Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176) |
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05/03/1989 | EP0314185A1 Pattern forming method |
05/03/1989 | EP0314037A2 Light-sensitive positive mixture containing a dye, and light-sensitive positive registration material prepared therefrom |
05/03/1989 | EP0314036A2 Apparatus for laminating and cutting photoresist webs |
05/03/1989 | EP0313993A1 Pattern forming method |
05/03/1989 | EP0313580A1 Radiation curable temporary solder mask. |
05/02/1989 | US4827356 Image recording apparatus capable of quickly discharging a recording paper |
05/02/1989 | US4827316 Printing frame |
05/02/1989 | US4827312 Image recording apparatus |
05/02/1989 | US4827284 Image recorder with a back-up roller pressing the nip roller into engagement |
05/02/1989 | US4827137 Soft vacuum electron beam patterning apparatus and process |
05/02/1989 | US4827118 Light-sensitive device having color filter and manufacturing method thereof |
05/02/1989 | US4827110 Method and apparatus for monitoring the location of wafer disks |
05/02/1989 | US4826943 Electron resists resistant to reactive ion etching |
05/02/1989 | US4826941 Process for the anionic polymerization of acrylic monomers and optionally of vinyl comonomers |
05/02/1989 | US4826888 Photopolymerizable composition |
05/02/1989 | US4826756 Crosslinking |
05/02/1989 | US4826755 Process of photoetching of superficial coatings based on polymeric materials |
05/02/1989 | US4826754 Method for anisotropically hardening a protective coating for integrated circuit manufacture |
05/02/1989 | US4826753 Triazine derivative |
05/02/1989 | US4826752 Dry photosensitive lithographic plate comprising a silicon rubber layer containing an aromatic aminosilane |
05/02/1989 | US4826751 Transfer-type photo-sensitive sheet |
05/02/1989 | US4826705 Radiation curable temporary solder mask |
05/02/1989 | US4826564 Method of selective reactive ion etching of substrates |
05/02/1989 | US4826291 Method for manufacturing diffraction grating |
05/02/1989 | CA1253369A1 Optical glass fibre having a synthetic resin cladding and method of manufacturing same |
04/27/1989 | DE3733874A1 Druckformherstellung mittels auswaschbarem bildtraeger Platemaking using washable bildtraeger |
04/26/1989 | EP0313221A2 Photostencils for screenprinting |
04/26/1989 | EP0313220A2 Photopolymers |
04/26/1989 | EP0313200A2 Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems |
04/26/1989 | EP0313111A2 Photoprinting with radiation transparent phototools |
04/26/1989 | EP0313013A2 System for modeling and displaying lithographic process |
04/26/1989 | EP0313007A2 Mixture polymerised by visible light |
04/26/1989 | EP0313006A2 Fhotopolymerizable composition comprising an initiator combination of 1,4-or 9,10-Dimethoxyanthracene and a trihalomethyl-(3H)-quinazolin-4-one |
04/26/1989 | EP0312950A2 Positive-working photosensitive composition containing a dye and positive-working photosensitive recording material prepared from this composition |
04/26/1989 | EP0312751A2 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therefrom |
04/26/1989 | EP0312624A1 Photosensitive composition |
04/26/1989 | EP0312551A1 Additive method for manufacturing printed circuit boards using aqueous alkaline developable and strippable photoresists |
04/25/1989 | US4825453 X-ray exposure apparatus |
04/25/1989 | US4825257 Picture recording method |
04/25/1989 | US4825256 Image recording device |
04/25/1989 | US4825251 Imaging process involving hardening of imaging web border area photosensitive microcapsules and an apparatus useful therein |
04/25/1989 | US4825247 Projection exposure apparatus |
04/25/1989 | US4825234 Cylindrical all around stereophotograph (photo-statue) and a cylindrical continuous photography with lenticule and its equipment |
04/25/1989 | US4825086 Apparatus for the exact mutual alignment of a mask and semiconductor wafer in a lithographic apparatus |
04/25/1989 | US4825041 Thermal developing apparatus |
04/25/1989 | US4824769 High contrast photoresist developer |
04/25/1989 | US4824768 From a thermally decomposable aluminum carboxylate compound |
04/25/1989 | US4824766 Chemical reaction product film; plasma etching |
04/25/1989 | US4824765 Dibenzalketones |
04/25/1989 | US4824763 Triamine positive photoresist stripping composition and prebaking process |
