| Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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| 06/06/1989 | US4837125 Electron-beam-sensitive resist material for microstructures in electronics |
| 06/06/1989 | US4837124 Mixtures of photsensitive acid and addition polymer having imide groups blocked by labile acid; resolution; contrast |
| 06/06/1989 | US4837122 Deleting fluid for printing plates and method for deletion |
| 06/06/1989 | US4837121 Positive-working photoresists |
| 06/06/1989 | US4837106 Recording materials containing photopolymerizable composition and component capable of causing a color reaction in microcapsules |
| 06/06/1989 | US4836902 Plasma gases; by-product ultraviolet radiation absorption baffles |
| 06/06/1989 | US4836689 Asymmetric purge air system for cleaning a lens |
| 06/06/1989 | CA1255412A1 Photosensitive resin composition |
| 06/06/1989 | CA1255142A1 Method and composition of matter for improving conductor resolution in microelectronic circuits |
| 06/01/1989 | WO1989004849A1 Thermally stable phenolic resin compositions and their use in light-sensitive compositions |
| 05/31/1989 | EP0318336A2 Dye-sensitive photopolymerizable compositions |
| 05/31/1989 | EP0318324A2 Photosensitive resin composition and method for forming patterns using the same |
| 05/31/1989 | EP0318037A2 Method for forming a fine pattern by using a patterned resist layer |
| 05/31/1989 | EP0317944A2 Polymers prepared from 4,4'-bis-(2-(amino (halo) phenoxyphenyl) hexafluoroisopropyl) diphenyl ether |
| 05/31/1989 | EP0317943A2 Polymers prepared from 4,4'-bis-[2-(3,4-(dicarboxyphenyl) hexafluoroisopropyl] diphenyl ether dianhydride |
| 05/31/1989 | EP0317942A2 Heat resistant polyamides and polybenzoxazoles from bis-[(aminohydroxyphenyl hexafluoro-isopropyl] diphenyl ethers |
| 05/31/1989 | EP0317941A2 Photosensitive polyimide polymer compositions |
| 05/31/1989 | EP0317842A2 Process and device for coating a sheet-like substrate |
| 05/30/1989 | US4835704 Adaptive lithography system to provide high density interconnect |
| 05/30/1989 | US4835698 Sheet feeder synchronization system having error correction means |
| 05/30/1989 | US4835272 Process for formation of base and light-sensitive material |
| 05/30/1989 | US4835193 Photopolymerizable epoxy resin composition |
| 05/30/1989 | US4835089 Resist pattern forming process with dry etching |
| 05/30/1989 | US4835088 Method and apparatus for generating high-resolution images |
| 05/30/1989 | US4835086 Polysulfone barrier layer for bi-level photoresists |
| 05/30/1989 | US4835085 1,2-Naphthoquinone diazide sulfonyl ester compound with linking benzotriazole groups and light-sensitive composition with compound |
| 05/30/1989 | US4834844 Process for the selective additive correction of voids in copying layers |
| 05/30/1989 | US4834834 Laser photochemical etching using surface halogenation |
| 05/30/1989 | US4834833 Grit blasting |
| 05/30/1989 | CA1254853A1 Impregnation of reinforcement with epoxide-phtopolymerizable compound composition to prepare prepregs |
| 05/30/1989 | CA1254789A1 Multilayer hybrid integrated circuit |
| 05/30/1989 | CA1254788A1 Copying materials |
| 05/30/1989 | CA1254787A1 Light-sensitive mixture, light-sensitive copying material prepared therefrom, and a process for the preparation of a printing form from the copying material |
| 05/30/1989 | CA1254786A1 Photosensitive material employing microcapsules having different photographic speeds |
| 05/30/1989 | CA1254782A1 Condenser system |
| 05/24/1989 | EP0317529A1 Burn-out frame for a copy print machine |
| 05/24/1989 | EP0317246A2 Apparatus to develop an image on a sheet of developing paper |
| 05/24/1989 | EP0316706A2 Polymerizable compounds and mixture polymerizable by radiation containing them |
| 05/24/1989 | EP0316705A2 Light sensitive printing plate for dry lithographic printing |
| 05/24/1989 | EP0316667A2 Storage stable positive photoresist composition |
| 05/24/1989 | EP0316618A2 Multilayer flat light sensitive registration material |
| 05/24/1989 | EP0316407A1 Replicating process for interference patterns |
| 05/24/1989 | EP0316396A1 Positioning apparatus particularly for use in a vacuum environment |
| 05/24/1989 | EP0260258B1 Stretched, composite polyester films useable particularly for graphic arts |
| 05/23/1989 | USRE32928 Cold plasma etching |
| 05/23/1989 | US4833621 Method of and apparatus for aligning a substrate |
| 05/23/1989 | US4833067 Developing solution for positive-working photoresist comprising tmah and non-ionic surfactant |
| 05/23/1989 | US4833066 Method of producing a transfer print |
| 05/23/1989 | US4833062 Light-sensitive microcapsule containing polymerizable compound and silver halide, and light-sensitive material employing the same |
