| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
|---|
| 01/11/1989 | EP0181343B1 Method of applying a protective layer on a surface to be subjected to etching |
| 01/11/1989 | CN1030305A Plate printing apparatus |
| 01/11/1989 | CN1030206A Material used for printing stencil |
| 01/10/1989 | US4797710 Heat developing device |
| 01/10/1989 | US4797696 Beam splitting apparatus |
| 01/10/1989 | US4797348 Crosslinking, development |
| 01/10/1989 | US4797347 Process for producing electrically conductive coating |
| 01/10/1989 | US4797346 Light-sensitive composition for positive-type light-sensitive lithographic printing plates |
| 01/10/1989 | US4797345 Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters of cycloalkyl substituted phenol and their use in light-sensitive mixtures |
| 01/10/1989 | US4797343 Light-sensitive material containing silver halide, reducing agent and polymerizable compound |
| 01/10/1989 | US4797334 Patterning optical and X-ray masks for integrated circuit fabrication |
| 01/10/1989 | US4797316 Etched glass and process of manufacturing same |
| 01/10/1989 | US4796999 Device for automatically determining the deviation between the structures of a pattern and those of an object compared therewith |
| 01/10/1989 | CA1248403A1 Bilevel resist |
| 01/10/1989 | CA1248402A1 Method of making articles using gas functionalized plasma developed layer |
| 01/10/1989 | CA1248401A1 Process for producing negative copies by means of a material based on 1,2-quinone diazides |
| 01/10/1989 | CA1248400A1 Photopatternable polyimide compositions and method for making |
| 01/10/1989 | CA1248388A1 Method for making dry planographic printing plate |
| 01/05/1989 | DE3821231A1 Stripper solution for cured positive photoresists |
| 01/04/1989 | EP0298034A2 Substituted anthraquinones and their use in epoxy resins |
| 01/04/1989 | EP0298033A2 Light-sensitive epoxy resins and their use |
| 01/04/1989 | EP0298032A2 Anthrachinoylcarboxylic acid hydrazide, curable compositions and their use |
| 01/04/1989 | EP0298031A1 Substituted anthraquinones and curable compositions |
| 01/04/1989 | EP0298030A2 Process for forming images |
| 01/04/1989 | EP0297873A2 Novel polymethine dyes and imaging compositions |
| 01/04/1989 | EP0297872A2 Novel polymethine dyes and UV absorbers and imaging materials for their use |
| 01/04/1989 | EP0297871A2 Novel polymethine dyes and UV absorbers and imaging materials for their use |
| 01/04/1989 | EP0297825A1 Light-sensitive 1,2-naphthoquinone-2-diazide-4-sulfonic acid monoesters and their use in light-sensitive mixtures |
| 01/04/1989 | EP0297583A2 Photosensitive material and image forming method by use thereof |
| 01/04/1989 | EP0297506A2 Removal of particles from solid-state surfaces by laser bombardement |
| 01/04/1989 | EP0297443A2 Light sensitive mixture for light sensitive coating materials |
| 01/04/1989 | EP0297442A1 Sulfonium salts comprising groups which are labile in acid environment |
| 01/04/1989 | EP0297247A1 Electron beam writing method and system using large range deflection in combination with a continuously moving table |
| 01/04/1989 | EP0297179A1 Process for the production of inverted micelles |
| 01/04/1989 | EP0297161A1 Projection exposure system |
| 01/04/1989 | EP0297153A1 Novel photosensitive resin compositions |
| 01/03/1989 | US4796194 Real world modeling and control process |
| 01/03/1989 | US4796042 Printing plate processor having recirculating water wash reclamation |
| 01/03/1989 | US4796038 Laser pattern generation apparatus |
| 01/03/1989 | US4796036 Capsule rupture printing system |
| 01/03/1989 | US4795829 Heat resistant molding materials for photoresists |
| 01/03/1989 | US4795766 Of ethylenically unsaturated compounds; printing ink |
| 01/03/1989 | US4795693 Rubber modified epoxy resin |
| 01/03/1989 | US4795692 Negative-working polymers useful as X-ray or E-beam resists |
| 01/03/1989 | US4795244 Projection type exposure apparatus |
| 01/03/1989 | CA1248278A1 Radiation-sensitive coating agent |
| 01/03/1989 | CA1248093A1 Organometallic compounds |
| 01/03/1989 | CA1247917A1 Articles having stabilized photosensitive diazo resin |
| 01/03/1989 | CA1247914A1 Developer for enhancing apparent photospeed of diazonium plates |
| 12/29/1988 | WO1988010194A1 Process for producing a flat texture-patterned print on shiny surfaces |
| 12/29/1988 | DE3800131A1 Lichtempfindliche zusammensetzung The light-sensitive composition |
