Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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12/14/1988 | EP0294953A2 Photopolymerisable compositions |
12/14/1988 | EP0294665A2 Process for the production of a colour image |
12/14/1988 | EP0294611A1 Process for the selective additive correction of defects in copying layers |
12/14/1988 | EP0294610A1 Single-stage electrochemical process for the production of images for reproduction layers |
12/14/1988 | EP0294379A1 Purge air system for a combustion instrument |
12/14/1988 | CN88102931A Method for manufacturing shadow masks |
12/14/1988 | CN88101184A Pressure development apparatus for imaging sheets employing photosensitive microcapsules |
12/13/1988 | US4791458 Multi-purpose apparatus for the imaging of printed wired boards |
12/13/1988 | US4791213 2-hydroxy-3-thioxathonyloxy-1-propanaminium salts |
12/13/1988 | US4791176 With alkenyl silane monomer; positive photoresist; oxygen-etching resistance; solvent-soluble |
12/13/1988 | US4791047 Shavings, impurities absorbed by buffer layer |
12/13/1988 | US4791046 Process for forming mask patterns of positive type resist material with trimethylsilynitrile |
12/13/1988 | US4791045 Photosensitizers and polymerizable compositions with mannich bases and iodonium salts |
12/13/1988 | US4791043 Positive photoresist stripping composition |
12/13/1988 | US4791039 Polycarbazole and aromatic colorant |
12/13/1988 | US4791004 Flowing liquid film onto supports; heating and/or irradiating to increase viscosity |
12/13/1988 | US4790661 Cross-mask holder device |
12/13/1988 | US4790642 Integrated metrology for microlithographic objective reducing lens |
12/13/1988 | US4790632 Liquid crystal device having the microlenses in correspondence with the pixel electrodes |
12/13/1988 | US4790262 Thin-film coating apparatus |
12/13/1988 | CA1246786A1 Blends of cyclic vinyl ether containing compounds and epoxides |
12/13/1988 | CA1246780A1 Compositions of matter which crosslink under the action of light in the presence of sensitisers |
12/13/1988 | CA1246759A1 X-ray lithography system |
12/13/1988 | CA1246384A1 Process for the production of images |
12/13/1988 | CA1246380A1 Light-sensitive planographic printing plate |
12/13/1988 | CA1246378A1 Light-sensitive mixture and copying material prepared with this mixture |
12/08/1988 | DE3720700C1 Verfahren zum Herstellen eines Mattdruckes auf Glanzoberflaechen A method for manufacturing a mat pressure to Glanzoberflaechen |
12/08/1988 | DE3716629A1 Heat-resistant positive resists, and process for the production of heat-resistant relief structures |
12/07/1988 | EP0294333A2 Composition for cationic polymerisation with hardening agents therefor |
12/07/1988 | EP0294325A2 Process of making a metallic pattern |
12/07/1988 | EP0294236A2 Image printers |
12/07/1988 | EP0294220A2 Photopolymerizable composition |
12/07/1988 | EP0293823A2 Deep-UV lithography |
12/07/1988 | EP0293704A2 Registration material with water soluble contrast enhaucement layer |
12/07/1988 | EP0293656A1 Process for producing images on photosensitive material |
12/07/1988 | EP0293643A2 Lithographic process having improved image quality |
12/07/1988 | EP0293466A1 Improving sensitivity of processless recording media |
12/07/1988 | EP0293463A1 Recording medium of improved stability |
12/07/1988 | EP0293461A1 Holograms. |
12/07/1988 | EP0176555B1 Multilayer hybrid integrated circuit |
12/07/1988 | CN88101652A Imaging system with integral cover sheet |
12/06/1988 | USRE32795 Exposure apparatus for production of integrated circuit |
12/06/1988 | US4789877 Pressing device |
12/06/1988 | US4789786 Providing a mask substrate and selectively forming a metal layer to lower work function |
12/06/1988 | US4789625 Acrylated polyurethane |
12/06/1988 | US4789622 Containing radiation sensitive polyacetylenes |
12/06/1988 | US4789621 Screen emulsions comprised of diacetone acrylamide |
12/06/1988 | US4789620 Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates |
12/06/1988 | US4789619 Acid-cleavable systems; sharpness; contrast; irreversible |
12/06/1988 | US4789427 Method for removing resist from semiconductor device |
12/06/1988 | US4789222 Illuminating optical system |
12/01/1988 | WO1988009565A1 Xenon short-arc discharge lamp |
