| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 07/06/1988 | EP0273058A1 Multi-mode narrow-band oscillation excimer laser |
| 07/06/1988 | EP0173708B1 Screen printing compositions |
| 07/06/1988 | EP0134789B1 Bilevel ultraviolet resist system for patterning substrates of high reflectivity |
| 07/05/1988 | US4755844 Automatic developing device |
| 07/05/1988 | US4755541 Substituted benzophenones and their liquid mixtures suitable for use as photopolymerization initiators |
| 07/05/1988 | US4755451 Developer for color proofing film with an alkyl glycol derivative of cyclohexane |
| 07/05/1988 | US4755450 Spectral sensitizing dyes in photopolymerizable systems |
| 07/05/1988 | US4755446 Storage stable photopolymerizable element wound in roll; on support of strippable flexible film |
| 07/05/1988 | US4755445 Support with photohardenable light sensitive layer of microcapsules containing photopolymerizable monomer or light sensitive resin, silicone rubber layer |
| 07/05/1988 | US4755442 Pattern developing process and apparatus therefor |
| 07/05/1988 | CA1238879A1 Process for producing light sensitive lithographic plate requiring no dampening solution |
| 07/05/1988 | CA1238781A1 Optical recording element having a polymerized crosslinked homopolymer smoothing layer |
| 06/30/1988 | WO1988004797A1 Method of patterning resist for printed wiring board |
| 06/30/1988 | WO1988004796A1 Holograms |
| 06/30/1988 | WO1988004793A1 Improving sensitivity of processless recording media |
| 06/30/1988 | WO1988004792A1 Recording medium of improved stability |
| 06/29/1988 | EP0273026A2 Solvents for Photoresist compositions |
| 06/29/1988 | EP0272853A2 Method and apparatus for automated reading of vernier patterns |
| 06/29/1988 | EP0272686A2 Method for manufacture of lithographic printing plate |
| 06/29/1988 | EP0272558A2 Process for glueing non-transparent carriers, and glueing systems for use therein |
| 06/29/1988 | EP0272550A2 Light-sensitive registration material with a light-sensitive intermediate layer |
| 06/29/1988 | EP0272549A2 Light-sensitive mixture with diazonium salt polycondensation products, and light-sensitive registration material prepared therewith |
| 06/29/1988 | EP0272498A2 Base-soluble ultraviolet photoresists having styrene maleimide resins |
| 06/29/1988 | CN87101157A Light sensitive mixtures for making repeatedly tonable layers |
| 06/29/1988 | CN85104369B Objective for a scanning projection photoetching machine |
| 06/28/1988 | US4753866 Method for processing an interlevel dielectric suitable for VLSI metallization schemes |
| 06/28/1988 | US4753865 Photosensitive compositions containing microgels |
| 06/28/1988 | US4753862 Color photography, radiology |
| 06/28/1988 | US4753860 Urethane acrylates, printed circuits |
| 06/28/1988 | US4753830 Forming layer of clathrate compound, transferring to substrate |
| 06/28/1988 | CA1238741A1 Photo-settable, light-shielding coating composition |
| 06/28/1988 | CA1238509A1 Photosensitive material employing encapsulated radiation sensitive composition and a transparentizable image-receiving layer |
| 06/23/1988 | DE3742387A1 Photosensitive composition |
| 06/22/1988 | EP0272215A2 Process for obtaining images |
| 06/22/1988 | EP0272019A2 Image forming method and recording medium |
| 06/22/1988 | EP0271851A2 Light sensitive mixtures for making repeatedly tonable layers |
| 06/22/1988 | EP0271737A2 Optical relay system with magnification |
| 06/22/1988 | EP0271708A2 Photoresist composition comprising an interpolymer of a silicon-containing monomer and an hydroxystyrene |
| 06/22/1988 | EP0271503A1 Method and apparatus for spreading resin by centrifugation |
| 06/22/1988 | CN87107321A Welding mask coating capable of exposure-imaging |
| 06/21/1988 | US4752946 Gas discharge derived annular plasma pinch x-ray source |
| 06/21/1988 | US4752668 System for laser removal of excess material from a semiconductor wafer |
| 06/21/1988 | US4752635 Halogen-containing polyacrylate derivatives |
| 06/21/1988 | US4752598 Thermal dye transfer assembly for heat transfer recording |
| 06/21/1988 | US4752553 High resolution solder mask photopolymers for screen coating over circuit traces |
| 06/21/1988 | US4752552 Compound producing acid upon irridation, compound with silyl ether or ester group decomposable by said acid |
| 06/21/1988 | US4752551 4-diazo-3,5-dioxocyclohexane carboxylic acid ester |
