Patents
Patents for G03F 7 - Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor (127,176)
05/1989
05/03/1989EP0314185A1 Pattern forming method
05/03/1989EP0314037A2 Light-sensitive positive mixture containing a dye, and light-sensitive positive registration material prepared therefrom
05/03/1989EP0314036A2 Apparatus for laminating and cutting photoresist webs
05/03/1989EP0313993A1 Pattern forming method
05/03/1989EP0313580A1 Radiation curable temporary solder mask.
05/02/1989US4827356 Image recording apparatus capable of quickly discharging a recording paper
05/02/1989US4827316 Printing frame
05/02/1989US4827312 Image recording apparatus
05/02/1989US4827284 Image recorder with a back-up roller pressing the nip roller into engagement
05/02/1989US4827137 Soft vacuum electron beam patterning apparatus and process
05/02/1989US4827118 Light-sensitive device having color filter and manufacturing method thereof
05/02/1989US4827110 Method and apparatus for monitoring the location of wafer disks
05/02/1989US4826943 Electron resists resistant to reactive ion etching
05/02/1989US4826941 Process for the anionic polymerization of acrylic monomers and optionally of vinyl comonomers
05/02/1989US4826888 Photopolymerizable composition
05/02/1989US4826756 Crosslinking
05/02/1989US4826755 Process of photoetching of superficial coatings based on polymeric materials
05/02/1989US4826754 Method for anisotropically hardening a protective coating for integrated circuit manufacture
05/02/1989US4826753 Triazine derivative
05/02/1989US4826752 Dry photosensitive lithographic plate comprising a silicon rubber layer containing an aromatic aminosilane
05/02/1989US4826751 Transfer-type photo-sensitive sheet
05/02/1989US4826705 Radiation curable temporary solder mask
05/02/1989US4826564 Method of selective reactive ion etching of substrates
05/02/1989US4826291 Method for manufacturing diffraction grating
05/02/1989CA1253369A1 Optical glass fibre having a synthetic resin cladding and method of manufacturing same
04/1989
04/27/1989DE3733874A1 Druckformherstellung mittels auswaschbarem bildtraeger Platemaking using washable bildtraeger
04/26/1989EP0313221A2 Photostencils for screenprinting
04/26/1989EP0313220A2 Photopolymers
04/26/1989EP0313200A2 Apparatus and method for making large area electronic devices, such as flat panel displays and the like, using correlated, aligned dual optical systems
04/26/1989EP0313111A2 Photoprinting with radiation transparent phototools
04/26/1989EP0313013A2 System for modeling and displaying lithographic process
04/26/1989EP0313007A2 Mixture polymerised by visible light
04/26/1989EP0313006A2 Fhotopolymerizable composition comprising an initiator combination of 1,4-or 9,10-Dimethoxyanthracene and a trihalomethyl-(3H)-quinazolin-4-one
04/26/1989EP0312950A2 Positive-working photosensitive composition containing a dye and positive-working photosensitive recording material prepared from this composition
04/26/1989EP0312751A2 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therefrom
04/26/1989EP0312624A1 Photosensitive composition
04/26/1989EP0312551A1 Additive method for manufacturing printed circuit boards using aqueous alkaline developable and strippable photoresists
04/25/1989US4825453 X-ray exposure apparatus
04/25/1989US4825257 Picture recording method
04/25/1989US4825256 Image recording device
04/25/1989US4825251 Imaging process involving hardening of imaging web border area photosensitive microcapsules and an apparatus useful therein
04/25/1989US4825247 Projection exposure apparatus
04/25/1989US4825234 Cylindrical all around stereophotograph (photo-statue) and a cylindrical continuous photography with lenticule and its equipment
04/25/1989US4825086 Apparatus for the exact mutual alignment of a mask and semiconductor wafer in a lithographic apparatus
04/25/1989US4825041 Thermal developing apparatus
04/25/1989US4824769 High contrast photoresist developer
04/25/1989US4824768 From a thermally decomposable aluminum carboxylate compound
04/25/1989US4824766 Chemical reaction product film; plasma etching
04/25/1989US4824765 Dibenzalketones
