1988 | EP0275970A2 Positive-working photoresist composition |
| 07/27/1988 | CN88100085A Photosensitive compositions containing microcapsules concentrated in surface layer |
| 07/26/1988 | US4760429 High speed reticle change system |
| 07/26/1988 | US4760150 Bis(methylenedioxyphenyl)imidazoles |
| 07/26/1988 | US4760014 Coagulating and precipitating photopolymer resin, and separating from aqueous phase to produce sludge |
| 07/26/1988 | US4760013 Sulfonium salt photoinitiators |
| 07/26/1988 | US4760011 Silver halide, ethylenic unsaturated polymerizable monomer, a reducing agent, and a base or precursor |
| 07/26/1988 | US4759822 Methods for producing an aperture in a surface |
| 07/26/1988 | US4759626 Determination of best focus for step and repeat projection aligners |
| 07/26/1988 | CA1239736A1 Compositions of matter which crosslink under the action of light in the presence of sensitisers |
| 07/26/1988 | CA1239612A1 Anodic oxidation and silicate treatments of roughened aluminium |
| 07/21/1988 | DE3800359A1 Process for the production of a lithographic printing plate |
| 07/21/1988 | DE3743875A1 Photopolymerisable composition |
| 07/21/1988 | DE3700949C1 Exposure device |
| 07/20/1988 | EP0275147A2 Improvements in or relating to printing plate precursors |
| 07/20/1988 | EP0275126A2 Method and apparatus for forming resist pattern |
| 07/20/1988 | EP0275044A2 Photosensitive compositions containing microcapsules concentrated in surface layer |
| 07/20/1988 | EP0274759A2 Printer |
| 07/20/1988 | EP0274757A2 Bilayer lithographic process |
| 07/19/1988 | US4758863 Process for imaging a wafer |
| 07/19/1988 | US4758640 Vinylsilyl group-containing monodisperse polymeric compound and a method for the preparation thereof |
| 07/19/1988 | US4758500 Process for the cementing of photopolymerizable flexographic printing elements or printing plates |
| 07/19/1988 | US4758497 Photosensitive naphthoquinone diazide sulfonyl ester compounds for the fabrication of lithographic plates and photosensitive sheet construction with the compounds |
| 07/19/1988 | US4758496 Light-sensitive material containing silver halide, reducing agent and polymerizable compound |
| 07/19/1988 | US4758127 Original feeding apparatus and a cassette for containing the original |
| 07/19/1988 | US4758091 For positioning a work piece |
| 07/19/1988 | CA1239499A1 Photopolymerisable composition, material coated therewith and process for the production of relief images |
| 07/19/1988 | CA1239487A1 Multiple vacuum arc derived plasma pinch x-ray source |
| 07/19/1988 | CA1239486A1 Gas discharge derived annular plasma pinch x-ray source |
| 07/14/1988 | WO1988005211A1 Flowing gas seal enclosure for processing workpiece surface with controlled gas environment and intense laser irradiation |
| 07/14/1988 | WO1988005205A1 X-y--z positioning stage |
| 07/14/1988 | WO1988005180A1 Light filters for microelectronics |
| 07/14/1988 | WO1988005179A1 Method and apparatus for recovering and reusing resist composition |
| 07/13/1988 | EP0274354A2 Photostructurable polyimide compositions, polyimides on the basis of benzhydrol tetracarboxylic acid and their fabrication |
| 07/13/1988 | EP0274318A2 Process for the anionic polymerization of acrylic monomers and vinyl comonomers |
| 07/13/1988 | EP0274075A2 Polyvinyl acetal, light-sensitive composition containing it and reproduction material made therefrom |
| 07/13/1988 | EP0274044A1 Method of Developing Lithographic plates |
| 07/13/1988 | CN87108379A Etched glass and process of manufacturing same |
| 07/13/1988 | CN87107655A Manafacturing multilayer circuit and its elements by receiver with catalyst |
| 07/12/1988 | US4757355 Mask storing mechanism |
| 07/12/1988 | US4757354 Projection optical system |
| 07/12/1988 | US4757207 Measurement of registration of overlaid test patterns by the use of reflected light |
| 07/12/1988 | US4757098 Contains chelate agent stabilizer comprising for example ethylenediamine, nitrilotriacetic acid, ethylenediamine tetraacetic acid, 1,2-cyclohexylenediaminetetraacetic acid |
| 07/12/1988 | US4756994 Ethylenically unsaturated monomer, photopolymerizable monomer, polymerization inhibitor, nitrogen-containing compound |
| 07/12/1988 | US4756991 Fluorescent toners surface coated with polymeric quaternary ammonium compound and slip agent |
| 07/12/1988 | US4756989 Image-forming materials sensitive to high-energy beam |
| 07/12/1988 | US4756988 Multilayer dry-film negative-acting photoresist |
| 07/12/1988 | US4756047 Apparatus for removing organic substance from substrate |
| 07/12/1988 | CA1239130A1 Light source device |
| 07/06/1988 | EP0273729A2 Solder resist ink composition |
| 07/06/1988 | EP0273703A2 An adaptive lithography method and system |
| 07/06/1988 | EP0273699A2 Developing device for photosensitive material |
| 07/06/1988 | EP0273393A2 Photosensitive resin composition |
| 07/06/1988 | EP0273376A1 Embedded catalyst receptors for metallization of dielectrics |
| 07/06/1988 | EP0273374A2 Method for making multilayer circuits using embedded catalyst receptors |
| 07/06/1988 | EP0273113A2 Photosensitive polymer composition and master printing plate |