Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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04/11/1989 | US4820549 Photo-curable resist resin composition for electroless plating, process for preparing a printed circuit board with the said resist resin composition and a printed circuit board having resist prepared from the said resist resin composition |
04/11/1989 | CA1252330A1 Dye-containing layer of a photopolymerizable mixture, and the production of relief plates and printing plates |
04/06/1989 | DE3831290A1 Lichtempfindliches material und verfahren zur bildbildung The light-sensitive material and process for image formation |
04/05/1989 | EP0310139A2 Light-sensitive microcapsule and light-sensitive material employing the same |
04/05/1989 | EP0310124A2 Process for producing an X-ray mask |
04/05/1989 | EP0309947A2 Method for producing apertures on a lenslet array |
04/05/1989 | EP0309783A2 Radiation crosslinkable resins for applications in the electronic |
04/05/1989 | EP0309682A2 Reticulation resistant photoresist coating |
04/05/1989 | EP0309619A1 Radiation sensitive acrylate composition |
04/05/1989 | CN1032245A Offset printing material |
04/04/1989 | US4819033 Illumination apparatus for exposure |
04/04/1989 | US4819032 Belt tensioning mechanism in a thermally developing apparatus |
04/04/1989 | US4819024 Image-forming apparatus having shearing device for cutting image-wise exposed photosensitive web |
04/04/1989 | US4818885 Electron beam writing method and system using large range deflection in combination with a continuously moving table |
04/04/1989 | US4818838 Apparatus for preselecting and maintaining a fixed gap between a workpiece and a vacuum seal apparatus in particle beam lithography systems |
04/04/1989 | US4818661 Method for fabricating thin film metallic meshes for use as Fabry-Perot interferometer elements, filters and other devices |
04/04/1989 | US4818660 Photohardenable electrostatic master having improved backtransfer and charge decay |
04/04/1989 | US4818658 Photoactive esterification product of a diazooxide compound and a curcumin dye and photoresist materials with product |
04/04/1989 | US4818070 Acrylated resins; agreeable refractive indices |
04/04/1989 | CA1252228A2 Deep-uv lithography |
03/29/1989 | EP0308902A2 Method for forming pattern by using langmuir-blodgett film |
03/29/1989 | EP0308400A1 Processing of exposed lithographic printing plates. |
03/29/1989 | EP0301044A4 Photoresist stripper composition. |
03/29/1989 | EP0203931B1 Method of producing devices using nonplanar lithography |
03/29/1989 | CN1032081A Receiver sheet having thermal initiator thereon |
03/28/1989 | US4816876 Contrast control for lens |
03/28/1989 | US4816873 Imaging device |
03/28/1989 | US4816692 Pattern splicing system and method for scanning of electron beam system |
03/28/1989 | US4816496 Photocurable composition |
03/28/1989 | US4816383 Method for forming fine patterns of conjugated polymers |
03/28/1989 | US4816381 Lanthium substituted lead titanate zirconate |
03/28/1989 | US4816380 Water soluble contrast enhancement layer method of forming resist image on semiconductor chip |
03/28/1989 | US4816379 Production of relief plates and printing plates by a positive-working method |
03/28/1989 | US4816377 Photolithographic method producing sub-micron patterns in the manufacture of electronic microcircuits |
03/28/1989 | US4816375 Photosolubilizable composition with silyl ether or silyl ester compound |
03/28/1989 | US4816371 Curable capsules, rupturing |
03/28/1989 | US4816368 Photocurable compositions, initiator dyes |
03/28/1989 | US4816367 Multilayer capsules, developers |
03/28/1989 | US4816361 Patterning optical and X-ray masks for integrated circuit fabrication |
03/28/1989 | US4816360 Reactive dyes, plastics |
03/28/1989 | US4816112 Planarization process through silylation |
03/28/1989 | CA1251884A1 Polyesters comprising recurring photoconductive and photocrosslinkable units and elements thereof |
03/28/1989 | CA1251680A1 Formation of etch-resistant resists through preferential permeation |
03/28/1989 | CA1251678A1 Aqueous-alkaline solution and process for developing positive-working reproduction layers |
03/28/1989 | CA1251677A1 Photosenstive microcapsules and method for preparing same |
03/23/1989 | DE3830440A1 Remover solution for photoresists |
03/22/1989 | EP0308274A2 Process for coating a substrate |
03/22/1989 | EP0308228A2 Receiver sheet |
03/22/1989 | EP0307951A2 Light-sensitive resin composition |
03/22/1989 | EP0307923A2 Resin composition curable with an active energy ray containing half-esterificated epoxy resin and monomer having ethylenically unsaturated bond |