| 05/23/1989 | CA1254432A1 High-temperature resistant, selectively developable positive-working resist |
| 05/23/1989 | CA1254431A1 Negative-working, non-swelling resist |
| 05/23/1989 | CA1254429A1 Positive photoresist developer containing development modifiers |
| 05/18/1989 | WO1989004507A1 Pattern forming material and method for forming pattern |
| 05/17/1989 | EP0316207A2 Process for the fabrication of a holographic mirror |
| 05/17/1989 | EP0316027A2 Photocurable resin composition |
| 05/17/1989 | EP0315988A2 Photopolymerizable composition |
| 05/17/1989 | EP0315954A2 Pattern-forming material and pattern formation method |
| 05/17/1989 | EP0315748A2 Positive-working radiation-sensitive composistion and radiation-sensitive recording material produced therefrom |
| 05/16/1989 | US4831640 Illumination system for x-ray lithography |
| 05/16/1989 | US4831177 Acid-curable composition containing a masked curing catalyst, and a process for its preparation |
| 05/16/1989 | US4831063 Rapid curing of an unsaturated epoxy/organoaluminum compound mixture by adding a silylperoxy compound; paints; coatings |
| 05/16/1989 | US4830953 Radiation-sensitive coating composition with polyazide and polyimide and process of photo-crosslinking the coating |
| 05/16/1989 | US4830947 Light-sensitive material containing silver halide, reducing agent and polymerizable compound |
| 05/16/1989 | US4830941 Process for the manufacture of a relief element |
| 05/16/1989 | EP0313580A4 Radiation curable temporary solder mask. |
| 05/16/1989 | CA1254261A1 Long life x-ray source target |
| 05/16/1989 | CA1254073A1 Coated material and use thereof |
| 05/11/1989 | EP0174954A4 Method for making integrated circuit devices using a layer of indium arsenide as an antireflective coating. |
| 05/10/1989 | EP0315375A2 Multilayer resist material and pattern forming method using the same |
| 05/10/1989 | EP0315216A2 Polyimides, process for their preparation and their use |
| 05/10/1989 | EP0315165A2 Positive-type photosensitive electrodeposition coating composition |
| 05/10/1989 | EP0315152A2 Photoablation process for films based on polymers having a perfluoroalkylpolyether structure by means of excimer laser rays |
| 05/10/1989 | EP0315120A2 Photohardenable electrostatic master having improved backtransfer and charge decay |
| 05/10/1989 | EP0315116A2 Photohardenable electrostatic master containing electron acceptor or donor |
| 05/10/1989 | EP0315080A2 Light-sensitive composition |
| 05/10/1989 | EP0315073A2 A composition for pattern forming materials |
| 05/10/1989 | EP0314732A1 Xenon short-arc discharge lamp. |
| 05/10/1989 | CN1032871A Photohardenable composition |
| 05/10/1989 | CN1032807A Photocurable compositions containing photobleachable ionic dye complexes |
| 05/09/1989 | US4829536 Multi-mode narrow-band oscillation excimer laser |
| 05/09/1989 | US4829340 Picture forming apparatus |
| 05/09/1989 | US4829193 Projection optical apparatus with focusing and alignment of reticle and wafer marks |
| 05/09/1989 | US4828965 Aqueous developing solution and its use in developing positive-working photoresist composition |
| 05/09/1989 | US4828964 Underlay for lift-off |
| 05/09/1989 | US4828963 Printing plate having photosensitive polymer composition |
| 05/09/1989 | US4828960 Enhanced absorption of light at particular wavelength |
| 05/09/1989 | US4828959 Light-sensitive diazonium resin mixture and light-sensitive diazonium resin containing recording material with organic peroxide compound |
| 05/09/1989 | US4828958 Basic development, high resolution |
| 05/09/1989 | US4828949 Cathode ray tubes, ammonium dichromate, pigments, polyvinyl alcohol, glycol, leveling, development |
| 05/09/1989 | US4828948 Method for the production of heat-resistant structured layers |
| 05/09/1989 | US4828947 Method for making a relief pattern of a cured resin on a transparent colored layer |
| 05/09/1989 | US4828641 Partial polymerization of monomer in binder in gap |
| 05/09/1989 | US4827867 Resist developing apparatus |
| 05/09/1989 | US4827866 Method and apparatus for treating an article in a heated environment |
| 05/09/1989 | CA1253728A1 Radiation sensitive compositions |
| 05/05/1989 | WO1989003761A1 Fiber/resin composites, and method of making the same |
| 05/05/1989 | WO1989003728A1 Method and apparatus for processing and transporting sheet materials |
| 05/03/1989 | EP0314599A2 Method of selective reactive ion etching of substrates |
| 05/03/1989 | EP0314462A2 Image developing apparatus |
| 05/03/1989 | EP0314248A2 Presensitized imaging element suitable for use as a lithographic printing plate |