| 12/29/1988 | DE3720465A1 Adhesion promoter for negative resist for the purpose of etching deep trenches in silicon wafers having a smooth surface, and method for preparing the adhesion promoter |
| 12/28/1988 | EP0297052A2 Photopolymerisable composition |
| 12/28/1988 | EP0297051A2 Photopolymerisable composition |
| 12/28/1988 | EP0297050A2 Photopolymerisable composition |
| 12/28/1988 | EP0296659A1 Drive mechanism having a pressure member |
| 12/28/1988 | EP0296249A1 Method and apparatus for recovering and reusing resist composition |
| 12/28/1988 | EP0296235A1 Flowing gas seal enclosure for processing workpiece surface with controlled gas environment and intense laser irradiation |
| 12/28/1988 | EP0296192A1 X-Y-$g(U)-Z POSITIONING STAGE |
| 12/28/1988 | EP0167779B1 Polymerisable compounds with perfluoroalkyl groups, registration layers containing them and their use in dry lithography |
| 12/28/1988 | CA1247782A Catalysis of urethane modification of polymers |
| 12/28/1988 | CA1247751A Raised relief circuit board with soldered connections having nomenclature applied thereto |
| 12/28/1988 | CA1247636A Process for making photopolymerizable aromatic polyamic acid derivatives |
| 12/28/1988 | CA1247446A Multiple registration and imaging process to form a set of registered imaged elements |
| 12/28/1988 | CA1247445A Method of producing printing plates |
| 12/28/1988 | CA1247444A Automatic repetitive registration and imagewise exposure of sheet substrates |
| 12/28/1988 | CA1247443A Registering and exposing sheet substrates using photosensitive liquid |
| 12/28/1988 | CA1247442A Sequential automatic registration and imagewise exposure of a sheet substrate |
| 12/28/1988 | CA1247441A Controlled roughening of a photosensitive composition |
| 12/28/1988 | CA1247440A Radiation curable coating for photographic laminate |
| 12/28/1988 | CA1247436A Process of preparing toner treated with polymeric quaternary ammonium salt and slip agent |
| 12/28/1988 | CA1247435A Toners treated with polymeric quaternary ammonium salts and slip agent and process |
| 12/27/1988 | US4794061 Device for aligning a photomask onto a printed wiring board |
| 12/27/1988 | US4794021 Spin coating, controlled desolventizing |
| 12/27/1988 | US4793694 Method and apparatus for laser beam homogenization |
| 12/27/1988 | US4793692 Green phthalolyanine and yellow isoindolinone or anththraquinone colorants |
| 12/22/1988 | DE3816211A1 Presensitized dry plate |
| 12/22/1988 | DE3718980A1 Step-and-repeat machine (repeater) |
| 12/21/1988 | EP0295944A2 Photosensitive resin composition and printing plate prepared therefrom |
| 12/21/1988 | EP0295818A2 Improvements relating to relief printing plate manufacture |
| 12/21/1988 | EP0295626A2 Photosensitive composition |
| 12/21/1988 | EP0295547A2 Composition curable by photopolymerization |
| 12/21/1988 | EP0295545A2 Heat relief stamping plates hardened by photopolymerisation |
| 12/21/1988 | EP0295465A1 Light sensitive composition with 1,2-naphthoquinonediazide, light sensitive registration material prepared therefrom and use thereof |
| 12/21/1988 | EP0295457A2 Method for forming pattern by using graft copolymerization |
| 12/21/1988 | EP0295344A1 Imaging material and an image-forming process |
| 12/21/1988 | CN87103740A Sensitizing glue for plate-making of screen process press |
| 12/20/1988 | US4792693 Step-and-repeat exposure method |
| 12/20/1988 | US4792517 Metal strip, photoresists |
| 12/20/1988 | US4792516 Photosensitive composition |
| 12/20/1988 | US4792514 Light-sensitive material |
| 12/20/1988 | US4792506 Free radical polymerization of vinyl monomers |
| 12/20/1988 | US4791880 Device for developing treatment of semiconductor materials |
| 12/15/1988 | WO1988009961A1 Arrangement for producing a structure by means of photolithography and manufacturing process thereof |
| 12/15/1988 | WO1988009945A1 Positioning apparatus particularly for use in a vacuum environment |
| 12/15/1988 | WO1988009527A3 Silicon-containing negative resist material, and process for its use in patterning substrates |
| 12/15/1988 | EP0280708A4 Photoengraving articles and methods of producing such articles. |
| 12/14/1988 | EP0295211A2 Photoresist composition |
| 12/14/1988 | EP0295053A2 Method of controlling variation of density of images in 3-D pictures |
| 12/14/1988 | EP0295044A2 Photoinitiator and photopolymerizable composition using the same |