Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
12/1988
12/14/1988EP0294953A2 Photopolymerisable compositions
12/14/1988EP0294665A2 Process for the production of a colour image
12/14/1988EP0294611A1 Process for the selective additive correction of defects in copying layers
12/14/1988EP0294610A1 Single-stage electrochemical process for the production of images for reproduction layers
12/14/1988EP0294379A1 Purge air system for a combustion instrument
12/14/1988CN88102931A Method for manufacturing shadow masks
12/14/1988CN88101184A Pressure development apparatus for imaging sheets employing photosensitive microcapsules
12/13/1988US4791458 Multi-purpose apparatus for the imaging of printed wired boards
12/13/1988US4791213 2-hydroxy-3-thioxathonyloxy-1-propanaminium salts
12/13/1988US4791176 With alkenyl silane monomer; positive photoresist; oxygen-etching resistance; solvent-soluble
12/13/1988US4791047 Shavings, impurities absorbed by buffer layer
12/13/1988US4791046 Process for forming mask patterns of positive type resist material with trimethylsilynitrile
12/13/1988US4791045 Photosensitizers and polymerizable compositions with mannich bases and iodonium salts
12/13/1988US4791043 Positive photoresist stripping composition
12/13/1988US4791039 Polycarbazole and aromatic colorant
12/13/1988US4791004 Flowing liquid film onto supports; heating and/or irradiating to increase viscosity
12/13/1988US4790661 Cross-mask holder device
12/13/1988US4790642 Integrated metrology for microlithographic objective reducing lens
12/13/1988US4790632 Liquid crystal device having the microlenses in correspondence with the pixel electrodes
12/13/1988US4790262 Thin-film coating apparatus
12/13/1988CA1246786A1 Blends of cyclic vinyl ether containing compounds and epoxides
12/13/1988CA1246780A1 Compositions of matter which crosslink under the action of light in the presence of sensitisers
12/13/1988CA1246759A1 X-ray lithography system
12/13/1988CA1246384A1 Process for the production of images
12/13/1988CA1246380A1 Light-sensitive planographic printing plate
12/13/1988CA1246378A1 Light-sensitive mixture and copying material prepared with this mixture
12/08/1988DE3720700C1 Verfahren zum Herstellen eines Mattdruckes auf Glanzoberflaechen A method for manufacturing a mat pressure to Glanzoberflaechen
12/08/1988DE3716629A1 Heat-resistant positive resists, and process for the production of heat-resistant relief structures
12/07/1988EP0294333A2 Composition for cationic polymerisation with hardening agents therefor
12/07/1988EP0294325A2 Process of making a metallic pattern
12/07/1988EP0294236A2 Image printers
12/07/1988EP0294220A2 Photopolymerizable composition
12/07/1988EP0293823A2 Deep-UV lithography
12/07/1988EP0293704A2 Registration material with water soluble contrast enhaucement layer
12/07/1988EP0293656A1 Process for producing images on photosensitive material
12/07/1988EP0293643A2 Lithographic process having improved image quality
12/07/1988EP0293466A1 Improving sensitivity of processless recording media
12/07/1988EP0293463A1 Recording medium of improved stability
12/07/1988EP0293461A1 Holograms.
12/07/1988EP0176555B1 Multilayer hybrid integrated circuit
12/07/1988CN88101652A Imaging system with integral cover sheet
12/06/1988USRE32795 Exposure apparatus for production of integrated circuit
12/06/1988US4789877 Pressing device
12/06/1988US4789786 Providing a mask substrate and selectively forming a metal layer to lower work function
12/06/1988US4789625 Acrylated polyurethane
12/06/1988US4789622 Containing radiation sensitive polyacetylenes
12/06/1988US4789621 Screen emulsions comprised of diacetone acrylamide
12/06/1988US4789620 Liquid photosensitive resin composition containing carboxylated epoxy acrylates or methacrylates
12/06/1988US4789619 Acid-cleavable systems; sharpness; contrast; irreversible
12/06/1988US4789427 Method for removing resist from semiconductor device
12/06/1988US4789222 Illuminating optical system
12/01/1988WO1988009565A1 Xenon short-arc discharge lamp
12/01/1988WO1988009527A2 Silicon-containing negative resist material, and process for its use in patterning substrates
12/01/1988WO1988009252A1 Replicating process for interference patterns
11/1988
11/30/1988EP0293058A2 A positive photosensitive resinous composition
11/30/1988EP0292976A2 Scanning type projection exposure system
11/30/1988EP0292868A2 Light sensitive composition, registration material containing it and process for the fabrication of heat resistant relief structures
11/30/1988EP0292821A2 Image reversal process for normally positive photoresists
11/30/1988EP0292519A1 Process and device for generating material structures of atomic dimensions.