04/25/1989 | US4824762 Nontoxic to humans; pollution control |
04/25/1989 | US4824760 Lithographic printing plate with benzotriazoles improved in printing endurance |
04/25/1989 | US4824758 Photoresist compositions based on acetoxystyrene copolymers |
04/25/1989 | US4824757 Process for preparing positive-acting photosensitive lithographic aluminum printing plate precursor using nitric acid electrokyte for graining |
04/25/1989 | US4824756 Image-forming method employing light-sensitive material containing silver halide, reducing agent and a mixture of polymerizable compounds |
04/25/1989 | US4824755 Rupturing photosensitive microcapsules |
04/25/1989 | CA1253024A1 Positive, laminable proofing construction |
04/25/1989 | CA1253021A1 Alignment and focusing system for a scanning mask aligner |
04/20/1989 | WO1989003545A1 Production of formes using washable image carriers |
04/20/1989 | WO1989003402A1 Ultraviolet-absorbing polymer material and photoetching process |
04/20/1989 | DE3822099A1 Effecting accurate micro-manipulating |
04/19/1989 | EP0312341A2 High resolution imagery systems |
04/19/1989 | EP0312083A2 Pattern measurement method |
04/19/1989 | EP0312066A2 A guard ring for a differentially pumped seal apparatus |
04/19/1989 | EP0312002A2 Exposure apparatus |
04/19/1989 | EP0311926A2 Photopolymerisable composition |
04/19/1989 | EP0311817A2 Method for removing an ion-implanted organic resin layer during fabrication of semiconductor devices |
04/19/1989 | EP0311624A1 Improved registration method in photolithography and equipment for carrying out this method |
04/18/1989 | US4823014 Position detecting device usable with an object having a surface |
04/18/1989 | US4822975 Method and apparatus for scanning exposure |
04/18/1989 | US4822866 Plasma resistant photoresists; removable with weak alkaline solutions |
04/18/1989 | US4822723 Reduced odor |
04/18/1989 | US4822722 Addition of carboxylated surfactant and inorganic compound |
04/18/1989 | US4822721 Forming photoresist patterns |
04/18/1989 | US4822720 Water developable screen printing composition |
04/18/1989 | US4822719 Radiation-sensitive mixture, radiation-sensitive recording material containing said mixture, and process for preparing relief images |
04/18/1989 | US4822718 Light absorbing coating |
04/18/1989 | US4822717 Image-forming method employing light-sensitive material containing silver halide, reducing agent and polymerizable compound |
04/18/1989 | US4822716 Polysilanes, Polysiloxanes and silicone resist materials containing these compounds |
04/18/1989 | US4822714 Transfer imaging system |
04/18/1989 | US4822713 Lithographic printing plates |
04/18/1989 | US4822639 Spin coating method and device |
04/18/1989 | CA1252782A1 Perester compounds |
04/12/1989 | EP0311399A2 Registering to a moving web |
04/12/1989 | EP0311063A2 Process and device for treatment of a photographic recording material |
04/12/1989 | EP0311058A2 X-ray exposure apparatus |
04/12/1989 | EP0310881A2 Polymeric iodonium salts, method for making, and heat curable compositions |
04/12/1989 | EP0310631A1 Thermal stabilization of photoresist images |
04/12/1989 | CN2035895U Synchronous device for drum phototype setting machine |
04/11/1989 | US4821196 High resolution automatic focus correction electronic subsystem for E-beam lithography |
04/11/1989 | US4821072 Pressurizing-type image forming device |
04/11/1989 | US4820930 Photomask positioning device |
04/11/1989 | US4820829 Substituted o-phthalaldehydes |
04/11/1989 | US4820788 Etching resistant photoresist, barrier |
04/11/1989 | US4820621 Alkyl-substituted phenyl or naphthyl ether of polyoxyethylene glycol |
04/11/1989 | US4820619 Copolymer of glycidyl (meth-) acrylate or vinyl ether) with (meth-) acrylic amide or ester having quaternary ammonium salt |
04/11/1989 | US4820611 Titanium nitride as an antireflection coating on highly reflective layers for photolithography |
04/11/1989 | US4820610 Process for preparation of light-sensitive composition polymerizable composition containing a silver halide in-water emulsion |
04/11/1989 | US4820609 Crosslinked copolymer of phenylmethacrylate and methacrylic acid with zing bromide additive |
04/11/1989 | US4820607 Containing a compound capable of producing an acid by actinic radiation |