| 06/21/1988 | US4752498 Method and apparatus for production of three-dimensional objects by photosolidification |
| 06/21/1988 | US4752346 Apparatus and method for separating adherent films |
| 06/21/1988 | US4752283 Waste water cleaning system for use with apparatus for processing exposed lithographic plates |
| 06/21/1988 | CA1238292A1 Producing aircraft windows with electroplated masked strike coat |
| 06/16/1988 | WO1988004470A1 Process and device for generating material structures of atomic dimensions |
| 06/16/1988 | WO1988004306A1 Ultraviolet-absorptive polymer material |
| 06/16/1988 | WO1988004237A1 Thermal imaging medium |
| 06/15/1988 | EP0271199A2 Novolak resin for positive photoresist |
| 06/15/1988 | EP0271195A1 Substituted triazine derivatives |
| 06/15/1988 | EP0271077A1 Copolymer of an alpha-beta unsaturated carboxylic acid, and process for its preparation |
| 06/15/1988 | EP0271010A2 Copolymers with 0-nitrocarbinol ester groups, and their use |
| 06/15/1988 | EP0271002A2 Transmittance modulation photomask, process for producing the same and process for producing diffraction grating |
| 06/15/1988 | EP0270945A2 Photopolymerizable composition having superior adhesion, articles and processes |
| 06/14/1988 | US4751723 Multiple vacuum arc derived plasma pinch x-ray source |
| 06/14/1988 | US4751172 Process for forming metal images |
| 06/14/1988 | US4751171 Pattern forming method |
| 06/14/1988 | US4751170 Using an organic silane and ultraviolet radiation |
| 06/14/1988 | US4751168 Sulfone-containing addition polymers |
| 06/14/1988 | US4751167 Reduction of adhesion of multilayer device upon exposure to light |
| 06/14/1988 | US4751165 Less grainy; enhanced optical density |
| 06/14/1988 | US4751162 Containing calcium to improve resolution |
| 06/14/1988 | US4750836 Method of measuring misalignment between superimposed patterns |
| 06/14/1988 | CA1238141A1 Photo-polymerisable compositions |
| 06/14/1988 | CA1237953A1 Inverted apply using bubble dispense |
| 06/09/1988 | DE3741385A1 Durch belichtung abbildbare loetmaskenbeschichtung By exposure imageable solder mask coating |
| 06/09/1988 | DE3740709A1 Process for erasing images formed on offset printing plates |
| 06/09/1988 | DE3641429A1 PCB protective film removal device - uses abutment strap to synchronise movements of carrier plates |
| 06/07/1988 | US4749867 Exposure apparatus |
| 06/07/1988 | US4749840 Intense laser irradiation using reflective optics |
| 06/07/1988 | US4749796 Xanthene derivative and a production process of the same |
| 06/07/1988 | US4749639 Hydroxy-, acyloxy- or hydroxyalkyloxy-methyl substituted (meth)acrylamide copolymers |
| 06/07/1988 | US4749436 Equipment for thermal stabilization process of photoresist pattern on semiconductor wafer |
| 06/01/1988 | EP0269573A2 Liquid photoinitiating mixture |
| 06/01/1988 | EP0269568A2 Polymerisable compositions |
| 06/01/1988 | EP0269398A2 Enhanced imaging composition containing an azinium activator |
| 06/01/1988 | EP0269397A2 Dye sensitized photographic imaging system |
| 06/01/1988 | EP0269219A2 Improved photolithography process using two photoresist layers for device fabrication |
| 06/01/1988 | EP0268859A2 Method of dividing semiconductor wafers |
| 06/01/1988 | EP0268595A1 Pattern transfer process for fabricating integrated-circuit devices. |
| 06/01/1988 | CN87106837A Lamination of photopolymerizable film onto a substrate employing an intermediate nonphotosensitive liquid layer |
| 05/31/1988 | US4748646 X-ray lithography system |
| 05/31/1988 | US4748478 Projection exposure apparatus |
| 05/31/1988 | US4748477 Exposure apparatus |
| 05/31/1988 | US4748104 Selective metallization process and additive method for manufactured printed circuit boards |
| 05/31/1988 | US4748045 Method and apparatus for photodeposition of films on surfaces |
| 05/31/1988 | US4747678 Optical relay system with magnification |
| 05/31/1988 | US4747421 Solid carbon dioxide particles impacted on photoresist |
| 05/31/1988 | CA1237549A1 Radiation-sensitive polycondensates, processes for their preparation, coated material and its use |
| 05/26/1988 | DE3738215A1 Curable resin composition |
| 05/25/1988 | EP0268553A1 Photosensitive mixtures |
| 05/25/1988 | EP0268429A2 Photoinitiator composition |
| 05/25/1988 | EP0268428A2 Exposure units |
| 05/25/1988 | EP0268290A2 Film peeling apparatus |