11/30/1988CN88102898A Method for providing design pattern on metal stencil and metal stencil having patternable covering layer
11/30/1988CN87202925U Dual-purpose plate-making machine for liquid and solid photosensing resin plate
11/29/1988US4788698 X-ray exposure system
11/29/1988US4788577 Substrate surface deflecting device
11/29/1988US4788127 For semiconductor wafers, heat resistance
11/29/1988US4788126 Radiation dosimeter and method for measuring radiation dosage
11/29/1988US4788125 Imaging materials employing microparticles including a silver initiator
11/29/1988US4788124 Ionic dye-reactive counter ion compound
11/29/1988US4788117 Semiconductor device fabrication including a non-destructive method for examining lithographically defined features
11/29/1988US4788115 Processing holograms
11/29/1988US4787615 Device for automatically supplying/discharging photosensitive material in an inclined-type step and repeat machine
11/23/1988EP0292323A2 Imaging method
11/23/1988EP0292236A2 Computer aided discrete traveler system for integrated control
11/23/1988EP0292219A2 Printed circuit board fabrication
11/23/1988EP0291994A2 Photoresist composition and photoresist material prepared therefrom, containing blocked monomer imide groups, and a suitable maleic-acid monomer
11/23/1988EP0291977A2 Patterned metal interlayer in a matrix
11/23/1988EP0291929A2 Method of manufacturing shadow masks
11/23/1988EP0291928A2 Hologram member
11/23/1988EP0291881A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom
11/23/1988EP0291880A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom
11/23/1988EP0291879A1 Photopolymerisable recording materials as well as photoresist layers and planographic printing plates on a basis of these recording materials as well as quinazolone-4 compounds
11/23/1988EP0291878A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom
11/23/1988EP0291861A2 Photopolymerisable registration materials, photoresist layers, and lithographic-printing plates made therefrom
11/23/1988EP0291786A2 Removal of residual catalyst from a dielectric substrate
11/23/1988EP0291779A2 Heat-resistant positive resist, and process for the production of heat-resistant resist patterns
11/23/1988EP0291670A1 Vapor phase photoresist silylation process
11/23/1988EP0291647A2 High resolution electron beam lithographic technique
11/22/1988US4786948 Printer
11/22/1988US4786947 Projection exposure apparatus
11/22/1988US4786586 Isocyanate modified butadiene or isobutylene polymer with (meth)acrylate diluent
11/22/1988US4786582 Sodium, lithium or potassium phosphates, salicylates, carbonates, bicarbonates, benzoates and sulfates
11/22/1988US4786581 Gumming solution for use in the burning-in of offset-printing plates comprising water, a hydrophilic polymer and an organic acid derivative
11/22/1988US4786580 Method of developing imaged diazo material with propanol containing developer composition
11/22/1988US4786579 Heat-resistant photosensitive resin composition
11/22/1988US4786578 Agent and method for the removal of photoresist and stripper residues from semiconductor substrates
11/22/1988US4786577 Lithographic printing plates, color proofing sheets, integrated circuits, photomasks
11/22/1988US4786569 Adhesively bonded photostructurable polyimide film
11/22/1988US4786537 Self-weeding dry transfer article
11/22/1988US4786417 Management of photoresist materials containing waste solution
11/22/1988US4786358 Method for forming a pattern of a film on a substrate with a laser beam
11/22/1988US4786188 Purge air system for a combustion instrument