12/01/1988 | WO1988009527A2 Silicon-containing negative resist material, and process for its use in patterning substrates |
12/01/1988 | WO1988009252A1 Replicating process for interference patterns |
11/30/1988 | EP0293058A2 A positive photosensitive resinous composition |
11/30/1988 | EP0292976A2 Scanning type projection exposure system |
11/30/1988 | EP0292868A2 Light sensitive composition, registration material containing it and process for the fabrication of heat resistant relief structures |
11/30/1988 | EP0292821A2 Image reversal process for normally positive photoresists |
11/30/1988 | EP0292519A1 Process and device for generating material structures of atomic dimensions. |
11/30/1988 | CN88102898A Method for providing design pattern on metal stencil and metal stencil having patternable covering layer |
11/30/1988 | CN87202925U Dual-purpose plate-making machine for liquid and solid photosensing resin plate |
11/29/1988 | US4788698 X-ray exposure system |
11/29/1988 | US4788577 Substrate surface deflecting device |
11/29/1988 | US4788127 For semiconductor wafers, heat resistance |
11/29/1988 | US4788126 Radiation dosimeter and method for measuring radiation dosage |
11/29/1988 | US4788125 Imaging materials employing microparticles including a silver initiator |
11/29/1988 | US4788124 Ionic dye-reactive counter ion compound |
11/29/1988 | US4788117 Semiconductor device fabrication including a non-destructive method for examining lithographically defined features |
11/29/1988 | US4788115 Processing holograms |
11/29/1988 | US4787615 Device for automatically supplying/discharging photosensitive material in an inclined-type step and repeat machine |
11/23/1988 | EP0292323A2 Imaging method |
11/23/1988 | EP0292236A2 Computer aided discrete traveler system for integrated control |
11/23/1988 | EP0292219A2 Printed circuit board fabrication |
11/23/1988 | EP0291994A2 Photoresist composition and photoresist material prepared therefrom, containing blocked monomer imide groups, and a suitable maleic-acid monomer |
11/23/1988 | EP0291977A2 Patterned metal interlayer in a matrix |
11/23/1988 | EP0291929A2 Method of manufacturing shadow masks |
11/23/1988 | EP0291928A2 Hologram member |
11/23/1988 | EP0291881A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom |
11/23/1988 | EP0291880A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom |
11/23/1988 | EP0291879A1 Photopolymerisable recording materials as well as photoresist layers and planographic printing plates on a basis of these recording materials as well as quinazolone-4 compounds |
11/23/1988 | EP0291878A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom |
11/23/1988 | EP0291861A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom |
11/23/1988 | EP0291786A2 Removal of residual catalyst from a dielectric substrate |
11/23/1988 | EP0291779A2 Heat-resistant positive resist, and process for the production of heat-resistant resist patterns |
11/23/1988 | EP0291670A1 Vapor phase photoresist silylation process |
11/23/1988 | EP0291647A2 High resolution electron beam lithographic technique |
11/22/1988 | US4786948 Printer |
11/22/1988 | US4786947 Projection exposure apparatus |
11/22/1988 | US4786586 Isocyanate modified butadiene or isobutylene polymer with (meth)acrylate diluent |
11/22/1988 | US4786582 Sodium, lithium or potassium phosphates, salicylates, carbonates, bicarbonates, benzoates and sulfates |
11/22/1988 | US4786581 Gumming solution for use in the burning-in of offset-printing plates comprising water, a hydrophilic polymer and an organic acid derivative |
11/22/1988 | US4786580 Method of developing imaged diazo material with propanol containing developer composition |
11/22/1988 | US4786579 Heat-resistant photosensitive resin composition |
11/22/1988 | US4786578 Agent and method for the removal of photoresist and stripper residues from semiconductor substrates |
11/22/1988 | US4786577 Lithographic printing plates, color proofing sheets, integrated circuits, photomasks |
11/22/1988 | US4786569 Adhesively bonded photostructurable polyimide film |
11/22/1988 | US4786537 Self-weeding dry transfer article |
11/22/1988 | US4786417 Management of photoresist materials containing waste solution |
11/22/1988 | US4786358 Method for forming a pattern of a film on a substrate with a laser beam |
11/22/1988 | US4786188 Purge air system for a combustion instrument |