Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
11/1988
11/22/1988US4786166 Determination of focal plane for a scanning projection aligner
11/22/1988US4785496 Hingeable plate assembly and displaceable hinge therefor
11/22/1988EP0190227A4 Product and process for producing an image on a substrate.
11/17/1988EP0291137A1 Method for providing a design pattern on a metal stencil and metal stencil having a patternable covering layer
11/17/1988EP0290917A2 Process for developing dry lithographic printing plates
11/17/1988EP0290916A2 Radiation-sensitive registration material
11/17/1988EP0290670A2 Pattern production process
11/17/1988EP0185016B1 Method of applying poly(methacrylic anhydride) resist to a semiconductor
11/15/1988US4785335 Method of printing through contact exposure in step-and-repeat machine
11/15/1988US4785332 Pressurizing image forming apparatus
11/15/1988US4785316 Image recording device
11/15/1988US4785192 Maintaining optical signals in prescribed alignment with respect to workpiece in movable equipment
11/15/1988US4785074 Radiation-sensitive polycondensates, processes for their preparation, coated material and its use
11/15/1988US4785062 Lithographic plates
11/15/1988US4784937 Developing solution for positive-working photoresist comprising a metal ion free organic base and an anionic surfactant
11/15/1988US4784936 Multilayer photoresists, nonionic surfactant
11/15/1988US4784935 Polychromatic and monochromatic light openings, x-rays lithography
11/15/1988US4784934 Polyacetylenic compounds coated on a film, aging
11/15/1988US4784933 Method for making lithographic printing plate using light wavelengths over 700 μm
11/15/1988US4784932 Image-forming method employing light-sensitive material and image-receiving material
11/15/1988US4784169 Apparatus for treating articles with solution to remove solids and then filtering the solution
11/15/1988CA1244995A1 Polyimides, a process for their preparation and their use
11/15/1988CA1244790A1 Roller engaging and disengaging device
11/10/1988DE3813457A1 Photosensitive composition
11/10/1988DE3813322A1 Colour image recording material, and the use thereof
11/10/1988DE3812636A1 Water-soluble, photosensitive composition
11/10/1988DE3714597A1 Workpiece, in particular semiconductor component, having fine patterns and lithographic method of patterning
11/10/1988DE3713606A1 Method for producing clock collages or parts thereof
11/09/1988EP0290245A2 Baking of lithographic plates
11/09/1988EP0290133A2 Ternary photoinitiator system for addition polymerization
11/09/1988EP0289595A1 Multilayer resist structure
11/08/1988US4783683 Image recording apparatus
11/08/1988US4783391 Radiation-sensitive polyamide polymer composition with anthraquinone monoazide
11/08/1988US4783390 Multicolor diazo image-forming material
11/08/1988US4783372 Homopolymers, copolymers and coated material and its use
11/08/1988CA1244587A1 Modified phenolic resins
11/08/1988CA1244579A1 Radiation-sensitive coating agent and its use
11/03/1988WO1988008360A1 Process for manufacturing a structured ceramic film or a ceramic object composed of such films
11/03/1988WO1988008337A1 Additive method for manufacturing printed circuit boards using aqueous alkaline developable and strippable photoresists
11/02/1988EP0289174A2 Antireflection coatings for use in photolithography
11/02/1988EP0288533A1 Image reversal system and process
11/02/1988EP0288491A1 Selective metallization process, additive method for manufacturing printed circuit boards, and composition for use therein.