03/22/1989 | EP0307922A2 Resin composition curable with an active energy ray containing half-esterificated epoxy resin as a constituent |
03/22/1989 | EP0307921A2 Resin composition curable with an active energy ray containing photopolymerizable polyurethane |
03/22/1989 | EP0307920A2 Resin composition curable with an active energy ray containing graft copolymerized polymer with trunk chain containing dicyclopentenyl group |
03/22/1989 | EP0307919A2 Resin composition curable with an active energy ray containing epoxy resin and monomer with ethylenically unsaturated bond |
03/22/1989 | EP0307918A2 Resin composition curable with an active energy ray containing epoxy resin containing at least a compound having one or more of epoxy group in the molecule |
03/22/1989 | EP0307906A1 Compensating eddy current effects in charged particle beam systems |
03/22/1989 | EP0307835A2 Process for detackifying photopolymer flexographic printing plates |
03/22/1989 | EP0307828A2 Light-sensitive composition and registration material prepared therefrom |
03/22/1989 | EP0307776A2 Light-sensitive printing plate for dry lithographic printing |
03/22/1989 | EP0307752A2 Poly(3-mono- and 3,5-disubstituted-4-acetoxystyrenes and 4-hydroxy-styrenes)and their use |
03/22/1989 | EP0307751A2 3-mono- and 3,5-disubstituted-4-acetoxy and -4-hydroxystyrenes and process for their production |
03/22/1989 | EP0307726A2 Semiconductor manufacturing process which compensates for the distortion between a pattern on a semiconductor body and the mask from which the pattern is derived |
03/22/1989 | EP0307596A2 Method of producing conductor networks |
03/22/1989 | CN1031899A Method for obtaining ultrathin protected phototools |
03/21/1989 | US4814830 Flat panel display device and manufacturing of the same |
03/21/1989 | US4814808 Developing apparatus for photo/pressure sensitive sheet |
03/21/1989 | US4814799 Method and apparatus for creating a photomask for projecting an image |
03/21/1989 | US4814626 Method for high precision position measurement of two-dimensional structures |
03/21/1989 | US4814625 Exposure apparatus having gas supplying means for air blow off |
03/21/1989 | US4814259 Laser generated electrically conductive pattern |
03/21/1989 | US4814258 PMGI bi-layer lift-off process |
03/21/1989 | US4814252 Light-sensitive material comprising light-sensitive layer provided on a paper support having a smooth surface on both sides |
03/21/1989 | US4814246 Light-sensitive photoconductive recording material with light sensitive covering layer for use in manufacturing printing form or printed circuit |
03/21/1989 | US4814244 Irradiating with ion beam |
03/21/1989 | US4814243 Thermocouple, computers, semiconductor manufacturing |
03/21/1989 | US4814233 Protective films, covertible to polyimides; tri-or tetra-carboxylic acids with benzophenone groups and diamines |
03/21/1989 | CA1251588A1 POLYMERS WITH GRAFT .alpha.-ALKYLACRYLATE FUNCTIONALITY |
03/21/1989 | CA1251363A1 Method of manufacturing a thin conductor device |
03/21/1989 | CA1251350A1 High contrast photoresist developer |
03/16/1989 | DE3729450A1 Process and device for coating both sides of a film web |
03/15/1989 | EP0307356A2 Organometallic compounds |
03/15/1989 | EP0307353A2 Organometal-containing polymers and their use |
03/15/1989 | EP0306784A2 Presensitized lithographic printing plate for dry lithography, and process for its production |
03/14/1989 | US4812962 Area feature sorting mechanism for neighborhood-based proximity correction in lithography processing of integrated circuit patterns |
03/14/1989 | US4812957 Optical system for uniform illumination of a plane surface |
03/14/1989 | US4812880 Exposure apparatus |
03/14/1989 | US4812661 Method and apparatus for hybrid I.C. lithography |
03/14/1989 | US4812551 Novolak resin for positive photoresist |
03/14/1989 | US4812542 Copolymers having o-nitrocarbinol ester groups and preparation thereof |
03/14/1989 | US4812488 Photocopolymerizable compositions based on hydroxyl-containing organic materials and substituted cycloaliphatic monoepoxide reactive diluents |
03/14/1989 | US4812440 Recording material containing leuco dye |
03/14/1989 | US4812388 Process to obtain thin film lines |
03/14/1989 | US4812384 Lithographic printing plates |
03/14/1989 | US4812354 Color image recording material |
03/14/1989 | US4812201 Method of ashing layers, and apparatus for ashing layers |
03/14/1989 | US4812200 Method for generating resist structures |
03/14/1989 | US4812028 Reflection type reduction projection optical system |
03/14/1989 | CA1251084A1 Tanning development in low silver photoimaging |
03/09/1989 | WO1989002175A1 Device for controlling the output of excimer laser |
03/09/1989 | WO1989002157A1 Target positioning for minimum debris |