04/25/1989US4824763 Triamine positive photoresist stripping composition and prebaking process
04/25/1989US4824762 Nontoxic to humans; pollution control
04/25/1989US4824760 Lithographic printing plate with benzotriazoles improved in printing endurance
04/25/1989US4824758 Photoresist compositions based on acetoxystyrene copolymers
04/25/1989US4824757 Process for preparing positive-acting photosensitive lithographic aluminum printing plate precursor using nitric acid electrokyte for graining
04/25/1989US4824756 Image-forming method employing light-sensitive material containing silver halide, reducing agent and a mixture of polymerizable compounds
04/25/1989US4824755 Rupturing photosensitive microcapsules
04/25/1989CA1253024A1 Positive, laminable proofing construction
04/25/1989CA1253021A1 Alignment and focusing system for a scanning mask aligner
04/20/1989WO1989003545A1 Production of formes using washable image carriers
04/20/1989WO1989003402A1 Ultraviolet-absorbing polymer material and photoetching process
04/20/1989DE3822099A1 Effecting accurate micro-manipulating
04/19/1989EP0312341A2 High resolution imagery systems
04/19/1989EP0312083A2 Pattern measurement method
04/19/1989EP0312066A2 A guard ring for a differentially pumped seal apparatus
04/19/1989EP0312002A2 Exposure apparatus
04/19/1989EP0311926A2 Photopolymerisable composition
04/19/1989EP0311817A2 Method for removing an ion-implanted organic resin layer during fabrication of semiconductor devices
04/19/1989EP0311624A1 Improved registration method in photolithography and equipment for carrying out this method
04/18/1989US4823014 Position detecting device usable with an object having a surface
04/18/1989US4822975 Method and apparatus for scanning exposure
04/18/1989US4822866 Plasma resistant photoresists; removable with weak alkaline solutions
04/18/1989US4822723 Reduced odor
04/18/1989US4822722 Addition of carboxylated surfactant and inorganic compound
04/18/1989US4822721 Forming photoresist patterns
04/18/1989US4822720 Water developable screen printing composition
04/18/1989US4822719 Radiation-sensitive mixture, radiation-sensitive recording material containing said mixture, and process for preparing relief images
04/18/1989US4822718 Light absorbing coating
04/18/1989US4822717 Image-forming method employing light-sensitive material containing silver halide, reducing agent and polymerizable compound
04/18/1989US4822716 Polysilanes, Polysiloxanes and silicone resist materials containing these compounds
04/18/1989US4822714 Transfer imaging system
04/18/1989US4822713 Lithographic printing plates
04/18/1989US4822639 Spin coating method and device
04/18/1989CA1252782A1 Perester compounds
04/12/1989EP0311399A2 Registering to a moving web
04/12/1989EP0311063A2 Process and device for treatment of a photographic recording material
04/12/1989EP0311058A2 X-ray exposure apparatus
04/12/1989EP0310881A2 Polymeric iodonium salts, method for making, and heat curable compositions
04/12/1989EP0310631A1 Thermal stabilization of photoresist images
04/12/1989CN2035895U Synchronous device for drum phototype setting machine
04/11/1989US4821196 High resolution automatic focus correction electronic subsystem for E-beam lithography
04/11/1989US4821072 Pressurizing-type image forming device
04/11/1989US4820930 Photomask positioning device
04/11/1989US4820829 Substituted o-phthalaldehydes
04/11/1989US4820788 Etching resistant photoresist, barrier
04/11/1989US4820621 Alkyl-substituted phenyl or naphthyl ether of polyoxyethylene glycol
04/11/1989US4820619 Copolymer of glycidyl (meth-) acrylate or vinyl ether) with (meth-) acrylic amide or ester having quaternary ammonium salt
04/11/1989US4820611 Titanium nitride as an antireflection coating on highly reflective layers for photolithography
04/11/1989US4820610 Process for preparation of light-sensitive composition polymerizable composition containing a silver halide in-water emulsion
04/11/1989US4820609 Crosslinked copolymer of phenylmethacrylate and methacrylic acid with zing bromide additive
04/11/1989US4820607 Containing a compound capable of producing an acid by actinic radiation