11/02/1988EP0185030B1 Bilevel resist
11/01/1988US4782364 Recording apparatus
11/01/1988US4782352 Capsule rupture printing system
11/01/1988US4782009 Method of coating and imaging photopatternable silicone polyamic acid
11/01/1988US4782008 Plasma-resistant polymeric material, preparation thereof, and use thereof
11/01/1988US4782007 Additive method for manufacturing printed circuit boards using aqueous alkaline developable and strippable photoresists
11/01/1988US4782005 N,N'-diorgano dicarboxamides as oxygen inhibitors in radiation sensitive acrylate compositions
11/01/1988US4782003 Prevention of undesired coloring
11/01/1988US4782002 Particles to protect microcapsules from premature rupturing
11/01/1988US4781942 Process for the photochemical vapor deposition of siloxane polymers
11/01/1988US4781941 Method of matting pre-sensitized plates
11/01/1988CA1244145A1 Process for forming planar chip-level wiring
11/01/1988CA1243880A1 Treatment of image-forming laminated plate
11/01/1988CA1243878A1 Method for making a negative working lithographic printing plate
11/01/1988CA1243876A1 Aqueous-alkaline developer for negative-working reproduction layers
10/1988
10/27/1988DE3811832A1 Dry, presensitised plate, and process for production of a lithographic printing plate
10/26/1988EP0288153A2 Screen Compositions
10/26/1988EP0287818A2 Polymerisable compounds and mixture containing them polymerisable by radiation
10/26/1988EP0287817A2 Photopolymerisable composition and registration material prepared therewith
10/26/1988EP0287750A2 Photoactive curcumin derivatives
10/25/1988US4780903 X-ray source
10/25/1988US4780747 Projection exposure apparatus
10/25/1988US4780617 Method for successive alignment of chip patterns on a substrate
10/25/1988US4780616 Projection optical apparatus for mask to substrate alignment
10/25/1988US4780606 Projection aligner method utilizing monitoring of light quantity
10/25/1988US4780396 Organic solvent free developer compositions for lithographic plates having neutral pH comprising a lithium and potassium salt and an anionic surfactant
10/25/1988US4780393 Polymeric binder, terminal ethylenic compound, photoinitiator, levco base of triarylmethane dye and photoc romic spiro-indolino-benzopyran compound
10/25/1988US4780392 Radiation-polymerizable composition and element containing a photopolymerizable acrylic monomer
10/25/1988US4780391 Color-image recording material
10/25/1988US4780371 Electrically conductive composition and use thereof
10/25/1988US4780177 Excimer laser patterning of a novel resist
10/25/1988US4779966 Single mirror projection optical system
10/25/1988US4779562 Apparatus for depositing mono-molecular layer
10/19/1988EP0287404A2 Pressure developer
10/19/1988EP0287222A2 Negative-working photoresists
10/19/1988EP0287212A1 Positive photosensitive planographic printing plate
10/19/1988EP0287020A2 Aqueous developable, curable composition of matter
10/19/1988EP0287019A2 Aqueous developable, radiation curable composition
10/19/1988EP0286961A2 Pull-raising member and pull-raising unit for peeling thin film
10/19/1988EP0286919A2 Process for the production and transfer of a multicolour image
10/19/1988CN87215291U End tooth circular incision machine
10/18/1988US4778859 Heat resistance films
10/18/1988US4778847 Preparation of carboxylates of hydroxyl-containing polymers
10/18/1988US4778747 Method of manufacturing optical memory element
10/18/1988US4778739 Reworking developed layer, release agent of polyethersulfone powder in n-methylpyrrolidone with absorptive dye
10/18/1988US4778738 Coating with different phosphors; cyclic array of elements
10/18/1988US4778256 Impregnating porous transparent base with photo-decomposable compounds; radiation of decreasing intensity
10/18/1988CA1243447A1 Photopolymer process and composition employing a photooxidizable component capable of forming endoperoxides
10/18/1988CA1243427A1 Laser pattern generation apparatus
10/18/1988CA1243417A1 Printed circuit board laminating apparatus
10/18/1988CA1243402A1 Methods of preparing and applying subbing layers for optical data disks
10/18/1988CA1243325A1 Liquid thioxanthonecarboxylic acid esters
10/12/1988EP0286594A2 Process for the production of photographically structurable coatings
10/12/1988EP0286272A2 High contrast, positive photoresist developer containing alkanolamine
10/12/1988EP0286146A2 End sensor
10/12/1988EP0286020A2 Method of joining the cut-up edges of photopolymerised flexographic formes
10/12/1988EP0286018A2 Exposure mask for materials coated with a photosensitive layer
10/12/1988EP0285797A2 Process for obtaining resist structures